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1. 发明授权

US08279404B2 Projection objective having mirror elements with reflective coatings 有权
标题翻译：具有反射涂层的镜面元件的投影物镜
公开(公告)号：US08279404B2
公开(公告)日：2012-10-02
申请号：US12703417
申请日：2010-02-10
申请人： Danny Chan , Hans-Juergen Mann , Sascha Migura
发明人： Danny Chan , Hans-Juergen Mann , Sascha Migura
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G03F7/70308 , B82Y10/00 , G02B5/0891 , G02B13/143 , G02B17/0663 , G03F7/70233 , G21K1/062 , G21K2201/067
摘要： An optical system is disclosed that includes a plurality of elements arranged to image radiation at a wavelength λ from an object field in an object surface to an image field in an image surface. The elements include mirror elements having a reflective surface formed by a reflective coating positioned at a path of radiation. At least one of the mirror elements has a rotationally asymmetrical reflective surface deviating from a best-fit rotationally symmetric reflective surface by about λ or more at one or more locations. The elements include an apodization correction element effective to correct a spatial intensity distribution in an exit pupil of the optical system relative to the optical system without the apodization correcting element. The apodization correction element can be effective to increase symmetry of the spatial intensity distribution in the exit pupil relative to the optical system without the apodization correcting element.
摘要翻译：公开了一种光学系统，其包括多个元件，其被布置成将从物体表面中的物场到波长λ的辐射成像到图像表面中的图像场。元件包括具有由位于辐射路径处的反射涂层形成的反射表面的镜元件。至少一个镜元件具有在一个或多个位置处偏离最佳拟合旋转对称反射表面约λ或更大的旋转非对称反射表面。这些元件包括有效地校正光学系统的出射光瞳相对于没有变迹校正元件的光学系统的空间强度分布的变迹校正元件。变迹校正元件可以有效地增加出射光瞳相对于没有变迹校正元件的光学系统的空间强度分布的对称性。

2. 发明授权

US09013678B2 Projection objective having mirror elements with reflective coatings 有权
标题翻译：具有反射涂层的镜面元件的投影物镜
公开(公告)号：US09013678B2
公开(公告)日：2015-04-21
申请号：US13613390
申请日：2012-09-13
申请人： Danny Chan , Hans-Juergen Mann , Sascha Migura
发明人： Danny Chan , Hans-Juergen Mann , Sascha Migura
IPC分类号： G03B27/54 , G03B27/72 , G03F7/20 , B82Y10/00 , G02B5/08 , G02B13/14 , G02B17/06 , G21K1/06
CPC分类号： G03F7/70308 , B82Y10/00 , G02B5/0891 , G02B13/143 , G02B17/0663 , G03F7/70233 , G21K1/062 , G21K2201/067
摘要： An optical system is disclosed that includes a plurality of elements arranged to image radiation at a wavelength λ from an object field in an object surface to an image field in an image surface. The elements include mirror elements have a reflective surface formed by a reflective coating positioned at a path of radiation. At least one of the mirror elements has a rotationally asymmetrical reflective surface deviating from a best-fit rotationally symmetric reflective surface by about λ or more at one or more locations. The elements include an apodization correction element effective to correct a spatial intensity distribution in an exit pupil of the optical system relative to the optical system without the apodization correcting element. The apodization correction element can be effective to increase symmetry of the spatial intensity distribution in the exit pupil relative to the optical system without the apodization correcting element.
摘要翻译：公开了一种光学系统，其包括多个元件，其被布置成将从物体表面中的物场到波长λ的辐射成像到图像表面中的图像场。元件包括镜元件具有由位于辐射路径上的反射涂层形成的反射表面。至少一个镜元件具有在一个或多个位置处偏离最佳拟合旋转对称反射表面约λ或更大的旋转非对称反射表面。这些元件包括有效地校正光学系统的出射光瞳相对于没有变迹校正元件的光学系统的空间强度分布的变迹校正元件。变迹校正元件可以有效地增加出射光瞳相对于没有变迹校正元件的光学系统的空间强度分布的对称性。

