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1. 发明申请

US20080128303A1 Device container assembly with adjustable retainers for a reticle 审中-公开
标题翻译：用于掩模版的带可调节保持器的装置容器组件
公开(公告)号：US20080128303A1
公开(公告)日：2008-06-05
申请号：US11634786
申请日：2006-12-05
申请人： Alton H. Phillips , Douglas C. Watson , Michael Binnard
发明人： Alton H. Phillips , Douglas C. Watson , Michael Binnard
IPC分类号： G03F9/00 , B65D85/38
CPC分类号： G03F7/70741 , G03F1/66
摘要： A device container assembly (30) for storing a reticle (26) includes a first container (246) and a device retainer assembly (248). The first container (246) encircles and encloses the reticle (26). The device retainer assembly (248) selectively couples the reticle to the first container (246). The device retainer assembly (248) can include an adjustable first device retainer (256) having a retainer section (280A) that is movable relative to the first container (246) between an engaged position (281A) in which the retainer section (280A) engages the reticle (26) and a disengaged position (281B) in which the retainer section (280A) does not engage the reticle (26). With this design, the device container assembly (30) can retain the reticle (26) in a secure fashion and the integrity of the reticle (26) is maintained by the device container assembly (30).
摘要翻译：一种用于存储掩模版（26）的装置容器组件（30）包括第一容器（246）和装置保持器组件（248）。第一容器（246）围绕并包围掩模版（26）。装置保持器组件（248）选择性地将掩模版连接到第一容器（246）。装置保持器组件（248）可以包括可调节的第一装置保持器（256），其具有保持器部分（280A），该保持器部分可相对于第一容器（246）移动在接合位置（281A）之间， 280A）接合所述掩模版（26）和所述保持器部分（280A）不接合所述掩模版（26）的分离位置（281B）。通过这种设计，装置容器组件30可以以安全的方式保持掩模版26，并且掩模版26的完整性由装置容器组件30保持。

2. 发明授权

US07830046B2 Damper for a stage assembly 有权
标题翻译：舞台组装的阻尼器
公开(公告)号：US07830046B2
公开(公告)日：2010-11-09
申请号：US11725024
申请日：2007-03-16
申请人： Michael Binnard , Douglas C. Watson , Jean-Marc Gery
发明人： Michael Binnard , Douglas C. Watson , Jean-Marc Gery
IPC分类号： H02K41/00
CPC分类号： H02K41/031 , H02K1/278 , H02K7/09 , H02K7/104 , H02K16/00 , H02K49/04
摘要： A stage assembly (220) that moves a work piece (200) along a first axis includes a stage base (236), a guide bar (238), a device table (240) that retains the work piece (200), a mover assembly (242), and a damper (225). The damper (225) can be a passive, electromagnetic damper that passively dampens movement of the guide bar (238) relative to the stage base (236) along a second axis that is orthogonal to the first axis. The damper (225) can include a magnet array (356) and a conductor (366) that is positioned in a magnetic field that surrounds the magnet array (356). With this design, relative movement between the guide bar (238) and the stage base (236) along the second axis induces the flow of current in the conductor (366) and eddy current damping. The damper (225) can include a first damper subassembly (252A) that is coupled to the guide bar (238) and a second damper subassembly (252B) that is coupled to the stage base (236).
摘要翻译：沿着第一轴线移动工件（200）的台架组件（220）包括台架（236），导杆（238），保持工件（200）的装置台（240）组件（242）和阻尼器（225）。阻尼器（225）可以是被动的电磁阻尼器，其被动地抑制导向杆（238）相对于载置台（236）沿着与第一轴线正交的第二轴线的运动。阻尼器（225）可以包括位于围绕磁体阵列（356）的磁场中的磁体阵列（356）和导体（366）。利用这种设计，沿着第二轴的引导杆（238）和台架（236）之间的相对运动引起导体（366）中的电流流动和涡流阻尼。阻尼器（225）可以包括联接到导杆（238）的第一阻尼器子组件（252A）和耦合到平台基座（236）的第二阻尼器子组件（252B）。

