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1. 发明授权

US08456616B2 Optical system for microlithography 有权
标题翻译：光刻系统
公开(公告)号：US08456616B2
公开(公告)日：2013-06-04
申请号：US12993540
申请日：2009-04-07
申请人： Daniel Kraehmer , Wilhelm Ulrich , Matthias Manger , Bernhard Gellrich
发明人： Daniel Kraehmer , Wilhelm Ulrich , Matthias Manger , Bernhard Gellrich
IPC分类号： G02B3/02 , G02B7/02 , G03B27/32 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70308
摘要： An optical system, in particular a projection objective, for microlithography, has an optical axis and at least one optical correction arrangement, which has a first optical correction element and at least one second optical correction element, wherein the first correction element is provided with a first aspherical surface contour, and wherein the second correction element is provided with a second aspherical surface contour, wherein the first surface contour and the second surface contour add up at least approximately to zero, wherein the correction arrangement has at least one drive for movement of at least one of the two correction elements. In this case, at least one of the two correction elements can rotate about a rotation axis which is at least approximately parallel to the optical axis, and the at least one drive is a rotary drive for rotation of one or both of the correction elements about the rotation axis.
摘要翻译：用于微光刻的光学系统，特别是投影物镜具有光轴和至少一个光学校正装置，其具有第一光学校正元件和至少一个第二光学校正元件，其中第一校正元件设置有第一非球面表面轮廓，并且其中所述第二校正元件设置有第二非球面轮廓，其中所述第一表面轮廓和所述第二表面轮廓至少近似为零，其中所述校正装置具有至少一个驱动器，两个校正元素中的至少一个。在这种情况下，两个校正元件中的至少一个可以围绕至少近似平行于光轴的旋转轴线旋转，并且至少一个驱动器是用于一个或两个校正元件旋转的旋转驱动器旋转轴。

2. 发明申请

US20110069295A1 OPTICAL SYSTEM FOR MICROLITHOGRAPHY 有权
标题翻译：用于微光学的光学系统
公开(公告)号：US20110069295A1
公开(公告)日：2011-03-24
申请号：US12993540
申请日：2009-04-07
申请人： Daniel Kraehmer , Wilhelm Ulrich , Matthias Manger , Bernhard Gellrich
发明人： Daniel Kraehmer , Wilhelm Ulrich , Matthias Manger , Bernhard Gellrich
IPC分类号： G03B27/54 , G02B13/18
CPC分类号： G03F7/70308
摘要： An optical system (10), in particular a projection objective (12), for microlithography, has an optical axis and at least one optical correction arrangement (44), which has a first optical correction element (48) and at least one second optical correction element, wherein the first correction element is provided with a first aspherical surface contour, and wherein the second correction element is provided with a second aspherical surface contour, wherein the first surface contour and the second surface contour add up at least approximately to zero, wherein the correction arrangement (44) has at least one drive for movement of at least one of the two correction elements. In this case, at least one of the two correction elements can rotate about a rotation axis which is at least approximately parallel to the optical axis, and the at least one drive is a rotary drive for rotation of one or both of the correction elements about the rotation axis.
摘要翻译：用于微光刻的光学系统（10），特别是投影物镜（12）具有光轴和至少一个光学校正装置（44），其具有第一光学校正元件（48）和至少一个第二光学校正元件校正元件，其中所述第一校正元件设置有第一非球面轮廓，并且其中所述第二校正元件设置有第二非球面轮廓，其中所述第一表面轮廓和所述第二表面轮廓至少近似为零，其中所述校正装置（44）具有用于所述两个校正元件中的至少一个的移动的至少一个驱动器。在这种情况下，两个校正元件中的至少一个可以围绕至少近似平行于光轴的旋转轴线旋转，并且至少一个驱动器是用于一个或两个校正元件旋转的旋转驱动器旋转轴。

3. 发明授权

US07570343B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US07570343B2
公开(公告)日：2009-08-04
申请号：US11285283
申请日：2005-11-23
申请人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
发明人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.
摘要翻译：微光投影曝光装置包括用于产生投影光的照明系统和投影透镜，能够将能够布置在投影透镜的物平面中的光罩成像到能够布置的感光层上的投影透镜在投影透镜的图像平面中。投影透镜被设计用于浸没模式，其中在图像侧的投影透镜的最终透镜元件浸入浸没液体中。相对于突起而言透明的端接元件紧固在图像侧的最终透镜元件与感光层之间。

4. 发明申请

US20060187430A1 Microlithographic projection exposure apparatus 有权
公开(公告)号：US20060187430A1
公开(公告)日：2006-08-24
申请号：US11285283
申请日：2005-11-23
申请人： Aurelian Dodoc , Karl Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
发明人： Aurelian Dodoc , Karl Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.

