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1. 发明申请

US20080218840A1 Methods for etching layers within a MEMS device to achieve a tapered edge 失效
标题翻译：用于蚀刻MEMS器件内的层以实现锥形边缘的方法
公开(公告)号：US20080218840A1
公开(公告)日：2008-09-11
申请号：US11506770
申请日：2006-08-18
申请人： Chengin Qui , Teruo Sasagawa , Ming-Hau Tung , Chun-Ming Wang , Stephen Zee
发明人： Chengin Qui , Teruo Sasagawa , Ming-Hau Tung , Chun-Ming Wang , Stephen Zee
IPC分类号： G02F1/01 , B29D11/00
CPC分类号： G02B26/0841 , B81B3/0072 , B81B2201/047 , B81B2203/0163 , B81B2203/019 , B81B2203/0307 , B81B2203/053 , B81C1/00142 , B81C1/00666 , B81C2201/0167 , G02B26/001 , Y10S359/90
摘要： Certain MEMS devices include layers patterned to have tapered edges. One method for forming layers having tapered edges includes the use of an etch leading layer. Another method for forming layers having tapered edges includes the deposition of a layer in which the upper portion is etchable at a faster rate than the lower portion. Another method for forming layers having tapered edges includes the use of multiple iterative etches. Another method for forming layers having tapered edges includes the use of a liftoff mask layer having an aperture including a negative angle, such that a layer can be deposited over the liftoff mask layer and the mask layer removed, leaving a structure having tapered edges.
摘要翻译：某些MEMS器件包括被图案化以具有渐缩边缘的层。用于形成具有渐缩边缘的层的一种方法包括使用蚀刻引导层。用于形成具有锥形边缘的层的另一种方法包括沉积一层，其中上部可以比下部更快的速度进行刻蚀。用于形成具有渐缩边缘的层的另一种方法包括使用多个迭代蚀刻。用于形成具有锥形边缘的层的另一种方法包括使用具有包括负角度的孔的剥离掩模层，使得可以在剥离掩模层上沉积一层，并且去除掩模层，留下具有渐缩边缘的结构。

2. 发明授权

US07660058B2 Methods for etching layers within a MEMS device to achieve a tapered edge 失效
标题翻译：用于蚀刻MEMS器件内的层以实现锥形边缘的方法
公开(公告)号：US07660058B2
公开(公告)日：2010-02-09
申请号：US11506770
申请日：2006-08-18
申请人： Chengbin Qiu , Teruo Sasagawa , Ming-Hau Tung , Chun-Ming Wang , Stephen Zee
发明人： Chengbin Qiu , Teruo Sasagawa , Ming-Hau Tung , Chun-Ming Wang , Stephen Zee
IPC分类号： H01L21/302 , B44C1/22
CPC分类号： G02B26/0841 , B81B3/0072 , B81B2201/047 , B81B2203/0163 , B81B2203/019 , B81B2203/0307 , B81B2203/053 , B81C1/00142 , B81C1/00666 , B81C2201/0167 , G02B26/001 , Y10S359/90
摘要： Certain MEMS devices include layers patterned to have tapered edges. One method for forming layers having tapered edges includes the use of an etch leading layer. Another method for forming layers having tapered edges includes the deposition of a layer in which the upper portion is etchable at a faster rate than the lower portion. Another method for forming layers having tapered edges includes the use of multiple iterative etches. Another method for forming layers having tapered edges includes the use of a liftoff mask layer having an aperture including a negative angle, such that a layer can be deposited over the liftoff mask layer and the mask layer removed, leaving a structure having tapered edges.
摘要翻译：某些MEMS器件包括被图案化以具有渐缩边缘的层。用于形成具有渐缩边缘的层的一种方法包括使用蚀刻引导层。用于形成具有锥形边缘的层的另一种方法包括沉积一层，其中上部可以比下部更快的速度进行刻蚀。用于形成具有渐缩边缘的层的另一种方法包括使用多个迭代蚀刻。用于形成具有锥形边缘的层的另一种方法包括使用具有包括负角度的孔的剥离掩模层，使得可以在剥离掩模层上沉积一层，并且去除掩模层，留下具有渐缩边缘的结构。

