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1. 发明申请

US20060043319A1 Arrangement for providing a reproducible target flow for the energy beam-induced generation of short-wavelength electromagnetic radiation 有权
标题翻译：用于为能量束引起的短波长电磁辐射的产生提供可重现的目标流的布置
公开(公告)号：US20060043319A1
公开(公告)日：2006-03-02
申请号：US11213007
申请日：2005-08-26
申请人： Kai Gaebel , Diethard Kloepfel , Guido Hergenhan
发明人： Kai Gaebel , Diethard Kloepfel , Guido Hergenhan
IPC分类号： G01J3/10
CPC分类号： H05G2/008 , H05G2/003 , H05G2/005 , H05G2/006
摘要： The invention is directed to an arrangement for providing a reproducible target flow for the energy beam-induced generation of short-wavelength radiation. It is the object of the invention to find a novel possibility for providing a reproducibly supplied target flow for the generation of a plasma that emits short-wavelength radiation which ensures a high directional stability of the target flow over a large number of individual plasma generation process for any target materials under given process conditions. According to the invention, this object is met in that a nozzle protection device is provided in the interaction chamber between the target nozzle and the interaction point for the generation of the plasma, and the nozzle protection device contains a gas pressure chamber which has an aperture along the target path for unobstructed passage of the target flow and which is filled with a buffer gas that is maintained at a pressure of some 10 mbar.
摘要翻译：本发明涉及一种用于为能量束诱发的短波长辐射的产生提供可再现目标流的装置。本发明的目的是找到一种新颖的可能性，以提供可重复提供的目标流，用于产生发射短波长辐射的等离子体，其确保目标流在大量单个等离子体产生过程中的高方向稳定性对于任何目标材料在给定的工艺条件下。根据本发明，该目的在于，在目标喷嘴和用于产生等离子体的相互作用点之间的相互作用室中设置喷嘴保护装置，并且喷嘴保护装置包含气体压力室，其具有孔径沿着目标路径通过目标流的无障碍通道，并且填充有保持在约10毫巴压力的缓冲气体。

2. 发明授权

US07372057B2 Arrangement for providing a reproducible target flow for the energy beam-induced generation of short-wavelength electromagnetic radiation 有权
标题翻译：用于为能量束引起的短波长电磁辐射的产生提供可重现的目标流的布置
公开(公告)号：US07372057B2
公开(公告)日：2008-05-13
申请号：US11213007
申请日：2005-08-26
申请人： Kai Gaebel , Diethard Kloepfel , Guido Hergenhan
发明人： Kai Gaebel , Diethard Kloepfel , Guido Hergenhan
IPC分类号： G01J3/10
CPC分类号： H05G2/008 , H05G2/003 , H05G2/005 , H05G2/006
摘要： The invention is directed to an arrangement for providing a reproducible target flow for the energy beam-induced generation of short-wavelength radiation. It is the object of the invention to find a novel possibility for providing a reproducibly supplied target flow for the generation of a plasma that emits short-wavelength radiation which ensures a high directional stability of the target flow over a large number of individual plasma generation process for any target materials under given process conditions. According to the invention, this object is met in that a nozzle protection device is provided in the interaction chamber between the target nozzle and the interaction point for the generation of the plasma, and the nozzle protection device contains a gas pressure chamber which has an aperture along the target path for unobstructed passage of the target flow and which is filled with a buffer gas that is maintained at a pressure of some 10 mbar.
摘要翻译：本发明涉及一种用于为能量束诱发的短波长辐射的产生提供可再现目标流的装置。本发明的目的是找到一种新颖的可能性，以提供可重复提供的目标流，用于产生发射短波长辐射的等离子体，其确保目标流在大量单个等离子体产生过程中的高方向稳定性对于任何目标材料在给定的工艺条件下。根据本发明，该目的在于，在目标喷嘴和用于产生等离子体的相互作用点之间的相互作用室中设置喷嘴保护装置，并且喷嘴保护装置包含气体压力室，其具有孔径沿着目标路径通过目标流的无障碍通道，并且填充有保持在约10毫巴压力的缓冲气体。

