专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5300396A Process of making naphthoquinone diazide esters using lactone solvents 失效
标题翻译：使用内酯溶剂制备萘醌二叠氮酯的方法
公开(公告)号：US5300396A
公开(公告)日：1994-04-05
申请号：US619154
申请日：1990-11-28
申请人： Dinesh N. Khanna , Robert E. Potvin
发明人： Dinesh N. Khanna , Robert E. Potvin
IPC分类号： G03C1/52 , C07C245/12 , C07C303/28 , C07C309/71 , C07C309/74 , C07C309/76 , C07C317/22 , C07C323/20 , G03F7/022
CPC分类号： C07C303/28 , G03F7/0226 , C07C2102/10
摘要： A method of preparing a photosensitizer condensate comprising: condensing a phenolic compound with a diazo sulfonyl chloride, wherein from about 50 to 100 mole percent of the diazo moiety is 2,1,4-diazo and from 0 to about 50 mole percent of the diazo moiety is 2,1,5 diazo; the phenolic compound having, on average, from about 60 mole percent to about 100 mole percent of its hydroxy groups esterified by the diazo sulfonyl chloride; wherein the condensing is conducted in a lactone solvent in the presence of an acid scavenger; and then subsequently isolating the photosensitizer condensate.
摘要翻译：一种制备光敏剂缩合物的方法，包括：将酚类化合物与重氮磺酰氯缩合，其中重氮部分的约50至100摩尔％为重氮基，重氮为0至约50摩尔％部分为2,1,5重氮; 酚类化合物平均具有由重氮磺酰氯酯化的约60摩尔％至约100摩尔％的羟基; 其中所述冷凝在酸清除剂存在下在内酯溶剂中进行; 然后随后分离光敏剂冷凝物。

2. 发明授权

US5260162A Photosensitizer compositions containing diazo fluorinated esters of hexafluoro-bis-phenols or bis-hexafluoroethers 失效
标题翻译：含有六氟 - 双酚或双 - 六氟醚的重氮氟化酯的光敏剂组合物
公开(公告)号：US5260162A
公开(公告)日：1993-11-09
申请号：US628549
申请日：1990-12-17
申请人： Dinesh N. Khanna , Robert E. Potvin
发明人： Dinesh N. Khanna , Robert E. Potvin
IPC分类号： C08K3/16 , C08L77/00 , C08L77/06 , G03F7/004 , G03F7/016 , G03F7/022 , G03F7/027 , G03F7/029 , G03F7/037 , G03F7/039 , H01L21/027 , G03F7/023
CPC分类号： G03F7/022 , G03F7/0046 , Y10S430/107
摘要： A photosensitizer composition comprising a diazo fluorinated ester containing the hexafluoroisopropylidene group, said photosensitizer selected from hexafluoro-bis-phenols having the following formula: ##STR1## where R is selected from hydrogen, methyl, ethyl and phenyl; and bis-hexafluoroethers having the following formula: ##STR2## wherein R' is selected from hydrogen, methyl, ethyl and phenyl.

3. 发明授权

US06368421B1 Composition for stripping photoresist and organic materials from substrate surfaces 失效
标题翻译：用于从基材表面剥离光致抗蚀剂和有机材料的组合物
公开(公告)号：US06368421B1
公开(公告)日：2002-04-09
申请号：US09113892
申请日：1998-07-10
申请人： Joseph E. Oberlander , Mark S. Slezak , Dinesh N. Khanna , Dana L. Durham , Lawrence F. Spinicelli
发明人： Joseph E. Oberlander , Mark S. Slezak , Dinesh N. Khanna , Dana L. Durham , Lawrence F. Spinicelli
IPC分类号： B08B304
CPC分类号： G03F7/426
摘要： The invention relates to the field of microelectronics, such as integrated circuits, and more particularly to compositions and methods of removing photoresists or other organic materials from the surfaces of substrates used in the fabrication of integrated circuits. In particular the present invention relates to amine-free stripping compositions comprising solvent and surfactant that can effectively remove organic materials without corroding the underlying substrate, and the invention also relates to methods for removing these organic materials with the novel stripping composition.
摘要翻译：本发明涉及微电子学领域，例如集成电路，更具体地涉及从用于制造集成电路的衬底表面去除光致抗蚀剂或其它有机材料的组合物和方法。特别地，本发明涉及不含无溶剂和表面活性剂的无胺汽提组合物，其可有效去除有机材料而不腐蚀下面的基底，本发明还涉及用新的汽提组合物除去这些有机材料的方法。