3. 发明申请

US20070103028A1 MEMS device and interconnects for same 失效
标题翻译： MEMS器件和互连相同
公开(公告)号：US20070103028A1
公开(公告)日：2007-05-10
申请号：US11540485
申请日：2006-09-29
申请人： Alan Lewis , Manish Kothari , John Batey , Teruo Sasagawa , Ming-Hau Tung , Gregory U'Ren , Stephen Zee
发明人： Alan Lewis , Manish Kothari , John Batey , Teruo Sasagawa , Ming-Hau Tung , Gregory U'Ren , Stephen Zee
IPC分类号： H02N11/00
CPC分类号： B81B7/0006 , B81B7/007 , B81B2201/047 , G02B26/001 , H02N1/006
摘要： A microelectromechanical systems device having an electrical interconnect between circuitry outside the device and at least one of an electrode and a movable layer within the device. At least a portion of the electrical interconnect is formed from the same material as a conductive layer between the electrode and a mechanical layer of the device. In an embodiment, this conductive layer is a sacrificial layer that is subsequently removed to form a cavity between the electrode and the movable layer. The sacrificial layer is preferably formed of molybdenum, doped silicon, tungsten, or titanium. According to another embodiment, the conductive layer is a movable reflective layer that preferably comprises aluminum.
摘要翻译：一种微机电系统装置，其具有在所述装置外部的电路和所述装置内的电极和可移动层中的至少一个之间的电互连。电互连的至少一部分由与电极和器件的机械层之间的导电层相同的材料形成。在一个实施例中，该导电层是牺牲层，其随后被去除以在电极和可移动层之间形成空腔。牺牲层优选由钼，掺杂硅，钨或钛形成。根据另一实施例，导电层是优选包括铝的可移动反射层。

4. 发明授权

US07580172B2 MEMS device and interconnects for same 失效
标题翻译： MEMS器件和互连相同
公开(公告)号：US07580172B2
公开(公告)日：2009-08-25
申请号：US11540485
申请日：2006-09-29
申请人： Alan G. Lewis , Manish Kothari , John Batey , Teruo Sasagawa , Ming-Hau Tung , Gregory D. U'Ren , Stephen Zee
发明人： Alan G. Lewis , Manish Kothari , John Batey , Teruo Sasagawa , Ming-Hau Tung , Gregory D. U'Ren , Stephen Zee
IPC分类号： G02F1/03 , G02B26/00
CPC分类号： B81B7/0006 , B81B7/007 , B81B2201/047 , G02B26/001 , H02N1/006
摘要： A microelectromechanical systems device having an electrical interconnect between circuitry outside the device and at least one of an electrode and a movable layer within the device. At least a portion of the electrical interconnect is formed from the same material as a conductive layer between the electrode and a mechanical layer of the device. In an embodiment, this conductive layer is a sacrificial layer that is subsequently removed to form a cavity between the electrode and the movable layer. The sacrificial layer is preferably formed of molybdenum, doped silicon, tungsten, or titanium. According to another embodiment, the conductive layer is a movable reflective layer that preferably comprises aluminum.
摘要翻译：一种微机电系统装置，其具有在所述装置外部的电路和所述装置内的电极和可移动层中的至少一个之间的电互连。电互连的至少一部分由与电极和器件的机械层之间的导电层相同的材料形成。在一个实施例中，该导电层是牺牲层，其随后被去除以在电极和可移动层之间形成空腔。牺牲层优选由钼，掺杂硅，钨或钛形成。根据另一实施例，导电层是优选包括铝的可移动反射层。

