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1. 发明申请

US20090035590A1 NON-COVALENTLY CROSSLINKABLE MATERIALS FOR PHOTOLITHOGRAPHY PROCESSES 有权
标题翻译：用于光刻方法的非共价交联材料
公开(公告)号：US20090035590A1
公开(公告)日：2009-02-05
申请号：US12180832
申请日：2008-07-28
申请人： Daniel M. Sullivan , Runhui Huang , Charles J. Neef , Jinhua Dai , Michael B. Swope
发明人： Daniel M. Sullivan , Runhui Huang , Charles J. Neef , Jinhua Dai , Michael B. Swope
IPC分类号： B32B15/08 , B32B27/00 , B32B27/06 , C08L39/08 , C08F126/06 , B05D5/12 , G03F7/20
CPC分类号： G03F7/091 , C08F212/14 , C08F220/14 , C08F220/18 , C08F220/26 , C08F220/34 , C08F220/56 , C08F226/06 , G03F7/11 , Y10T428/31678 , Y10T428/31855 , Y10T428/31935
摘要： This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalently crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.
摘要翻译：本发明描述了使用非共价交联的树脂涂料用于光刻应用的组合物和方法。这些材料被设计成在涂覆之后进行提供耐溶剂性的改变，并且在一些材料中经历同时的水基溶解度。非共价相互作用允许这些涂层比共价交联的材料更容易去除。这些类型的材料非常适用于沟槽和间隙填充应用，以及抗反射涂层，旋涂碳层和蚀刻掩模。

2. 发明授权

US09482951B2 Non-covalently crosslinkable materials for photolithography processes 有权
标题翻译：用于光刻工艺的非共价交联材料
公开(公告)号：US09482951B2
公开(公告)日：2016-11-01
申请号：US12180832
申请日：2008-07-28
申请人： Daniel M. Sullivan , Runhui Huang , Charles J. Neef , Jinhua Dai , Michael B. Swope
发明人： Daniel M. Sullivan , Runhui Huang , Charles J. Neef , Jinhua Dai , Michael B. Swope
IPC分类号： B32B27/06 , G03F7/09 , C08F212/14 , C08F220/18 , C08F220/34 , C08F226/06 , G03F7/11 , C08F220/14 , C08F220/26 , C08F220/56
CPC分类号： G03F7/091 , C08F212/14 , C08F220/14 , C08F220/18 , C08F220/26 , C08F220/34 , C08F220/56 , C08F226/06 , G03F7/11 , Y10T428/31678 , Y10T428/31855 , Y10T428/31935
摘要： This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalently crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.
摘要翻译：本发明描述了使用非共价交联的树脂涂料用于光刻应用的组合物和方法。这些材料被设计成在涂覆之后进行提供耐溶剂性的改变，并且在一些材料中经历同时的水基溶解度。非共价相互作用允许这些涂层比共价交联的材料更容易去除。这些类型的材料非常适用于沟槽和间隙填充应用，以及抗反射涂层，旋涂碳层和蚀刻掩模。

3. 发明授权

US07745540B2 Gap fill materials and bottom anti-reflective coatings comprising hyperbranched polymers 有权
标题翻译：间隙填充材料和包含超支化聚合物的底部抗反射涂层
公开(公告)号：US07745540B2
公开(公告)日：2010-06-29
申请号：US11852137
申请日：2007-09-07
申请人： Chelladurai Devadoss , Mandar Bhave , Runhui Huang
发明人： Chelladurai Devadoss , Mandar Bhave , Runhui Huang
IPC分类号： C08F8/00 , C08F16/02 , C08F16/12 , C08F2/00 , C08F20/06 , C08F118/02
CPC分类号： C09D5/34 , C09D201/005 , Y10T428/2462
摘要： New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a dendritic polymer dispersed or dissolved in a solvent system, and preferably a light attenuating compound, a crosslinking agent, and a catalyst. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
摘要翻译：提供了具有改善的流动性能的新的抗反射或填充组合物。组合物包含分散或溶解在溶剂体系中的树枝状聚合物，优选光衰减化合物，交联剂和催化剂。本发明的组合物可用于在双镶嵌工艺中的后续蚀刻期间保护接触或通孔免于降解。本发明的组合物还可以施加到基底（例如，硅晶片）以形成具有高蚀刻速率的抗反射涂层，其在随后的光致抗蚀剂曝光和显影期间最小化或防止反射。

4. 发明授权

US06653411B2 Anti-reflective coating compositions comprising polymerized aminoplasts 有权
公开(公告)号：US06653411B2
公开(公告)日：2003-11-25
申请号：US10003558
申请日：2001-10-24
申请人： Rama Puligadda , Runhui Huang
发明人： Rama Puligadda , Runhui Huang
IPC分类号： C08L6700
CPC分类号： H04B1/403 , C08L61/28 , G02B1/111 , H04B1/30
摘要： Improved anti-reflective coating compositions for use in integrated circuit manufacturing processes and methods of forming these compositions are provided. Broadly, the compositions are formed by heating a solution comprising a compound including specific compounds (e.g., alkoxy alkyl melamines, alkoxy alkyl benzoguanamines) under acidic conditions so as to polymerize the compounds and form polymers having an average molecular weight of at least about 1,000 Daltons. The monomers of the resulting polymers are joined to one another via linkage groups (e.g., —CH2—, —CH2—O—CH2—) which are bonded to nitrogen atoms on the respective monomers. The polymerized compound is mixed with a solvent and applied to a substrate surface after which it is baked to form an anti-reflective layer. The resulting layer has high k values and can be formulated for both conformal and planar applications.