3. 发明授权

US07869000B2 Stage assembly with lightweight fine stage and low transmissibility 有权
标题翻译：舞台装配轻巧细腻，传送率低
公开(公告)号：US07869000B2
公开(公告)日：2011-01-11
申请号：US11048405
申请日：2005-01-31
申请人： Yoichi Arai , Andrew J. Hazelton , Michael Binnard , W. Thomas Novak , Douglas C. Watson , Kirk Lok
发明人： Yoichi Arai , Andrew J. Hazelton , Michael Binnard , W. Thomas Novak , Douglas C. Watson , Kirk Lok
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70716
摘要： A stage assembly (220) that moves a work piece (200) along a first axis, along a second axis and along a third axis includes a first stage (238), a first mover assembly (242) that moves the first stage (238) along the first axis, a second stage (240) that retains the work piece (200), a second mover assembly (244), and a non-contact bearing (257). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) along the first axis, along the second axis, and along the third axis. The non-contact bearing (257) supports the mass of the second stage (240). Further, the non-contact bearing (257) allows the second stage (240) to move relative to the first stage (238) along the first axis and along the second axis. The second mover assembly (244) can move the second stage (240) with at least four degrees of movement.
摘要翻译：沿着第二轴线沿着第三轴线沿着第一轴线移动工件（200）的台架组件（220）包括第一阶段（238），第一移动器组件（242），其使第一阶段（238）移动），保持所述工件（200）的第二级（240），第二移动器组件（244）和非接触式轴承（257）。第二移动器组件（244）沿着第一轴线沿着第二轴线和第三轴线相对于第一阶段（238）移动第二阶段（240）。非接触轴承（257）支撑第二级（240）的质量。此外，非接触式轴承（257）允许第二级（240）相对于第一级（238）沿着第一轴线并沿着第二轴线移动。第二移动器组件（244）可以以至少四个移动程度移动第二平台（240）。

4. 发明申请

US20080225253A1 Damper for a stage assembly 有权
标题翻译：舞台组装的阻尼器
公开(公告)号：US20080225253A1
公开(公告)日：2008-09-18
申请号：US11725024
申请日：2007-03-16
申请人： Michael Binnard , Douglas C. Watson , Jean-Marc Gery
发明人： Michael Binnard , Douglas C. Watson , Jean-Marc Gery
IPC分类号： G03B27/42 , G03B27/58 , H02K41/00
CPC分类号： H02K41/031 , H02K1/278 , H02K7/09 , H02K7/104 , H02K16/00 , H02K49/04
摘要： A stage assembly (220) that moves a work piece (200) along a first axis includes a stage base (236), a guide bar (238), a device table (240) that retains the work piece (200), a mover assembly (242), and a damper (225). The damper (225) can be a passive, electromagnetic damper that passively dampens movement of the guide bar (238) relative to the stage base (236) along a second axis that is orthogonal to the first axis. The damper (225) can includes a magnet array (356) and a conductor (366) that is positioned in a magnetic field that surrounds the magnet array (356). With this design, relative movement between the guide bar (238) and the stage base (236) along the second axis induces the flow of current in the conductor (366) and eddy current damping. The damper (225) can include a first damper subassembly (252A) that is coupled to the guide bar (238) and a second damper subassembly (252B) that is coupled to the stage base (236).
摘要翻译：沿着第一轴线移动工件（200）的台架组件（220）包括台架（236），导杆（238），保持工件（200）的装置台（240）组件（242）和阻尼器（225）。阻尼器（225）可以是被动的电磁阻尼器，其被动地抑制导向杆（238）相对于载置台（236）沿着与第一轴线正交的第二轴线的运动。阻尼器（225）可以包括位于围绕磁体阵列（356）的磁场中的磁体阵列（356）和导体（366）。利用这种设计，沿着第二轴的引导杆（238）和台架（236）之间的相对运动引起导体（366）中的电流流动和涡流阻尼。阻尼器（225）可以包括联接到导杆（238）的第一阻尼器子组件（252A）和耦合到载物台基座（236）的第二阻尼器子组件（252B）。

5. 发明授权

US06842226B2 Flexure supported wafer table 失效
标题翻译：弯曲支撑晶圆台
公开(公告)号：US06842226B2
公开(公告)日：2005-01-11
申请号：US09960584
申请日：2001-09-21
申请人： Douglas C. Watson , Michael Binnard
发明人： Douglas C. Watson , Michael Binnard
IPC分类号： G03F7/20 , G03B27/58 , G03B27/62 , G03B27/42
CPC分类号： G03F7/707 , G03F7/70716 , G03F7/70758 , G03F7/70816
摘要： An apparatus and method for supporting and precisely positioning a table or stage with respect to a frame. The table is supported by at least one flexible member which is flexible in a plurality of degrees of freedom. The flexible member is mounted on a base which is movable in an additional degree of freedom. In the context of lithographic semiconductor processing, a wafer stage can thereby be precisely positioned with respect to a frame or reticle in six degrees of freedom.
摘要翻译：一种用于相对于框架支撑和精确地定位桌子或台阶的装置和方法。桌子由至少一个灵活的多个自由度的柔性构件支撑。柔性构件安装在可以在另外的自由度上移动的基座上。在光刻半导体处理的上下文中，因此可以以六个自由度相对于框架或掩模版精确地定位晶片台。

