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    • 4. 发明申请
    • Method of making nanowires
    • 制造纳米线的方法
    • US20070108435A1
    • 2007-05-17
    • US11349458
    • 2006-02-07
    • Eric HarmonJerry WoodallDavid Salzman
    • Eric HarmonJerry WoodallDavid Salzman
    • H01L29/06
    • H01L29/0665B82Y10/00H01L21/02392H01L21/02461H01L21/02463H01L21/02505H01L21/02513H01L21/02546H01L21/02573H01L21/0259H01L21/02642H01L29/0673H01L29/0676H01L29/20H01L29/207H01L29/66318H01L29/7371
    • A novel technique for manufacturing nanostructures and nanostructure is disclosed. The invention exploits techniques to deposit a second semiconductor material on a first semiconductor material with incomplete coverage of the second layer, and forming the nanostructures by filling the holes in the second semiconductor layer with a third semiconductor material. This allows the production of nanowires, nanorods, nanocylinders, and nanotubes with a controllable density and size distribution. Additionally, contact can be made to the bottom of the nanostructures through the first semiconductor layer allowing large area contacts to arrays of nanostructures to be formed. Similarly, contact can be made to the top of the nanostructure by direct deposition of a large area contacting layer. This allows the formation of nanostructure diodes and other nanostructure interconnections. Furthermore, a third large area contact to the second semiconductor layer can be used to modulate the conductivity of the arrays of nanostructures, enabling realization of a wide variety of nano transistors.
    • 公开了一种用于制造纳米结构和纳米结构的新技术。 本发明利用技术将第二半导体材料沉积在具有第二层不完全覆盖的第一半导体材料上,并且通过用第三半导体材料填充第二半导体层中的孔来形成纳米结构。 这允许以可控的密度和尺寸分布生产纳米线,纳米棒,纳米瓶和纳米管。 此外,可以通过第一半导体层与纳米结构的底部接触,从而形成与纳米结构阵列的大面积接触。 类似地,可以通过大面积接触层的直接沉积而与纳米结构的顶部接触。 这允许形成纳米结构二极管和其他纳米结构互连。 此外,可以使用与第二半导体层的第三大面积接触来调制纳米结构阵列的导电性,从而实现各种各样的纳米晶体管。