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1. 发明申请

WO2014090635A1 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的光学系统
公开(公告)号：WO2014090635A1
公开(公告)日：2014-06-19
申请号：PCT/EP2013/075383
申请日：2013-12-03
申请人： CARL ZEISS SMT GMBH , MAUL, Manfred
发明人： MAUL, Manfred
IPC分类号： G03F7/20 , G02B17/06 , G02B27/28
CPC分类号： G03F7/70191 , G02B5/3075 , G02B5/3091 , G02B17/06 , G02B27/28 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： The invention relates to an optical system of a microlithographic projection exposure apparatus, in particular for operation in the EUV, comprising a mirror arrangement (200) composed of a plurality of mutually independently adjustable mirror elements, and at least one polarization-influencing arrangement (100) arranged upstream of the mirror arrangement (200) relative to the light propagation direction, wherein the polarization-influencing arrangement (100) has a group of first reflection surfaces (111, 112,...) and a group of second reflection surfaces (121, 122,...), wherein the first reflection surfaces (111, 112,...) are tiltable independently of one another, and wherein, during the operation of the optical system, light reflected at respectively one of the first reflection surfaces (111, 112,...) can be directed onto the mirror arrangement (200) via respectively a different one of the second reflection surfaces (121, 122,...) depending on the tilting of said first reflection surface (111, 112,...).
摘要翻译：本发明涉及一种微光刻投影曝光装置的光学系统，特别是用于在EUV中操作的光学系统，包括由多个相互独立可调节的镜元件组成的反射镜装置（200）和至少一个偏振影响装置（100 ），其布置在所述反射镜装置（200）的相对于光传播方向的上游，其中所述偏振影响装置（100）具有一组第一反射表面（111,112，...）和一组第二反射表面 121,122，...），其中所述第一反射表面（111,112，...）彼此独立地倾斜，并且其中，在所述光学系统的操作期间，分别在所述第一反射根据所述第一反射冲浪的倾斜，可以分别通过不同的第二反射表面（121,122，...）将表面（111,112，...）引导到反射镜装置（200） ace（111,112，...）。

2. 发明申请

WO2017046136A1 ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY 审中-公开
标题翻译：投影光刻照明光学单元
公开(公告)号：WO2017046136A1
公开(公告)日：2017-03-23
申请号：PCT/EP2016/071653
申请日：2016-09-14
申请人： CARL ZEISS SMT GMBH
发明人： VAN GORKOM, Ramon , MERTENS, Bastiaan Matthias , BIELING, Stig , WISCHMEIER, Lars , MAUL, Manfred , ENDRES, Martin
IPC分类号： G03F7/20 , G02B5/09
CPC分类号： G03F7/70116 , G02B5/09 , G03F7/70075 , G03F7/701 , G03F7/702
摘要： An illumination optical unit for projection lithography serves for illuminating an object field (8), in which an object (12) to be imaged is arrangeable, along an illumination beam path. A first facet mirror (6) has first facets (21) for reflecting guidance of illumination light (3) and for arrangement in a used region of a far field of an EUV light source. A second facet mirror (7) serves for reflecting guidance of the illumination light (3) reflected by the first facet mirror (6) to the object field (8). The second facet mirror (7) has second facets (25) for guiding respectively one illumination light partial beam (26) into the object field (8). The first facet mirror (6) is arranged in a field plane (6a) of the illumination optical unit. The second facet mirror (7) is arranged at a distance from a field plane (6a) and from a pupil plane (12b) of the illumination optical unit. The two facet mirrors (6, 7) are arranged in relation to one another in such a way that at least some of the illumination light partial beams (26) are guided over first facets (21) of the first facet mirror (6) with seamlessly connected reflection surfaces. An illumination optical unit without the mandatory use of a MEMS mirror as first facet mirror emerges.
摘要翻译：用于投影光刻的照明光学单元用于照亮其中待成像对象（12）可以沿照明光束路径布置的物场（8）。第一刻面镜（6）具有第一刻面（21），用于反射照明光（3）的引导并用于安排在EUV光源的远场的使用区域中。第二面反射镜（7）用于将由第一刻面镜（6）反射的照明光（3）的引导反射到物场（8）。第二面反射镜（7）具有用于将一个照明光部分光束（26）引导到物场（8）中的第二刻面（25）。第一刻面镜（6）布置在照明光学单元的场平面（6a）中。第二刻面镜（7）被布置成距离场平面（6a）和照明光学单元的光瞳平面（12b）一定距离。这两个面反射镜（6,7）相对于彼此布置成使得至少一些照明光部分光束（26）被引导到第一分面反射镜（6）的第一小面（21）上，无缝连接的反射面。出现了没有必须使用MEMS反射镜作为第一小面镜的照明光学单元。