6. 发明授权

US06734947B2 Quick chamber seals 失效
标题翻译：快速室密封
公开(公告)号：US06734947B2
公开(公告)日：2004-05-11
申请号：US09760797
申请日：2001-01-17
申请人： Douglas C. Watson , Michael Binnard
发明人： Douglas C. Watson , Michael Binnard
IPC分类号： G03B2752
CPC分类号： G03F7/70691 , G03B27/42 , G03F7/708
摘要： A chamber seal device is provided to seal a wafer stage chamber assembly to isolate semiconductor substrates, a wafer stage device, and the process of making semiconductor wafers from an atmospheric condition, so that the resulted wafers have an improved quality and meet certain wafer manufacturing specifications. The wafer stage chamber assembly includes a wafer stage chamber, a top wall and a base frame. The wafer stage chamber assembly is supported by an apparatus frame of an exposure apparatus via a plurality of body supports. The chamber seal device includes one or more o-ring seals positioned in between and surrounding the perimeter of the wafer stage chamber and the top wall, or the wafer stage chamber and the base frame to seal the wafer stage chamber assembly.
摘要翻译：提供室密封装置以密封晶片台室组件以隔离半导体衬底，晶片台装置以及从大气条件制造半导体晶片的过程，使得所得到的晶片具有改进的质量并满足某些晶片制造规范。晶片台室组件包括晶片台室，顶壁和底架。晶片台室组件经由多个主体支撑体由曝光装置的装置框架支撑。腔室密封装置包括一个或多个O形环密封件，该密封件位于晶片载置台和顶壁之间并围绕晶片台室周边或围绕晶片台室和基座框架以密封晶片台室组件。

7. 发明授权

US06639654B2 Wafer stage carrier and removal assembly 失效
公开(公告)号：US06639654B2
公开(公告)日：2003-10-28
申请号：US09843077
申请日：2001-04-27
申请人： Michael Binnard , Douglas C. Watson
发明人： Michael Binnard , Douglas C. Watson
IPC分类号： G03B2758
CPC分类号： G03F7/70716 , G03F7/70825 , G03F7/709 , Y10S414/135
摘要： A device and method are provided to remove a wafer stage carrier carrying a wafer stage assembly from an exposure apparatus. The wafer stage carrier may be removably fastened to the apparatus frame of the exposure apparatus by any types of mechanical fasteners. The removal assembly includes a set of expandable supports and a set of removal supports. When the apparatus frame supports the wafer stage carrier, the wafer stage carrier hangs above a stationary surface, such as the ground. To remove the wafer stage carrier, the set of expandable supports is expanded until it reaches the ground and is capable of supporting the weight of the wafer stage carrier. At this juncture, the mechanical fasteners may be removed to allow the weight of the wafer stage carrier to transfer from the apparatus frame to the expandable supports. The set of expandable supports may reduce its expansion to lower the wafer stage carrier away from the exposure apparatus until the set of removal supports reaches the ground and supports the weight of the wafer stage carrier.

8. 发明授权

US08853988B2 Control systems and methods for compensating for effects of a stage motor 有权
标题翻译：用于补偿平台电机的影响的控制系统和方法
公开(公告)号：US08853988B2
公开(公告)日：2014-10-07
申请号：US12406322
申请日：2009-03-18
申请人： Michael B. Binnard , Scott Coakley , Douglas C. Watson , Pai-Hsueh Yang
发明人： Michael B. Binnard , Scott Coakley , Douglas C. Watson , Pai-Hsueh Yang
IPC分类号： G05B1/06 , G05B19/404 , G03F7/20
CPC分类号： G05B19/404 , G03F7/70725 , G03F7/70758 , G05B2219/41128 , G05B2219/41443
摘要： Embodiments of the invention compensate for one or more effects of a stage motor in a precision stage device. A feedforward module receives an input signal corresponding to the effect of the motor and generates a feedforward control signal that can be used to modify a motor control signal to compensate for the effect of the motor. In some embodiments, a control system is provided to compensate for a back-electromotive force generated by a motor, while in other embodiments, a control system may compensate for an inductive effect of a motor. Embodiments of the invention may be useful in precision stage devices, for example, lithography devices such as steppers and scanners.
摘要翻译：本发明的实施例补偿了精密级装置中的级电动机的一个或多个效果。前馈模块接收与电动机的效果相对应的输入信号，并产生可用于修改电动机控制信号以补偿电动机的影响的前馈控制信号。在一些实施例中，提供控制系统以补偿由电动机产生的反电动势，而在其他实施例中，控制系统可以补偿电动机的感应效应。本发明的实施例可用于精密平台装置，例如平版印刷装置，例如步进器和扫描器。

