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1. 发明申请

WO2007053338A3 SYSTEMS AND METHODS TO SHAPE LASER LIGHT AS A HOMOGENEOUS LINE BEAM FOR INTERACTION WITH A FILM DEPOSITED ON A SUBSTRATE 审中-公开
公开(公告)号：WO2007053338A3
公开(公告)日：2007-05-10
申请号：PCT/US2006/041137
申请日：2006-10-20
申请人： CYMER, INC. , AKINS, Robert, P. , SANDSTROM, Richard, L.
发明人： AKINS, Robert, P. , SANDSTROM, Richard, L.
IPC分类号： H01L21/336
摘要： Systems and methods are disclosed for shaping and homogenizing a laser beam for interaction with a film. The shaping and homogenizing system may include a lens array and a lens that is positioned to receive laser light from the lens array and produce a respective elongated image in a plane for each lens in the lens array. In addition, the system may include a beam stop having an edge that is positioned in the plane, and a moveable mount rotating a lens of the lens array to vary an alignment between one of the elongated images and the beam stop edge.

2. 发明申请

WO2005089130A3 A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
公开(公告)号：WO2005089130A3
公开(公告)日：2005-09-29
申请号：PCT/US2005/007056
申请日：2005-03-03
申请人： CYMER, INC. , AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
发明人： AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
IPC分类号： H01J35/20
摘要： An EUV light source apparatus (20) comprises a pulse laser (22) providing laser pulses (55) at a selected pulse repetition rate focused at a desired target ignition site (28); a target formation system (92) providing discrete targets (94); a target steering system (350) intermediate the target formation system (92) and the ignition site (28); a target tracking system (42) providing information about movement of the target (94) between the target formation system (92) and the target steering system (350); an electrostatic plasma containment apparatus (314) providing an electric plasma confinement field (316) at or near the ignition site (28) at the time of ignition; a vessel (30) having an intermediate wall (282) for passing EUV light; and a magnetic plasma confinement mechanism (329) creating a magnetic field (320) in the vicinity of the ignition site (28).

3. 发明申请

WO2009123733A1 SYSTEMS AND METHODS FOR FILTERING OUT-OF-BAND RADIATION IN EUV EXPOSURE TOOLS 审中-公开
标题翻译：用于在EUV接触工具中过滤带外辐射的系统和方法
公开(公告)号：WO2009123733A1
公开(公告)日：2009-10-08
申请号：PCT/US2009/002058
申请日：2009-04-01
申请人： CYMER, INC. , AKINS, Robert, P. , FOMENKOV, Igor, V.
发明人： AKINS, Robert, P. , FOMENKOV, Igor, V.
IPC分类号： A61N5/06
CPC分类号： G03F7/70566 , G02B5/0891 , G02B5/3075 , G03F7/70033 , H01J35/06 , H05G2/001
摘要： In a first aspect, an apparatus for exposing a substrate with EUV radiation is described herein which may comprise a target material; a laser source generating a laser beam having a wavelength, λ, for irradiating the target material to generate EUV radiation, the laser beam defining a primary polarization direction; at least one mirror reflecting the EUV radiation along a path to the substrate; and a polarization filter disposed along the path filtering at least a portion of light having the wavelength, λ.
摘要翻译：在第一方面，本文描述了一种用EUV辐射曝光衬底的装置，其可包括靶材料; 激光源，其产生具有用于照射所述目标材料以产生EUV辐射的波长λ的激光束，所述激光束限定主偏振方向; 至少一个反射EUV辐射的镜子沿着到衬底的路径; 以及偏振滤光器，沿着所述路径设置，对至少一部分具有波长λ的光进行滤波。

4. 发明申请

WO2007038216A3 WEB-BASED METHOD FOR INFORMATION SEARCHES 审中-公开
公开(公告)号：WO2007038216A3
公开(公告)日：2007-04-05
申请号：PCT/US2006/036876
申请日：2006-09-20
申请人： CYMER, INC. , AKINS, Robert, P. , KLENE, Brian, C. , CEFALO, Albert, P. , CRAY, William, C.
发明人： AKINS, Robert, P. , KLENE, Brian, C. , CEFALO, Albert, P. , CRAY, William, C.
IPC分类号： G06F17/30
摘要： A method of providing the service of obtaining information for a client is disclosed, which may comprise, providing a search service brokering internet location; providing an information search identification internet location accessible on or through the search service brokering internet location; providing an information search reference internet location associated with the information search identification internet location; and providing access to a searcher to the information search reference internet location to log in a reference. The search service brokering internet location may comprise a search service broker web-site; and the search identification internet location may comprise a search service broker web-site search web-page; and, the search reference internet location may comprise a search service broker web-site reference web-page. The method may also comprise date stamping the log in of a reference.

5. 发明公开

EP1726028A2 A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE 有权
标题翻译：用高重复率产生的等离子体EUV光源的激光
公开(公告)号：EP1726028A2
公开(公告)日：2006-11-29
申请号：EP05724572.2
申请日：2005-03-03
申请人： Cymer, Inc.
发明人： AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
IPC分类号： H01J35/20
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap.

