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1. 发明申请

WO2003021728A2 VERY NARROW BAND, TWO CHAMBER, HIGH REP RATE GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：非常窄带，两个室，高倍率气体放电激光系统
公开(公告)号：WO2003021728A2
公开(公告)日：2003-03-13
申请号：PCT/US2002/027925
申请日：2002-08-28
申请人： CYMER, INC. (a Nevada corporation) , KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
发明人： KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
IPC分类号： H01S
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.
摘要翻译：一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。配置为MOPA并被专门用于集成电路光刻的光源的ArF准分子激光系统中的优选实施例。在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。主振荡器配备有具有非常快的调谐镜的线窄化封装，能够以4000Hz或更高的重复频率在脉冲到脉冲的基础上控制中心线波长，精度低于0.2μm。

2. 发明申请

WO2008127599A2 METHOD AND APPARATUS FOR STABILIZING AND TUNING THE BANDWIDTH OF LASER LIGHT 审中-公开
标题翻译：用于稳定和调整激光光带宽度的方法和设备
公开(公告)号：WO2008127599A2
公开(公告)日：2008-10-23
申请号：PCT/US2008/004598
申请日：2008-04-09
申请人： CYMER, INC. (A NEVADA CORPORATION) , PARTLO, William, N. , JACQUES, Robert, N. , O'BRIEN, Kevin, M. , ISHIHARA, Toshihiko
发明人： PARTLO, William, N. , JACQUES, Robert, N. , O'BRIEN, Kevin, M. , ISHIHARA, Toshihiko
IPC分类号： H01S3/098 , H01S3/102
CPC分类号： H01S3/1055 , G02B27/646 , H01S3/137 , H01S3/139 , H01S3/225 , H01S2301/02
摘要： According to aspects of an embodiment of the disclosed subject matter, method and apparatus are disclose that ma y comprise adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, without utilizing any beam magnification control, or adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for other than bandwidth control, and adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for bandwidth control based on the error signal.
摘要翻译：根据所公开的主题的一个实施例的多个方面，公开了一种方法和装置，该方法和装置可以包括：基于所述误差信号，或用于控制除带宽之外的另一激光器工作参数，而不利用任何光束放大率控制，或基于误差信号调整用于带宽控制的种子激光器和放大器激光器中的气体放电之间的差分定时，或者用于控制除了带宽控制之外还利用光束放大率控制，以及根据误差信号调整用于带宽控制的种子激光器和放大器激光器中的气体放电之间的差分定时，或者为了控制其他激光器工作参数激光工作参数以外的带宽，同时利用光束放大控制进行带宽控制的基础上错误信号。

3. 发明申请

WO2007038412A2 THERMAL-EXPANSION TOLERANT, PREIONIZER ELECTRODE FOR A GAS DISCHARGE LASER 审中-公开
标题翻译：耐热膨胀剂，气体放电激光用电极
公开(公告)号：WO2007038412A2
公开(公告)日：2007-04-05
申请号：PCT/US2006/037225
申请日：2006-09-25
申请人： CYMER, INC. (A NEVADA CORPORATION) , STEIGER, Thomas, D. , UJAZDOWSKI, Richard, C.
发明人： STEIGER, Thomas, D. , UJAZDOWSKI, Richard, C.
IPC分类号： H01S3/22 , H01S3/03 , H01S3/097 , H01S3/223
CPC分类号： H01S3/09713 , H01S3/036 , H01S3/0384 , H01S3/0385 , H01S3/0388 , H01S3/225
摘要： A corona-discharge type, preionizer assembly for a gas discharge laser is disclosed. The assembly may include an electrode and a hollow, dielectric tube that defines a tube bore. In one aspect, the electrode may include a first elongated conductive member having a first end disposed in the bore of the tube. In addition, the electrode may include a second elongated conductive member having a first end disposed in the bore and spaced from the first end of the first conductive member. For the assembly, the first and second conductive members may be held at a same voltage potential.
摘要翻译：公开了一种用于气体放电激光器的电晕放电型前置电离器组件。组件可以包括限定管孔的电极和中空的电介质管。在一个方面，电极可以包括第一细长导电构件，其具有设置在管孔中的第一端。此外，电极可以包括第二细长导电构件，其具有设置在孔中并与第一导电构件的第一端隔开的第一端。对于组件，第一和第二导电构件可以保持在相同的电压电位。