3. 发明申请

US20100282987A1 ARRANGEMENT FOR THE CONTINUOUS GENERATION OF LIQUID TIN AS EMITTER MATERIAL IN EUV RADIATION SOURCES 有权
标题翻译：在EUV辐射源中连续生成液氮作为发射体材料的安排
公开(公告)号：US20100282987A1
公开(公告)日：2010-11-11
申请号：US12773148
申请日：2010-05-04
申请人： Guido Hergenhan , Diethard Kloepfel , Todd Byrnes , Elma Weber , Mike Möritz
发明人： Guido Hergenhan , Diethard Kloepfel , Todd Byrnes , Elma Weber , Mike Möritz
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： The invention is directed to an arrangement for generating EUV radiation based on a hot plasma using liquid emitter material. The object of the invention is to find a novel possibility for generating EUV radiation which allows a continuous supply of liquid, particularly metal, emitter material (2) under a defined high pressure without having to interrupt the continuous supply of emitter material (2) when consumed emitter material (2) must be replenished. According to the invention, this object is met in that the emitter material supply unit (4) has at least a first pressure vessel (44) and a second pressure vessel (44′) between the reservoir vessel (41) and the injection device (5) for generating a high emitter material pressure for the injection unit (5), the pressure vessels (44, 44′) are acted upon by a high-pressure gas system (73) with a gas pressure (74) in the megapascal range, and the emitter material supply unit (4) has means for switching the high-pressure gas system (73) from one pressure vessel (44, 44′) to the other pressure vessel (44, 44′) and for correspondingly alternately switching the injection unit (5) to the constant emitter material pressure of the respective pressure vessel (44, 44′) being pressurized, wherein at least one of the pressure vessels (44, 44′) can be refilled during the continuous operation of droplet generation and plasma generation.
摘要翻译：本发明涉及一种用于使用液体发射器材料基于热等离子体生成EUV辐射的装置。本发明的目的是找到产生EUV辐射的新型可能性，其允许在限定的高压下连续供应液体，特别是金属发射体材料（2），而不必中断发射体材料（2）的连续供应，当消耗的发射体材料（2）必须补充。根据本发明，满足的目的在于，发射体材料供应单元（4）在储存器容器（41）和注射装置（4）之间至少具有第一压力容器（44）和第二压力容器（44'） 5）用于产生用于注入单元（5）的高发射极材料压力，压力容器（44,44'）被高压气体系统（73）作用，其中气压（74）在兆帕范围内，并且发射体材料供给单元（4）具有用于将高压气体系统（73）从一个压力容器（44,44'）切换到另一个压力容器（44,44'）的装置，并且相应地交替地切换注射单元（5）到相应的压力容器（44,44'）的恒定的发射器材料压力被加压，其中至少一个压力容器（44,44'）可以在液滴生成的连续操作期间重新填充，等离子体生成

4. 发明授权

US07368742B2 Arrangement and method for metering target material for the generation of short-wavelength electromagnetic radiation 失效
标题翻译：用于测量目标材料以产生短波长电磁辐射的布置和方法
公开(公告)号：US07368742B2
公开(公告)日：2008-05-06
申请号：US11182362
申请日：2005-07-15
申请人： Guido Hergenhan , Diethard Kloepfel
发明人： Guido Hergenhan , Diethard Kloepfel
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006
摘要： The invention is directed to an arrangement for metering target material for the generation of short-wavelength electromagnetic radiation from an energy beam induced plasma, in particular X radiation and EUV radiation. The object of the invention is to find a novel possibility for metering target material for the generation of short-wavelength electromagnetic radiation from an energy beam induced plasma which makes it possible to provide reproducibly supplied mass-limited targets in such a way that only the amount of target material for plasma generation that can be effectively converted to radiating plasma in the desired wavelength region arrives in the interaction chamber and, therefore, debris generation and the gas burden in the interaction chamber are minimized. This object is met, according to the invention, in that an injection device is provided for target generation, wherein means are arranged upstream of the nozzle in a nozzle chamber for a defined, temporary pressure increase in order to introduce an individual target into the interaction chamber exclusively when required, and an antechamber is arranged around the nozzle for generating a quasistatic pressure upstream of the interaction chamber, wherein an equilibrium pressure in the antechamber prevents the escape of target material as long as there is no pressure increase in the nozzle chamber.
摘要翻译：本发明涉及一种用于计量用于从能量束感应等离子体，特别是X辐射和EUV辐射产生短波长电磁辐射的目标材料的装置。本发明的目的是找到一种用于从能量束诱导等离子体产生短波长电磁辐射的目标材料的新型可能性，这使得可以以这样的方式提供可再现地提供的质量限制目标：用于等离子体生成的目标材料可以被有效地转换成所需波长区域中的辐射等离子体到达相互作用室，因此，相互作用室中的碎屑产生和气体负荷被最小化。根据本发明，符合本发明的目的在于提供一种用于目标产生的注射装置，其中装置在喷嘴的上游设置在喷嘴室中，用于限定的临时压力增加，以将单个靶引入相互作用并且在喷嘴周围布置有前室，用于在相互作用室的上游产生准静压，其中只要喷嘴室中没有压力增加，前室中的平衡压力就可以防止目标材料的逸出。

