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1. 发明授权

US08446665B2 Catadioptric projection objective 有权
标题翻译：反射折射投影物镜
公开(公告)号：US08446665B2
公开(公告)日：2013-05-21
申请号：US12562693
申请日：2009-09-18
申请人： Alexander Epple , Vladimir Kamenov , Toralf Gruner , Thomas Schicketanz
发明人： Alexander Epple , Vladimir Kamenov , Toralf Gruner , Thomas Schicketanz
IPC分类号： G02B5/08
CPC分类号： G02B17/0892 , G02B1/11 , G02B17/08 , G02B17/0896 , G03F7/70 , G03F7/70225 , G03F7/70275
摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.2% for an operating wavelength of between 150 nm and 250 nm and for an angle-of-incidence range of between 0° and 30°. As an alternative or in addition, all the surfaces of the lenses of the second partial objective are configured such that the deviation from the marginal ray concentricity is greater than or equal to 20°.
摘要翻译：用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7）上。该目的包括将对象场成像到第一实际中间图像（13）上的第一部分目标（11），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15）物镜（19）将第二中间图像成像到图像场上。第二部分目标是具有恰好一个凹面镜并具有至少一个透镜（L21，L22）的反射折射物镜。第一折叠镜（23）将来自物体平面的辐射偏转到凹面镜，并且第二折叠镜（25）将来自凹面镜的辐射偏转到图像平面。第二部分物镜的透镜的至少一个表面（L21，L22）具有对于150nm至250nm的工作波长具有小于0.2％的反射率的抗反射涂层，并且对于介于0°和30°之间。作为替代或另外，第二部分物镜的透镜的所有表面被配置为使得与边缘射线同心度的偏差大于或等于20°。

2. 发明申请

US20110038061A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
标题翻译：目标投影目标
公开(公告)号：US20110038061A1
公开(公告)日：2011-02-17
申请号：US12562693
申请日：2009-09-18
申请人： Alexander EPPLE , Vladimir Kamenov , Toralf Gruner , Thomas Schicketanz
发明人： Alexander EPPLE , Vladimir Kamenov , Toralf Gruner , Thomas Schicketanz
IPC分类号： G02B17/00 , G03B27/52
CPC分类号： G02B17/0892 , G02B1/11 , G02B17/08 , G02B17/0896 , G03F7/70 , G03F7/70225 , G03F7/70275
摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.2% for an operating wavelength of between 150 nm and 250 nm and for an angle-of-incidence range of between 0° and 30°. As an alternative or in addition, all the surfaces of the lenses of the second partial objective are configured such that the deviation from the marginal ray concentricity is greater than or equal to 20°.
摘要翻译：用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7）上。该目的包括将对象场成像到第一实际中间图像（13）上的第一部分目标（11），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15）物镜（19）将第二中间图像成像到图像场上。第二部分目标是具有恰好一个凹面镜并具有至少一个透镜（L21，L22）的反射折射物镜。第一折叠镜（23）将来自物体平面的辐射偏转到凹面镜，并且第二折叠镜（25）将来自凹面镜的辐射偏转到图像平面。第二部分物镜的透镜（L21，L22）的至少一个表面具有对于150nm至250nm的工作波长具有小于0.2％的反射率的抗反射涂层，并且对于介于0°和30°之间。作为替代或另外，第二部分物镜的透镜的所有表面被配置为使得与边缘射线同心度的偏差大于或等于20°。

3. 发明授权

US08896814B2 Catadioptric projection objective comprising deflection mirrors and projection exposure method 有权
标题翻译：折反射投影物镜包括偏转镜和投影曝光方法
公开(公告)号：US08896814B2
公开(公告)日：2014-11-25
申请号：US13431681
申请日：2012-03-27
申请人： Thomas Schicketanz , Toralf Gruner
发明人： Thomas Schicketanz , Toralf Gruner
IPC分类号： G03B27/54 , G03B27/42 , G02B17/08 , G03F7/20 , G02B13/14
CPC分类号： G02B17/0892 , G02B13/14 , G02B17/08 , G02B17/0896 , G03F1/26 , G03F7/702 , G03F7/70225 , G03F7/70258 , G03F7/70266 , G03F7/70275 , G03F7/70308 , G03F7/70316 , G03F7/70441 , G03F7/70791
摘要： A catadioptric projection objective has a multiplicity of lenses and at least one concave mirror, and also two deflection mirrors in order to separate a partial beam path running from the object field to the concave mirror from the partial beam path running from the concave mirror to the image field. The deflection mirrors are tilted relative to the optical axis of the projection objective about tilting axes running parallel to a first direction (x-direction). The first deflection mirror is arranged in optical proximity to a first field plane and the second deflection mirror is arranged in optical proximity to a second field plane, which is optically conjugate with respect to the first field plane. A displacement device for the synchronous displacement of the deflection mirrors is provided. The deflection mirrors have different local distributions of their reflection properties in first and second reflection regions, respectively.
摘要翻译：反射折射投射物镜具有多个透镜和至少一个凹面镜，以及两个偏转镜，以便将从物镜场延伸的部分光束路径与从凹面镜到图像字段。偏转镜相对于投影物镜的光轴相对于平行于第一方向（x方向）延伸的倾斜轴线倾斜。第一偏转镜被布置成光接近第一场平面，并且第二偏转镜布置成光学接近于相对于第一场平面光学共轭的第二场平面。提供了用于偏转镜的同步位移的位移装置。偏转镜在第一反射区域和第二反射区域中的反射特性分别具有不同的局部分布。

