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1. 发明授权

US09188771B2 Reflective optical imaging system 有权
标题翻译：反光光学成像系统
公开(公告)号：US09188771B2
公开(公告)日：2015-11-17
申请号：US13313641
申请日：2011-12-07
申请人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
发明人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
IPC分类号： G03B27/68 , G02B17/06
CPC分类号： G02B17/0657 , G03F7/70233
摘要： An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength λ0 has a multiplicity of mirrors. Each mirror has a mirror surface having a reflective layer arrangement having a sequence of individual layers.
摘要翻译：借助于来自主波长λ0附近的波长范围的电磁辐射，用于将配置在成像系统的物体平面中的图案成像成像系统的图像平面的光学成像系统具有多个反射镜。每个反射镜具有镜面，反射层布置具有单个层序列。

2. 发明申请

US20120224160A1 REFLECTIVE OPTICAL IMAGING SYSTEM 有权
标题翻译：反射光学成像系统
公开(公告)号：US20120224160A1
公开(公告)日：2012-09-06
申请号：US13313641
申请日：2011-12-07
申请人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
发明人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
IPC分类号： G03B27/70 , G03B27/32 , G02B23/00
CPC分类号： G02B17/0657 , G03F7/70233
摘要： An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength λ0 has a multiplicity of mirrors. Each mirror has a mirror surface having a reflective layer arrangement having a sequence of individual layers.
摘要翻译：借助于来自主波长λ0附近的波长范围的电磁辐射，用于将配置在成像系统的物体平面中的图案成像成像系统的图像平面的光学成像系统具有多个反射镜。每个反射镜具有镜面，反射层布置具有单个层序列。

3. 发明授权

US09494718B2 Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective 有权
标题翻译： EUV波长范围的镜面，这种反射镜的基板，包括这种反射镜或这种基板的微光刻的投影物镜，以及用于微光刻的投影曝光装置，包括这种投射物镜
公开(公告)号：US09494718B2
公开(公告)日：2016-11-15
申请号：US13525233
申请日：2012-06-15
申请人： Stephan Muellender , Joern Weber , Wilfried Clauss , Hans-Jochen Paul , Gerhard Braun , Sascha Migura , Aurelian Dodoc , Christoph Zaczek , Gisela Von Blanckenhagen , Roland Loercher
发明人： Stephan Muellender , Joern Weber , Wilfried Clauss , Hans-Jochen Paul , Gerhard Braun , Sascha Migura , Aurelian Dodoc , Christoph Zaczek , Gisela Von Blanckenhagen , Roland Loercher
IPC分类号： G02B5/08 , G02B1/10 , G03F7/20 , B82Y30/00
CPC分类号： G02B5/0891 , B82Y30/00 , G02B1/10 , G02B1/105 , G02B1/14 , G02B5/0816 , G03F7/70233 , G03F7/70316 , G03F7/70958
摘要： A mirror (1a; 1a′; 1b; 1b′; 1c; 1c′) for the EUV wavelength range and having a substrate (S) and a layer arrangement, wherein the layer arrangement includes at least one surface layer system (P′″) consisting of a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include two individual layers composed of different materials for a high refractive index layer (H′″) and a low refractive index layer (L′″), wherein the layer arrangement includes at least one surface protecting layer (SPL, Lp) or at least one surface protecting layer system (SPLS) having a thickness of greater than 20 nm, and preferably greater than 50 nm.
摘要翻译：用于EUV波长范围的反射镜（1a; 1a'; 1b; 1b'; 1c; 1c'），并具有衬底（S）和层布置，其中层布置包括至少一个表层系统（P' ）由各层的至少两个周期（P3）的周期性序列组成，其中周期（P3）包括由用于高折射率层（H“”）和低折射率层（H“”）的不同材料组成的两个单独层 L“），其中所述层布置包括至少一个表面保护层（SPL，Lp）或至少一个具有大于20nm，优选大于50nm的厚度的表面保护层系统（SPLS）。