5. 发明申请

US20060017026A1 Arrangement and method for metering target material for the generation of short-wavelength electromagnetic radiation 失效
标题翻译：用于测量目标材料以产生短波长电磁辐射的布置和方法
公开(公告)号：US20060017026A1
公开(公告)日：2006-01-26
申请号：US11182362
申请日：2005-07-15
申请人： Guido Hergenhan , Diethard Kloepfel
发明人： Guido Hergenhan , Diethard Kloepfel
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006
摘要： The invention is directed to an arrangement for metering target material for the generation of short-wavelength electromagnetic radiation from an energy beam induced plasma, in particular X radiation and EUV radiation. The object of the invention is to find a novel possibility for metering target material for the generation of short-wavelength electromagnetic radiation from an energy beam induced plasma which makes it possible to provide reproducibly supplied mass-limited targets in such a way that only the amount of target material for plasma generation that can be effectively converted to radiating plasma in the desired wavelength region arrives in the interaction chamber and, therefore, debris generation and the gas burden in the interaction chamber are minimized. This object is met, according to the invention, in that an injection device is provided for target generation, wherein means are arranged upstream of the nozzle in a nozzle chamber for a defined, temporary pressure increase in order to introduce an individual target into the interaction chamber exclusively when required, and an antechamber is arranged around the nozzle for generating a quasistatic pressure upstream of the interaction chamber, wherein an equilibrium pressure in the antechamber prevents the escape of target material as long as there is no pressure increase in the nozzle chamber.
摘要翻译：本发明涉及一种用于计量用于从能量束感应等离子体，特别是X辐射和EUV辐射产生短波长电磁辐射的目标材料的装置。本发明的目的是找到一种用于从能量束诱导等离子体产生短波长电磁辐射的目标材料的新型可能性，这使得可以以这样的方式提供可再现地提供的质量限制目标：用于等离子体生成的目标材料可以被有效地转换成所需波长区域中的辐射等离子体到达相互作用室，因此，相互作用室中的碎屑产生和气体负荷被最小化。根据本发明，符合本发明的目的在于提供一种用于目标产生的注射装置，其中装置在喷嘴的上游设置在喷嘴室中，用于限定的临时压力增加，以将单个靶引入相互作用并且在喷嘴周围布置有前室，用于在相互作用室的上游产生准静压，其中只要喷嘴室中没有压力增加，前室中的平衡压力就可以防止目标材料的逸出。

6. 发明授权

US08154000B2 Arrangement for the continuous generation of liquid tin as emitter material in EUV radiation sources 有权
标题翻译：在EUV辐射源中连续生成液体锡作为发射体材料的布置
公开(公告)号：US08154000B2
公开(公告)日：2012-04-10
申请号：US12773148
申请日：2010-05-04
申请人： Guido Hergenhan , Diethard Kloepfel , Todd Byrnes , Elma Weber , Mike Möritz
发明人： Guido Hergenhan , Diethard Kloepfel , Todd Byrnes , Elma Weber , Mike Möritz
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： The invention is directed to an arrangement for generating EUV radiation based on a hot plasma using liquid emitter material. The object of the invention is to find a novel possibility for generating EUV radiation which allows a continuous supply of liquid, particularly metal, emitter material (2) under a defined high pressure without having to interrupt the continuous supply of emitter material (2) when consumed emitter material (2) must be replenished. According to the invention, this object is met in that the emitter material supply unit (4) has at least a first pressure vessel (44) and a second pressure vessel (44′) between the reservoir vessel (41) and the injection device (5) for generating a high emitter material pressure for the injection unit (5), the pressure vessels (44, 44′) are acted upon by a high-pressure gas system (73) with a gas pressure (74) in the megapascal range, and the emitter material supply unit (4) has means for switching the high-pressure gas system (73) from one pressure vessel (44, 44′) to the other pressure vessel (44, 44′) and for correspondingly alternately switching the injection unit (5) to the constant emitter material pressure of the respective pressure vessel (44, 44′) being pressurized, wherein at least one of the pressure vessels (44, 44′) can be refilled during the continuous operation of droplet generation and plasma generation.
摘要翻译：本发明涉及一种用于使用液体发射器材料基于热等离子体生成EUV辐射的装置。本发明的目的是找到产生EUV辐射的新型可能性，其允许在限定的高压下连续供应液体，特别是金属发射体材料（2），而不必中断发射体材料（2）的连续供应，当消耗的发射体材料（2）必须补充。根据本发明，满足的目的在于，发射体材料供应单元（4）在储存器容器（41）和注射装置（4）之间至少具有第一压力容器（44）和第二压力容器（44'） 5）用于产生用于注入单元（5）的高发射极材料压力，压力容器（44,44'）被高压气体系统（73）作用，其中气压（74）在兆帕范围内，并且发射体材料供给单元（4）具有用于将高压气体系统（73）从一个压力容器（44,44'）切换到另一个压力容器（44,44'）的装置，并且相应地交替地切换注射单元（5）到相应的压力容器（44,44'）的恒定的发射器材料压力被加压，其中至少一个压力容器（44,44'）可以在液滴生成的连续操作期间重新填充，等离子体生成