5. 发明授权

US06432611B1 Anti-reflective coating compositions comprising polymerized aminoplasts 有权
公开(公告)号：US06432611B1
公开(公告)日：2002-08-13
申请号：US09691780
申请日：2000-10-18
申请人： Rama Puligadda , Runhui Huang
发明人： Rama Puligadda , Runhui Huang
IPC分类号： G03C1492
CPC分类号： G02B1/111 , C08L61/28 , Y10T428/31504 , Y10T428/31667 , Y10T428/31862 , Y10T428/31942
摘要： Improved anti-reflective coating compositions for use in integrated circuit manufacturing processes and methods of forming these compositions are provided. Broadly, the compositions are formed by heating a solution comprising a compound including specific compounds (e.g., alkoxy alkyl melamines, alkoxy alkyl benzoguanamines) under acidic conditions so as to polymerize the compounds and form polymers having an average molecular weight of at least about 1,000 Daltons. The monomers of the resulting polymers are joined to one another via linkage groups (e.g., —CH2—, —CH2—O—CH2—) which are bonded to nitrogen atoms on the respective monomers. The polymerized compound is mixed with a solvent and applied to a substrate surface after which it is baked to form an anti-reflective layer. The resulting layer has high k values and can be formulated for both conformal and planar applications.

6. 发明授权

US06399686B1 Anti-reflective coating compositions comprising polymerized aminoplasts 有权
标题翻译：包含聚合的氨基塑料的抗反射涂料组合物
公开(公告)号：US06399686B1
公开(公告)日：2002-06-04
申请号：US09691774
申请日：2000-10-18
申请人： Rama Puligadda , Runhui Huang
发明人： Rama Puligadda , Runhui Huang
IPC分类号： B05D302
CPC分类号： G02B1/111 , C08L61/28 , Y10T428/31504 , Y10T428/31667 , Y10T428/31862 , Y10T428/31942
摘要： Improved anti-reflective coating compositions for use in integrated circuit manufacturing processes and methods of forming these compositions are provided. Broadly, the compositions are formed by heating a solution comprising a compound including specific compounds (e.g., alkoxy alkyl melamines, alkoxy alkyl benzoguanamines) under acidic conditions so as to polymerize the compounds and form polymers having an average molecular weight of at least about 1,000 Daltons. The monomers of the resulting polymers are joined to one another via linkage groups (e.g., —CH2—,—CH2—O—CH2—) which are bonded to nitrogen atoms on the respective monomers. The polymerized compound is mixed with a solvent and applied to a substrate surface after which it is baked to form an anti-reflective layer. The resulting layer has high k values and can be formulated for both conformal and planar applications.
摘要翻译：提供用于集成电路制造工艺的改进的抗反射涂料组合物和形成这些组合物的方法。广泛地，通过在酸性条件下加热包含特定化合物（例如，烷氧基烷基三聚氰胺，烷氧基烷基苯胍胺）的化合物的溶液来形成组合物，以便使化合物聚合并形成平均分子量为至少约1,000道尔顿的聚合物。所得聚合物的单体通过与各单体上的氮原子键合的连接基团（例如-CH 2 - ， - CH 2 -O-CH 2 - ）彼此连接。将聚合的化合物与溶剂混合并施加到基材表面，然后将其烘焙以形成抗反射层。所得到的层具有高k值，并且可以适用于共形和平面应用。

7. 发明授权

US07754818B2 Gap fill materials and bottom anti-reflective coatings comprising hyperbranched polymers 有权
公开(公告)号：US07754818B2
公开(公告)日：2010-07-13
申请号：US11032930
申请日：2005-01-11
申请人： Chelladurai Devadoss , Mandar Bhave , Runhui Huang
发明人： Chelladurai Devadoss , Mandar Bhave , Runhui Huang
IPC分类号： C08F8/00 , C08F16/02 , C08F16/12 , C08F20/06 , C08F118/02 , C08F2/00 , C08F4/00
CPC分类号： C09D5/34 , C09D201/005 , Y10T428/2462
摘要： New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a dendritic polymer dispersed or dissolved in a solvent system, and preferably a light attenuating compound, a crosslinking agent, and a catalyst. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.