4. 发明授权

US6106995A Antireflective coating material for photoresists 失效
标题翻译：用于光致抗蚀剂的抗反射涂层材料
公开(公告)号：US6106995A
公开(公告)日：2000-08-22
申请号：US373319
申请日：1999-08-12
申请人： Sunit S. Dixit , M. Dalil Rahman , Dinesh N. Khanna , Joseph E. Oberlander , Dana L. Durham
发明人： Sunit S. Dixit , M. Dalil Rahman , Dinesh N. Khanna , Joseph E. Oberlander , Dana L. Durham
IPC分类号： G03F7/004 , C09D5/00 , C09D179/00 , G03F7/09 , G03F7/11 , H01L21/027 , G03C1/492
CPC分类号： G03F7/091
摘要： The present invention relates to an antireflective coating composition comprising an admixture of:a) a polymer defined by the following structure: ##STR1## where, R.sub.1 & R.sub.2 are independently hydrogen, or C.sub.1 to C.sub.5 alkylR.sub.3 is a methyl, ethyl, propyl or butyl groupR.sub.4 -R.sub.7 are independently hydrogen, or C.sub.1 to C.sub.5 alkyln=10 to 50,000(b) a fluorine-containing, sparingly water-soluble (0.1%-10% by weight in water) organic C.sub.3 -C.sub.13 aliphatic carboxylic acid;(c) a non-metallic hydroxide; and(d) a solvent.The invention also relates to a method for producing such an antireflective coating composition and to a method for producing a microelectronic device using such an antireflective coating composition in conjunction with a photoresist composition.
摘要翻译：本发明涉及一种抗反射涂料组合物，其包含以下混合物的混合物：a）由以下结构定义的聚合物：其中R1和R2独立地为氢，或C1至C5烷基，R3为甲基，乙基，丙基或丁基R4 -R7独立地为氢，或C 1至C 5烷基n = 10至50,000（b）含氟的微水溶性（0.1重量％-10重量％的水）有机C 3 -C 13脂族羧酸; （c）非金属氢氧化物; 和（d）溶剂。本发明还涉及一种制备这种抗反射涂料组合物的方法和一种使用这种抗反射涂料组合物与光致抗蚀剂组合物一起生产微电子器件的方法。

5. 发明授权

US5981145A Light absorbing polymers 失效
标题翻译：吸光聚合物
公开(公告)号：US5981145A
公开(公告)日：1999-11-09
申请号：US846986
申请日：1997-04-30
申请人： Shuji Ding , Dinesh N. Khanna , Ping-Hung Lu , Jianhui Shan , Ralph R. Dammel , Dana L. Durham , M. Dalil Rahman , Iain McCulloch
发明人： Shuji Ding , Dinesh N. Khanna , Ping-Hung Lu , Jianhui Shan , Ralph R. Dammel , Dana L. Durham , M. Dalil Rahman , Iain McCulloch
IPC分类号： G03F7/11 , C08F8/00 , C08F8/30 , G03F7/09 , H01L21/027
CPC分类号： G03F7/091 , C08F8/00 , C08F8/30 , C08F12/24 , C08F212/14 , C08F2810/20
摘要： The present invention relates to a novel polymer suitable for use as an antireflective coating or as an additive in photoresist for absorption of reflected light. The novel polymer comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The polymer is soluble in organic solvents, preferrably solvents of low toxicity, or it may be soluble in water, which may additionally contain other water miscible organic solvents.
摘要翻译：本发明涉及一种适合用作抗反射涂层的新型聚合物或作为用于吸收反射光的光刻胶中的添加剂。该新型聚合物包含至少一个含有吸收约180nm至约450nm的染料的单元和至少一个不含芳香官能团的单元。聚合物可溶于有机溶剂中，优选低毒性溶剂，或者它可溶于水，其可另外含有其它与水可混溶的有机溶剂。

6. 发明授权

US5395871A Process of making a stable solution of poly(hydroxystyrene) functionalized with t-butyloxycarbonyl groups 失效
标题翻译：制备用叔丁氧基羰基官能化的聚（羟基苯乙烯）稳定溶液的方法
公开(公告)号：US5395871A
公开(公告)日：1995-03-07
申请号：US239096
申请日：1994-05-06
申请人： Dinesh N. Khanna
发明人： Dinesh N. Khanna
IPC分类号： C08F12/22 , C08J3/09 , C08L25/08 , C08L25/18 , C08K5/06 , C08F18/24 , C08K5/10 , C08L69/00
CPC分类号： C08J3/09 , C08F12/22 , C08J2325/18
摘要： Poly(hydroxystyrene) resins in which a portion of the hydroxyl groups are functionalized with t-butyloxycarbonyl groups ("t-Boc") tend to decompose during drying of the wet solid and on storage in the solid state. Solutions that are more stable than the solid material can be made from the wet freshly synthesized solid by dissolving the wet solid in a solvent that forms an azeotrope with water and then distilling the azeotrope of water and solvent from the solution until the solution contains less than about 1% by weight of water.
摘要翻译：其中一部分羟基被叔丁氧基羰基（“t-Boc”）官能化的聚（羟基苯乙烯）树脂在湿固体的干燥期间倾向于分解并在固体状态下储存。比固体材料更稳定的溶液可以通过将湿固体溶解在与水形成共沸物的溶剂中，然后从溶液中蒸馏出水和溶剂的共沸物，直到溶液含有少于约1重量％的水。