3. 发明申请

US20130010352A1 PROJECTION OBJECTIVE HAVING MIRROR ELEMENTS WITH REFLECTIVE COATINGS 有权
标题翻译：投影目标具有反射涂层的镜子元件
公开(公告)号：US20130010352A1
公开(公告)日：2013-01-10
申请号：US13613390
申请日：2012-09-13
申请人： Danny Chan , Hans-Juergen Mann , Sascha Migura
发明人： Danny Chan , Hans-Juergen Mann , Sascha Migura
IPC分类号： G02B17/06
CPC分类号： G03F7/70308 , B82Y10/00 , G02B5/0891 , G02B13/143 , G02B17/0663 , G03F7/70233 , G21K1/062 , G21K2201/067
摘要： An optical system is disclosed that includes a plurality of elements arranged to image radiation at a wavelength λ from an object field in an object surface to an image field in an image surface. The elements include mirror elements have a reflective surface formed by a reflective coating positioned at a path of radiation. At least one of the mirror elements has a rotationally asymmetrical reflective surface deviating from a best-fit rotationally symmetric reflective surface by about λ or more at one or more locations. The elements include an apodization correction element effective to correct a spatial intensity distribution in an exit pupil of the optical system relative to the optical system without the apodization correcting element. The apodization correction element can be effective to increase symmetry of the spatial intensity distribution in the exit pupil relative to the optical system without the apodization correcting element.
摘要翻译：公开了一种光学系统，其包括多个元件，其被布置成将从物体表面中的物场到波长λ的辐射成像到图像表面中的图像场。元件包括镜元件具有由位于辐射路径上的反射涂层形成的反射表面。至少一个镜元件具有在一个或多个位置处偏离最佳拟合旋转对称反射表面约λ或更大的旋转非对称反射表面。这些元件包括有效地校正光学系统的出射光瞳相对于没有变迹校正元件的光学系统的空间强度分布的变迹校正元件。变迹校正元件可以有效地增加出射光瞳相对于没有变迹校正元件的光学系统的空间强度分布的对称性。

4. 发明申请

US20100195075A1 PROJECTION OBJECTIVE HAVING MIRROR ELEMENTS WITH REFLECTIVE COATINGS 有权
标题翻译：投影目标具有反射涂层的镜子元件
公开(公告)号：US20100195075A1
公开(公告)日：2010-08-05
申请号：US12703417
申请日：2010-02-10
申请人： Danny Chan , Hans-Juergen Mann , Sascha Migura
发明人： Danny Chan , Hans-Juergen Mann , Sascha Migura
IPC分类号： G02B17/06 , G03B27/70 , G03F7/20
CPC分类号： G03F7/70308 , B82Y10/00 , G02B5/0891 , G02B13/143 , G02B17/0663 , G03F7/70233 , G21K1/062 , G21K2201/067
摘要： An optical system is disclosed that includes a plurality of elements arranged to image radiation at a wavelength λ from an object field in an object surface to an image field in an image surface. The elements include mirror elements having a reflective surface formed by a reflective coating positioned at a path of radiation. At least one of the mirror elements has a rotationally asymmetrical reflective surface deviating from a best-fit rotationally symmetric reflective surface by about λ or more at one or more locations. The elements include an apodization correction element effective to correct a spatial intensity distribution in an exit pupil of the optical system relative to the optical system without the apodization correcting element. The apodization correction element can be effective to increase symmetry of the spatial intensity distribution in the exit pupil relative to the optical system without the apodization correcting element.
摘要翻译：公开了一种光学系统，其包括多个元件，其被布置成将从物体表面中的物场到波长λ的辐射成像到图像表面中的图像场。元件包括具有由位于辐射路径处的反射涂层形成的反射表面的镜元件。至少一个镜元件具有在一个或多个位置处偏离最佳拟合旋转对称反射表面约λ或更大的旋转非对称反射表面。这些元件包括有效地校正光学系统的出射光瞳相对于没有变迹校正元件的光学系统的空间强度分布的变迹校正元件。变迹校正元件可以有效地增加出射光瞳相对于没有变迹校正元件的光学系统的空间强度分布的对称性。

