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1. 发明申请

US20060043319A1 Arrangement for providing a reproducible target flow for the energy beam-induced generation of short-wavelength electromagnetic radiation 有权
标题翻译：用于为能量束引起的短波长电磁辐射的产生提供可重现的目标流的布置
公开(公告)号：US20060043319A1
公开(公告)日：2006-03-02
申请号：US11213007
申请日：2005-08-26
申请人： Kai Gaebel , Diethard Kloepfel , Guido Hergenhan
发明人： Kai Gaebel , Diethard Kloepfel , Guido Hergenhan
IPC分类号： G01J3/10
CPC分类号： H05G2/008 , H05G2/003 , H05G2/005 , H05G2/006
摘要： The invention is directed to an arrangement for providing a reproducible target flow for the energy beam-induced generation of short-wavelength radiation. It is the object of the invention to find a novel possibility for providing a reproducibly supplied target flow for the generation of a plasma that emits short-wavelength radiation which ensures a high directional stability of the target flow over a large number of individual plasma generation process for any target materials under given process conditions. According to the invention, this object is met in that a nozzle protection device is provided in the interaction chamber between the target nozzle and the interaction point for the generation of the plasma, and the nozzle protection device contains a gas pressure chamber which has an aperture along the target path for unobstructed passage of the target flow and which is filled with a buffer gas that is maintained at a pressure of some 10 mbar.
摘要翻译：本发明涉及一种用于为能量束诱发的短波长辐射的产生提供可再现目标流的装置。本发明的目的是找到一种新颖的可能性，以提供可重复提供的目标流，用于产生发射短波长辐射的等离子体，其确保目标流在大量单个等离子体产生过程中的高方向稳定性对于任何目标材料在给定的工艺条件下。根据本发明，该目的在于，在目标喷嘴和用于产生等离子体的相互作用点之间的相互作用室中设置喷嘴保护装置，并且喷嘴保护装置包含气体压力室，其具有孔径沿着目标路径通过目标流的无障碍通道，并且填充有保持在约10毫巴压力的缓冲气体。

2. 发明授权

US07372057B2 Arrangement for providing a reproducible target flow for the energy beam-induced generation of short-wavelength electromagnetic radiation 有权
标题翻译：用于为能量束引起的短波长电磁辐射的产生提供可重现的目标流的布置
公开(公告)号：US07372057B2
公开(公告)日：2008-05-13
申请号：US11213007
申请日：2005-08-26
申请人： Kai Gaebel , Diethard Kloepfel , Guido Hergenhan
发明人： Kai Gaebel , Diethard Kloepfel , Guido Hergenhan
IPC分类号： G01J3/10
CPC分类号： H05G2/008 , H05G2/003 , H05G2/005 , H05G2/006
摘要： The invention is directed to an arrangement for providing a reproducible target flow for the energy beam-induced generation of short-wavelength radiation. It is the object of the invention to find a novel possibility for providing a reproducibly supplied target flow for the generation of a plasma that emits short-wavelength radiation which ensures a high directional stability of the target flow over a large number of individual plasma generation process for any target materials under given process conditions. According to the invention, this object is met in that a nozzle protection device is provided in the interaction chamber between the target nozzle and the interaction point for the generation of the plasma, and the nozzle protection device contains a gas pressure chamber which has an aperture along the target path for unobstructed passage of the target flow and which is filled with a buffer gas that is maintained at a pressure of some 10 mbar.
摘要翻译：本发明涉及一种用于为能量束诱发的短波长辐射的产生提供可再现目标流的装置。本发明的目的是找到一种新颖的可能性，以提供可重复提供的目标流，用于产生发射短波长辐射的等离子体，其确保目标流在大量单个等离子体产生过程中的高方向稳定性对于任何目标材料在给定的工艺条件下。根据本发明，该目的在于，在目标喷嘴和用于产生等离子体的相互作用点之间的相互作用室中设置喷嘴保护装置，并且喷嘴保护装置包含气体压力室，其具有孔径沿着目标路径通过目标流的无障碍通道，并且填充有保持在约10毫巴压力的缓冲气体。

