专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2008105988A3 LASER GAS INJECTION SYSTEM 审中-公开
公开(公告)号：WO2008105988A3
公开(公告)日：2008-09-04
申请号：PCT/US2008/001348
申请日：2008-02-01
申请人： CYMER, INC , DUNSTAN, Wayne, J. , O'BRIEN, Kevin, M. , JACQUES, Robert, N. , BESAUCELE, Herve, A. , RIGGS, Daniel, J. , RATNAM, Aravind
发明人： DUNSTAN, Wayne, J. , O'BRIEN, Kevin, M. , JACQUES, Robert, N. , BESAUCELE, Herve, A. , RIGGS, Daniel, J. , RATNAM, Aravind
IPC分类号： H01S3/22
摘要： A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality of laser operating Input and/or output parameters; utilizing a set of at least one parameter of utilization in the photolithography process to determine a gas use model in relation to the respective input or output parameter; predicting the end of gas life based upon the mod and a measurement of the respective input or output parameter. The parameter may comprise a pulse utilization pattern.

2. 发明申请

WO2013002970A1 SYSTEM AND METHOD FOR AUTOMATIC GAS OPTIMIZATION IN A TWO-CHAMBER GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：二室气体放电激光系统中自动气体优化的系统与方法
公开(公告)号：WO2013002970A1
公开(公告)日：2013-01-03
申请号：PCT/US2012/040933
申请日：2012-06-05
申请人： CYMER, INC. , O'BRIEN, Kevin, M. , THORNES, Joshua, J. , RIGGS, Daniel, J. , JIANG, Rui
发明人： O'BRIEN, Kevin, M. , THORNES, Joshua, J. , RIGGS, Daniel, J. , JIANG, Rui
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/104 , H01S3/2251 , H01S3/2366
摘要： A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser such as an excimer laser. The laser is continuously fired at a low power output, and the gas in the amplifier laser chamber bled until the discharge voltage meets/exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased, and the gas bled again until the voltage and pressure meet/exceed the minimum values. The laser is then fired in a burst pattern that approximates the expected firing of the laser in operation, and the gas bled until the discharge voltage meets/exceeds the minimum value and the output energy meets/exceeds a minimum value, again without dropping the pressure in the chamber below the minimum value. Once the minimum values are provided, the process runs quickly without manual interaction.
摘要翻译：一种用于在诸如准分子激光器的二室气体放电激光器的腔室中的再填充之后自动执行气体优化的系统和方法。激光器以低功率输出连续点火，并且放大器激光器室中的气体排出直到放电电压达到/超过最小值，而不将压力降低到最小值以下。功率输出增加，气体再次流出，直到电压和压力达到/超过最小值。然后以突发模式发射激光，其近似于操作中激光器的预期发射，并且气体流出直到放电电压达到/超过最小值，并且输出能量达到/超过最小值，同时不降低压力在室内低于最小值。一旦提供最小值，该过程即可快速运行，无需手动交互。

3. 发明申请

WO2013003193A1 SYSTEM AND METHOD FOR HIGH ACCURACY GAS REFILL IN A TWO CHAMBER GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：两台气体放电激光系统中高精度气体补充系统及方法
公开(公告)号：WO2013003193A1
公开(公告)日：2013-01-03
申请号：PCT/US2012/043541
申请日：2012-06-21
申请人： CYMER, INC. , JIANG, Rui , THORNES, Joshua, J. , RIGGS, Daniel, J. , O'BRIEN, Kevin, M.
发明人： JIANG, Rui , THORNES, Joshua, J. , RIGGS, Daniel, J. , O'BRIEN, Kevin, M.
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/22 , H01S3/225 , H01S3/2308 , H01S3/2366
摘要： Systems and methods for automatically performing a high accuracy gas refill, in a laser chamber of a two chamber gas discharge laser such as an excimer laser are disclosed. Based, upon a target pressure and halogen concentration that is either predetermined or entered by a user, and with no further user action, a non-halogen containing gas is added to the chamber to a first pressure, followed by the addition of halogen containing gas to a second pressure which is greater than a target pressure for the chamber, such that the halogen content in the gas at the second pressure is at a desired concentration. The gas in the chamber is bled until the pressure drops to the target pressure. The amount of non-halogen containing gas added is estimated automatically, and the amount of halogen containing gas is measured so that the desired concentration is obtained, taking into account both temperature and any gas remaining in the fill pipes from prior laser operation.
摘要翻译：公开了在诸如准分子激光器的二室气体放电激光器的激光室中自动执行高精度气体补充的系统和方法。基于目标压力和卤素浓度，其由用户预先确定或输入，并且在不再进一步的用户动作的情况下，将不含卤素的气体加入室中至第一压力，然后加入含卤素气体达到大于室的目标压力的第二压力，使得在第二压力下的气体中的卤素含量处于所需浓度。室内的气体流出，直到压力下降到目标压力。自动估算不含卤素气体的量，并测量含卤素气体的量，以便从先前的激光操作考虑到温度和填充管中剩余的任何气体，获得所需的浓度。