4. 发明申请

US20120236277A1 CATADIOPTRIC PROJECTION OBJECTIVE COMPRISING DEFLECTION MIRRORS AND PROJECTION EXPOSURE METHOD 有权
标题翻译：包含反射镜和投影曝光方法的目标投影目标
公开(公告)号：US20120236277A1
公开(公告)日：2012-09-20
申请号：US13431681
申请日：2012-03-27
申请人： Thomas Schicketanz , Toralf Gruner
发明人： Thomas Schicketanz , Toralf Gruner
IPC分类号： G03B27/42 , G02B17/08
CPC分类号： G02B17/0892 , G02B13/14 , G02B17/08 , G02B17/0896 , G03F1/26 , G03F7/702 , G03F7/70225 , G03F7/70258 , G03F7/70266 , G03F7/70275 , G03F7/70308 , G03F7/70316 , G03F7/70441 , G03F7/70791
摘要： A catadioptric projection objective has a multiplicity of lenses and at least one concave mirror, and also two deflection mirrors in order to separate a partial beam path running from the object field to the concave mirror from the partial beam path running from the concave mirror to the image field. The deflection mirrors are tilted relative to the optical axis of the projection objective about tilting axes running parallel to a first direction (x-direction). The first deflection mirror is arranged in optical proximity to a first field plane and the second deflection mirror is arranged in optical proximity to a second field plane, which is optically conjugate with respect to the first field plane. A displacement device for the synchronous displacement of the deflection mirrors is provided. The deflection mirrors have different local distributions of their reflection properties in first and second reflection regions, respectively.
摘要翻译：反射折射投射物镜具有多个透镜和至少一个凹面镜，以及两个偏转镜，以便将从物镜场延伸的部分光束路径与从凹面镜到图像字段。偏转镜相对于投影物镜的光轴相对于平行于第一方向（x方向）延伸的倾斜轴线倾斜。第一偏转镜被布置成光接近第一场平面，并且第二偏转镜布置成光学接近于相对于第一场平面光学共轭的第二场平面。提供了用于偏转镜的同步位移的位移装置。偏转镜在第一反射区域和第二反射区域中的反射特性分别具有不同的局部分布。

5. 发明授权

US09086637B2 Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system 有权
标题翻译：投影曝光系统和相应投影曝光系统的应力调整操作方法
公开(公告)号：US09086637B2
公开(公告)日：2015-07-21
申请号：US13590673
申请日：2012-08-21
申请人： Bernhard Kneer , Markus Deguenther , Toralf Gruner
发明人： Bernhard Kneer , Markus Deguenther , Toralf Gruner
IPC分类号： G03B27/54 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70191 , G03F7/70116 , G03F7/70341 , G03F7/70558 , G03F7/7085
摘要： A projection exposure system and a method for operating a projection exposure system for microlithography with an illumination system are disclosed. The illumination system includes at least one variably adjustable pupil-defining element. The illumination stress of at least one optical element of the projection exposure system is determined automatically in the case of an adjustment of the at least one variably adjustable pupil-defining element. From the automatically determined illumination stress, the maximum radiant power of the light source is set or determined and/or in which an illumination system is provided with which different illumination settings can be made. Usage of the projection exposure system is recorded and, from the history of the usage, at least one state parameter of at least one optical element of the projection exposure system is determined.
摘要翻译：公开了一种用于利用照明系统操作用于微光刻的投影曝光系统的投影曝光系统和方法。所述照明系统包括至少一个可变地调整的光瞳限定元件。在调整至少一个可变瞳孔限定元件的情况下，自动确定投影曝光系统的至少一个光学元件的照明应力。根据自动确定的照明应力，设置或确定光源的最大辐射功率，和/或其中提供可以进行不同照明设置的照明系统。记录投影曝光系统的使用，并且根据使用历史确定投影曝光系统的至少一个光学元件的至少一个状态参数。

