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1. 发明申请

WO2013156251A1 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND METHOD FOR ADJUSTING AN OPTICAL SYSTEM 审中-公开
标题翻译：微波投影曝光装置的光学系统和调整光学系统的方法
公开(公告)号：WO2013156251A1
公开(公告)日：2013-10-24
申请号：PCT/EP2013/056079
申请日：2013-03-22
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , PATRA, Michael , HENNERKES, Christoph , TRAUTER, Bastian
发明人： SÄNGER, Ingo , PATRA, Michael , HENNERKES, Christoph , TRAUTER, Bastian
IPC分类号： G03F7/20 , G02B26/08 , G02B27/28
CPC分类号： G03F7/70141 , G02B26/0833 , G02B27/286 , G03F7/70116 , G03F7/70566
摘要： The invention relates to an optical system of a microlithographic projection exposure apparatus, and to a method for adjusting an optical system. An optical system comprises a mirror arrangement (120, 200, 400, 500, 800, 900) having a plurality of mirror elements (120a, 120b, 120c,... ) which are adjustable independently of one another for the purpose of changing an angular distribution of the light reflected by the mirror arrangement, a polarization-influencing optical arrangement (110) having at least one polarization-influencing component (111, 112, 113, 310, 320, 411, 511), wherein, by displacing said polarization-influencing component, a degree of overlap between the polarization-influencing component and the mirror arrangement can be set in a variable manner, and a light coupling-out region (630, 730, 830, 930), which, for the purpose of taking account of a possible incorrect positioning of the polarization-influencing component, couples out light from the beam path of the optical system in such a way that no light passes into a pupil plane of the projection exposure apparatus from a partial region of the mirror arrangement during the operation of the optical system.
摘要翻译：本发明涉及一种微光刻投影曝光装置的光学系统以及调整光学系统的方法。光学系统包括具有多个镜子元件（120a，120b，120c，...）的反射镜装置（120,200,400,500,800,900），它们彼此独立地调节，以便改变由反射镜装置反射的光的角度分布，具有至少一个偏振影响分量（111,112,113,310,320,411,511）的偏振影响光学装置（110），其中，通过移位所述偏振可以以可变的方式设置偏振影响部件和反射镜装置之间的重叠程度，以及用于拍摄的光耦合输出区域（630,730,830,930）考虑到偏振影响分量的可能的不正确的定位，将光从光学系统的光束路径耦合出来，使得光不会从镜子的部分区域进入投影曝光装置的光瞳平面 t在光学系统的操作期间。

2. 发明申请

WO2014139815A1 OPTICAL ASSEMBLY FOR INCREASING THE ETENDUE 审中-公开
标题翻译：光大会增加信息
公开(公告)号：WO2014139815A1
公开(公告)日：2014-09-18
申请号：PCT/EP2014/054047
申请日：2014-03-03
申请人： CARL ZEISS SMT GMBH
发明人： SÄNGER, Ingo , HENNERKES, Christoph
IPC分类号： G03F7/20
CPC分类号： G03F7/70033 , G03F7/70075 , G03F7/70116 , G03F7/70191 , G21K1/065 , G21K1/067 , G21K1/12
摘要： An optical system has a light source (2) having an original etendue of less than 0.1 mm 2 for an illumination system (5) for projection lithography. An optical assembly (13) serves for simultaneously increasing the etendue of a used emission (12) of the light source (2). The optical assembly (13) is embodied such that an increase in the etendue by at least a factor of 10 results. A component of the optical assembly (13) that is impinged on is displaced relative to the light source (2) such that an impingement region of the emission (12) of the light source (2) on the optical component of the optical assembly (13) varies temporally.
摘要翻译：光学系统具有对于用于投影光刻的照明系统（5）具有小于0.1mm 2的原始流明度的光源（2）。光学组件（13）用于同时增加光源（2）的使用的发射（12）的光密度。光学组件（13）被实施为使得光密度增加至少10倍的结果。被照射的光学组件（13）的部件相对于光源（2）移位，使得光学组件的光学部件上的光源（2）的发射（12）的冲击区域 13）暂时变化。

