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1. 发明授权

US07570343B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US07570343B2
公开(公告)日：2009-08-04
申请号：US11285283
申请日：2005-11-23
申请人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
发明人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.
摘要翻译：微光投影曝光装置包括用于产生投影光的照明系统和投影透镜，能够将能够布置在投影透镜的物平面中的光罩成像到能够布置的感光层上的投影透镜在投影透镜的图像平面中。投影透镜被设计用于浸没模式，其中在图像侧的投影透镜的最终透镜元件浸入浸没液体中。相对于突起而言透明的端接元件紧固在图像侧的最终透镜元件与感光层之间。

2. 发明申请

US20060187430A1 Microlithographic projection exposure apparatus 有权
公开(公告)号：US20060187430A1
公开(公告)日：2006-08-24
申请号：US11285283
申请日：2005-11-23
申请人： Aurelian Dodoc , Karl Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
发明人： Aurelian Dodoc , Karl Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.

3. 发明授权

US07532306B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US07532306B2
公开(公告)日：2009-05-12
申请号：US10917371
申请日：2004-08-13
申请人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski
IPC分类号： G03B27/42 , G03B27/52 , G03B27/54
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.
摘要翻译：微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12）能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光敏感层。

4. 发明申请

US20100045952A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置
公开(公告)号：US20100045952A1
公开(公告)日：2010-02-25
申请号：US12611999
申请日：2009-11-04
申请人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski
IPC分类号： G03B27/42 , G03B27/54
摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.
摘要翻译：微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12）能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光敏感层。

5. 发明申请

US20080316452A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置
公开(公告)号：US20080316452A1
公开(公告)日：2008-12-25
申请号：US12199998
申请日：2008-08-28
申请人： Aurelian Dodoc , Karl-Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Aurelian Dodoc , Karl-Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski
IPC分类号： G03G15/08
摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.
摘要翻译：微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12）能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光敏感层。

6. 发明授权

US07751129B2 Refractive projection objective for immersion lithography 有权
$Refractive projection objective for immersion lithography$
标题翻译：用于浸没光刻的折射投影物镜
公开(公告)号：US07751129B2
公开(公告)日：2010-07-06
申请号：US10576754
申请日：2003-10-22
申请人： Aurelian Dodoc , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Aurelian Dodoc , Wilhelm Ulrich , Hans-Juergen Rostalski
IPC分类号： G02B9/60
CPC分类号： G03F7/70241 , G02B13/143 , G03F7/70341
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups in the case of which a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power are provided. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size. For working wavelengths below 200 nm, structural widths of substantially under 100 nm can be resolved when use is made of immersion fluids between the projection objective and substrate.
摘要翻译：适合于浸没微光刻的纯折射投影物镜被设计为具有五个透镜组的单腰系统，在这种情况下，具有负屈光力的第一透镜组，正屈光力的第二透镜组，负折射力的第三透镜组提供折射光焦度，正屈光力的第四透镜组和正屈光力的第五透镜组。第四透镜组具有位于第三透镜组（LG3）和第四透镜组（LG4）之间的边缘光线高度的拐点附近的入射面（E）。在入射面和系统隔膜（5）之间没有设置具有大量屈光力的负透镜。本发明的投影物镜的实施例结合大图像场实现非常高的数值孔径NA> 1，并且通过紧凑的设计尺寸来区分。对于低于200nm的工作波长，当在投影物镜和基底之间使用浸没流体时，可以解决基本上在100nm以下的结构宽度。

7. 发明授权

US07969663B2 Projection objective for immersion lithography 有权
标题翻译：浸没光刻的投影目标
公开(公告)号：US07969663B2
公开(公告)日：2011-06-28
申请号：US12819861
申请日：2010-06-21
申请人： Aurelian Dodoc , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Aurelian Dodoc , Wilhelm Ulrich , Hans-Juergen Rostalski
IPC分类号： G02B9/60
CPC分类号： G03F7/70241 , G02B13/143 , G03F7/70341
摘要： A projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, and has a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size. For working wavelengths below 200 nm, structural widths of substantially under 100 nm can be resolved when use is made of immersion fluids between the projection objective and substrate.
摘要翻译：适用于浸没微光刻的投影物镜被设计为具有五个透镜组的单腰系统，并且具有负折光力的第一透镜组，正屈光力的第二透镜组，负折射光焦度的第三透镜组，正屈光力的第四透镜组和正屈光力的第五透镜组。第四透镜组具有位于第三透镜组（LG3）和第四透镜组（LG4）之间的边缘光线高度的拐点附近的入射面（E）。在入射面和系统隔膜（5）之间没有设置具有大量屈光力的负透镜。本发明的投影物镜的实施例结合大图像场实现非常高的数值孔径NA> 1，并且通过紧凑的设计尺寸来区分。对于低于200nm的工作波长，当在投影物镜和基底之间使用浸没流体时，可以解决基本上在100nm以下的结构宽度。