6. 发明授权

US09069263B2 Method for improving the imaging properties of a projection objective, and such a projection objective 有权
标题翻译：用于改善投影物镜的成像特性的方法和这种投影物镜
公开(公告)号：US09069263B2
公开(公告)日：2015-06-30
申请号：US12836176
申请日：2010-07-14
申请人： Olaf Conradi , Heiko Feldmann , Gerald Richter , Sascha Bleidistel , Andreas Frommeyer , Toralf Gruner , Wolfgang Hummel
发明人： Olaf Conradi , Heiko Feldmann , Gerald Richter , Sascha Bleidistel , Andreas Frommeyer , Toralf Gruner , Wolfgang Hummel
IPC分类号： G02B9/00 , G02B17/00 , G03F7/20
CPC分类号： G02B27/0068 , G02B3/0081 , G02B26/0825 , G03F7/7015 , G03F7/70266 , G03F7/70558 , Y10S359/90
摘要： The invention relates to a method for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.
摘要翻译：本发明涉及一种用于改善微光刻投影物镜的成像特性的方法，其中投影物镜在物平面和像平面之间具有多个透镜，多个透镜中的第一透镜被分配有第一操纵器（ ml，Mn），用于使透镜主动变形，第一透镜变形以至少部分地校正像差，多个透镜中的至少一个第二透镜进一步被分配至少一个第二操纵器，并且第二透镜另外变形到第一个镜头。此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

7. 发明授权

US08325323B2 Method and system for correcting image changes 有权
标题翻译：用于校正图像变化的方法和系统
公开(公告)号：US08325323B2
公开(公告)日：2012-12-04
申请号：US12361842
申请日：2009-01-29
申请人： Olaf Conradi , Toralf Gruner
发明人： Olaf Conradi , Toralf Gruner
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70258
摘要： The disclosure relates to a method for compensating image errors, generated by intensity distributions in optical systems, such as in projection lens arrays of microlithography systems, and to respective optical systems, such as projection lens arrays of microlithography systems.
摘要翻译：本公开涉及一种用于补偿由光学系统中的强度分布产生的图像误差的方法，例如在微光刻系统的投影透镜阵列中，以及相应的光学系统，例如微光刻系统的投影透镜阵列。

8. 发明申请

US20110222043A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20110222043A1
公开(公告)日：2011-09-15
申请号：US13112357
申请日：2011-05-20
申请人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
发明人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
IPC分类号： G03B27/72
CPC分类号： G02B1/11 , G03F7/70191 , G03F7/70308 , G03F7/70958
摘要： The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.
摘要翻译：本公开涉及一种微光刻投影曝光装置，例如用于生产大型集成电路和其它微结构元件的微光投影曝光装置。本公开特别涉及光学元件的涂层以增加或降低反射率。

9. 发明申请

US20110075121A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
标题翻译：目标投影目标
公开(公告)号：US20110075121A1
公开(公告)日：2011-03-31
申请号：US12748862
申请日：2010-03-29
申请人： Alexander Epple , Toralf Gruner , Ralf Mueller
发明人： Alexander Epple , Toralf Gruner , Ralf Mueller
IPC分类号： G03B27/72 , G02B17/06
CPC分类号： G02B13/143 , G02B17/0892 , G03F7/70225
摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9), including a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17) and a third partial objective (19) imaging the second intermediate image onto the image field (7). The second partial objective (15) has exactly one concave mirror (21) and at least one lens (23). The minimum distance between an optically utilized region of the concave mirror (21) and an optically utilized region of a surface (25)—facing the concave mirror—of a lens (23) adjacent to the concave mirror is greater than 10 mm.
摘要翻译：用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7），包括对物场进行成像的第一部分物镜（11）到第一实际中间图像（13），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15）和将第二中间图像成像到图像场（7）上的第三部分目标（19））。第二部分物镜（15）具有正好一个凹面镜（21）和至少一个透镜（23）。凹面镜（21）的光学利用区域与与凹面镜相邻的透镜（23）的凹面镜的表面（25）的光学利用区域之间的最小距离大于10mm。

10. 发明申请

US20100265478A1 PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE INSTALLATION 有权
标题翻译：微波投影曝光安装投影镜头系统
公开(公告)号：US20100265478A1
公开(公告)日：2010-10-21
申请号：US12825001
申请日：2010-06-28
申请人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Bärbel Schwaer , Olaf Rogalsky , Arif Kazi
发明人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Bärbel Schwaer , Olaf Rogalsky , Arif Kazi
IPC分类号： G03B27/68
CPC分类号： G03F7/70341 , G03F7/70891
摘要： A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.
摘要翻译：微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。

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