4. 发明申请

US20120212810A1 MIRROR FOR THE EUV WAVELENGTH RANGE, PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY CROMPRISING SUCH A MIRROR, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING SUCH A PROJECTION OBJECTIVE 审中-公开
标题翻译：用于EUV波长范围的镜像，用于对这样的镜子进行微结构化的投影目标和用于包含这种投影目标的微观计算的投影曝光装置
公开(公告)号：US20120212810A1
公开(公告)日：2012-08-23
申请号：US13347431
申请日：2012-01-10
申请人： Hans-Jochen Paul , Gerhard Braun , Sascha Migura , Aurelian Dodoc , Christoph Zaczek
发明人： Hans-Jochen Paul , Gerhard Braun , Sascha Migura , Aurelian Dodoc , Christoph Zaczek
IPC分类号： G02B5/08
CPC分类号： G03F7/70958 , B82Y10/00 , G02B5/0891 , G03F7/70316 , G03F7/70941 , G21K1/062 , G21K2201/064 , G21K2201/067
摘要： EUV-mirror having a substrate (S) and a layer arrangement that includes plural layer subsystems (P″, P′″) each consisting of a periodic sequence of at least two periods (P2, P3) of individual layers. The periods (P2, P3) include two individual layers composed of different materials for a high refractive index layer (H″, H′″) and a low refractive index layer (L″, L′″) and have within each layer subsystem (P″, P′″) a constant thickness (d2, d3) that deviates from that of the periods of an adjacent layer subsystem. In one alternative, the layer subsystem (P″) second most distant from the substrate has a period sequence (P2) such that the first high refractive index layer (H′″) of the layer subsystem (P′″) most distant from the substrate directly succeeds the last high refractive index layer (H″) of the layer subsystem (P″) second most distant from the substrate
摘要翻译：具有基板（S）的EUV反射镜以及包括多层子系统（P“，P”“）的层布置，每个子系统由各层的至少两个周期（P2，P3）的周期性序列构成。周期（P2，P3）包括由用于高折射率层（H“，H”“）和低折射率层（L”，L“”）的不同材料组成的两个单独层，并且在每个层子系统 P“，P”“）与相邻层子系统的周期偏差的恒定厚度（d2，d3）。在一个替代方案中，距衬底第二最远的层子系统（P“）具有周期序列（P2），使得层子系统（P'”）的第一高折射率层（H“”）最远离衬底直接成为距离衬底最远的层子系统（P“）的最后一个高折射率层（H”）

5. 发明授权

US07093937B2 Optical component and coating system for coating substrates for optical components 有权
标题翻译：用于光学部件涂覆基板的光学部件和涂层系统
公开(公告)号：US07093937B2
公开(公告)日：2006-08-22
申请号：US11052751
申请日：2005-02-09
申请人： Harry Bauer , Matthias Heller , Hans-Jochen Paul , Jens Ullmann , Patrick Scheible , Christoph Zaczek
发明人： Harry Bauer , Matthias Heller , Hans-Jochen Paul , Jens Ullmann , Patrick Scheible , Christoph Zaczek
IPC分类号： G02C7/02
CPC分类号： G02B1/10 , C23C14/0021 , C23C14/044 , C23C14/505
摘要： An optical component and a coating system for coating substrates for optical components with essentially rotationally symmetric coatings, the system having a planetary-drive system (1) that has a rotating planet carrier (2) and several planets (4), each of which carries a single substrate, that corotate both with the planet carrier and with respect to the primary carrier. In one embodiment a set of stationary first masks (20) that allow controlling the radial variation in physical film thickness is arranged between a source (8) of material situated beneath the planets and the substrates. A set of second masks that mask off evaporation angles exceeding a limiting evaporation or incidence angle (β max) for every substrate also corotate with the primary carrier (2), which allows depositing coatings having a prescribed radial film-thickness distribution and a virtually constant density of the coating material over their full radial extents for relatively low, and only slightly varying, evaporation angles.
摘要翻译：一种用于涂覆具有基本上旋转对称涂层的光学部件的基板的光学部件和涂层系统，该系统具有行星传动系统（1），其具有旋转的行星架（2）和几个行星（4），每个行星架单个衬底，其与行星架相关并且相对于主载体共转。在一个实施例中，允许控制物理膜厚度的径向变化的一组固定第一掩模（20）布置在位于行星下方的材料源（8）和基板之间。掩盖每个底物超过限制蒸发或入射角（βmax）的蒸发角度的一组第二掩模也与主载体（2）一致，这允许沉积具有规定径向膜厚度分布和实际上恒定的涂层在完全径向范围内涂层材料的密度相对较低且仅略微变化的蒸发角度。