7. 发明授权

US5221592A Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester 失效
标题翻译：苯并内酯环化合物的重氮酯和使用重氮酯的正性光致抗蚀剂组合物和元素
公开(公告)号：US5221592A
公开(公告)日：1993-06-22
申请号：US847527
申请日：1992-03-06
申请人： Dinesh N. Khanna , Douglas McKenzie , Chester J. Sobodacha , Ralph R. Dammel
发明人： Dinesh N. Khanna , Douglas McKenzie , Chester J. Sobodacha , Ralph R. Dammel
IPC分类号： G03F7/022
CPC分类号： G03F7/022 , Y10S430/168
摘要： A photosensitizer comprising a diazo ester of benzolactone ring compound, such as phenolphthalein or cresolphthalein as the backbone, where at least one of the hydroxy groups on the benzolactone ring compound has been esterified with diazo-sulfonyl chloride consisting of 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride or a mixture thereof, and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition and a suitable solvent.
摘要翻译：一种光敏剂，其包含苯并内酯环化合物的重氮酯，例如酚酞或甲酚酞作为主链，其中苯并内酯环化合物上的至少一个羟基已用由60至100摩尔％2的重氮磺酰氯酯化， 1,4或2,1,5-重氮磺酰氯或其混合物，以及光致抗蚀剂，其包含光致抗蚀剂组合物中以足以使光致抗蚀剂组合物均匀光敏的量的光敏剂的混合物; 水不溶性的碱溶性酚醛清漆树脂，酚醛清漆树脂以足以形成基本均匀的光致抗蚀剂组合物和合适溶剂的量存在于光致抗蚀剂组合物中。

8. 发明授权

US5037949A Polymers prepared from 4,4'-bis[2-(amino (halo) phenoxyphenyl) hexafluoroisopropyl]diphenyl ether 失效
标题翻译：由4,4'-双[2-（氨基（卤代）苯氧基苯基）六氟异丙基]二苯基醚制备的聚合物
公开(公告)号：US5037949A
公开(公告)日：1991-08-06
申请号：US489448
申请日：1990-03-06
申请人： Werner H. Mueller , Dinesh N. Khanna , Rohitkumar H. Vora , Ruediger J. Erckel
发明人： Werner H. Mueller , Dinesh N. Khanna , Rohitkumar H. Vora , Ruediger J. Erckel
IPC分类号： C07C65/24 , C07C217/90 , C08G69/40 , C08G73/10 , C08G73/12 , G03F7/038
CPC分类号： C07C65/24 , C07C217/90 , C08G69/40 , C08G73/105 , C08G73/1057 , C08G73/1064 , C08G73/123 , C08G73/124 , G03F7/0387
摘要： This invention relates to new fluorine-containing polyimides, polyamide-acids/esters, polyamides, addition polyimides and imide oligomers which exhibit low melting points, better solubilities, low dielectric constants, superior thermal and thermal oxidative stability, and improved processing characteristics.The products of this invention are characterized by the fact that they are derived from 4,4'-bis[2-(amino(halo)phenoxyphenyl)hexafluoroisopropyl]diphenyl ether.
摘要翻译：本发明涉及显示低熔点，更好的溶解度，低介电常数，优异的热和热氧化稳定性以及改善的加工特性的新的含氟聚酰亚胺，聚酰胺酸/酯，聚酰胺，加成聚酰亚胺和酰亚胺低聚物。本发明的产物的特征在于它们衍生自4,4'-双[2-（氨基（卤代）苯氧基苯基）六氟异丙基]二苯醚。

