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    • 2. 发明专利
    • Projection optical system
    • 投影光学系统
    • JP2012042967A
    • 2012-03-01
    • JP2011208150
    • 2011-09-22
    • Carl Zeiss Smt Gmbhカール・ツァイス・エスエムティー・ゲーエムベーハー
    • RAU JOHANNESSHAPAHAR ALMINGELLRICH BERNHARDJENS KUGLERMAHLMANN MARTINGOYPERT BERNHARDPETASCH THOMASFUERTER GERHARD
    • G02B7/02G03F7/20H01L21/027
    • G03F7/7015G02B7/00G02B7/008G02B7/021G02B7/028G02B7/22G02B17/08G02B17/0804G02B17/0812G02B17/0892G03F7/70808G03F7/70825G03F7/70833G03F7/70883
    • PROBLEM TO BE SOLVED: To provide a structure of an airtight and light-tight housing preventing complication of a whole system in a support section of an auxiliary optical system of a projection optical system of a microlithography system.SOLUTION: A first optical element module 7 includes a first housing and at least a first optical element, and the first optical element is stored in the first housing and includes a first optical use region 10.7 that regulates a first optical axis 10.13 and is optically used. At least a single second optical element module 8 is provided adjacent to the first optical element module 7 and includes at least a single second optical element, and the second optical element regulates a second optical axis 10.14 of a projection optical unit 2. The first housing includes a first housing axis 3.2 and an external wall 3.3 extending in the circumferential direction with respect to the first optical axis 10.13, the first optical axis 10.13 is laterally deflected and is at least one of axes being inclined with respect to the first housing axis 3.2, and the first housing axis 3.2 is substantially in a same straight line with the second optical axis 8.3.
    • 要解决的问题:提供一种气密和不透光的壳体的结构,以防止在微光刻系统的投影光学系统的辅助光学系统的支撑部分中的整个系统的复杂化。 解决方案:第一光学元件模块7包括第一壳体和至少第一光学元件,并且第一光学元件被存储在第一壳体中并且包括第一光学使用区域10.7,其调节第一光轴10.13和 被光学使用。 至少单个第二光学元件模块8设置成与第一光学元件模块7相邻并且包括至少一个第二光学元件,并且第二光学元件调节投影光学单元2的第二光轴10.14。第一壳体 包括第一壳体轴线3.2和相对于第一光轴10.13在圆周方向上延伸的外壁3.3,第一光轴10.13横向偏转,并且至少一个轴线相对于第一壳体轴线3.2倾斜 并且第一壳体轴线3.2与第二光轴8.3基本上处于相同的直线。 版权所有(C)2012,JPO&INPIT