5. 发明授权

US08344470B2 Electromechanical devices having support structures 有权
标题翻译：具有支撑结构的机电装置
公开(公告)号：US08344470B2
公开(公告)日：2013-01-01
申请号：US13099221
申请日：2011-05-02
申请人： Jeffrey B. Sampsell , Clarence Chui , Manish Kothari , Mark W. Miles , Teruo Sasagawa , Wonsuk Chung , Ming-Hau Tung
发明人： Jeffrey B. Sampsell , Clarence Chui , Manish Kothari , Mark W. Miles , Teruo Sasagawa , Wonsuk Chung , Ming-Hau Tung
IPC分类号： H01L31/0232
CPC分类号： G02B26/001 , B81B3/007 , B81B2201/047 , B81B2203/0307 , B81B2203/053
摘要： Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, both rivets and posts may be used. In certain embodiments, these support structures are formed from rigid inorganic materials, such as metals or oxides. In certain embodiments, etch barriers may also be deposited to facilitate the use of materials in the formation of support structures which are not selectively etchable with respect to other components within the MEMS device.
摘要翻译： MEMS器件的实施例包括通过间隙与导电固定层间隔开的导电可移动层，并且由导电可移动层中的上凹部的刚性支撑结构或铆钉支撑，或由导电可移动层中的凹陷下方的柱支撑。在某些实施例中，可以使用铆钉和柱。在某些实施方案中，这些支撑结构由诸如金属或氧化物的刚性无机材料形成。在某些实施例中，还可以沉积蚀刻阻挡层以促进材料在形成相对于MEMS器件内的其它部件不能选择性蚀刻的支撑结构的形成中的使用。

6. 发明授权

US07623287B2 Non-planar surface structures and process for microelectromechanical systems 失效
标题翻译：微机电系统的非平面表面结构和工艺
公开(公告)号：US07623287B2
公开(公告)日：2009-11-24
申请号：US11406866
申请日：2006-04-19
申请人： Teruo Sasagawa , Lior Kogut , Ming-Hau Tung
发明人： Teruo Sasagawa , Lior Kogut , Ming-Hau Tung
IPC分类号： G02B26/00
CPC分类号： B81B3/0008 , G02B26/001
摘要： Methods of making MEMS devices including interferometric modulators involve depositing various layers, including stationary layers, movable layers and sacrificial layers, on a substrate. A non-planar surface is formed on one or more layers by flowing an etchant through a permeable layer. In one embodiment the non-planar surface is formed on a sacrificial layer. A movable layer formed over the non-planar surface of the sacrificial layer results in a non-planar interface between the sacrificial and movable layers. Removal of the sacrificial layer results in a released MEMS device having reduced contact area between the movable and stationary layers when the MEMS device is actuated. The reduced contact area results in lower adhesion forces and reduced stiction during actuation of the MEMS device. These methods may be used to manufacture released and unreleased interferometric modulators.
摘要翻译：制造包括干涉式调制器的MEMS器件的方法包括在衬底上沉积包括固定层，可移动层和牺牲层的各种层。通过使蚀刻剂流过可渗透层而在一个或多个层上形成非平面表面。在一个实施例中，非平面表面形成在牺牲层上。形成在牺牲层的非平面表面上的可移动层导致牺牲层和可移动层之间的非平面界面。牺牲层的去除导致释放的MEMS器件在MEMS器件致动时具有减小可移动层和固定层之间的接触面积。减小的接触面积导致MEMS器件的致动期间较低的粘附力和降低的静摩擦力。这些方法可用于制造释放和未释放的干涉式调制器。

7. 发明申请

US20090009847A1 INTEGRATED IMODS AND SOLAR CELLS ON A SUBSTRATE 失效
公开(公告)号：US20090009847A1
公开(公告)日：2009-01-08
申请号：US11773757
申请日：2007-07-05
申请人： Teruo Sasagawa , Lior Kogut , Ming-Hau Tung
发明人： Teruo Sasagawa , Lior Kogut , Ming-Hau Tung
IPC分类号： G02B26/00 , H01M10/44 , H02J7/00 , B05D5/12
CPC分类号： G02B26/001 , H01L27/142 , H01L31/072 , H01L31/0725 , Y02E10/50
摘要： Embodiments of the present invention relate to interferometric display devices comprising an interferometric modulator and a solar cell and methods of making thereof. In some embodiments, the solar cell is configured to provide energy to the interferometric modulator. The solar cell and the interferometric modulator may be formed above the same substrate. A layer of the solar cell may be shared with a layer of the interferometric modulator.

