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1. 发明申请

US20110141446A1 PROJECTION OBJECTIVE 有权
标题翻译：投影目标
公开(公告)号：US20110141446A1
公开(公告)日：2011-06-16
申请号：US12951216
申请日：2010-11-22
申请人： Reinhold Walser , Thomas Schicketanz
发明人： Reinhold Walser , Thomas Schicketanz
IPC分类号： G03B27/54 , G02B17/06
CPC分类号： G02B17/0647 , G03F7/70233 , G03F7/70308 , G03F7/70316
摘要： A projection objective, such as for EUV lithography, for imaging a pattern arranged in an object plane into an image plane with the aid of electromagnetic radiation from the extreme ultraviolet range is provided. The projection objective includes a plurality of mirrors provided with reflective coatings and arranged between the object plane and the image plane. At least one of the mirrors includes a graded reflective coating with a rotationally-asymmetric coating thickness profile in the mirror plane on a substrate with a rotationally-asymmetric or rotationally-symmetric surface profile. The projection objective can exhibit increased overall transmission.
摘要翻译：提供了一种诸如用于EUV光刻的投影物镜，用于借助于来自极紫外范围的电磁辐射将在物平面中布置的图案成像到图像平面中。投影物镜包括设置有反射涂层并且布置在物平面和像平面之间的多个反射镜。至少一个反射镜包括在基板上的镜面中具有旋转非对称涂层厚度分布的渐变反射涂层，具有旋转不对称或旋转对称的表面轮廓。投影物镜可以表现出增加的整体透射。

2. 发明授权

US08902406B2 Projection objective 有权
标题翻译：投影目标
公开(公告)号：US08902406B2
公开(公告)日：2014-12-02
申请号：US12951216
申请日：2010-11-22
申请人： Reinhold Walser , Thomas Schicketanz
发明人： Reinhold Walser , Thomas Schicketanz
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G02B17/0647 , G03F7/70233 , G03F7/70308 , G03F7/70316
摘要： A projection objective, such as for EUV lithography, for imaging a pattern arranged in an object plane into an image plane with the aid of electromagnetic radiation from the extreme ultraviolet range is provided. The projection objective includes a plurality of mirrors provided with reflective coatings and arranged between the object plane and the image plane. At least one of the mirrors includes a graded reflective coating with a rotationally-asymmetric coating thickness profile in the mirror plane on a substrate with a rotationally-asymmetric or rotationally-symmetric surface profile. The projection objective can exhibit increased overall transmission.
摘要翻译：提供了一种诸如用于EUV光刻的投影物镜，用于借助于来自极紫外范围的电磁辐射将在物平面中布置的图案成像到图像平面中。投影物镜包括设置有反射涂层并且布置在物平面和像平面之间的多个反射镜。至少一个反射镜包括在基板上的镜面中具有旋转非对称涂层厚度分布的渐变反射涂层，具有旋转不对称或旋转对称的表面轮廓。投影物镜可以表现出增加的整体透射。

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