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1. 发明申请

US20090035590A1 NON-COVALENTLY CROSSLINKABLE MATERIALS FOR PHOTOLITHOGRAPHY PROCESSES 有权
标题翻译：用于光刻方法的非共价交联材料
公开(公告)号：US20090035590A1
公开(公告)日：2009-02-05
申请号：US12180832
申请日：2008-07-28
申请人： Daniel M. Sullivan , Runhui Huang , Charles J. Neef , Jinhua Dai , Michael B. Swope
发明人： Daniel M. Sullivan , Runhui Huang , Charles J. Neef , Jinhua Dai , Michael B. Swope
IPC分类号： B32B15/08 , B32B27/00 , B32B27/06 , C08L39/08 , C08F126/06 , B05D5/12 , G03F7/20
CPC分类号： G03F7/091 , C08F212/14 , C08F220/14 , C08F220/18 , C08F220/26 , C08F220/34 , C08F220/56 , C08F226/06 , G03F7/11 , Y10T428/31678 , Y10T428/31855 , Y10T428/31935
摘要： This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalently crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.
摘要翻译：本发明描述了使用非共价交联的树脂涂料用于光刻应用的组合物和方法。这些材料被设计成在涂覆之后进行提供耐溶剂性的改变，并且在一些材料中经历同时的水基溶解度。非共价相互作用允许这些涂层比共价交联的材料更容易去除。这些类型的材料非常适用于沟槽和间隙填充应用，以及抗反射涂层，旋涂碳层和蚀刻掩模。

2. 发明授权

US09482951B2 Non-covalently crosslinkable materials for photolithography processes 有权
标题翻译：用于光刻工艺的非共价交联材料
公开(公告)号：US09482951B2
公开(公告)日：2016-11-01
申请号：US12180832
申请日：2008-07-28
申请人： Daniel M. Sullivan , Runhui Huang , Charles J. Neef , Jinhua Dai , Michael B. Swope
发明人： Daniel M. Sullivan , Runhui Huang , Charles J. Neef , Jinhua Dai , Michael B. Swope
IPC分类号： B32B27/06 , G03F7/09 , C08F212/14 , C08F220/18 , C08F220/34 , C08F226/06 , G03F7/11 , C08F220/14 , C08F220/26 , C08F220/56
CPC分类号： G03F7/091 , C08F212/14 , C08F220/14 , C08F220/18 , C08F220/26 , C08F220/34 , C08F220/56 , C08F226/06 , G03F7/11 , Y10T428/31678 , Y10T428/31855 , Y10T428/31935
摘要： This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalently crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.
摘要翻译：本发明描述了使用非共价交联的树脂涂料用于光刻应用的组合物和方法。这些材料被设计成在涂覆之后进行提供耐溶剂性的改变，并且在一些材料中经历同时的水基溶解度。非共价相互作用允许这些涂层比共价交联的材料更容易去除。这些类型的材料非常适用于沟槽和间隙填充应用，以及抗反射涂层，旋涂碳层和蚀刻掩模。

3. 发明申请

US20130011630A1 METAL-OXIDE FILMS FROM SMALL MOLECULES FOR LITHOGRAPHIC APPLICATIONS 有权
标题翻译：来自小分子的金属氧化物膜用于光刻应用
公开(公告)号：US20130011630A1
公开(公告)日：2013-01-10
申请号：US13178301
申请日：2011-07-07
申请人： Daniel M. Sullivan , Charles J. Neef , Yubao Wang , Tantiboro Ouattara
发明人： Daniel M. Sullivan , Charles J. Neef , Yubao Wang , Tantiboro Ouattara
IPC分类号： B32B3/10 , B05D3/02 , G03F7/004 , C09D183/00 , G03F7/20
CPC分类号： H01L21/0276 , C08G77/58 , C09D183/14 , G03F7/0752 , G03F7/09 , G03F7/091 , G03F7/094 , H01L21/0332 , Y10T428/24802
摘要： Metal-oxide films for lithographic applications are provided. The films are formed from compositions comprising metal-oxide precursor compounds including metals and metalloids other than silicon. These films are easily produced and can be modified with a variety of ligands, including alkoxides, phenoxides, carboxylates, beta-diketones, and beta-ketoesters.
摘要翻译：提供了用于光刻应用的金属氧化物膜。该膜由包含金属和氧化物前体化合物的组合物形成，包括除硅以外的金属和准金属。这些膜容易生产，并且可以用各种配体进行改性，包括醇盐，苯氧化物，羧酸盐，β-二酮和β-酮酯。

