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1. 发明授权

US08154000B2 Arrangement for the continuous generation of liquid tin as emitter material in EUV radiation sources 有权
标题翻译：在EUV辐射源中连续生成液体锡作为发射体材料的布置
公开(公告)号：US08154000B2
公开(公告)日：2012-04-10
申请号：US12773148
申请日：2010-05-04
申请人： Guido Hergenhan , Diethard Kloepfel , Todd Byrnes , Elma Weber , Mike Möritz
发明人： Guido Hergenhan , Diethard Kloepfel , Todd Byrnes , Elma Weber , Mike Möritz
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： The invention is directed to an arrangement for generating EUV radiation based on a hot plasma using liquid emitter material. The object of the invention is to find a novel possibility for generating EUV radiation which allows a continuous supply of liquid, particularly metal, emitter material (2) under a defined high pressure without having to interrupt the continuous supply of emitter material (2) when consumed emitter material (2) must be replenished. According to the invention, this object is met in that the emitter material supply unit (4) has at least a first pressure vessel (44) and a second pressure vessel (44′) between the reservoir vessel (41) and the injection device (5) for generating a high emitter material pressure for the injection unit (5), the pressure vessels (44, 44′) are acted upon by a high-pressure gas system (73) with a gas pressure (74) in the megapascal range, and the emitter material supply unit (4) has means for switching the high-pressure gas system (73) from one pressure vessel (44, 44′) to the other pressure vessel (44, 44′) and for correspondingly alternately switching the injection unit (5) to the constant emitter material pressure of the respective pressure vessel (44, 44′) being pressurized, wherein at least one of the pressure vessels (44, 44′) can be refilled during the continuous operation of droplet generation and plasma generation.
摘要翻译：本发明涉及一种用于使用液体发射器材料基于热等离子体生成EUV辐射的装置。本发明的目的是找到产生EUV辐射的新型可能性，其允许在限定的高压下连续供应液体，特别是金属发射体材料（2），而不必中断发射体材料（2）的连续供应，当消耗的发射体材料（2）必须补充。根据本发明，满足的目的在于，发射体材料供应单元（4）在储存器容器（41）和注射装置（4）之间至少具有第一压力容器（44）和第二压力容器（44'） 5）用于产生用于注入单元（5）的高发射极材料压力，压力容器（44,44'）被高压气体系统（73）作用，其中气压（74）在兆帕范围内，并且发射体材料供给单元（4）具有用于将高压气体系统（73）从一个压力容器（44,44'）切换到另一个压力容器（44,44'）的装置，并且相应地交替地切换注射单元（5）到相应的压力容器（44,44'）的恒定的发射器材料压力被加压，其中至少一个压力容器（44,44'）可以在液滴生成的连续操作期间重新填充，等离子体生成

2. 发明申请

US20100282987A1 ARRANGEMENT FOR THE CONTINUOUS GENERATION OF LIQUID TIN AS EMITTER MATERIAL IN EUV RADIATION SOURCES 有权
标题翻译：在EUV辐射源中连续生成液氮作为发射体材料的安排
公开(公告)号：US20100282987A1
公开(公告)日：2010-11-11
申请号：US12773148
申请日：2010-05-04
申请人： Guido Hergenhan , Diethard Kloepfel , Todd Byrnes , Elma Weber , Mike Möritz
发明人： Guido Hergenhan , Diethard Kloepfel , Todd Byrnes , Elma Weber , Mike Möritz
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： The invention is directed to an arrangement for generating EUV radiation based on a hot plasma using liquid emitter material. The object of the invention is to find a novel possibility for generating EUV radiation which allows a continuous supply of liquid, particularly metal, emitter material (2) under a defined high pressure without having to interrupt the continuous supply of emitter material (2) when consumed emitter material (2) must be replenished. According to the invention, this object is met in that the emitter material supply unit (4) has at least a first pressure vessel (44) and a second pressure vessel (44′) between the reservoir vessel (41) and the injection device (5) for generating a high emitter material pressure for the injection unit (5), the pressure vessels (44, 44′) are acted upon by a high-pressure gas system (73) with a gas pressure (74) in the megapascal range, and the emitter material supply unit (4) has means for switching the high-pressure gas system (73) from one pressure vessel (44, 44′) to the other pressure vessel (44, 44′) and for correspondingly alternately switching the injection unit (5) to the constant emitter material pressure of the respective pressure vessel (44, 44′) being pressurized, wherein at least one of the pressure vessels (44, 44′) can be refilled during the continuous operation of droplet generation and plasma generation.
摘要翻译：本发明涉及一种用于使用液体发射器材料基于热等离子体生成EUV辐射的装置。本发明的目的是找到产生EUV辐射的新型可能性，其允许在限定的高压下连续供应液体，特别是金属发射体材料（2），而不必中断发射体材料（2）的连续供应，当消耗的发射体材料（2）必须补充。根据本发明，满足的目的在于，发射体材料供应单元（4）在储存器容器（41）和注射装置（4）之间至少具有第一压力容器（44）和第二压力容器（44'） 5）用于产生用于注入单元（5）的高发射极材料压力，压力容器（44,44'）被高压气体系统（73）作用，其中气压（74）在兆帕范围内，并且发射体材料供给单元（4）具有用于将高压气体系统（73）从一个压力容器（44,44'）切换到另一个压力容器（44,44'）的装置，并且相应地交替地切换注射单元（5）到相应的压力容器（44,44'）的恒定的发射器材料压力被加压，其中至少一个压力容器（44,44'）可以在液滴生成的连续操作期间重新填充，等离子体生成

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