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    • 2. 发明申请
    • SOLAR CELL AND METHOD FOR THE PRODUCTION THEREOF
    • 太阳能电池及其生产方法
    • US20110155239A1
    • 2011-06-30
    • US12997623
    • 2009-05-29
    • Daniel BiroFlorian ClementOliver Schultz-Wittmann
    • Daniel BiroFlorian ClementOliver Schultz-Wittmann
    • H01L31/0216H01L31/18
    • H01L31/0682H01L31/02245H01L31/0504H01L31/1804Y02E10/547Y02P70/521
    • A solar cell having a semiconductor substrate with a front face and a rear face extending substantially parallel thereto, a front face metallization, a rear face metallization and at least three doped regions having at least two different conductivity types, including: a first doped region with a first conductivity type located on the front face of the semiconductor substrate and extends substantially over the entire front face; a second doped region with the opposite conductivity type to that of the first conductivity type located on the rear face and extends partially over said face; and a third doped region with the first conductivity type located on the rear face and extends partially over said face. The front face metallization is connected to the first doped region and the rear face metallization is connected to the second doped region in an electrically conductive manner and the solar cell has an electrically conductive connection which connects the third doped region to the front face metallization and/or the first doped region.
    • 一种具有半导体衬底的太阳能电池,其具有基本上平行于其的前表面和后表面,前表面金属化,背面金属化和至少三个具有至少两种不同导电类型的掺杂区域,包括:具有 第一导电类型位于半导体衬底的前表面上并且基本上在整个正面上延伸; 第二掺杂区域,其具有与位于后表面上的第一导电类型相反的导电类型并且部分地延伸在所述面上; 以及具有第一导电类型的第三掺杂区域位于后表面上并且部分地在所述面上延伸。 前面金属化连接到第一掺杂区域,并且背面金属化以导电方式连接到第二掺杂区域,并且太阳能电池具有导电连接,其将第三掺杂区域连接到前面金属化和/ 或第一掺杂区域。
    • 5. 发明授权
    • Fine line metallization of photovoltaic devices by partial lift-off of optical coatings
    • 通过光学涂层的部分剥离对光伏器件进行细线金属化
    • US08236604B2
    • 2012-08-07
    • US13027576
    • 2011-02-15
    • Oliver Schultz-WittmannDouglas CraftsDenis DeCeusterAdrian Turner
    • Oliver Schultz-WittmannDouglas CraftsDenis DeCeusterAdrian Turner
    • H01L21/28
    • H01L31/022425H01L31/02168Y02E10/50
    • A metal grid contact and dielectric pattern on a layer requiring conductive contact in a photovoltaic device. The invention includes, in one aspect, forming a metal film; forming an etch resist over the metal film by, e.g., directly writing and in-situ curing the etch resist using, e.g., ink-jetting or screen-printing; etching the metal film leaving the resist pattern and a metal grid contact pattern under the etch resist intact; forming a dielectric layer over the etch resist; and removing the resist pattern and the dielectric over the etch resist, leaving a substantially co-planar metal grid contact and dielectric pattern. The metal grid contact pattern may form the front and/or back contact electrode of a solar cell; and the dielectric layer may be an optical reflection or antireflection layer. The layer requiring contact may be multifunctional providing its own passivation, such that passivation is substantially not required in the dielectric layer.
    • 在光伏器件中需要导电接触的层上的金属栅极接触和电介质图案。 本发明在一个方面包括形成金属膜; 通过例如使用例如喷墨或丝网印刷直接写入和原位固化蚀刻抗蚀剂,在金属膜上形成蚀刻抗蚀剂; 蚀刻离开抗蚀剂图案的金属膜和蚀刻抗蚀剂下方的金属栅格接触图案完整; 在所述抗蚀剂上形成介电层; 并且在抗蚀剂上去除抗蚀剂图案和电介质,留下基本上共平面的金属栅极接触和电介质图案。 金属栅格接触图案可以形成太阳能电池的前和/或后接触电极; 并且电介质层可以是光学反射或抗反射层。 需要接触的层可以是多功能的,提供其自身的钝化,使得在介电层中基本上不需要钝化。