3. 发明申请

WO2014114494A1 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的光学系统
公开(公告)号：WO2014114494A1
公开(公告)日：2014-07-31
申请号：PCT/EP2014/050261
申请日：2014-01-09
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , HENNERKES, Christoph
发明人： SÄNGER, Ingo , HENNERKES, Christoph
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70116 , G03F7/70566
摘要： The invention relates to an optical system of a microlithographic projection exposure apparatus, comprising at least one mirror arrangement (200) having a plurality of mirror elements which are adjustable independently of one another for the purpose of changing an angular distribution of the light reflected by the mirror arrangement, and a polarization-influencing optical element (110, 210-212, 310, 411, 412, 510, 610, 710), which generates,for impinging light having a constantly linear or a circular input polarization distribution, an output polarization distribution having a direction of polarization that varies continuously over the light beam cross section.
摘要翻译：本发明涉及一种微光刻投影曝光装置的光学系统，其包括至少一个反射镜装置（200），该反射镜装置具有多个可独立调节的反射镜元件，以便改变由反射镜布置和偏振影响光学元件（110,210-212,310,411,412,510,610,710），其产生用于入射具有恒定线性或圆形输入偏振分布的光，输出偏振分布具有在光束截面上连续变化的偏振方向。

4. 发明申请

WO2014131604A1 OPTICAL ASSEMBLY FOR ROTATING POLARIZATION 审中-公开
标题翻译：旋转偏振光学装置
公开(公告)号：WO2014131604A1
公开(公告)日：2014-09-04
申请号：PCT/EP2014/052523
申请日：2014-02-10
申请人： CARL ZEISS SMT GMBH
发明人： RUOFF, Johannes , ZIMMERMANN, Jörg , KRÄHMER, Daniel , HENNERKES, Christoph , SÄNGER, Ingo , SCHLESENER, Frank
IPC分类号： G02B27/28 , G03F7/20
CPC分类号： G02B27/286 , G02B5/3083 , G03F7/70308 , G03F7/70566
摘要： An optical assembly (28) serves for rotating the polarization of linearly polarized incident input light (3a) and for generating linearly polarized emergent output light (3b). The assembly (28) is embodied such that a polarization of the input light (3 a) is rotated by a polarization rotation angle that is greater than 10°. At least one p-mirror (M2) is arranged for reflecting p-polarized incident light such that the p-polarized light is incident with an angle (a) of incidence that deviates from a 45° angle by at least 10°. This results in an optical assembly which provides linearly polarized output light having a predefined polarization direction with the lowest possible throughput losses.
摘要翻译：光学组件（28）用于旋转线性偏振入射输入光（3a）的偏振并用于产生线偏振的出射光输出光（3b）。组件（28）被实施为使得输入光（3a）的偏振旋转大于10°的偏振旋转角度。至少一个p镜（M2）布置用于反射p偏振入射光，使得p偏振光以与45°角偏离至少10°的入射角（a）入射。这导致光学组件，其提供具有预定极化方向的线偏振输出光，具有尽可能低的吞吐量损失。