6. 发明申请

US20050146683A1 Optical component and coating system for coating substrates for optical components 有权
标题翻译：用于光学部件涂覆基板的光学部件和涂层系统
公开(公告)号：US20050146683A1
公开(公告)日：2005-07-07
申请号：US11052751
申请日：2005-02-09
申请人： Harry Bauer , Matthias Heller , Hans-Jochen Paul , Jens Ullmann , Patrick Scheible , Christoph Zaczek
发明人： Harry Bauer , Matthias Heller , Hans-Jochen Paul , Jens Ullmann , Patrick Scheible , Christoph Zaczek
IPC分类号： G02B1/11 , B05B13/02 , B05B15/04 , B05D1/32 , C03C17/245 , C23C14/04 , C23C14/50 , G02B1/10 , G02C7/02
CPC分类号： G02B1/10 , C23C14/0021 , C23C14/044 , C23C14/505
摘要： An optical component and a coating system for coating substrates for optical components with essentially rotationally symmetric coatings, the system having a planetary-drive system (1) that has a rotating planet carrier (2) and several planets (4), each of which carries a single substrate, that corotate both with the planet carrier and with respect to the primary carrier. In one embodiment a set of stationary first masks (20) that allow controlling the radial variation in physical film thickness is arranged between a source (8) of material situated beneath the planets and the substrates. A set of second masks that mask off evaporation angles exceeding a limiting evaporation or incidence angle (β max) for every substrate also corotate with the primary carrier (2), which allows depositing coatings having a prescribed radial film-thickness distribution and a virtually constant density of the coating material over their full radial extents for relatively low, and only slightly varying, evaporation angles.
摘要翻译：一种用于涂覆具有基本上旋转对称涂层的光学部件的基板的光学部件和涂层系统，该系统具有行星传动系统（1），其具有旋转的行星架（2）和几个行星（4），每个行星架单个衬底，其与行星架相关并且相对于主载体共转。在一个实施例中，允许控制物理膜厚度的径向变化的一组固定第一掩模（20）布置在位于行星下方的材料源（8）和基板之间。掩盖每个底物超过限制蒸发或入射角（βmax）的蒸发角度的一组第二掩模也与主载体（2）一致，这允许沉积具有规定径向膜厚度分布和实际上恒定的涂层在完全径向范围内涂层材料的密度相对较低且仅略微变化的蒸发角度。

7. 发明授权

US06863398B2 Method and coating system for coating substrates for optical components 有权
标题翻译：用于光学元件涂覆基板的方法和涂层系统
公开(公告)号：US06863398B2
公开(公告)日：2005-03-08
申请号：US10244419
申请日：2002-09-17
申请人： Harry Bauer , Matthias Heller , Hans-Jochen Paul , Jens Ullmann , Patrick Scheible , Christoph Zaczek
发明人： Harry Bauer , Matthias Heller , Hans-Jochen Paul , Jens Ullmann , Patrick Scheible , Christoph Zaczek
IPC分类号： G02B1/11 , B05B13/02 , B05B15/04 , B05D1/32 , C03C17/245 , C23C14/04 , C23C14/50 , G02B1/10 , G02C7/02 , B05D5/06
CPC分类号： G02B1/10 , C23C14/0021 , C23C14/044 , C23C14/505
摘要： A method for coating substrates (10) for optical components with essentially rotationally symmetric coatings employs a coating system equipped with a planetary-drive system (1) that has a rotating planet carrier (2) and several planets (4), each of which carries a single substrate, that corotate both with the planet carrier and with respect to the primary carrier. In one embodiment a set of stationary first masks (20) that allow controlling the radial variation in physical film thickness is arranged between a source (8) of material situated beneath the planets and the substrates. A set of second masks that mask off evaporation angles exceeding a limiting evaporation or incidence angle (β max) for every substrate also corotate with the primary carrier (2), which allows depositing coatings having a prescribed radial film-thickness distribution and a virtually constant density of the coating material over their full radial extents for relatively low, and only slightly varying, evaporation angles.
摘要翻译：用于涂覆具有基本旋转对称涂层的光学部件的基板（10）的方法使用配备有行星传动系统（1）的涂层系统，行星传动系统（1）具有旋转的行星架（2）和几个行星（4），每个行星架单个衬底，其与行星架相关并且相对于主载体共转。在一个实施例中，允许控制物理膜厚度的径向变化的一组固定第一掩模（20）布置在位于行星下方的材料源（8）和基板之间。掩盖每个底物超过限制蒸发或入射角（βmax）的蒸发角度的一组第二掩模也与主载体（2）一致，这允许沉积具有规定径向膜厚度分布和实际上恒定的涂层在完全径向范围内涂层材料的密度相对较低且仅略微变化的蒸发角度。

8. 发明申请

US20080291419A1 PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY 审中-公开
公开(公告)号：US20080291419A1
公开(公告)日：2008-11-27
申请号：US12187116
申请日：2008-08-06
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

9. 发明申请

US20050225737A1 Projection objective for immersion lithography 有权
标题翻译：浸没光刻的投影目标
公开(公告)号：US20050225737A1
公开(公告)日：2005-10-13
申请号：US11015553
申请日：2004-12-20
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
摘要翻译：在投影物镜中，借助于设置在光路中的投影物镜的最后一个光学元件与图像之间的浸没介质，将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中平面，最后一个光学元件具有透明基板和与基板相配合的保护层系统，用于与浸没介质接触，用于增加最后一个光学元件对浸入介质引起的劣化的电阻。

10. 发明授权

US10146137B2 Catadioptric projection objective including a reflective optical component and a measuring device 有权
公开(公告)号：US10146137B2
公开(公告)日：2018-12-04
申请号：US13423344
申请日：2012-03-19
申请人： Sascha Bleidistel , Toralf Gruner , Christoph Zaczek , Ralf Mueller
发明人： Sascha Bleidistel , Toralf Gruner , Christoph Zaczek , Ralf Mueller
IPC分类号： G03F7/20 , G02B13/14 , G02B17/08
摘要： A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.

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