4. 发明授权

US08647809B2 Metal-oxide films from small molecules for lithographic applications 有权
标题翻译：用于光刻应用的小分子的金属氧化物膜
公开(公告)号：US08647809B2
公开(公告)日：2014-02-11
申请号：US13178301
申请日：2011-07-07
申请人： Daniel M. Sullivan , Charles J. Neef , Yubao Wang , Tantiboro Ouattara
发明人： Daniel M. Sullivan , Charles J. Neef , Yubao Wang , Tantiboro Ouattara
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： H01L21/0276 , C08G77/58 , C09D183/14 , G03F7/0752 , G03F7/09 , G03F7/091 , G03F7/094 , H01L21/0332 , Y10T428/24802
摘要： Metal-oxide films for lithographic applications are provided. The films are formed from compositions comprising metal-oxide precursor compounds including metals and metalloids other than silicon. These films are easily produced and can be modified with a variety of ligands, including alkoxides, phenoxides, carboxylates, beta-diketones, and beta-ketoesters.
摘要翻译：提供了用于光刻应用的金属氧化物膜。该膜由包含金属和氧化物前体化合物的组合物形成，包括除硅以外的金属和准金属。这些膜容易生产，并且可以用各种配体进行改性，包括醇盐，苯氧化物，羧酸盐，β-二酮和β-酮酯。

5. 发明授权

US06426399B1 Methods for the synthesis and polymerization of &agr;,&agr;'-dihalo-p-xylenes 失效
标题翻译： α，α'-二卤代对二甲苯的合成和聚合方法
公开(公告)号：US06426399B1
公开(公告)日：2002-07-30
申请号：US09502953
申请日：2000-02-11
申请人： John P. Ferraris , Charles J. Neef
发明人： John P. Ferraris , Charles J. Neef
IPC分类号： C08F600
CPC分类号： C08G61/025 , C08G61/02 , C08G2261/3424
摘要： The present invention describes an improved method for the polymerization of &agr;,&agr;-dihalo-p-xylene's such as the &agr;,&agr;′-dihalo-2-methoxy-5-(2-ethylhexyloxy)-xylene's. The procedure for synthesis is based on the specific order of addition of reagents and the use of an anionic initiator that allows control of the molecular weight of the polymer. The molecular weight control allows processability of the polymer which is important for its utility in applications including in light-emitting-diodes, field effect transistors and photovoltaic devices.
摘要翻译：本发明描述了α，α-二卤代对二甲苯如α，α'-二卤代-2-甲氧基-5-（2-乙基己氧基） - 二甲苯聚合的改进方法。合成方法基于试剂的特定加入顺序以及允许控制聚合物分子量的阴离子引发剂的使用。分子量控制允许聚合物的加工性，其对于其在包括发光二极管，场效应晶体管和光伏器件中的应用中的应用是重要的。

