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    • 3. 发明申请
    • Optically addressed spatial light modulator and method
    • 光学寻址空间光调制器和方法
    • US20070216985A1
    • 2007-09-20
    • US11713773
    • 2007-03-02
    • Jerry WoodallJonathan Sachs
    • Jerry WoodallJonathan Sachs
    • G02B26/00B32B9/04
    • G02F1/135G02B27/1026G02B27/1033G02B27/141G02B27/145G02B27/149G02F1/0126G02F1/133553G02F1/1354H04N9/3105H04N9/312H04N9/3167Y10T428/31504
    • An optical device has an electrically insulating first barrier layer disposed over a first electrode layer, a photoconductive layer disposed over the first barrier layer, and a carrier confining layer disposed over the photoconducting layer. The carrier confining layer defines a volume throughout which a plurality of carrier traps are dispersed. Further, an electrically insulating second barrier layer is disposed over the carrier confining layer, a light blocking layer is disposed over the second barrier layer for blocking light of a selected wavelength band. A reflective layer is disposed over the light blocking layer for reflecting light within the selected wavelength band, a birefringent or dispersive layer is disposed over the reflective layer, and an optically transmissive second electrode layer is disposed over the birefringent or dispersive layer. A method is also disclosed, as are additional layers intervening between those detailed above.
    • 光学器件具有设置在第一电极层上的电绝缘的第一阻挡层,设置在第一阻挡层上的光电导层和设置在光导层上的载流子限制层。 载体限制层限定了多个载体陷阱分散在其中的体积。 此外,电绝缘的第二阻挡层设置在载体限制层的上方,遮光层设置在第二阻挡层上,用于阻挡所选波长带的光。 反射层设置在遮光层上,用于反射所选波长带内的光,双折射或色散层设置在反射层上,并且透光的第二电极层设置在双折射或色散层上。 还公开了一种方法,以及介于上述细节之间的附加层也是如此。
    • 4. 发明申请
    • Method of making nanowires
    • 制造纳米线的方法
    • US20070108435A1
    • 2007-05-17
    • US11349458
    • 2006-02-07
    • Eric HarmonJerry WoodallDavid Salzman
    • Eric HarmonJerry WoodallDavid Salzman
    • H01L29/06
    • H01L29/0665B82Y10/00H01L21/02392H01L21/02461H01L21/02463H01L21/02505H01L21/02513H01L21/02546H01L21/02573H01L21/0259H01L21/02642H01L29/0673H01L29/0676H01L29/20H01L29/207H01L29/66318H01L29/7371
    • A novel technique for manufacturing nanostructures and nanostructure is disclosed. The invention exploits techniques to deposit a second semiconductor material on a first semiconductor material with incomplete coverage of the second layer, and forming the nanostructures by filling the holes in the second semiconductor layer with a third semiconductor material. This allows the production of nanowires, nanorods, nanocylinders, and nanotubes with a controllable density and size distribution. Additionally, contact can be made to the bottom of the nanostructures through the first semiconductor layer allowing large area contacts to arrays of nanostructures to be formed. Similarly, contact can be made to the top of the nanostructure by direct deposition of a large area contacting layer. This allows the formation of nanostructure diodes and other nanostructure interconnections. Furthermore, a third large area contact to the second semiconductor layer can be used to modulate the conductivity of the arrays of nanostructures, enabling realization of a wide variety of nano transistors.
    • 公开了一种用于制造纳米结构和纳米结构的新技术。 本发明利用技术将第二半导体材料沉积在具有第二层不完全覆盖的第一半导体材料上,并且通过用第三半导体材料填充第二半导体层中的孔来形成纳米结构。 这允许以可控的密度和尺寸分布生产纳米线,纳米棒,纳米瓶和纳米管。 此外,可以通过第一半导体层与纳米结构的底部接触,从而形成与纳米结构阵列的大面积接触。 类似地,可以通过大面积接触层的直接沉积而与纳米结构的顶部接触。 这允许形成纳米结构二极管和其他纳米结构互连。 此外,可以使用与第二半导体层的第三大面积接触来调制纳米结构阵列的导电性,从而实现各种各样的纳米晶体管。