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1. 发明申请

WO2013156251A1 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND METHOD FOR ADJUSTING AN OPTICAL SYSTEM 审中-公开
标题翻译：微波投影曝光装置的光学系统和调整光学系统的方法
公开(公告)号：WO2013156251A1
公开(公告)日：2013-10-24
申请号：PCT/EP2013/056079
申请日：2013-03-22
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , PATRA, Michael , HENNERKES, Christoph , TRAUTER, Bastian
发明人： SÄNGER, Ingo , PATRA, Michael , HENNERKES, Christoph , TRAUTER, Bastian
IPC分类号： G03F7/20 , G02B26/08 , G02B27/28
CPC分类号： G03F7/70141 , G02B26/0833 , G02B27/286 , G03F7/70116 , G03F7/70566
摘要： The invention relates to an optical system of a microlithographic projection exposure apparatus, and to a method for adjusting an optical system. An optical system comprises a mirror arrangement (120, 200, 400, 500, 800, 900) having a plurality of mirror elements (120a, 120b, 120c,... ) which are adjustable independently of one another for the purpose of changing an angular distribution of the light reflected by the mirror arrangement, a polarization-influencing optical arrangement (110) having at least one polarization-influencing component (111, 112, 113, 310, 320, 411, 511), wherein, by displacing said polarization-influencing component, a degree of overlap between the polarization-influencing component and the mirror arrangement can be set in a variable manner, and a light coupling-out region (630, 730, 830, 930), which, for the purpose of taking account of a possible incorrect positioning of the polarization-influencing component, couples out light from the beam path of the optical system in such a way that no light passes into a pupil plane of the projection exposure apparatus from a partial region of the mirror arrangement during the operation of the optical system.
摘要翻译：本发明涉及一种微光刻投影曝光装置的光学系统以及调整光学系统的方法。光学系统包括具有多个镜子元件（120a，120b，120c，...）的反射镜装置（120,200,400,500,800,900），它们彼此独立地调节，以便改变由反射镜装置反射的光的角度分布，具有至少一个偏振影响分量（111,112,113,310,320,411,511）的偏振影响光学装置（110），其中，通过移位所述偏振可以以可变的方式设置偏振影响部件和反射镜装置之间的重叠程度，以及用于拍摄的光耦合输出区域（630,730,830,930）考虑到偏振影响分量的可能的不正确的定位，将光从光学系统的光束路径耦合出来，使得光不会从镜子的部分区域进入投影曝光装置的光瞳平面 t在光学系统的操作期间。

2. 发明申请

WO2013135500A1 METHOD FOR ADJUSTING AN OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：调整微观投影曝光装置光学系统的方法
公开(公告)号：WO2013135500A1
公开(公告)日：2013-09-19
申请号：PCT/EP2013/054167
申请日：2013-03-01
申请人： CARL ZEISS SMT GMBH , SAENGER, Ingo , TRAUTER, Bastian
发明人： SAENGER, Ingo , TRAUTER, Bastian
IPC分类号： G03F7/20 , G02B26/08 , G02B27/28
CPC分类号： G03F7/70191 , G02B26/0833 , G02B27/286 , G03F7/70116 , G03F7/70141 , G03F7/70566
摘要： The invention relates to a method for adjusting an optical system in a microlithographic projection exposure apparatus, wherein the optical system comprises a mirror arrangement with a plurality of mirror elements, which can be adjusted independently from one another for changing an angular distribution of the light reflected by the mirror arrangement, and a polarization-influencing optical arrangement which has at least one polarization-influencing component, wherein it is possible to set in variable fashion a degree of overlap between the polarization-influencing component and the mirror arrangement by displacing this polarization-influencing component. A method according to the invention comprises the following steps: establishing, for a given actual position of the polarization-influencing component (111, 112, 113, 310, 320, 411, 511), a distribution of IPS values in a pupil plane of the projection exposure apparatus, wherein each IPS value denotes the degree of realization of a predetermined polarization state for a light ray reflected at a respective mirror element of the mirror arrangement (120, 200, 400, 500), and changing the position of the polarization-influencing component on the basis of the established distribution.
摘要翻译：本发明涉及一种用于在微光刻投影曝光装置中调整光学系统的方法，其中光学系统包括具有多个反射镜元件的反射镜装置，其可以彼此独立地调节，以改变反射光的角度分布以及具有至少一个偏振影响分量的偏振影响光学装置，其中可以以可变的方式设置偏振影响部件和反射镜装置之间的重叠程度，影响组件。根据本发明的方法包括以下步骤：针对偏振影响分量（111,112,113,310,320,411,511）的给定实际位置建立IPS值在瞳孔平面中的分布投影曝光装置，其中每个IPS值表示在反射镜装置（120,200,400,500）的各个反射镜元件处反射的光线的预定偏振态的实现程度，并且改变偏振的位置在确定的分配的基础上的影响组件。

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