3. 发明授权

US07599470B2 Arrangement for generating extreme ultraviolet radiation from a plasma generated by an energy beam with high conversion efficiency and minimum contamination 有权
标题翻译：用于从具有高转换效率和最小污染的能量束产生的等离子体产生极紫外辐射的装置
公开(公告)号：US07599470B2
公开(公告)日：2009-10-06
申请号：US11733845
申请日：2007-04-11
申请人： Diethard Kloepfel , Kai Gaebel
发明人： Diethard Kloepfel , Kai Gaebel
IPC分类号： H05G2/00 , G21G4/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/008
摘要： The invention is directed to an arrangement for generating extreme ultraviolet radiation from a plasma generated by an energy beam with high conversion efficiency, particularly for application in radiation sources for EUV lithography. It is the object of the invention to find a novel possibility for generating EUV radiation by means of a plasma induced by an energy beam that permits a more efficient conversion of the energy radiation into EUV radiation in the wavelength region of 13.5 nm and ensures a long lifetime of the optical components and the injection device. According to the invention, this object is met by using a mixture of particles with a carrier gas and the target feed device has a gas liquefaction chamber, wherein the target material is supplied to the injection unit as a mixture of solid particles in liquefied carrier gas, and a droplet generator is provided for generating a defined droplet size and series of droplets, wherein means which are controllable in a frequency-dependent manner and which are triggered by the pulse frequency of the energy beam are connected to the injection unit for the series of droplets.
摘要翻译：本发明涉及一种用于从具有高转换效率的能量束产生的等离子体产生极紫外辐射的装置，特别是用于EUV光刻的辐射源中。本发明的目的是找到一种通过能量束产生的等离子体产生EUV辐射的新型可能性，该等离子体能够将能量辐射更有效地转换成13.5nm波长区域中的EUV辐射，并确保长时间光学部件和注射装置的使用寿命。根据本发明，通过使用颗粒与载体气体的混合物来满足该目的，并且目标进料装置具有气体液化室，其中将目标材料作为液化载气中的固体颗粒的混合物供给到注射单元，并且提供液滴发生器，用于产生限定的液滴尺寸和一系列液滴，其中以频率相关方式可控制并且由能量束的脉冲频率触发的装置连接到用于串联的注射单元的液滴。

4. 发明申请

US20060017026A1 Arrangement and method for metering target material for the generation of short-wavelength electromagnetic radiation 失效
标题翻译：用于测量目标材料以产生短波长电磁辐射的布置和方法
公开(公告)号：US20060017026A1
公开(公告)日：2006-01-26
申请号：US11182362
申请日：2005-07-15
申请人： Guido Hergenhan , Diethard Kloepfel
发明人： Guido Hergenhan , Diethard Kloepfel
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006
摘要： The invention is directed to an arrangement for metering target material for the generation of short-wavelength electromagnetic radiation from an energy beam induced plasma, in particular X radiation and EUV radiation. The object of the invention is to find a novel possibility for metering target material for the generation of short-wavelength electromagnetic radiation from an energy beam induced plasma which makes it possible to provide reproducibly supplied mass-limited targets in such a way that only the amount of target material for plasma generation that can be effectively converted to radiating plasma in the desired wavelength region arrives in the interaction chamber and, therefore, debris generation and the gas burden in the interaction chamber are minimized. This object is met, according to the invention, in that an injection device is provided for target generation, wherein means are arranged upstream of the nozzle in a nozzle chamber for a defined, temporary pressure increase in order to introduce an individual target into the interaction chamber exclusively when required, and an antechamber is arranged around the nozzle for generating a quasistatic pressure upstream of the interaction chamber, wherein an equilibrium pressure in the antechamber prevents the escape of target material as long as there is no pressure increase in the nozzle chamber.
摘要翻译：本发明涉及一种用于计量用于从能量束感应等离子体，特别是X辐射和EUV辐射产生短波长电磁辐射的目标材料的装置。本发明的目的是找到一种用于从能量束诱导等离子体产生短波长电磁辐射的目标材料的新型可能性，这使得可以以这样的方式提供可再现地提供的质量限制目标：用于等离子体生成的目标材料可以被有效地转换成所需波长区域中的辐射等离子体到达相互作用室，因此，相互作用室中的碎屑产生和气体负荷被最小化。根据本发明，符合本发明的目的在于提供一种用于目标产生的注射装置，其中装置在喷嘴的上游设置在喷嘴室中，用于限定的临时压力增加，以将单个靶引入相互作用并且在喷嘴周围布置有前室，用于在相互作用室的上游产生准静压，其中只要喷嘴室中没有压力增加，前室中的平衡压力就可以防止目标材料的逸出。