9. 发明授权

US5011753A Photoresist compositions containing polyamides polybenzoxa from bis((aminohydroxyphenyl)hexafluoroisopropyl)diphenyl ethers 失效
标题翻译：含有二（（氨基羟基苯基）六氟异丙基）二苯基醚的聚酰胺聚苯并恶唑的光致抗蚀剂组合物
公开(公告)号：US5011753A
公开(公告)日：1991-04-30
申请号：US476332
申请日：1990-02-07
申请人： Werner H. Mueller , Dinesh N. Khanna
发明人： Werner H. Mueller , Dinesh N. Khanna
IPC分类号： C08G69/26 , C08G69/32 , C08G73/22 , G02F1/1337 , G03F7/023 , G03F7/037 , H01B3/30
CPC分类号： H01B3/303 , C08G69/26 , C08G69/32 , C08G73/22 , G02F1/133723 , G03F7/0233 , G03F7/037
摘要： Heat resistant, shapable, hydroxy and/or alkoxy-substituted polyamides derived from at least one diamine selected from unsubstituted and substituted 4,4'-bis[2-(4-amino-3-hydroxyphenyl)hexafluoroisopropyl)]diphenyl ether 4,4'-bis-[2-(3-amino-4-hydroxyphenyl)hexafluoroisopropyl]diphenyl ether and a dicarboxylic acid or a derivative thereof e.g. its acid halo or ester. The polyamides of the invention may be thermally cured to form polybenzoxazoles of higher heat resistance which are stable to hydrolytic, chemical and radiation attack.The polyamides of the invention may be formed into shaped articles by molding, extrusion and solvent casting processes preferably in the presence of a solvent or diluent and then optionally converted into heat resistant, insoluble polybenzoxazoles. These shaped articles are useful in aircraft, electronic and other commercial applications where heat, chemical and radiation resistance are desired in conjunction with good mechanical and electrical properties.
摘要翻译：衍生自至少一种选自未取代的和取代的4,4'-双[2-（4-氨基-3-羟基苯基）六氟异丙基）]二苯基醚4,4'-二胺的二胺的耐热，可成形的羟基和/或烷氧基取代的聚酰胺 ' - 双 - [2-（3-氨基-4-羟基苯基）六氟异丙基]二苯醚和二羧酸或其衍生物例如其酸卤素或酯。本发明的聚酰胺可以被热固化以形成对于水解，化学和辐射攻击是稳定的较高耐热性的聚苯并恶唑。本发明的聚酰胺可以通过模制，挤出和溶剂浇铸方法形成成型制品，优选在溶剂或稀释剂的存在下，然后任选地转化成耐热不溶性聚苯并恶唑。这些成型制品在飞机，电子和其他商业应用中是有用的，其中需要耐热，耐化学性和耐辐射性以及良好的机械和电学性能。

10. 发明授权

US4978733A Polyamide-polyamide-polyimide and polybenzoxazole-polyamide-polyimide polymer having at least one fluorine-containing linking group 失效
标题翻译：具有至少一个含氟连接基团的聚酰胺 - 聚酰胺 - 聚酰亚胺和聚苯并恶唑 - 聚酰胺 - 聚酰亚胺聚合物
公开(公告)号：US4978733A
公开(公告)日：1990-12-18
申请号：US321024
申请日：1989-03-09
申请人： Dinesh N. Khanna
发明人： Dinesh N. Khanna
IPC分类号： C08G73/14 , C08G73/22 , C08J3/09
CPC分类号： C08J3/091 , C08G73/14 , C08G73/22 , C08J2379/08
摘要： The present invention provides polyamide-polyamide-polyimide and polybenzoxazole-polyamide-polyimide polymers derived therefrom with improved processing and film characteristics having incorporated into the polymeric backbone the polymeric condensation residuum of novel aromatic diamino compounds having the formula: ##STR1## wherein A is selected from the group consisting of SO.sub.2, O, S, CO, C.sub.1 to C.sub.6 alkylene, perfluoroalkylene or perfluoroarylalkylene having from 1 to 10 carbon atoms and a bond directly linking the two aromatic groups, and R is selected from the group consisting of hydrogen, hydroxy and C.sub.1 to C.sub.4 alkoxy.The PA-PA-PI polymers of this invention are prepared by reacting compounds of the above formula alone or admixed with other aromatic diamines, with carboxyphenyl trimellitimide or the acid halide or ester derivatives thereof, alone or admixed with one or more aromatic diacid chlorides and/or one or more aromatic tetracarboxylic acids or anhydrides thereof. Polybenzoxazole-polyamide-polyimide derivatives of such polymers are prepared utilizing compounds of the above formula wherein R is hydroxy or C.sub.1 to C.sub.4 alkoxy, and by subjecting the resulting alkoxy or hydroxy-substituted polyamide-polyamide-polyimide to a dehydrating and cyclizing reaction to form the oxazole linkage which gives rise to polybenzoxazole-polyamide-polyimide polymers.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式