8. 发明授权

US06670425B2 Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings 有权
标题翻译：具有环氧化物环的聚合物的抗反射涂层与光衰减化合物和未反应的环氧化物环反应
公开(公告)号：US06670425B2
公开(公告)日：2003-12-30
申请号：US09874783
申请日：2001-06-05
申请人： Rama Puligadda , James E. Lamb, III , Tony D. Flaim , Runhui Huang , Xie Shao
发明人： Rama Puligadda , James E. Lamb, III , Tony D. Flaim , Runhui Huang , Xie Shao
IPC分类号： B32B2706
CPC分类号： G03F7/091 , Y10S438/952 , Y10T428/31511 , Y10T428/31525
摘要： Anti-reflective compositions and methods of using those compositions with low dielectric constant materials are provided. In one embodiment, the compositions include polymers comprising recurring monomers having unreacted epoxide groups. In another embodiment, the polymers further comprise recurring monomers comprising epoxide rings reacted with a light attenuating compound so as to open the ring. The compositions can be applied to dielectric layers so as to minimize or prevent reflection during the dual damascene process while simultaneously blocking via or photoresist poisoning which commonly occurs when organic anti-reflective coatings are applied to low dielectric constant layers.
摘要翻译：提供抗反射组合物和使用具有低介电常数材料的那些组合物的方法。在一个实施方案中，组合物包括包含具有未反应的环氧基团的重复单体的聚合物。在另一个实施方案中，聚合物还包含包含与光衰减化合物反应以便打开环的环氧化物环的重复单体。组合物可以施加到电介质层，以便在双镶嵌工艺期间最小化或防止反射，同时阻挡当将有机抗反射涂层施加到低介电常数层时通常发生的通孔或光致抗蚀剂中毒。

9. 发明授权

US06663916B2 Anti-reflective coating of polymer with epoxide rings reacted with light attenuating compound and unreacted epoxide rings 有权
公开(公告)号：US06663916B2
公开(公告)日：2003-12-16
申请号：US10174173
申请日：2002-06-18
申请人： Rama Puligadda , James E. Lamb, III , Tony D. Flaim , Runhui Huang , Xie Shao
发明人： Rama Puligadda , James E. Lamb, III , Tony D. Flaim , Runhui Huang , Xie Shao
IPC分类号： B05D302
CPC分类号： G03F7/091 , Y10S438/952 , Y10T428/31511 , Y10T428/31525
摘要： Anti-reflective compositions and methods of using those compositions with low dielectric constant materials are provided. In one embodiment, the compositions include polymers comprising recurring monomers having unreacted epoxide groups. In another embodiment, the polymers further comprise recurring monomers comprising epoxide rings reacted with a light attenuating compound so as to open the ring. The compositions can be applied to dielectric layers so as to minimize or prevent reflection during the dual damascene process while simultaneously blocking via or photoresist poisoning which commonly occurs when organic anti-reflective coatings are applied to low dielectric constant layers.

10. 发明授权

US06323310B1 Anti-reflective coating compositions comprising polymerized aminoplasts 有权
标题翻译：包含聚合的氨基塑料的抗反射涂料组合物
公开(公告)号：US06323310B1
公开(公告)日：2001-11-27
申请号：US09552236
申请日：2000-04-19
申请人： Rama Puligadda , Runhui Huang
发明人： Rama Puligadda , Runhui Huang
IPC分类号： C08G7306
CPC分类号： G02B1/111 , C08L61/28 , Y10T428/31504 , Y10T428/31667 , Y10T428/31862 , Y10T428/31942
摘要： Improved anti-reflective coating compositions for use in integrated circuit manufacturing processes and methods of forming these compositions are provided. Broadly, the compositions are formed by heating a solution comprising a compound including specific compounds (e.g., alkoxy alkyl melamines, alkoxy alkyl benzoguanamines) under acidic conditions so as to polymerize the compounds and form polymers having an average molecular weight of at least about 1,000 Daltons. The monomers of the resulting polymers are joined to one another via linkage groups (e.g., —CH2—, —CH2—O—CH2—) which are bonded to nitrogen atoms on the respective monomers. The polymerized compound is mixed with a solvent and applied to a substrate surface after which it is baked to form an anti-reflective layer. The resulting layer has high k values and can be formulated for both conformal and planar applications.
摘要翻译：提供用于集成电路制造工艺的改进的抗反射涂料组合物和形成这些组合物的方法。广泛地，通过在酸性条件下加热包含特定化合物（例如，烷氧基烷基三聚氰胺，烷氧基烷基苯胍胺）的化合物的溶液来形成组合物，以便使化合物聚合并形成平均分子量为至少约1,000道尔顿的聚合物。所得聚合物的单体通过与各单体上的氮原子键合的连接基团（例如，-CH 2 - ， - CH 2 -O-CH 2 - ）彼此连接。将聚合的化合物与溶剂混合并施加到基材表面，然后将其烘焙以形成抗反射层。所得到的层具有高k值，并且可以适用于共形和平面应用。

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