5. 发明授权

US08154000B2 Arrangement for the continuous generation of liquid tin as emitter material in EUV radiation sources 有权
标题翻译：在EUV辐射源中连续生成液体锡作为发射体材料的布置
公开(公告)号：US08154000B2
公开(公告)日：2012-04-10
申请号：US12773148
申请日：2010-05-04
申请人： Guido Hergenhan , Diethard Kloepfel , Todd Byrnes , Elma Weber , Mike Möritz
发明人： Guido Hergenhan , Diethard Kloepfel , Todd Byrnes , Elma Weber , Mike Möritz
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： The invention is directed to an arrangement for generating EUV radiation based on a hot plasma using liquid emitter material. The object of the invention is to find a novel possibility for generating EUV radiation which allows a continuous supply of liquid, particularly metal, emitter material (2) under a defined high pressure without having to interrupt the continuous supply of emitter material (2) when consumed emitter material (2) must be replenished. According to the invention, this object is met in that the emitter material supply unit (4) has at least a first pressure vessel (44) and a second pressure vessel (44′) between the reservoir vessel (41) and the injection device (5) for generating a high emitter material pressure for the injection unit (5), the pressure vessels (44, 44′) are acted upon by a high-pressure gas system (73) with a gas pressure (74) in the megapascal range, and the emitter material supply unit (4) has means for switching the high-pressure gas system (73) from one pressure vessel (44, 44′) to the other pressure vessel (44, 44′) and for correspondingly alternately switching the injection unit (5) to the constant emitter material pressure of the respective pressure vessel (44, 44′) being pressurized, wherein at least one of the pressure vessels (44, 44′) can be refilled during the continuous operation of droplet generation and plasma generation.
摘要翻译：本发明涉及一种用于使用液体发射器材料基于热等离子体生成EUV辐射的装置。本发明的目的是找到产生EUV辐射的新型可能性，其允许在限定的高压下连续供应液体，特别是金属发射体材料（2），而不必中断发射体材料（2）的连续供应，当消耗的发射体材料（2）必须补充。根据本发明，满足的目的在于，发射体材料供应单元（4）在储存器容器（41）和注射装置（4）之间至少具有第一压力容器（44）和第二压力容器（44'） 5）用于产生用于注入单元（5）的高发射极材料压力，压力容器（44,44'）被高压气体系统（73）作用，其中气压（74）在兆帕范围内，并且发射体材料供给单元（4）具有用于将高压气体系统（73）从一个压力容器（44,44'）切换到另一个压力容器（44,44'）的装置，并且相应地交替地切换注射单元（5）到相应的压力容器（44,44'）的恒定的发射器材料压力被加压，其中至少一个压力容器（44,44'）可以在液滴生成的连续操作期间重新填充，等离子体生成