5. 发明授权

US08054557B2 Lithography projection objective, and a method for correcting image defects of the same 有权
标题翻译：平版印刷投影物镜，以及用于校正图像缺陷的方法
公开(公告)号：US08054557B2
公开(公告)日：2011-11-08
申请号：US12715473
申请日：2010-03-02
申请人： Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
发明人： Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
IPC分类号： G02B9/00 , G03B27/42 , G03F7/00
CPC分类号： G03F7/70341 , G03F7/7015
摘要： Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.
摘要翻译：公开了投影目标以及相关组件，系统和方法。通常，投影物镜被配置成将来自物体平面的辐射图像到图像平面。投影物镜可以包括沿着光轴的多个光学元件。多个光学元件可以包括一组光学元件和最靠近图像平面的最后一个光学元件，以及被配置为相对于图像平面移动最后一个光学元件的定位装置。通常，投影物镜被配置为用于微光刻投影曝光机。

6. 发明授权

US07692868B2 Lithography projection objective, and a method for correcting image defects of the same 有权
标题翻译：平版印刷投影物镜，以及用于校正图像缺陷的方法
公开(公告)号：US07692868B2
公开(公告)日：2010-04-06
申请号：US12265090
申请日：2008-11-05
申请人： Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
发明人： Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
IPC分类号： G02B9/00 , G03B27/42 , G03F7/00
CPC分类号： G03F7/70341 , G03F7/7015
摘要： Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.
摘要翻译：公开了投影目标以及相关组件，系统和方法。通常，投影物镜被配置成将来自物体平面的辐射图像到图像平面。投影物镜可以包括沿着光轴的多个光学元件。多个光学元件可以包括一组光学元件和最靠近图像平面的最后一个光学元件，以及被配置为相对于图像平面移动最后一个光学元件的定位装置。通常，投影物镜被配置为用于微光刻投影曝光机。

7. 发明授权

US08345222B2 High transmission, high aperture catadioptric projection objective and projection exposure apparatus 有权
标题翻译：高透射率，高孔径反射折射投影物镜和投影曝光装置
公开(公告)号：US08345222B2
公开(公告)日：2013-01-01
申请号：US12580369
申请日：2009-10-16
申请人： Daniel Kraehmer , Ralf Mueller , Thomas Schicketanz , Wilhelm Ulrich , Alexander Epple
发明人： Daniel Kraehmer , Ralf Mueller , Thomas Schicketanz , Wilhelm Ulrich , Alexander Epple
IPC分类号： G03B27/54 , G03B27/70 , G03B27/68 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70958 , G02B1/115 , G02B17/0812 , G03F7/70225 , G03F7/70341
摘要： The disclosure provides projection objectives which may be used in a microlithographic projection exposure apparatus to expose a radiation-sensitive substrate arranged in the region of an image surface of the projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective. The disclosure also provides projection exposure apparatus which include such projection objectives, as well as related components and methods.
摘要翻译：本公开提供了投影物镜，其可以用于微光刻投影曝光设备中，以使布置在投影物镜的图像表面区域中的辐射敏感基底与至少一个掩模图案的图像布置在投影物镜的物体表面。本公开还提供了包括这种投影目标的投影曝光装置以及相关的部件和方法。

8. 发明授权

US07697211B2 Symmetrical objective having four lens groups for microlithography 有权
标题翻译：具有用于微光刻的四个透镜组的对称物镜
公开(公告)号：US07697211B2
公开(公告)日：2010-04-13
申请号：US12257156
申请日：2008-10-23
申请人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
发明人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
IPC分类号： G02B27/30
CPC分类号： G02B13/143 , G02B13/26 , G03F7/70241
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.
摘要翻译：本发明的特征在于一种用于微光刻的系统，其包括配置成在多个汞发射线处发射辐射的水银光源，设置成接收由水银光源发射的辐射的投影物镜，以及被配置为相对于投影物镜定位晶片的台。在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。用于所述投影物镜的光学透镜系统包括四个透镜组，每个透镜组具有包括二氧化硅的两个透镜，另一方面，第一和第二透镜组以及第三透镜组和第四透镜组相对于垂直的平面对称地定位到所述透镜系统的光轴。