8. 发明授权

US07492509B2 Projection optical system 有权
标题翻译：投影光学系统
公开(公告)号：US07492509B2
公开(公告)日：2009-02-17
申请号：US10581651
申请日：2004-11-25
申请人： Hans-Juergen Rostalski , Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
发明人： Hans-Juergen Rostalski , Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
IPC分类号： G02B13/14
CPC分类号： G03F7/70241 , G02B13/143
摘要： A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses of positive and negative refractive powers, wherein the following relation is fulfilled: 2 · y · NA · 1 k · ∑ i = 1 k ⁢  φ i  ≥ V 1 wherein: y is half a diameter in mm of a maximum image field imaged by the projection optical system, NA is a maximum numerical aperture on a side of the second object, φi is a refractive power in mm−1 of the ith lens, k is a total number of lenses of the projection optical system, and wherein V1 is greater than 0.045.
摘要翻译：投影光学系统包括沿投影光学系统的光轴设置的多个透镜; 其中所述多个透镜可分为四个不重叠的正和负屈光力透镜组，其中满足以下关系： $2。y。NA1k/ mo>我 =1k其中：y是由投影光学系统成像的最大图像场的直径的一半，NA是第二物体一侧的最大数值孔径，phii是第i个透镜的mm-1的屈光度 k是投影光学系统的透镜的总数，其中V1大于0.045。$

9. 发明申请

US20080043345A1 Refractive Projection Objective for Immersion Lithography 有权
$Refractive Projection Objective for Immersion Lithography$
标题翻译：折射投影目标沉积光刻
公开(公告)号：US20080043345A1
公开(公告)日：2008-02-21
申请号：US10576754
申请日：2003-10-22
申请人： Aurelian Dodoc , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Aurelian Dodoc , Wilhelm Ulrich , Hans-Juergen Rostalski
IPC分类号： G02B27/18
CPC分类号： G03F7/70241 , G02B13/143 , G03F7/70341
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups in the case of which a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power are provided. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size. For working wavelengths below 200 nm, structural widths of substantially under 100 nm can be resolved when use is made of immersion fluids between the projection objective and substrate.
摘要翻译：适合于浸没微光刻的纯折射投影物镜被设计为具有五个透镜组的单腰系统，在这种情况下，具有负屈光力的第一透镜组，正屈光力的第二透镜组，负折射力的第三透镜组提供折射光焦度，正屈光力的第四透镜组和正屈光力的第五透镜组。第四透镜组具有位于第三透镜组（LG 3）和第四透镜组（LG 4）之间的边缘光线高度的拐点附近的入射面（E）。在入射面和系统隔膜（5）之间没有设置具有大量屈光力的负透镜。本发明的投影物镜的实施例结合大图像场实现非常高的数值孔径NA> 1，并且通过紧凑的设计尺寸来区分。对于低于200nm的工作波长，当在投影物镜和基底之间使用浸没流体时，可以解决基本上在100nm以下的结构宽度。

10. 发明申请

US20070258152A1 Projection Optical System 有权
标题翻译：投影光学系统
公开(公告)号：US20070258152A1
公开(公告)日：2007-11-08
申请号：US10581651
申请日：2004-11-25
申请人： Hans-Juergen Rostalski , Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
发明人： Hans-Juergen Rostalski , Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
IPC分类号： G02B9/34
CPC分类号： G03F7/70241 , G02B13/143
摘要： A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses of positive and negative refractive powers, wherein the following relation is fulfilled: 2 · y · NA · 1 k · ∑ i = 1 k ⁢  φ i  ≥ V 1 wherein: y is half a diameter in mm of a maximum image field imaged by the projection optical system, NA is a maximum numerical aperture on a side of the second object, φi is a refractive power in mm−1 of the ith lens, k is a total number of lenses of the projection optical system, and wherein V1 is greater than 0.045.
摘要翻译：投影光学系统包括沿投影光学系统的光轴设置的多个透镜; 其中所述多个透镜可被分成具有正和负折射光焦度的四个不重叠的透镜组，其中满足以下关系： $2=1> =V1大于0.045。$

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