7. 发明授权

US06995382B2 Arrangement for the generation of intensive short-wave radiation based on a plasma 失效
标题翻译：基于等离子体产生强烈的短波辐射的布置
公开(公告)号：US06995382B2
公开(公告)日：2006-02-07
申请号：US10777616
申请日：2004-02-12
申请人： Christian Ziener , Kai Gaebel , Guido Hergenhan
发明人： Christian Ziener , Kai Gaebel , Guido Hergenhan
IPC分类号： G01J1/00 , G21G4/00
CPC分类号： H05G2/003 , H05G2/006
摘要： The invention is directed to an arrangement for generating intensive radiation based on a plasma, particularly short-wavelength radiation from soft x-ray radiation to extreme ultraviolet (EUV) radiation. The object of the invention is to find a novel possibility for generating radiation generated from plasma in which the individual pulse energy coupled into the plasma and, therefore, the usable radiation output are appreciably increased while retaining the advantages of mass-limited targets. According to the invention, this object is met in that the target generator has a multiple-channel nozzle with a plurality of separate orifices, wherein the orifices generate a plurality of target jets, the excitation radiation for generating plasma being directed simultaneously portion by portion to the target jets.
摘要翻译：本发明涉及用于基于等离子体产生强烈辐射的装置，特别是从软X射线辐射到极紫外（EUV）辐射的短波长辐射。本发明的目的是找到用于产生从等离子体产生的辐射的新颖可能性，其中耦合到等离子体中的各个脉冲能量以及因此可用的辐射输出明显地增加，同时保留了大量限制目标的优点。根据本发明，该目的是满足目标发生器具有多通道喷嘴，其具有多个分开的孔口，其中孔口产生多个目标射流，用于产生等离子体的激发辐射被一部分同时引导到目标射流。

8. 发明授权

US07274030B2 Apparatus for the temporally stable generation of EUV radiation by means of a laser-induced plasma 有权
标题翻译：用于通过激光诱导等离子体时间稳定地产生EUV辐射的装置
公开(公告)号：US07274030B2
公开(公告)日：2007-09-25
申请号：US11149916
申请日：2005-06-10
申请人： Guido Hergenhan , Christian Ziener , Kai Gaebel
发明人： Guido Hergenhan , Christian Ziener , Kai Gaebel
IPC分类号： H05H1/00
CPC分类号： G03F7/70033 , B82Y10/00 , H05G2/003 , H05G2/008
摘要： The invention is directed to an apparatus for generating soft x-radiation, particularly EUV radiation, by laser-induced plasma. The object of the invention, to find a novel possibility for generating EUV radiation by means of a laser-induced plasma by which a temporally stable radiation emission in the desired wavelength region is ensured when interacting with the target without active regulation of the laser beam, is met according to the invention in that at least one laser is directed to the target, wherein the laser has at least one defined plane with a highly stable spatial distribution of the power density of the laser, and this defined plane is imaged on the target by an optical imaging system so as to be reduced so that the optical image of the defined plane is active for the plasma generation instead of the laser focus. The invention is applied in exposure machines for semiconductor lithography for spatially stable generation of radiation.
摘要翻译：本发明涉及一种用于通过激光诱导等离子体产生软x辐射，特别是EUV辐射的装置。本发明的目的是为了找到通过激光诱导等离子体产生EUV辐射的新颖可能性，通过该等离子体，当与靶相互作用而确保在期望波长区域中的时间上稳定的辐射发射而无需主动调节激光束时，根据本发明满足的是，至少一个激光被引导到目标，其中激光器具有至少一个具有激光功率密度的高度稳定的空间分布的限定平面，并且该定义的平面被成像在目标通过光学成像系统被减少，使得限定平面的光学图像对于等离子体产生而不是激光焦点是有效的。本发明应用于用于半导体光刻的曝光机，用于在空间上稳定地产生辐射。