5. 发明申请

WO2013013947A2 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND MICROLITHOGRAPHIC EXPOSURE METHOD 审中-公开
标题翻译：微型投影曝光装置的光学系统及微型曝光方法
公开(公告)号：WO2013013947A2
公开(公告)日：2013-01-31
申请号：PCT/EP2012/063102
申请日：2012-07-05
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , ZIMMERMANN, Jörg , RUOFF, Johannes , MEIER, Martin , SCHLESENER, Frank , HENNERKES, Christoph
发明人： SÄNGER, Ingo , ZIMMERMANN, Jörg , RUOFF, Johannes , MEIER, Martin , SCHLESENER, Frank , HENNERKES, Christoph
IPC分类号： G03F7/20 , G02B27/10 , G02B27/28 , G02B5/09
CPC分类号： G03F7/70191 , G02B27/283 , G03F7/70108 , G03F7/70116 , G03F7/70566
摘要： The disclosure relates to optical systems of a microlithographic projection exposure apparatus, and to a microlithographic exposure method. According to an aspect of the disclosure, an optical system has a light source, a ray-splitting optical element (110, 310, 410, 510, 706), which splits a light ray incident on this element when the projection exposure apparatus is in operation into a first partial ray (S101, S301, S401, S501, S701) and a second partial ray (S102, S302, S402, S502, S702), with the first and the second partial ray having mutually orthogonal polarization directions, and at least one ray-deflecting optical element (205, 206, 330, 340, 350, 360, 370, 470, 530, 540, 710, 720, 730, 810, 820, 830) for generating a desired polarized illumination setting from the first partial ray (S101, S301, S401, S501, S701) and the second partial ray (S102, S302, S402, S502, S702), wherein the ray-splitting optical element (110, 310, 410, 510, 706) is arranged such that light incident on this ray-splitting optical element when the projection exposure apparatus is in operation has a degree of polarization of less than one.
摘要翻译：本公开涉及微光刻投影曝光设备的光学系统，并且涉及微光刻曝光方法。根据本公开的一个方面，光学系统具有光源，当投影曝光设备处于入射时将入射在该元件上的光线分开的光线分离光学元件（110,310,410,510,706）在第一和第二部分光线具有相互正交的偏振方向的情况下将第一部分光线（S101，S301，S401，S501，S701）和第二部分光线（S102，S302，S402，S502，S702）至少一个用于从第一个偏振照明装置产生期望的偏振照明设置的光线偏转光学元件（205,206,330,340,350,360,370,470,530,540,710,720,730,810,820,830）（110,310,410,510,706）排列的部分光线（S101，S301，S401，S501，S701）和第二部分光线（S102，S302，S402，S502，S702）使得当投影曝光装置在操作中时入射到该光线分离光学元件上的光具有小于1的偏振度。

6. 发明申请

WO2013007731A1 ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY 审中-公开
标题翻译：投影光刻照明光学单元
公开(公告)号：WO2013007731A1
公开(公告)日：2013-01-17
申请号：PCT/EP2012/063520
申请日：2012-07-11
申请人： CARL ZEISS SMT GMBH , HENNERKES, Christoph , SÄNGER, Ingo , ZIMMERMANN, Jörg , RUOFF, Johannes , MEIER, Martin , SCHLESENER, Frank
发明人： HENNERKES, Christoph , SÄNGER, Ingo , ZIMMERMANN, Jörg , RUOFF, Johannes , MEIER, Martin , SCHLESENER, Frank
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02B7/1815 , G02B17/06 , G02B26/0816 , G03F7/70108 , G03F7/70116 , G03F7/70891
摘要： An illumination optical unit for projection lithography has a first polarization mirror device (16) for the reflection and polarization of illumination light (3). A second mirror device (22), which is disposed downstream of the polarization mirror device (16), serves for the reflection of an illumination light beam (25). At least one drive device (21; 27) is operatively connected to at least one of the two mirror devices (16; 22). The two mirror devices (16; 22) are displaceable relative to one another with the aid of the drive device (21; 27) between a first relative position, which leads to a first beam geometry of the illumination light beam (25) after reflection at the second mirror device (22), and a second relative position, which leads to a second beam geometry of the illumination light beam (25) after reflection at the second mirror device (22), which is different from the first beam geometry. This results in a flexible predefinition of different illumination geometries, in particular of different illumination geometries with rotationally symmetrical illumination.
摘要翻译：用于投影光刻的照明光学单元具有用于照明光（3）的反射和偏振的第一偏振镜装置（16）。设置在偏振镜装置（16）下游的第二镜装置（22）用于照明光束（25）的反射。至少一个驱动装置（21; 27）可操作地连接到两个反射镜装置（16; 22）中的至少一个。借助于驱动装置（21; 27），两个反射镜装置（16; 22）可相对于彼此移动，该第一相对位置在第一相对位置之间，该第一相对位置在反射之后导致照明光束（25）的第一光束几何形状在第二反射镜装置（22）和第二相对位置，其在第二反射镜装置（22）反射之后导致照明光束（25）的第二光束几何形状，其与第一光束几何形状不同。这导致不同照明几何形状的灵活预定义，特别是具有旋转对称照明的不同照明几何形状。