4. 发明申请

WO2013028272A1 ENERGY SENSORS FOR LIGHT BEAM ALIGNMENT 审中-公开
标题翻译：用于光束对准的能量传感器
公开(公告)号：WO2013028272A1
公开(公告)日：2013-02-28
申请号：PCT/US2012/046093
申请日：2012-07-10
申请人： CYMER, INC. ( A NEVADA CORPORATION) , GRAHAM, Matthew, R. , CHANG, Steven , CROUCH, James, H. , FOMENKOV, Igor, V.
发明人： GRAHAM, Matthew, R. , CHANG, Steven , CROUCH, James, H. , FOMENKOV, Igor, V.
IPC分类号： H05G2/00
CPC分类号： G03F7/70033 , H05G2/003 , H05G2/008
摘要： An apparatus includes a drive laser system producing an amplified light beam of pulses that travels along a drive axis; a beam delivery system that directs the amplified light beam of pulses toward a target region; a target material delivery system that provides a target mixture containing a target material in the target region; two or more sensors radially separated from a main axis that crosses the target region, the two or more sensors being configured to detect energy of ultraviolet electromagnetic radiation emitted from a plasma state of the target material when the amplified light beam of pulses intersects the target mixture; and a controller that receives the output from the two or more sensors. The controller is configured to estimate a relative radial alignment between the target mixture and the drive axis within the target region based on an analysis of the detected energy.
摘要翻译：一种装置包括驱动激光系统，其产生沿驱动轴线行进的放大的脉冲光束; 射束传送系统，其将放大的脉冲光束朝向目标区域引导; 目标材料输送系统，其在目标区域中提供含有靶材料的目标混合物; 两个或更多个传感器与跨越目标区域的主轴径向分离，两个或更多个传感器被配置为当被放大的脉冲光束与目标混合物相交时，检测从目标材料的等离子体状态发射的紫外电磁辐射的能量 ; 以及接收来自两个或更多个传感器的输出的控制器。控制器被配置为基于对所检测的能量的分析来估计目标混合物和目标区域内的驱动轴之间的相对径向对准。

5. 发明申请

WO2008130474A1 EXTENDABLE ELECTRODE FOR GAS DISCHARGE LASER 审中-公开
标题翻译：用于气体放电激光器的可扩展电极
公开(公告)号：WO2008130474A1
公开(公告)日：2008-10-30
申请号：PCT/US2008/003890
申请日：2008-03-25
申请人： CYMER, INC. (a Nevada Corporation) , SANDSTROM, Richard, L. , CHUNG, Tae, H. , UJAZDOWSKI, Richard, C.
发明人： SANDSTROM, Richard, L. , CHUNG, Tae, H. , UJAZDOWSKI, Richard, C.
IPC分类号： H01S3/097
CPC分类号： H01S3/038 , H01S3/0381 , H01S3/09705 , H01S3/0971 , H01S3/225 , H01S3/2366
摘要： Disclosed herein are systems and methods for extending one or both of the discharge electrodes in a transverse discharge gas laser chamber in which one or both the electrodes are subject to a dimensional change due to erosion. Electrode extension can be performed to increase the chamber life, increase laser performance over the life of the chamber, or both. Operationally, the inter-electrode spacing may be adjusted to maintain a specific target gap distance between the electrodes or to optimize a specific parameter of the laser output beam such as bandwidth, pulse-to-pulse energy stability, beam size, etc.
摘要翻译：本文公开了用于在横向放电气体激光室中延伸一个或两个放电电极的系统和方法，其中一个或两个电极由于侵蚀而经受尺寸变化。可以执行电极延伸以增加室的寿命，在室的寿命或两者都增加激光器性能。可操作地，可以调整电极间间隔以维持电极之间的特定目标间隙距离或者优化激光输出光束的特定参数，例如带宽，脉冲到脉冲能量稳定性，光束尺寸等。

6. 发明申请

WO2005013440A3 ELECTRODES FOR FLUORINE GAS DISCHARGE LASERS 审中-公开
公开(公告)号：WO2005013440A3
公开(公告)日：2005-02-10
申请号：PCT/US2004/022809
申请日：2004-07-16
申请人： CYMER, INC. (a Nevada corporation) , MORTON, Richard, G. , MOOSMAN, Bryan , DYER, Timothy , CARMICHAEL, James, A. , ZHANG, Jiping
发明人： MORTON, Richard, G. , MOOSMAN, Bryan , DYER, Timothy , CARMICHAEL, James, A. , ZHANG, Jiping
IPC分类号： H01S3/10 , H01S3/00 , H01S3/22
摘要： Fluorine gas discharge laser electrodes and electrode systems are disclosed that may comprise a plurality of current return tangs extending for less than the respective length of the second elongated gas discharge electrode. In addition disclosed are electrodes that may comprise a first discharge shaping magnet mounted in a first elongated gas discharge electrode and a second discharge shaping magnet mounted in a second elongated gas discharge electrode. This may also comprise at least one of the first and second gas discharge electrodes has imbedded therein a first and a second auxiliary field creating magnet. Also disclosed is an electrode that may comprise a crown straddling the centerline axis between the pair of side walls and the pair of end walls, comprising a first material, forming at least a portion of the discharge region of the electrode and a pair of elongated high erosion regions on either side of the crown comprising a second material with a relatively higher erosion rate during gas discharge than that of the first material. Also disclosed are electrodes that may comprise a first insert in the electrode body comprising an electrically conductive material having a different coefficient of thermal conductivity than the electrode body. Also disclosed are electrodes that may have a thin film of semi-conductive material coating at least the discharge footprint of the gas discharge electrode, or at least a portion of the discharge region covered with a pre-formed reef having generally uniform pore size and distribution, and methods of making such coatings or reef. Also disclosed is a method of forming an electrode by diffusion bonding a first piece of a first material to a second piece of a second material utilizing a diffusion bonding catalyst between the first piece of material and the second piece of material during the diffusion bonding step and machining the bonded pieces to form an electrode.

