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    • 3. 发明授权
    • Reducing optical loss in reflective optical gratings
    • 减少反射光栅光损耗
    • US08300999B2
    • 2012-10-30
    • US12927412
    • 2010-11-12
    • Wei QianDazeng FengCheng-Chih KungJoan FongMehdi Asghari
    • Wei QianDazeng FengCheng-Chih KungJoan FongMehdi Asghari
    • G02B6/34G02B6/26G02B6/28G02B6/10
    • G02B6/124G02B6/29326G02B6/29328
    • An optical device includes a light-transmitting medium on a base. The light-transmitting medium at least partially defines a free propagation region through which light signals travel. A reflective grating is positioned such that light signals can travel through the free propagation region and be received by the optical grating. The optical grating is configured to reflect the received light signal back into the free propagation region. The optical grating reflects the light signals such that light signals associated with different wavelengths separate as the light signals travel through the free propagation region. The portion of the light-transmitting medium that defines the free propagation region has a facet through with the light signals are transmitted. The grating includes a buffer layer between the facet and a reflecting layer that is configured to reflect the light signals received by the grating.
    • 光学装置包括在基座上的透光介质。 透光介质至少部分地限定光信号行进的自由传播区域。 反射光栅被定位成使得光信号可以穿过自由传播区域并被光栅接收。 光栅被配置为将接收的光信号反射回自由传播区域。 光栅反射光信号,使得与不同波长相关联的光信号随着光信号穿过自由传播区域而分离。 限定自由传播区域的光传输介质的一部分具有透过光信号的小平面。 光栅包括在小面和反射层之间的缓冲层,其被配置为反射由光栅接收的光信号。
    • 4. 发明申请
    • Reducing optical loss in reflective optical gratings
    • 减少反射光栅光损耗
    • US20110150392A1
    • 2011-06-23
    • US12927412
    • 2010-11-12
    • Wei QianDazeng FengCheng-Chih KungJoan FongMehdi Asghari
    • Wei QianDazeng FengCheng-Chih KungJoan FongMehdi Asghari
    • G02B6/34
    • G02B6/124G02B6/29326G02B6/29328
    • An optical device includes a light-transmitting medium on a base. The light-transmitting medium at least partially defines a free propagation region through which light signals travel. A reflective grating is positioned such that light signals can travel through the free propagation region and be received by the optical grating. The optical grating is configured to reflect the received light signal back into the free propagation region. The optical grating reflects the light signals such that light signals associated with different wavelengths separate as the light signals travel through the free propagation region. The portion of the light-transmitting medium that defines the free propagation region has a facet through with the light signals are transmitted. The grating includes a buffer layer between the facet and a reflecting layer that is configured to reflect the light signals received by the grating.
    • 光学装置包括在基座上的透光介质。 透光介质至少部分地限定光信号行进的自由传播区域。 反射光栅被定位成使得光信号可以穿过自由传播区域并被光栅接收。 光栅被配置为将接收的光信号反射回自由传播区域。 光栅反射光信号,使得与不同波长相关联的光信号随着光信号穿过自由传播区域而分离。 限定自由传播区域的光传输介质的一部分具有透过光信号的小平面。 光栅包括在小面和反射层之间的缓冲层,其被配置为反射由光栅接收的光信号。
    • 10. 发明授权
    • Method of fabricating DRAM capacitor
    • 制造DRAM电容的方法
    • US5998255A
    • 1999-12-07
    • US145711
    • 1998-09-02
    • Cheng-Chih KungPeter Chou
    • Cheng-Chih KungPeter Chou
    • H01L21/8242
    • H01L27/10852
    • A fabricating method for a DRAM capacitor is provided. A DRAM is formed on a substrate, wherein a transistor has been formed. A first oxide layer is formed over the substrate and a contact window is formed on the first oxide layer to expose a source region of the transistor. Then, a bit line is formed in the contact window, wherein the bit line is connected to the source region of the transistor. A second oxide layer is formed on the bit line and the first oxide layer. Then, a third oxide layer is formed on the second oxide layer. A second contact window is further defined to expose a drain region of the transistor, wherein the drain region has a native oxide layer formed on it. Next, a first polysilicon film is formed on the exposed drain region of the second contact window. A high dosage implantation is used to remove the native oxide layer. Then, a second polysilicon layer is formed over the substrate. Finally, the finishing process followed is performed to complete the fabrication of a DRAM capacitor.
    • 提供了一种用于DRAM电容器的制造方法。 在衬底上形成DRAM,其中形成了晶体管。 在衬底上形成第一氧化物层,并且在第一氧化物层上形成接触窗以暴露晶体管的源极区域。 然后,在接触窗口中形成位线,其中位线连接到晶体管的源极区域。 在位线和第一氧化物层上形成第二氧化物层。 然后,在第二氧化物层上形成第三氧化物层。 进一步限定第二接触窗口以暴露晶体管的漏极区域,其中漏极区域上形成有自然氧化物层。 接下来,在第二接触窗的暴露漏极区上形成第一多晶硅膜。 使用高剂量植入来去除天然氧化物层。 然后,在衬底上形成第二多晶硅层。 最后,执行完成处理以完成DRAM电容器的制造。