9. 发明授权

US06992834B2 Objective with birefringent lenses 失效
标题翻译：目标双折射镜片
公开(公告)号：US06992834B2
公开(公告)日：2006-01-31
申请号：US11071523
申请日：2005-03-02
申请人： Michael Totzeck , Vladimer Kamenov , Daniel Kraehmer , Wilhelm Ulrich
发明人： Michael Totzeck , Vladimer Kamenov , Daniel Kraehmer , Wilhelm Ulrich
IPC分类号： G02B21/02
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G02B13/143 , G03F7/70241 , G03F7/705 , G03F7/70966
摘要： Objective (1, 601), in particular a projection objective for a microlithography projection apparatus, with first birefringent lenses (L108, L109, L129, L130) and with second birefringent lenses (L101–L107, L110–L128). The first lenses (L108, L109, L129, L130) are distinguished from the second lenses (L101–L107, L110–L128) by the lens material used or by the material orientation. After passing through the first lenses (L108, L109, L129, L130) and the second lenses (L101–L107, L110–L128), an outer aperture ray (5, 7) and a principal ray (9) are subject to optical path differences for two mutually orthogonal states of polarization. The difference between these optical path differences is smaller than 25% of the working wavelength. In at least one first lens (L129, L130), the aperture angle of the outer aperture ray (5, 7) is at least 70% of the largest aperture angle occurring for said aperture ray in all of the first lenses (L108, L109, L129, L130) and second lenses (L101–L107, L110–L128). This arrangement has the result that the first lenses (L108, L109, L129, L130) have a combined material volume of no more than 20% of the combined total material volume of the first lenses (L108, L109, L129, L130) and second lenses (L101–L107, L110–L128).
摘要翻译：目的（1，601），特别是具有第一双折射透镜（L108，L109，L129，L130）和第二双折射透镜（L101-L107，L110-L128）的微光刻投影装置的投影物镜。第一透镜（L108，L109，L129，L130）与所使用的透镜材料或材料取向与第二透镜（L101-L107，L110-L128）不同。在通过第一透镜（L108，L109，L129，L130）和第二透镜（L101-L107，L110-L128）之后，外光线（5,7）和主光线（9）经受光路两个相互正交的极化状态的差异。这些光程差之差小于工作波长的25％。在至少一个第一透镜（L129，L130）中，外光圈（5,7）的孔径角为所有第一透镜（L108，L109）中的所述孔径光线发生的最大孔径角的至少70％，L129，L130）和第二透镜（L101-L107，L110-L128）。这种结构的结果是，第一透镜（L108，L109，L129，L130）的组合材料体积不超过第一透镜（L108，L109，L129，L130）和第二透镜镜头（L101-L107，L110-L128）。

10. 发明申请

US20100157435A1 LITHOGRAPHY PROJECTION OBJECTIVE, AND A METHOD FOR CORRECTING IMAGE DEFECTS OF THE SAME 有权
标题翻译：图像投影目标和校正其图像缺陷的方法
公开(公告)号：US20100157435A1
公开(公告)日：2010-06-24
申请号：US12715473
申请日：2010-03-02
申请人： Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
发明人： Ulrich Loering , Vladan Blahnik , Wilhelm Ulrich , Daniel Kraehmer , Norbert Wabra
IPC分类号： G02B3/00
CPC分类号： G03F7/70341 , G03F7/7015
摘要： Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.
摘要翻译：公开了投影目标以及相关组件，系统和方法。通常，投影物镜被配置成将来自物体平面的辐射图像到图像平面。投影物镜可以包括沿着光轴的多个光学元件。多个光学元件可以包括一组光学元件和最靠近图像平面的最后一个光学元件，以及被配置为相对于图像平面移动最后一个光学元件的定位装置。通常，投影物镜被配置为用于微光刻投影曝光机。

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