9. 发明授权

US08767174B2 Temperature-controlled holding devices for planar articles 有权
标题翻译：用于平面物品的温度控制保持装置
公开(公告)号：US08767174B2
公开(公告)日：2014-07-01
申请号：US13026129
申请日：2011-02-11
申请人： Michael R. Sogard , Alton H. Phillips , Douglas C. Watson
发明人： Michael R. Sogard , Alton H. Phillips , Douglas C. Watson
IPC分类号： G03B27/42
CPC分类号： H01L21/67109 , G03F7/70716 , G03F7/70875
摘要： An exemplary apparatus includes a controllably movable body, a holding device, and a coolant circulation device. The body comprises a wall including a planar contact surface that receives the reverse surface of the article. The wall co-extends with at least a heat-receiving area of the utility surface whenever the article is being held by the body. The wall also includes a second surface separated from but proximal to the contact surface, and is thermally conductive from the contact surface to the second surface. The holding device holds the article to the contact surface with the reverse surface contacting the contact surface. The coolant circulation device delivers flow of a coolant fluid to the second surface to urge conduction of heat from the contact surface to the second surface. The holding device and coolant-circulation device operate in concert to actively control shape of the article being held by the apparatus.
摘要翻译：示例性装置包括可控制的移动体，保持装置和冷却剂循环装置。该主体包括一个壁，该壁包括接纳制品的相反表面的平面接触表面。每当物品被身体保持时，墙壁至少与实用表面的受热区域共同延伸。该壁还包括从接触表面分离但接近接触表面的第二表面，并且从接触表面到第二表面是导热的。保持装置将物品保持在与接触表面接触的反面的接触表面上。冷却剂循环装置将冷却剂流体的流动传递到第二表面以促使热量从接触表面传导到第二表面。保持装置和冷却剂循环装置协同工作以主动地控制由装置保持的物品的形状。

10. 发明申请

US20140176931A1 INTERMITTENT TEMPERATURE CONTROL OF MOVABLE OPTICAL ELEMENTS 审中-公开
标题翻译：可移动光学元件的间歇温度控制
公开(公告)号：US20140176931A1
公开(公告)日：2014-06-26
申请号：US14237821
申请日：2012-08-12
申请人： Alton H. Phillips , Douglas C. Watson , Travis D. Bow , Hiroyuki Kondo , Atsushi Yamada , Hideo Takino , Hideki Komatsuda
发明人： Alton H. Phillips , Douglas C. Watson , Travis D. Bow , Hiroyuki Kondo , Atsushi Yamada , Hideo Takino , Hideki Komatsuda
IPC分类号： G02B26/08 , G03F7/20
CPC分类号： G02B26/0816 , G03F7/70075 , G03F7/702 , G03F7/70825 , G03F7/70891 , G03F7/7095
摘要： An optical system including an optical element, a positioning mechanism configured to position the optical element into an operational position, and a temperature control mechanism configured to intermittently control the temperature of the optical element between operations. By alternatively positioning the optical element between an operational position and a position in thermal contact with the temperature control mechanism, the two mechanisms for positioning and controlling the temperature of the optical element are de-coupled from one another. As a result, the mechanism for each may be optimized In non-exclusive embodiments, the temperature control mechanism may be used to control the temperature of an individual optical element or a plurality of optical elements, such as for example, a fly's eye mirror used in an illumination unit of an EUV lithography tool.
摘要翻译：一种光学系统，包括光学元件，配置成将光学元件定位在操作位置的定位机构，以及配置为在操作之间间歇地控制光学元件的温度的温度控制机构。通过可选地将光学元件定位在与温度控制机构热接触的操作位置和位置之间，用于定位和控制光学元件的温度的两个机构彼此脱耦合。结果，可以优化每个的机构在非排他性的实施例中，温度控制机构可用于控制单个光学元件或多个光学元件的温度，例如使用的飞眼镜在EUV光刻工具的照明单元中。

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