4. 发明申请

WO2008127599A2 METHOD AND APPARATUS FOR STABILIZING AND TUNING THE BANDWIDTH OF LASER LIGHT 审中-公开
标题翻译：用于稳定和调整激光光带宽度的方法和设备
公开(公告)号：WO2008127599A2
公开(公告)日：2008-10-23
申请号：PCT/US2008/004598
申请日：2008-04-09
申请人： CYMER, INC. (A NEVADA CORPORATION) , PARTLO, William, N. , JACQUES, Robert, N. , O'BRIEN, Kevin, M. , ISHIHARA, Toshihiko
发明人： PARTLO, William, N. , JACQUES, Robert, N. , O'BRIEN, Kevin, M. , ISHIHARA, Toshihiko
IPC分类号： H01S3/098 , H01S3/102
CPC分类号： H01S3/1055 , G02B27/646 , H01S3/137 , H01S3/139 , H01S3/225 , H01S2301/02
摘要： According to aspects of an embodiment of the disclosed subject matter, method and apparatus are disclose that ma y comprise adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, without utilizing any beam magnification control, or adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for other than bandwidth control, and adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for bandwidth control based on the error signal.
摘要翻译：根据所公开的主题的一个实施例的多个方面，公开了一种方法和装置，该方法和装置可以包括：基于所述误差信号，或用于控制除带宽之外的另一激光器工作参数，而不利用任何光束放大率控制，或基于误差信号调整用于带宽控制的种子激光器和放大器激光器中的气体放电之间的差分定时，或者用于控制除了带宽控制之外还利用光束放大率控制，以及根据误差信号调整用于带宽控制的种子激光器和放大器激光器中的气体放电之间的差分定时，或者为了控制其他激光器工作参数激光工作参数以外的带宽，同时利用光束放大控制进行带宽控制的基础上错误信号。

5. 发明申请

WO2011126992A1 METHOD AND APPARATUS FOR CONTROLLING LIGHT BANDWIDTH 审中-公开
标题翻译：控制光束带宽的方法和装置
公开(公告)号：WO2011126992A1
公开(公告)日：2011-10-13
申请号：PCT/US2011/031116
申请日：2011-04-04
申请人： CYMER, INC. , O'BRIEN, Kevin, M. , TRINTCHOUK, Fedor, B.
发明人： O'BRIEN, Kevin, M. , TRINTCHOUK, Fedor, B.
IPC分类号： H01S3/10
CPC分类号： H01S3/2308 , H01S3/134 , H01S3/225
摘要： An apparatus includes a light source that produces a light beam, a bandwidth measurement system, a plurality of bandwidth actuation systems, and a control system. Each bandwidth actuation system includes one or more bandwidth actuators and each bandwidth actuation system is connected to an optical feature that is optically coupled to the produced light beam and operable to modify the connected optical feature to select a bandwidth within a bandwidth range of the produced light beam. The control system is connected to the bandwidth measurement system and to the plurality of bandwidth actuation systems. The control system is configured to switch between activating and operating a first bandwidth actuation system and activating and operating a second bandwidth actuation system independently and separately of activating and operating the first bandwidth actuation system based on a provided bandwidth measurement and a selected target bandwidth.
摘要翻译：一种装置包括产生光束的光源，带宽测量系统，多个带宽致动系统和控制系统。每个带宽致动系统包括一个或多个带宽致动器，并且每个带宽致动系统连接到光学特征，该光学特征光学地耦合到所产生的光束并且可操作以修改所连接的光学特征，以在所产生的光的带宽范围内选择带宽光束。控制系统连接到带宽测量系统和多个带宽致动系统。控制系统被配置为在激活和操作第一带宽致动系统之间切换，并且基于所提供的带宽测量和所选择的目标带宽，独立且独立地激活和操作第一带宽致动系统来激活和操作第二带宽致动系统。