5. 发明授权

US09568845B2 Mirror for use in a microlithography projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的镜子
公开(公告)号：US09568845B2
公开(公告)日：2017-02-14
申请号：US13417510
申请日：2012-03-12
申请人： Martin Rocktaeschel , Hartmut Enkisch , Franz-Josef Stickel , Oliver Natt , Hans-Juergen Mann , Sascha Migura
发明人： Martin Rocktaeschel , Hartmut Enkisch , Franz-Josef Stickel , Oliver Natt , Hans-Juergen Mann , Sascha Migura
IPC分类号： G03B27/68 , G03B27/52 , G03B27/54 , G03F7/20 , G02B5/08
CPC分类号： G03F7/70958 , G02B5/0833 , G03F7/70191 , G03F7/70308 , G03F7/70316
摘要： A mirror including a substrate and a reflective coating that includes a first group of layers and a second group of layers arranged between the substrate and the first group of layers. Both the first and second groups of layers include a plurality of alternating first material layers and second material layers, arranged one above another. The refractive index of the first material for radiation in the range of 5-30 nm is greater than the refractive index of the second material in that wavelength range. The first group of layers is configured to have a number of layers that is greater than 20, such that, upon irradiation with radiation having a wavelength in the range of 5-30 nm, less than 20% of the radiation reaches the second group of layers, which has a layer thickness variation for correcting the surface form of the mirror.
摘要翻译：一种包括基板和反射涂层的反射镜，其包括布置在基板和第一组层之间的第一组层和第二组层。第一组和第二组都包括多个交替的第一材料层和第二材料层，其彼此排列。用于5-30nm范围内的辐射的第一材料的折射率大于在该波长范围内的第二材料的折射率。第一组层被配置为具有大于20的多个层，使得当辐射具有在5-30nm范围内的波长的辐射时，少于20％的辐射达到第二组层，其具有用于校正反射镜的表面形式的层厚度变化。

6. 发明授权

US09188771B2 Reflective optical imaging system 有权
标题翻译：反光光学成像系统
公开(公告)号：US09188771B2
公开(公告)日：2015-11-17
申请号：US13313641
申请日：2011-12-07
申请人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
发明人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
IPC分类号： G03B27/68 , G02B17/06
CPC分类号： G02B17/0657 , G03F7/70233
摘要： An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength λ0 has a multiplicity of mirrors. Each mirror has a mirror surface having a reflective layer arrangement having a sequence of individual layers.
摘要翻译：借助于来自主波长λ0附近的波长范围的电磁辐射，用于将配置在成像系统的物体平面中的图案成像成像系统的图像平面的光学成像系统具有多个反射镜。每个反射镜具有镜面，反射层布置具有单个层序列。

7. 发明申请

US20120224160A1 REFLECTIVE OPTICAL IMAGING SYSTEM 有权
标题翻译：反射光学成像系统
公开(公告)号：US20120224160A1
公开(公告)日：2012-09-06
申请号：US13313641
申请日：2011-12-07
申请人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
发明人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
IPC分类号： G03B27/70 , G03B27/32 , G02B23/00
CPC分类号： G02B17/0657 , G03F7/70233
摘要： An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength λ0 has a multiplicity of mirrors. Each mirror has a mirror surface having a reflective layer arrangement having a sequence of individual layers.
摘要翻译：借助于来自主波长λ0附近的波长范围的电磁辐射，用于将配置在成像系统的物体平面中的图案成像成像系统的图像平面的光学成像系统具有多个反射镜。每个反射镜具有镜面，反射层布置具有单个层序列。

8. 发明授权

US08486590B2 Reflective mask for EUV lithography 有权
标题翻译： EUV光刻用反光罩
公开(公告)号：US08486590B2
公开(公告)日：2013-07-16
申请号：US13526472
申请日：2012-06-18
申请人： Vladimir Kamenov , Sascha Migura
发明人： Vladimir Kamenov , Sascha Migura
IPC分类号： G03F1/24
CPC分类号： G03F7/70316 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70216
摘要： To improve the mask of an EUV lithography apparatus in view of its high reflectivity, a reflective mask is suggested for EUV lithography having a reflective multilayer system on a substrate configured for a working wavelength in the EUV range and having stacks with layers of at least two materials with different real parts of the refractive index at the working wavelength, wherein the multilayer system (V) is configured such that, as it is irradiated with EUV radiation at a fixed wavelength and an angle interval between the smallest and the largest angle of incidence of up to 21°, the apodization is less than 30%.
摘要翻译：鉴于其高反射率，为了改进EUV光刻设备的掩模，建议用于EUV光刻的反射掩模，其在被配置用于EUV范围中的工作波长的衬底上具有反射多层系统，并且具有至少两层的层在工作波长处具有不同实际折射率部分的材料，其中多层体系（V）被配置为使得当被固定波长的EUV辐射和最小和最大入射角之间的角度间隔照射时高达21°，变迹小于30％。