8. 发明授权

US08120125B2 MEMS devices having overlying support structures 有权
标题翻译：具有上覆支撑结构的MEMS器件
公开(公告)号：US08120125B2
公开(公告)日：2012-02-21
申请号：US13012538
申请日：2011-01-24
申请人： Teruo Sasagawa , SuryaPrakash Ganti , Mark W. Miles , Clarence Chui , Manish Kothari , Ming-Hau Tung
发明人： Teruo Sasagawa , SuryaPrakash Ganti , Mark W. Miles , Clarence Chui , Manish Kothari , Ming-Hau Tung
IPC分类号： H01L29/82
CPC分类号： G02B26/001 , B81B3/007 , B81B2201/047 , B81B2203/0307 , B81B2203/053
摘要： Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, portions of the rivet structures extend through the movable layer and contact underlying layers. In other embodiments, the material used to form the rigid support structures may also be used to passivate otherwise exposed electrical leads in electrical connection with the MEMS devices, protecting the electrical leads from damage or other interference.
摘要翻译： MEMS器件的实施例包括通过间隙与导电固定层间隔开的导电可移动层，并且由导电可移动层中的上凹部的刚性支撑结构或铆钉支撑，或由导电可移动层中的凹陷下方的柱支撑。在某些实施例中，铆钉结构的部分延伸穿过可移动层并接触下面的层。在其他实施例中，用于形成刚性支撑结构的材料也可以用于钝化与MEMS装置电连接的其它暴露的电引线，保护电引线免受损坏或其他干扰。

9. 发明授权

US08094363B2 Integrated imods and solar cells on a substrate 失效
标题翻译：在基板上集成的imods和太阳能电池
公开(公告)号：US08094363B2
公开(公告)日：2012-01-10
申请号：US12544580
申请日：2009-08-20
申请人： Teruo Sasagawa , Lior Kogut , Ming-Hau Tung
发明人： Teruo Sasagawa , Lior Kogut , Ming-Hau Tung
IPC分类号： G02B26/00 , H01L21/31
CPC分类号： G02B26/001 , H01L27/142 , H01L31/072 , H01L31/0725 , Y02E10/50
摘要： Embodiments of the present invention relate to interferometric display devices comprising an interferometric modulator and a solar cell and methods of making thereof. In some embodiments, the solar cell is configured to provide energy to the interferometric modulator. The solar cell and the interferometric modulator may be formed above the same substrate. A layer of the solar cell may be shared with a layer of the interferometric modulator.
摘要翻译：本发明的实施例涉及包括干涉式调制器和太阳能电池的干涉式显示装置及其制造方法。在一些实施例中，太阳能电池被配置为向干涉式调制器提供能量。太阳能电池和干涉式调制器可以形成在同一衬底上方。太阳能电池的一层可以与干涉式调制器的一层共享。

10. 发明申请

US20090308452A1 INTEGRATED IMODS AND SOLAR CELLS ON A SUBSTRATE 失效
标题翻译：在基底上的集成的IMODS和太阳能电池
公开(公告)号：US20090308452A1
公开(公告)日：2009-12-17
申请号：US12544580
申请日：2009-08-20
申请人： Teruo Sasagawa , Lior Kogut , Ming-Hau Tung
发明人： Teruo Sasagawa , Lior Kogut , Ming-Hau Tung
IPC分类号： H01L31/02 , H01L31/18 , G02B26/00
CPC分类号： G02B26/001 , H01L27/142 , H01L31/072 , H01L31/0725 , Y02E10/50
摘要： Embodiments of the present invention relate to interferometric display devices comprising an interferometric modulator and a solar cell and methods of making thereof. In some embodiments, the solar cell is configured to provide energy to the interferometric modulator. The solar cell and the interferometric modulator may be formed above the same substrate. A layer of the solar cell may be shared with a layer of the interferometric modulator.
摘要翻译：本发明的实施例涉及包括干涉式调制器和太阳能电池的干涉式显示装置及其制造方法。在一些实施例中，太阳能电池被配置为向干涉式调制器提供能量。太阳能电池和干涉式调制器可以形成在同一衬底上方。太阳能电池的一层可以与干涉式调制器的一层共享。

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