6. 发明申请

US20100282987A1 ARRANGEMENT FOR THE CONTINUOUS GENERATION OF LIQUID TIN AS EMITTER MATERIAL IN EUV RADIATION SOURCES 有权
标题翻译：在EUV辐射源中连续生成液氮作为发射体材料的安排
公开(公告)号：US20100282987A1
公开(公告)日：2010-11-11
申请号：US12773148
申请日：2010-05-04
申请人： Guido Hergenhan , Diethard Kloepfel , Todd Byrnes , Elma Weber , Mike Möritz
发明人： Guido Hergenhan , Diethard Kloepfel , Todd Byrnes , Elma Weber , Mike Möritz
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： The invention is directed to an arrangement for generating EUV radiation based on a hot plasma using liquid emitter material. The object of the invention is to find a novel possibility for generating EUV radiation which allows a continuous supply of liquid, particularly metal, emitter material (2) under a defined high pressure without having to interrupt the continuous supply of emitter material (2) when consumed emitter material (2) must be replenished. According to the invention, this object is met in that the emitter material supply unit (4) has at least a first pressure vessel (44) and a second pressure vessel (44′) between the reservoir vessel (41) and the injection device (5) for generating a high emitter material pressure for the injection unit (5), the pressure vessels (44, 44′) are acted upon by a high-pressure gas system (73) with a gas pressure (74) in the megapascal range, and the emitter material supply unit (4) has means for switching the high-pressure gas system (73) from one pressure vessel (44, 44′) to the other pressure vessel (44, 44′) and for correspondingly alternately switching the injection unit (5) to the constant emitter material pressure of the respective pressure vessel (44, 44′) being pressurized, wherein at least one of the pressure vessels (44, 44′) can be refilled during the continuous operation of droplet generation and plasma generation.
摘要翻译：本发明涉及一种用于使用液体发射器材料基于热等离子体生成EUV辐射的装置。本发明的目的是找到产生EUV辐射的新型可能性，其允许在限定的高压下连续供应液体，特别是金属发射体材料（2），而不必中断发射体材料（2）的连续供应，当消耗的发射体材料（2）必须补充。根据本发明，满足的目的在于，发射体材料供应单元（4）在储存器容器（41）和注射装置（4）之间至少具有第一压力容器（44）和第二压力容器（44'） 5）用于产生用于注入单元（5）的高发射极材料压力，压力容器（44,44'）被高压气体系统（73）作用，其中气压（74）在兆帕范围内，并且发射体材料供给单元（4）具有用于将高压气体系统（73）从一个压力容器（44,44'）切换到另一个压力容器（44,44'）的装置，并且相应地交替地切换注射单元（5）到相应的压力容器（44,44'）的恒定的发射器材料压力被加压，其中至少一个压力容器（44,44'）可以在液滴生成的连续操作期间重新填充，等离子体生成

7. 发明授权

US07368742B2 Arrangement and method for metering target material for the generation of short-wavelength electromagnetic radiation 失效
标题翻译：用于测量目标材料以产生短波长电磁辐射的布置和方法
公开(公告)号：US07368742B2
公开(公告)日：2008-05-06
申请号：US11182362
申请日：2005-07-15
申请人： Guido Hergenhan , Diethard Kloepfel
发明人： Guido Hergenhan , Diethard Kloepfel
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006
摘要： The invention is directed to an arrangement for metering target material for the generation of short-wavelength electromagnetic radiation from an energy beam induced plasma, in particular X radiation and EUV radiation. The object of the invention is to find a novel possibility for metering target material for the generation of short-wavelength electromagnetic radiation from an energy beam induced plasma which makes it possible to provide reproducibly supplied mass-limited targets in such a way that only the amount of target material for plasma generation that can be effectively converted to radiating plasma in the desired wavelength region arrives in the interaction chamber and, therefore, debris generation and the gas burden in the interaction chamber are minimized. This object is met, according to the invention, in that an injection device is provided for target generation, wherein means are arranged upstream of the nozzle in a nozzle chamber for a defined, temporary pressure increase in order to introduce an individual target into the interaction chamber exclusively when required, and an antechamber is arranged around the nozzle for generating a quasistatic pressure upstream of the interaction chamber, wherein an equilibrium pressure in the antechamber prevents the escape of target material as long as there is no pressure increase in the nozzle chamber.
摘要翻译：本发明涉及一种用于计量用于从能量束感应等离子体，特别是X辐射和EUV辐射产生短波长电磁辐射的目标材料的装置。本发明的目的是找到一种用于从能量束诱导等离子体产生短波长电磁辐射的目标材料的新型可能性，这使得可以以这样的方式提供可再现地提供的质量限制目标：用于等离子体生成的目标材料可以被有效地转换成所需波长区域中的辐射等离子体到达相互作用室，因此，相互作用室中的碎屑产生和气体负荷被最小化。根据本发明，符合本发明的目的在于提供一种用于目标产生的注射装置，其中装置在喷嘴的上游设置在喷嘴室中，用于限定的临时压力增加，以将单个靶引入相互作用并且在喷嘴周围布置有前室，用于在相互作用室的上游产生准静压，其中只要喷嘴室中没有压力增加，前室中的平衡压力就可以防止目标材料的逸出。

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