6. 发明公开

EP2265333A1 SYSTEMS AND METHODS FOR FILTERING OUT-OF-BAND RADIATION IN EUV EXPOSURE TOOLS 审中-公开
标题翻译：系统和方法用于滤除带外辐射在EUV曝光工具
公开(公告)号：EP2265333A1
公开(公告)日：2010-12-29
申请号：EP09727332.0
申请日：2009-04-01
申请人： Cymer, Inc.
发明人： AKINS, Robert, P. , FOMENKOV, Igor, V.
IPC分类号： A61N5/06
CPC分类号： G03F7/70566 , G02B5/0891 , G02B5/3075 , G03F7/70033 , H01J35/06 , H05G2/001
摘要： In a first aspect, an apparatus for exposing a substrate with EUV radiation is described herein which may comprise a target material; a laser source generating a laser beam having a wavelength, λ, for irradiating the target material to generate EUV radiation, the laser beam defining a primary polarization direction; at least one mirror reflecting the EUV radiation along a path to the substrate; and a polarization filter disposed along the path filtering at least a portion of light having the wavelength, λ.

7. 发明授权

EP0669047B1 APPARATUS FOR, AND METHOD OF, MAINTAINING A CLEAN WINDOW IN A LASER 失效
标题翻译：为保持清洁的激光窗口的方法和装置
公开(公告)号：EP0669047B1
公开(公告)日：1999-01-20
申请号：EP93924408.3
申请日：1993-10-25
申请人： Cymer, Inc.
发明人： AKINS, Robert, P.
IPC分类号： H01S3/225 , H01S3/034 , H01S3/04
CPC分类号： H01S3/0346 , H01S3/0401 , H01S3/225
摘要： A first gas in a laser cavity is ionized by an electrical discharge in the cavity as a step in producing an energy radiation. Debris (particulates) is produced during the formation of the energy radiation. The radiation and the debris move toward an optical element in the cavity. The optical element may be a window or a mirror. The debris tends to deposit everywhere in the cavity, including on the optical element, thereby dirtying the optical element. This inhibits the efficiency in the laser operation. A clean gas is directed into the cavity through a passage (54) at a position displaced from the optical element (56). The clean gas then passes in the cavity through an orifice (65) further from the optical element than the passage. The flow of the first gas through the orifice creates a venturi effect on the clean gas to insure that the clean gas will move away from the optical element. In this way, the clean gas inhibits the first gas and the debris from moving to the optical element. Baffles (62) in the cavity between the passage and the orifice provide irregularities in the movement of the first gas from the orifice to the optical element, thereby further inhibiting the movement of the debris to the optical element. Baffles (68) in the cavity between the passage and the optical element also inhibit the movement of any gas to the optical element. An electrically grounded screen (66) in the displaced passage attracts any ions present in the clean gas.

8. 发明授权

EP1726028B1 A HIGH REPETITION RATE LASER PRODUCED PLASMA EUV LIGHT SOURCE 有权
标题翻译：用高重复率产生的等离子体EUV光源的激光
公开(公告)号：EP1726028B1
公开(公告)日：2014-05-21
申请号：EP05724572.2
申请日：2005-03-03
申请人： Cymer, Inc.
发明人： AKINS, Robert, P. , SANDSTROM, Richard, L. , PARTLO, William, N. , FOMENKOV, Igor, V. , STEIGER, Thomas, D. , ALGOTS, Martin, J. , BOWERING, Norbert, R. , JACQUES, Robert, N. , PALENSCHAT, Frederick, A. , SONG, Jun
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008

9. 发明授权

EP1952105B1 SYSTEMS AND METHODS TO SHAPE LASER LIGHT AS A HOMOGENEOUS LINE BEAM FOR INTERACTION WITH A FILM DEPOSITED ON A SUBSTRATE 有权转让
标题翻译： SYSTEM AND METHOD FOR相互作用的成形激光作为齐次线光束与A SUBSTRATE沉积膜
公开(公告)号：EP1952105B1
公开(公告)日：2012-04-04
申请号：EP06826398.7
申请日：2006-10-20
申请人： Cymer, Inc.
发明人： AKINS, Robert, P. , SANDSTROM, Richard, L.
IPC分类号： H01L21/336 , G02B3/00 , B23K26/06 , B23K26/067 , B23K26/073
CPC分类号： B23K26/0604 , B23K26/0608 , B23K26/066 , B23K26/067 , B23K26/0738 , G02B27/0966 , G02B27/0988 , G02B27/46
摘要： Systems and methods are disclosed for shaping and homogenizing a laser beam for interaction with a film. The shaping and homogenizing system may include a lens array and a lens that is positioned to receive laser light from the lens array and produce a respective elongated image in a plane for each lens in the lens array. In addition, the system may include a beam stop having an edge that is positioned in the plane, and a moveable mount rotating a lens of the lens array to vary an alignment between one of the elongated images and the beam stop edge.

10. 发明公开

EP1952105A2 SYSTEMS AND METHODS TO SHAPE LASER LIGHT AS A HOMOGENEOUS LINE BEAM FOR INTERACTION WITH A FILM DEPOSITED ON A SUBSTRATE 有权转让
标题翻译： SYSTEM AND METHOD FOR相互作用的成形激光作为齐次线光束与A SUBSTRATE沉积膜
公开(公告)号：EP1952105A2
公开(公告)日：2008-08-06
申请号：EP06826398.7
申请日：2006-10-20
申请人： Cymer, Inc.
发明人： AKINS, Robert, P. , SANDSTROM, Richard, L.
IPC分类号： G01J1/20
CPC分类号： B23K26/0604 , B23K26/0608 , B23K26/066 , B23K26/067 , B23K26/0738 , G02B27/0966 , G02B27/0988 , G02B27/46
摘要： Systems and methods are disclosed for shaping and homogenizing a laser beam for interaction with a film. The shaping and homogenizing system may include a lens array and a lens that is positioned to receive laser light from the lens array and produce a respective elongated image in a plane for each lens in the lens array. In addition, the system may include a beam stop having an edge that is positioned in the plane, and a moveable mount rotating a lens of the lens array to vary an alignment between one of the elongated images and the beam stop edge.

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