9. 发明授权

US07250621B2 Method and arrangement for the plasma-based generation of intensive short-wavelength radiation 失效
标题翻译：用于等离子体生成强烈的短波长辐射的方法和装置
公开(公告)号：US07250621B2
公开(公告)日：2007-07-31
申请号：US11045779
申请日：2005-01-27
申请人： Kai Gaebel , Christian Ziener , Guido Hergenhan
发明人： Kai Gaebel , Christian Ziener , Guido Hergenhan
IPC分类号： H01J49/00
CPC分类号： H05G2/003 , H05G2/008
摘要： The invention is directed to a method and an arrangement for the plasma-based generation of intensive short-wavelength radiation, particularly EUV radiation. The object of the invention, to find a novel possibility for plasma-based generation of intensive soft x-radiation, particularly EUV radiation, which permits efficient energy conversion in the desired spectral band with high repetition frequency (several kHz) of the plasma excitation, minimized emission of debris and low erosion of the nozzle of the target generator, is met according to the invention in that an additional energy beam is directed on the target flow spatially in advance of its interaction with the high-energy beam, the target flow being acted upon by this additional energy beam with substantially weaker energy pulses compared to the high-energy beam in order to divide the target flow into a first portion and at least one second portion, wherein the target flow is excited at an interaction point within the second portion by the high-energy beam for generating a hot, radiating plasma, and the second portion is decoupled from the first portion and therefore from the target generator in such a way that a hydrodynamic disturbance generated in the second portion by the pulse of the high-energy beam is transmitted into the first portion only negligibly.
摘要翻译：本发明涉及一种用于等离子体生成强烈的短波长辐射，特别是EUV辐射的方法和装置。本发明的目的是为了发现等离子体产生强烈的软x辐射，特别是EUV辐射的新颖可能性，其允许在等离子体激发的高重复频率（几kHz）的期望光谱带中进行有效的能量转换，根据本发明，符合最小化的碎屑的排放和目标发生器的喷嘴的低侵蚀性，因为在与高能束的相互作用之前，另外的能量束在空间上被引导到目标流上，目标流是为了将目标流分成第一部分和至少一个第二部分，目标流在第二部分内的相互作用点被激发，该能量束与该高能束相比基本上较弱的能量脉冲作用在该附加能量束上部分由高能束产生热辐射等离子体，第二部分与第一部分分离，因此从目标发电机，使得通过高能量束的脉冲在第二部分中产生的流体动力学干扰仅可忽略不计地传递到第一部分。

10. 发明申请

US20060219959A1 Radiation source for the generation of short-wavelength radiation 有权
标题翻译：用于产生短波长辐射的辐射源
公开(公告)号：US20060219959A1
公开(公告)日：2006-10-05
申请号：US11393325
申请日：2006-03-30
申请人： Guido Hergenhan , Kai Gaebel , Thomas Brauner
发明人： Guido Hergenhan , Kai Gaebel , Thomas Brauner
IPC分类号： G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , G03F7/70841 , G03F7/70858 , G03F7/70908 , G03F7/70916
摘要： In a radiation source for the generation of short-wavelength radiation, it is the object of the invention to effectively increase the protection of the collimator optics by a buffer gas without substantially reducing the radiation transmission. A vacuum chamber which encloses a radiation-emitting plasma and is outfitted with at least one feed line and one outlet line for a buffer gas in order to ensure protection against debris for at least one optical element which directs the radiation to a radiation outlet opening in the vacuum chamber has chamber areas with particle deceleration of varying magnitude by the buffer gas. The particle deceleration is greater at least in a first chamber area in which the optical element is arranged than in any other chamber area.
摘要翻译：在用于产生短波长辐射的辐射源中，本发明的目的是通过缓冲气体有效地增加对准直器光学元件的保护，而不会基本上减少辐射透射。包围发射辐射的等离子体的真空室，并配备有用于缓冲气体的至少一个进料管线和一个出口管线，以便确保防止碎片对于至少一个将辐射引导到辐射出口开口处的碎片真空室具有通过缓冲气体具有不同大小的粒子减速的腔室区域。至少在布置光学元件的第一室区域中，粒子减速度比在任何其它室区域中更大。

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