6. 发明授权

US07510004B1 Method for treating an underground formation 失效
标题翻译：处理地下地层的方法
公开(公告)号：US07510004B1
公开(公告)日：2009-03-31
申请号：US10666658
申请日：2003-09-19
申请人： James E. Hessert , D. Daniel Wallace , Jimmy D. DeLong , Charles J. Neef
发明人： James E. Hessert , D. Daniel Wallace , Jimmy D. DeLong , Charles J. Neef
IPC分类号： E21B33/13 , E21B37/00
CPC分类号： C09K8/512 , C08L1/26 , C08L1/286 , C09K8/426 , C09K8/44 , C08L2666/02
摘要： A swellable polymer gel composition for use in subterranean formations. The composition comprises water, a water soluble polymer, a water soluble crosslinking system and a swelling agent. The crosslinking system may be either a redox system or a chelating system. The amounts of the polymer and the crosslinking system are effective to form a substantially uniformly reacted tri-dimensional gel structure. To the gel solution, is added a swelling agent in an amount sufficient to increase the volume of the gel a predetermined percentage. The swelling agent may be a natural or a synthetic agent. A strengthening agent may be added to increase the gel strength of the composition. The composition has numerous uses and is particularly useful in oil industry applications such as plugging wells, sealing casing leaks and reducing water production from water-bearing hydrocarbon formations. The composition is economically produced, preserves the wellbore for future reentry in plugging operations, inhibits corrosion of casing by the hydration of water, inhibits the leaching of hazardous metal into the environment, and continuously expands in the presence of water.
摘要翻译：用于地下地层的可溶胀聚合物凝胶组合物。该组合物包含水，水溶性聚合物，水溶性交联体系和溶胀剂。交联体系可以是氧化还原体系或螯合体系。聚合物和交联体系的量有效地形成基本上均匀反应的三维凝胶结构。向凝胶溶液中加入足以使凝胶体积增加预定百分比的溶胀剂。溶胀剂可以是天然或合成剂。可以加入增强剂以增加组合物的凝胶强度。该组合物具有许多用途，并且在石油工业应用中特别有用，例如堵塞井，密封套管泄漏和减少含水烃地层的水分产生。该组合物经济地生产，保留井筒，以防止堵塞作业中的后续再入，通过水合水分抑制套管的腐蚀，抑制有害金属浸入环境中，并在水的存在下不断膨胀。

7. 发明授权

US06740469B2 Developer-soluble metal alkoxide coatings for microelectronic applications 有权
标题翻译：用于微电子应用的显影剂可溶性金属醇盐涂料
公开(公告)号：US06740469B2
公开(公告)日：2004-05-25
申请号：US10180625
申请日：2002-06-25
申请人： Vandana Krishnamurthy , Charles J. Neef , Juliet A. M. Snook
发明人： Vandana Krishnamurthy , Charles J. Neef , Juliet A. M. Snook
IPC分类号： G03C1735
CPC分类号： C08G79/10 , C08G79/00 , C08L85/00 , G03F7/091 , Y10S430/106 , Y10S430/11 , Y10S430/111 , Y10S430/151
摘要： Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers of the composition include recurring units having the formula where X is a light-attenuating moiety, M is a metal, and each R is individually selected from the group consisting of hydrogen, alkyls, aryls, alkoxys, and phenoxys. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.
摘要翻译：提供了抗反射组合物和使用这些组合物形成电路的方法。组合物包含溶解或分散在溶剂体系中的聚合物。在一个优选实施方案中，组合物的聚合物包括具有式（I）的重复单元，其中X是光衰减部分，M是金属，并且每个R各自选自氢，烷基，芳基，烷氧基和苯氧基。所得到的组合物是旋转碗相容的（即，它们在微光刻工艺的烘烤阶段之前或在室温下储存期间不交联）是湿显影的并且具有优异的光学性能。

8. 发明授权

US07323289B2 Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties 有权
标题翻译：底部抗反射涂层衍生自具有多个环氧部分的小核心分子
公开(公告)号：US07323289B2
公开(公告)日：2008-01-29
申请号：US10679521
申请日：2003-10-06
申请人： Charles J. Neef , Mandar Bhave , Michelle Fowler , Michelle Windsor
发明人： Charles J. Neef , Mandar Bhave , Michelle Fowler , Michelle Windsor
IPC分类号： G03F7/11 , C07C67/48 , C07C69/76 , B32B27/38
CPC分类号： G03F7/091 , C09B69/00 , Y10S430/111 , Y10T428/31511 , Y10T428/31515
摘要： Novel anti-reflective coatings comprising small molecules (e.g., less than about 5,000 g/mole) in lieu of high molecular weight polymers and methods of using those coatings are provided. In one embodiment, aromatic carboxylic acids are used as the chromophores, and the resulting compounds are blended with a crosslinking agent and an acid. Anti-reflective coating films prepared according to the invention exhibit improved properties compared to high molecular weight polymeric anti-reflective coating films. The small molecule anti-reflective coatings have high etch rates and good via fill properties. Photolithographic processes carried out with the inventive material result in freestanding, 110-nm profiles.
摘要翻译：提供了包含小分子（例如小于约5,000g / mol）代替高分子量聚合物的新型抗反射涂层以及使用这些涂层的方法。在一个实施方案中，使用芳族羧酸作为发色团，并将所得化合物与交联剂和酸共混。与高分子量聚合物抗反射涂膜相比，根据本发明制备的抗反射涂膜显示出改进的性能。小分子抗反射涂层具有高蚀刻速率和良好的通孔填充性能。使用本发明材料进行的光刻工艺产生独立的110nm轮廓。