7. 发明申请

WO2017032896A1 ANORDNUNG EINER VORRICHTUNG ZUM SCHUTZ EINES IN EINER OBJEKTEBENE ANZUORDNENDEN RETIKELS GEGEN VERSCHMUTZUNG 审中-公开
标题翻译：的装置的用于保护在属性LEVEL免受污染布置来布置光罩
公开(公告)号：WO2017032896A1
公开(公告)日：2017-03-02
申请号：PCT/EP2016/070248
申请日：2016-08-26
申请人： CARL ZEISS SMT GMBH
发明人： HENNERKES, Christoph
IPC分类号： G03F1/62 , G03F7/20 , G02B5/28
CPC分类号： G03F7/70916 , G02B5/283 , G03F1/62 , G03F7/70191 , G03F7/70575
摘要： Eine Schutzvorrichtung (28) zum Schutz eines Retikels (7) ist relativ zu einer Objektebene (6) verkippt ausgerichtet.
摘要翻译：用于掩模版（7）的保护的保护装置（28）被定向到相对于物平面（6）倾斜。

8. 发明申请

WO2016074930A1 METHOD FOR PREDICTING AT LEAST ONE ILLUMINATION PARAMETER FOR EVALUATING AN ILLUMINATION SETTING 审中-公开
标题翻译：用于预测最小一个照明参数的方法，用于评估照明设置
公开(公告)号：WO2016074930A1
公开(公告)日：2016-05-19
申请号：PCT/EP2015/075011
申请日：2015-10-28
申请人： CARL ZEISS SMT GMBH
发明人： GEHRKE, Ralf , HENNERKES, Christoph , HÖGELE, Wolfgang , ZIMMERMANN, Jörg
IPC分类号： G03F7/20
CPC分类号： G03F7/70125 , G03F7/70075 , G03F7/70116 , G03F7/702 , G03F7/70516
摘要： In a method for predicting at least one illumination parameter for evaluating an illumination setting for illuminating an object field of a projection exposure apparatus, illumination parameters are measured at a number n of calibration settings (j Ka1 ), correction terms (f i ) for prediction values of the illumination parameters (p) are determined from the measured values and then at least one illumination parameter (p*) of at least one illumination setting (j*), which is not contained in the set of n calibration settings (j Ka1 ), is predicted.
摘要翻译：在用于预测用于照射投影曝光装置的对象场的照明设定的至少一个照明参数的方法中，照射参数以n个校准设定（jKa1），校正项（fi）根据测量值确定照明参数（p），然后至少一个不包含在n个校准设置（jKa1）组中的照明设置（j *）的照明参数（p *）为预料到的。

