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    • 4. 发明申请
    • Sub-resolution gaps generated by controlled over-etching
    • 通过控制过蚀刻产生的子分辨率间隙
    • US20060063369A1
    • 2006-03-23
    • US10943624
    • 2004-09-17
    • JengPing LuJackson HoChinwen ShihMichael ChabinycWilliam Wong
    • JengPing LuJackson HoChinwen ShihMichael ChabinycWilliam Wong
    • H01L21/4763H01L21/302
    • H01L21/76838B82Y30/00H01L21/28506H01L27/124
    • Controlled overetching is utilized to produce metal patterns having gaps that are smaller than the resolution limits of the feature patterning (e.g., photolithography) process utilized to produce the metal patterns. A first metal layer is formed and masked, and exposed regions are etched away. The etching process is allowed to continue in a controlled manner to produced a desired amount of over-etching (i.e., undercutting the mask) such that an edge of the first metal layer is offset from an edge of the mask by a predetermined gap distance. A second metal layer is then deposited such that an edge of the second metal layer is spaced from the first metal layer by the predetermined gap distance. The metal gap is used to define, for example, transistor channel lengths, thereby facilitating the production of transistors having channel lengths defined by etching process control that are smaller than the process resolution limits.
    • 控制过蚀刻用于产生具有小于用于产生金属图案的特征图案化(例如,光刻)工艺的分辨率限制的间隙的金属图案。 第一金属层被形成并被掩蔽,并且暴露的区域被蚀刻掉。 允许蚀刻处理以受控的方式继续,以产生期望量的过蚀刻(即,底切掩模),使得第一金属层的边缘以预定的间隙距离偏离掩模的边缘。 然后沉积第二金属层,使得第二金属层的边缘与第一金属层隔开预定的间隙距离。 金属间隙用于限定例如晶体管沟道长度,由此有助于生产具有小于工艺分辨率极限的蚀刻工艺控制定义的沟道长度的晶体管。
    • 5. 发明授权
    • Variable volume between flexible structure and support surface
    • 柔性结构和支撑表面之间的可变体积
    • US07710371B2
    • 2010-05-04
    • US11014490
    • 2004-12-16
    • Ping MeiJurgen DanielJames B. BoyceKathleen Dore Boyce, legal representativeJackson HoRachel LauYu Wang
    • Ping MeiJurgen DanielJames B. BoyceJackson HoRachel LauYu Wang
    • G09G3/34C25B9/00F04B17/00B41J2/14G02F1/153H04R19/00
    • C25D5/02C23C18/28C25D5/56H04R19/04
    • Cells can include variable volumes defined between a flexible structure, such as a polymer layer, and a support surface, with the flexible structure and support surface being attached in a first region that surrounds a second region in which they are unattached. Various adhesion structures can attach the flexible structure and the support surface. When unstretched, the flexible structure can lie in a flat position on the support surface. In response to a stretching force away from the support surface, the flexible structure can move out of the flat position, providing the variable volume. Electrodes, such as on the flexible structure, on the support surface, and over the flexible structure, can have charge levels that couple with each other and with the variable volume. A support structure can include a device layer with signal circuitry that provides a signal path between an electrode and external circuitry. One or more ducts can provide fluid communication with each cell's variable volume. Arrays of such cells can be implemented for various applications, such as optical modulators, displays, printheads, and microphones.
    • 细胞可以包括在诸如聚合物层的柔性结构和支撑表面之间限定的可变体积,其中柔性结构和支撑表面附接在围绕其未连接的第二区域的第一区域中。 各种粘合结构可以附接柔性结构和支撑表面。 当未拉伸时,柔性结构可以位于支撑表面上的平坦位置。 响应于远离支撑表面的拉伸力,柔性结构可以移出平坦位置,从而提供可变的体积。 诸如柔性结构的电极,在支撑表面上以及柔性结构上的电极可以具有彼此耦合并且具有可变体积的电荷水平。 支撑结构可以包括具有提供电极和外部电路之间的信号路径的信号电路的器件层。 一个或多个管道可以提供与每个电池的可变体积的流体连通。 可以对诸如光学调制器,显示器,打印头和麦克风的各种应用来实现这种单元的阵列。