9. 发明授权

US06872506B2 Wet-developable anti-reflective compositions 有权
标题翻译：湿显影抗反射组合物
公开(公告)号：US06872506B2
公开(公告)日：2005-03-29
申请号：US10601897
申请日：2003-06-23
申请人： Charles J. Neef , Vandana Krishnamurthy
发明人： Charles J. Neef , Vandana Krishnamurthy
IPC分类号： C08G79/00 , C08L85/00 , G02B1/11 , G03F7/004 , G03C5/00
CPC分类号： C08G79/00 , C08L85/00 , G02B1/111 , Y10S430/106 , C08L2666/02
摘要： Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers include a light-attenuating moiety having a structure selected from the group consisting of: where: each of X1 and Y is individually selected from the group consisting of electron withdrawing groups; R2 is selected from the group consisting of alkyls and aryls; and R3 is selected from the group consisting of hydrogen and alkyls. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.
摘要翻译：提供了抗反射组合物和使用这些组合物形成电路的方法。组合物包含溶解或分散在溶剂体系中的聚合物。在优选的实施方案中，聚合物包括具有选自以下的结构的光衰减部分：其中：X 1和Y各自独立地选自吸电子基团; R 2是选自烷基和芳基; 所得组合物与纺丝碗相容（即它们在微光刻工艺的烘烤阶段之前或在室温下储存期间不交联）是湿显影的，并具有优异的光学性能。

10. 发明申请

US20100040988A1 SPIN BOWL COMPATIBLE POLYAMIC ACIDS/IMIDES AS WET DEVELOPABLE POLYMER BINDERS FOR ANTI-REFLECTIVE COATINGS 审中-公开
标题翻译：作为抗反射涂层的可开发的聚合物粘合剂，旋转熔融的聚氨酯/
公开(公告)号：US20100040988A1
公开(公告)日：2010-02-18
申请号：US12582455
申请日：2009-10-20
申请人： Robert Christian Cox , Charles J. Neef
发明人： Robert Christian Cox , Charles J. Neef
IPC分类号： G03F7/20
CPC分类号： C09D179/08 , C08G73/10 , C08G73/1025 , C08G73/1039 , C08G73/1064 , G02B1/111 , G03F7/038 , G03F7/091 , Y10S430/106 , Y10S430/151
摘要： Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers of the composition include recurring monomers having the formulas where: (1) each R is individually selected from the group consisting of hydrogen, —OH, aliphatics, and phenyls; and (2) L is selected from the group consisting of —SO2— and —CR′2—, where each R′ is individually selected from the group consisting of hydrogen, aliphatics, phenyls, and —CX3, where each X is individually selected from the group consisting of the halogens. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.
摘要翻译：提供了抗反射组合物和使用这些组合物形成电路的方法。组合物包含溶解或分散在溶剂体系中的聚合物。在一个优选的实施方案中，组合物的聚合物包括具有下式的重复单体：其中：（1）每个R独立地选自氢，-OH，脂族和苯基; 和（2）L选自-SO 2 - 和-CR 2 - ，其中每个R'分别选自氢，脂族基，苯基和-CX 3，其中每个X被单独选择来自由卤素组成的组。所得到的组合物是旋转碗相容的（即，它们在微光刻工艺的烘烤阶段之前或在室温下储存期间不交联）是湿显影的并且具有优异的光学性能。

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