会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明申请
    • Fixtureless vertical paddle electroplating cell
    • 无夹钳垂直电镀电镀槽
    • US20060070883A1
    • 2006-04-06
    • US10958161
    • 2004-10-04
    • Lincoln BejanDouglas CraftsSteve SwainDuy Trang
    • Lincoln BejanDouglas CraftsSteve SwainDuy Trang
    • C25D5/02C25D17/00
    • C25D17/001C25D17/00C25D17/004C25D17/007C25D17/06
    • A submersible assembly for exposing respective front surfaces of different work-pieces to an electroplating bath as a partial respective electrodes thereof, while protecting opposing, rear surfaces of the work-pieces from the bath. The assembly includes a wall, having a front surface also partially forming a first electrode of the bath, and having an opening smaller in size than the perimeter of a work-piece while substantially corresponding in size to the portion of the front surface of the work-piece to be exposed to the bath. The assembly also includes a chuck mechanism for applying pressure against the rear surface of the work-piece to thereby hold the work-piece against a rear surface of the wall and create a fluid-tight seal between the rear surface of the wall and the perimeter of the front surface of the work-piece, thereby exposing the front surface of the work-piece to the bath while protecting the rear surface of the work-piece from exposure to the bath.
    • 一种用于将不同工件的各个前表面暴露于电镀浴作为其部分相应电极的潜水组件,同时保护工件的相对的后表面与熔池相对。 该组件包括壁,其前表面也部分地形成浴槽的第一电极,并且具有比工件的周边更小的开口,同时基本上对应于工件前表面部分的尺寸 衣服要暴露在浴缸里。 组件还包括用于向工件的后表面施加压力的卡盘机构,从而将工件保持在壁的后表面上,并在壁的后表面与周边之间产生流体密封 的工件的前表面,从而将工件的前表面暴露于浴中,同时保护工件的后表面免于暴露于浴中。
    • 5. 发明申请
    • OPTICAL SUBASSEMBLY
    • 光学分层
    • US20050117853A1
    • 2005-06-02
    • US09752881
    • 2000-12-28
    • Venkatesan MuraliDouglas CraftsSuresh RamalingamBrett ZaborskySiegfried Fleischer
    • Venkatesan MuraliDouglas CraftsSuresh RamalingamBrett ZaborskySiegfried Fleischer
    • G02B6/42G02B6/36
    • G02B6/4246G02B6/4214G02B6/4292
    • An apparatus including a base having a first opening of a dimension suitable to pass a light emission therethrough, a first side wall coupled to the base and having a second opening of a dimension suitable to pass a light emission therethrough, a second side wall coupled to the base and having a reflective component thereon, and the base, the first side wall, and the second side wall define an interior chamber with the reflective component disposed in the interior chamber; and a fiber connector extending from an exterior of the first side wall adjacent the second opening. A method including powering a laser disposed in a substrate coupling a fiber optic cable to an optical subassembly; and aligning the optical assembly over the transceiver board to capture the emitted light from the laser in the fiber optic cable.
    • 一种装置,包括具有第一开口的基座,该第一开口的尺寸适于通过其中的光发射;第一侧壁,其耦合到所述基座并且具有适于使光发射通过的尺寸的第二开口;第二侧壁, 所述底座并且在其上具有反射部件,并且所述基座,所述第一侧壁和所述第二侧壁限定内部腔室,所述反射部件设置在所述内部腔室中; 以及从邻近第二开口的第一侧壁的外部延伸的光纤连接器。 一种方法,包括为将光纤电缆耦合到光学子组件的基板中的激光器供电; 并且将光学组件对准在收发器板上以捕获来自光纤电缆中的激光器的发射光。
    • 7. 发明授权
    • Fine line metallization of photovoltaic devices by partial lift-off of optical coatings
    • 通过光学涂层的部分剥离对光伏器件进行细线金属化
    • US08236604B2
    • 2012-08-07
    • US13027576
    • 2011-02-15
    • Oliver Schultz-WittmannDouglas CraftsDenis DeCeusterAdrian Turner
    • Oliver Schultz-WittmannDouglas CraftsDenis DeCeusterAdrian Turner
    • H01L21/28
    • H01L31/022425H01L31/02168Y02E10/50
    • A metal grid contact and dielectric pattern on a layer requiring conductive contact in a photovoltaic device. The invention includes, in one aspect, forming a metal film; forming an etch resist over the metal film by, e.g., directly writing and in-situ curing the etch resist using, e.g., ink-jetting or screen-printing; etching the metal film leaving the resist pattern and a metal grid contact pattern under the etch resist intact; forming a dielectric layer over the etch resist; and removing the resist pattern and the dielectric over the etch resist, leaving a substantially co-planar metal grid contact and dielectric pattern. The metal grid contact pattern may form the front and/or back contact electrode of a solar cell; and the dielectric layer may be an optical reflection or antireflection layer. The layer requiring contact may be multifunctional providing its own passivation, such that passivation is substantially not required in the dielectric layer.
    • 在光伏器件中需要导电接触的层上的金属栅极接触和电介质图案。 本发明在一个方面包括形成金属膜; 通过例如使用例如喷墨或丝网印刷直接写入和原位固化蚀刻抗蚀剂,在金属膜上形成蚀刻抗蚀剂; 蚀刻离开抗蚀剂图案的金属膜和蚀刻抗蚀剂下方的金属栅格接触图案完整; 在所述抗蚀剂上形成介电层; 并且在抗蚀剂上去除抗蚀剂图案和电介质,留下基本上共平面的金属栅极接触和电介质图案。 金属栅格接触图案可以形成太阳能电池的前和/或后接触电极; 并且电介质层可以是光学反射或抗反射层。 需要接触的层可以是多功能的,提供其自身的钝化,使得在介电层中基本上不需要钝化。