9. 发明授权

US09494718B2 Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective 有权
标题翻译： EUV波长范围的镜面，这种反射镜的基板，包括这种反射镜或这种基板的微光刻的投影物镜，以及用于微光刻的投影曝光装置，包括这种投射物镜
公开(公告)号：US09494718B2
公开(公告)日：2016-11-15
申请号：US13525233
申请日：2012-06-15
申请人： Stephan Muellender , Joern Weber , Wilfried Clauss , Hans-Jochen Paul , Gerhard Braun , Sascha Migura , Aurelian Dodoc , Christoph Zaczek , Gisela Von Blanckenhagen , Roland Loercher
发明人： Stephan Muellender , Joern Weber , Wilfried Clauss , Hans-Jochen Paul , Gerhard Braun , Sascha Migura , Aurelian Dodoc , Christoph Zaczek , Gisela Von Blanckenhagen , Roland Loercher
IPC分类号： G02B5/08 , G02B1/10 , G03F7/20 , B82Y30/00
CPC分类号： G02B5/0891 , B82Y30/00 , G02B1/10 , G02B1/105 , G02B1/14 , G02B5/0816 , G03F7/70233 , G03F7/70316 , G03F7/70958
摘要： A mirror (1a; 1a′; 1b; 1b′; 1c; 1c′) for the EUV wavelength range and having a substrate (S) and a layer arrangement, wherein the layer arrangement includes at least one surface layer system (P′″) consisting of a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include two individual layers composed of different materials for a high refractive index layer (H′″) and a low refractive index layer (L′″), wherein the layer arrangement includes at least one surface protecting layer (SPL, Lp) or at least one surface protecting layer system (SPLS) having a thickness of greater than 20 nm, and preferably greater than 50 nm.
摘要翻译：用于EUV波长范围的反射镜（1a; 1a'; 1b; 1b'; 1c; 1c'），并具有衬底（S）和层布置，其中层布置包括至少一个表层系统（P' ）由各层的至少两个周期（P3）的周期性序列组成，其中周期（P3）包括由用于高折射率层（H“”）和低折射率层（H“”）的不同材料组成的两个单独层 L“），其中所述层布置包括至少一个表面保护层（SPL，Lp）或至少一个具有大于20nm，优选大于50nm的厚度的表面保护层系统（SPLS）。

10. 发明申请

US20120212810A1 MIRROR FOR THE EUV WAVELENGTH RANGE, PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY CROMPRISING SUCH A MIRROR, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING SUCH A PROJECTION OBJECTIVE 审中-公开
标题翻译：用于EUV波长范围的镜像，用于对这样的镜子进行微结构化的投影目标和用于包含这种投影目标的微观计算的投影曝光装置
公开(公告)号：US20120212810A1
公开(公告)日：2012-08-23
申请号：US13347431
申请日：2012-01-10
申请人： Hans-Jochen Paul , Gerhard Braun , Sascha Migura , Aurelian Dodoc , Christoph Zaczek
发明人： Hans-Jochen Paul , Gerhard Braun , Sascha Migura , Aurelian Dodoc , Christoph Zaczek
IPC分类号： G02B5/08
CPC分类号： G03F7/70958 , B82Y10/00 , G02B5/0891 , G03F7/70316 , G03F7/70941 , G21K1/062 , G21K2201/064 , G21K2201/067
摘要： EUV-mirror having a substrate (S) and a layer arrangement that includes plural layer subsystems (P″, P′″) each consisting of a periodic sequence of at least two periods (P2, P3) of individual layers. The periods (P2, P3) include two individual layers composed of different materials for a high refractive index layer (H″, H′″) and a low refractive index layer (L″, L′″) and have within each layer subsystem (P″, P′″) a constant thickness (d2, d3) that deviates from that of the periods of an adjacent layer subsystem. In one alternative, the layer subsystem (P″) second most distant from the substrate has a period sequence (P2) such that the first high refractive index layer (H′″) of the layer subsystem (P′″) most distant from the substrate directly succeeds the last high refractive index layer (H″) of the layer subsystem (P″) second most distant from the substrate
摘要翻译：具有基板（S）的EUV反射镜以及包括多层子系统（P“，P”“）的层布置，每个子系统由各层的至少两个周期（P2，P3）的周期性序列构成。周期（P2，P3）包括由用于高折射率层（H“，H”“）和低折射率层（L”，L“”）的不同材料组成的两个单独层，并且在每个层子系统 P“，P”“）与相邻层子系统的周期偏差的恒定厚度（d2，d3）。在一个替代方案中，距衬底第二最远的层子系统（P“）具有周期序列（P2），使得层子系统（P'”）的第一高折射率层（H“”）最远离衬底直接成为距离衬底最远的层子系统（P“）的最后一个高折射率层（H”）

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