9. 发明申请

WO2014128025A1 ILLUMINATION SYSTEM FOR AN EUV LITHOGRAPHY DEVICE AND FACET MIRROR THEREFOR 审中-公开
标题翻译：用于EUV光刻设备和其表面镜的照明系统
公开(公告)号：WO2014128025A1
公开(公告)日：2014-08-28
申请号：PCT/EP2014/052639
申请日：2014-02-11
申请人： CARL ZEISS SMT GMBH
发明人： RUOFF, Johannes , SAENGER, Ingo , ZIMMERMANN, Joerg , KRAEHMER, Daniel , HENNERKES, Christoph , SCHLESENER, Frank
IPC分类号： G03F7/20 , G02B5/09 , G02B26/08 , G02B27/00
CPC分类号： G03F7/70158 , G02B26/0833 , G02B27/0905 , G02B27/0933 , G02B27/0977 , G03F7/70075 , G03F7/70091 , G03F7/70108 , G03F7/70116 , G03F7/7015 , G03F7/702 , G03F7/70316
摘要： The invention relates to an illumination system (10) for an EUV lithography device (1 ), comprising: a first facet mirror (13) having facet elements (13a-d) that reflect EUV radiation (4), and a second facet mirror (14) having facet elements (14a-d) for reflecting the EUV radiation (4) reflected by the first facet mirror (13) onto an illumination field. At least one of the facet elements (13a-d; 14a,c; 14b,d) of the first facet mirror (13) or of the second facet mirror (14) is designed as a diffractive optical element for diffracting the EUV radiation (4). In particular, at least one of the facet elements (14a,c; 14b,d) of the second facet mirror (14) is designed as a diffractive optical element (14a,c; 14b,d) for illuminating only a part of the illumination field. The invention also relates to an EUV lithography device (1 ) comprising such an illumination system (10), and to a facet mirror (13, 14) comprising at least one diffractive facet element (13a-d, 14a-d).
摘要翻译：本发明涉及一种用于EUV光刻设备（1）的照明系统（10），包括：具有反射EUV辐射（4）的小面元件（13a-d）的第一小面镜（13）和第二小面镜 14）具有用于将由第一小平面镜（13）反射的EUV辐射（4）反射到照明场上的小面元件（14a-d）。第一小平面镜（13）或第二面反射镜（14）的小面元件（13a-d; 14a，c; 14b，d）中的至少一个被设计为衍射光学元件，用于衍射EUV辐射 4）。特别地，第二分面反射镜（14）的小面元件（14a，c; 14b，d）中的至少一个被设计为衍射光学元件（14a，c; 14b，d），仅用于照射照明场。本发明还涉及包括这种照明系统（10）和包括至少一个衍射小面元件（13a-d，14a-d）的小平面镜（13,14）的EUV光刻设备（1）。

10. 发明申请

WO2014067812A1 EUV LIGHT SOURCE FOR GENERATING A USABLE OUTPUT BEAM FOR A PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：用于生成投影曝光装置的可用输出光束的EUV光源
公开(公告)号：WO2014067812A1
公开(公告)日：2014-05-08
申请号：PCT/EP2013/072043
申请日：2013-10-22
申请人： CARL ZEISS SMT GMBH
发明人： SÄNGER, Ingo , MAUL, Manfred , HENNERKES, Christoph , RUOFF, Johannes , KRÄHMER, Daniel
IPC分类号： G03F7/20 , G02B27/28 , G21K1/06 , H05H7/04
CPC分类号： H05G2/001 , G02B27/286 , G03F7/70033 , G03F7/70075 , G03F7/70116 , G03F7/70308 , G03F7/70566 , G21K1/06 , G21K1/062 , G21K1/16 , H01J35/00 , H05H7/04
摘要： An EUV light source (2) serves for generating a usable output beam (3) of EUV illumination light for a projection exposure apparatus (1) for projection lithography. The light source (2) has an EUV generation device (2c) which generates an EUV raw output beam. The latter is circularly polarized. For the purposes of setting the polarization of the usable output beam (3) and in respect of the polarization direction, a polarization setting device (32; 39) has a linearly polarizing effect on the raw output beam. This results in an EUV light source, which provides an improved output beam for a resolution-optimized illumination.
摘要翻译： EUV光源（2）用于产生用于投影光刻的投影曝光装置（1）的EUV照明光的可用输出光束（3）。光源（2）具有产生EUV原始输出光束的EUV生成装置（2c）。后者是圆极化的。为了设定可使用的输出光束（3）的极化和偏振方向的偏振，偏光设定装置（32; 39）对原始输出光束具有线性偏振效果。这导致EUV光源，其提供用于分辨率优化照明的改进的输出光束。

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