6. 发明公开

EP2137798A2 METHOD AND APPARATUS FOR STABILIZING AND TUNING THE BANDWIDTH OF LASER LIGHT 审中-公开
标题翻译：方法和设备用于稳定和调节激光的带宽
公开(公告)号：EP2137798A2
公开(公告)日：2009-12-30
申请号：EP08742695.3
申请日：2008-04-09
申请人： Cymer, Inc. (A Nevada Corporation)
发明人： PARTLO, William, N. , JACQUES, Robert, N. , O'BRIEN, Kevin, M. , ISHIHARA, Toshihiko
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G02B27/646 , H01S3/137 , H01S3/139 , H01S3/225 , H01S2301/02
摘要： According to aspects of an embodiment of the disclosed subject matter, method and apparatus are disclose that ma y comprise adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, without utilizing any beam magnification control, or adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for other than bandwidth control, and adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for bandwidth control based on the error signal.

7. 发明公开

EP2115834A2 LASER GAS INJECTION SYSTEM 审中-公开
标题翻译： LASERGASINJEKTIONSSYSTEM
公开(公告)号：EP2115834A2
公开(公告)日：2009-11-11
申请号：EP08713373.2
申请日：2008-02-01
申请人： Cymer, Inc.
发明人： DUNSTAN, Wayne, J. , O'BRIEN, Kevin, M. , JACQUES, Robert, N. , BESAUCELE, Herve, A. , RIGGS, Daniel, J. , RATNAM, Aravind
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , G03F7/70025 , G03F7/70525 , G03F7/70975 , H01S3/0014 , H01S3/1305 , H01S3/1306 , H01S3/134 , H01S3/2251 , H01S3/2256
摘要： A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality of laser operating input and/or output parameters; utilizing a set of at least one parameter of utilization in the photolithography process to determine a gas use model in relation to the respective input or output parameter; predicting the end of gas life based upon the model and a measurement of the respective input or output parameter. The parameter may comprise a pulse utilization pattern. The method and apparatus may comprise performing gas management for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas comprising: utilizing periodic and frequent partial gas refills comprising an inject comprising a mixture of halogen gas and bulk gas in generally the same ration as the premix ratio provided to the laser in a full gas refill, and in an amount less than two percent of the total gas pressure prior to the injection.

8. 发明公开

EP2556569A1 METHOD AND APPARATUS FOR CONTROLLING LIGHT BANDWIDTH 审中-公开
标题翻译：方法和设备控制光带宽
公开(公告)号：EP2556569A1
公开(公告)日：2013-02-13
申请号：EP11766562.0
申请日：2011-04-04
申请人： Cymer, Inc.
发明人： O'BRIEN, Kevin, M. , TRINTCHOUK, Fedor, B.
IPC分类号： H01S3/10
CPC分类号： H01S3/2308 , H01S3/134 , H01S3/225
摘要： An apparatus includes a light source that produces a light beam, a bandwidth measurement system, a plurality of bandwidth actuation systems, and a control system. Each bandwidth actuation system includes one or more bandwidth actuators and each bandwidth actuation system is connected to an optical feature that is optically coupled to the produced light beam and operable to modify the connected optical feature to select a bandwidth within a bandwidth range of the produced light beam. The control system is connected to the bandwidth measurement system and to the plurality of bandwidth actuation systems. The control system is configured to switch between activating and operating a first bandwidth actuation system and activating and operating a second bandwidth actuation system independently and separately of activating and operating the first bandwidth actuation system based on a provided bandwidth measurement and a selected target bandwidth.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式