7. 发明授权

EP1929595B1 THERMAL-EXPANSION TOLERANT, PREIONIZER ELECTRODE FOR A GAS DISCHARGE LASER 有权转让
标题翻译：热膨胀容错VORIONISIERERELEKTRODE用于气体放LASER
公开(公告)号：EP1929595B1
公开(公告)日：2010-11-03
申请号：EP06804111.0
申请日：2006-09-25
申请人： Cymer, Inc. (A Nevada Corporation)
发明人： STEIGER, Thomas, D. , UJAZDOWSKI, Richard, C.
IPC分类号： H01S3/097 , H01S3/038 , H01S3/22
CPC分类号： H01S3/09713 , H01S3/036 , H01S3/0384 , H01S3/0385 , H01S3/0388 , H01S3/225
摘要： A corona-discharge type, preionizer assembly for a gas discharge laser is disclosed. The assembly may include an electrode and a hollow, dielectric tube that defines a tube bore. In one aspect, the electrode may include a first elongated conductive member having a first end disposed in the bore of the tube. In addition, the electrode may include a second elongated conductive member having a first end disposed in the bore and spaced from the first end of the first conductive member. For the assembly, the first and second conductive members may be held at a same voltage potential.

8. 发明公开

EP1929595A2 THERMAL-EXPANSION TOLERANT, PREIONIZER ELECTRODE FOR A GAS DISCHARGE LASER 有权转让
标题翻译：热膨胀容错VORIONISIERERELEKTRODE用于气体放LASER
公开(公告)号：EP1929595A2
公开(公告)日：2008-06-11
申请号：EP06804111.0
申请日：2006-09-25
申请人： Cymer, Inc. (A Nevada Corporation)
发明人： STEIGER, Thomas, D. , UJAZDOWSKI, Richard, C.
IPC分类号： H01S3/097
CPC分类号： H01S3/09713 , H01S3/036 , H01S3/0384 , H01S3/0385 , H01S3/0388 , H01S3/225
摘要： A corona-discharge type, preionizer assembly for a gas discharge laser is disclosed. The assembly may include an electrode and a hollow, dielectric tube that defines a tube bore. In one aspect, the electrode may include a first elongated conductive member having a first end disposed in the bore of the tube. In addition, the electrode may include a second elongated conductive member having a first end disposed in the bore and spaced from the first end of the first conductive member. For the assembly, the first and second conductive members may be held at a same voltage potential.

9. 发明公开

EP2137798A2 METHOD AND APPARATUS FOR STABILIZING AND TUNING THE BANDWIDTH OF LASER LIGHT 审中-公开
标题翻译：方法和设备用于稳定和调节激光的带宽
公开(公告)号：EP2137798A2
公开(公告)日：2009-12-30
申请号：EP08742695.3
申请日：2008-04-09
申请人： Cymer, Inc. (A Nevada Corporation)
发明人： PARTLO, William, N. , JACQUES, Robert, N. , O'BRIEN, Kevin, M. , ISHIHARA, Toshihiko
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G02B27/646 , H01S3/137 , H01S3/139 , H01S3/225 , H01S2301/02
摘要： According to aspects of an embodiment of the disclosed subject matter, method and apparatus are disclose that ma y comprise adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, without utilizing any beam magnification control, or adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for other than bandwidth control, and adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for bandwidth control based on the error signal.

10. 发明公开

EP2084500A2 DRIVE LASER DELIVERY SYSTEMS FOR EUV LIGHT SOURCE 有权
标题翻译： ANSTEUERLASER-输送系统EUV光源
公开(公告)号：EP2084500A2
公开(公告)日：2009-08-05
申请号：EP07838971.5
申请日：2007-09-27
申请人： Cymer, Inc. (A Nevada Corporation)
发明人： BYKANOV, Alexander N. , FOMENKOV, Igor V. , KHODYKIN, Oleh V. , ERSHOV, Alexander I.
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , H01S3/0064 , H01S3/073 , H01S3/0805 , H01S3/08054 , H01S3/08059 , H01S3/083 , H01S3/10092 , H01S3/105 , H01S3/1066 , H01S3/115 , H01S3/121 , H01S3/127 , H01S3/2232 , H01S3/2316 , H01S3/2325 , H01S3/2383 , H05G2/008
摘要： An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.

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