3. 发明申请

WO2014139872A1 ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY 审中-公开
标题翻译：投影光刻照明光学单元
公开(公告)号：WO2014139872A1
公开(公告)日：2014-09-18
申请号：PCT/EP2014/054422
申请日：2014-03-07
申请人： CARL ZEISS SMT GMBH
发明人： MAUL, Manfred
IPC分类号： G03F7/20 , G02B5/09 , G02B26/08
CPC分类号： G03F7/70566 , G02B5/09 , G02B27/0905 , G02B27/0983 , G03F7/70075 , G03F7/70116 , G03F7/70191
摘要： An illumination optical unit (4) for projection lithography serves to illuminate an object field (5), in which an object (7) to be imaged can be arranged, with illumination light (16). The illumination optical unit (4) comprises a field facet mirror (19) with a plurality of field facets (20). Furthermore, the illumination optical unit (4) comprises a pupil facet mirror (25) with a plurality of pupil facets. The field facets (20) are imaged in the object field (5) by a transfer optical unit (21, 25, 39). The at least one pupil facet mirror (25) has at least one pupil facet mirror polarization section (29, 30) and at least one pupil facet mirror neutral section (34). The polarization section (29, 30) is arranged in such a way that the illumination light is reflected in the region of a Brewster angle. The neutral section (34) is arranged in such a way that the illumination light (16) is reflected in the region of a normal incidence. What emerges is an illumination optical unit, in which the illumination of the object to be imaged can be designed in a flexible manner and can be adapted well to predetermined values.
摘要翻译：用于投影光刻的照明光学单元（4）用于照亮其中可以用照明光（16）布置要成像的物体（7）的物场（5）。照明光学单元（4）包括具有多个场面（20）的场面反射镜（19）。此外，照明光学单元（4）包括具有多个光瞳面的瞳孔面反射镜（25）。场面（20）通过传送光学单元（21,25,39）在物场（5）中成像。至少一个瞳孔面反射镜（25）具有至少一个光瞳面镜偏振部分（29,30）和至少一个瞳孔面镜面中立部分（34）。偏振部分（29,30）被布置成使得照明光在布鲁斯特角的区域中被反射。中性部分（34）以这样一种方式被布置，使得照明光（16）在正常入射的区域中被反射。出现的是照明光学单元，其中可以以灵活的方式设计要成像的物体的照明并且可以很好地适应于预定值。

4. 发明申请

WO2017050360A1 METHOD OF OPERATING A MICROLITHOGRAPHIC PROJECTION APPARATUS AND ILLUMINATIONS SYSTEM OF SUCH AN APPARATUS 审中-公开
标题翻译：微型投影装置的操作方法和这种装置的照明系统
公开(公告)号：WO2017050360A1
公开(公告)日：2017-03-30
申请号：PCT/EP2015/071826
申请日：2015-09-23
申请人： CARL ZEISS SMT GMBH
发明人： DEGÜNTHER, Markus , EISENMENGER, Johannes , HILT, Stefanie , KORB, Thomas , SCHLESENER, Frank , MAUL, Manfred
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70116 , G02B3/0062 , G02B26/0833 , G03F7/70075 , G03F7/7085
摘要： According to a method of operating an illumination System of a microlithographic projection apparatus, a spatial light modulator (52) having a modulation surface (222) is provided which is formed by a plurality of micromirrors (56). Each micromirror comprises a mirror surface (224-1-1 to 224-4-9) having an orientation that can be changed individually for each micromirror. For at least one of the micromirrors, at least one parameter that is related to the mirror surface is measured. The orientation of the mirror surfaces is controlled depending on the at least one measured parameter. A light pattern is produced on the modulation surface (222), and an image of the light pattern is formed on an optical Integrator (60) that has a plurality of light entrance facets (75). Finally, images of the light entrance facets (75) are superimposed on a mask (16).
摘要翻译：根据一种操作微光刻投影装置的照明系统的方法，提供了由多个微反射镜（56）形成的具有调制面（222）的空间光调制器（52）。每个微反射镜包括镜面（224-1-1至224-4-9），其具有可以针对每个微反射镜单独改变的取向。对于至少一个微镜，测量与镜面相关的至少一个参数。根据至少一个测量参数来控制镜面的取向。在调制面（222）上产生光图案，并且在具有多个光入射面（75）的光学积分器（60）上形成光图案的图像。最后，将光入射面（75）的图像叠加在掩模（16）上。

5. 发明申请

WO2013178432A1 ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY 审中-公开
标题翻译：投影光刻照明光学单元
公开(公告)号：WO2013178432A1
公开(公告)日：2013-12-05
申请号：PCT/EP2013/059383
申请日：2013-05-06
申请人： CARL ZEISS SMT GMBH
发明人： MAUL, Manfred
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G02B17/002 , G02B26/0816 , G03F7/70075 , G03F7/70091 , G03F7/70116 , G03F7/70191 , G03F7/702 , G03F7/70566
摘要： An illumination optical unit (32) for projection lithography serves for illuminating an object field (5), in which an object to be imaged can be arranged, with illumination light (14). The illumination optical unit has a collector for collecting the emission of a light source for the illumination light (14). The collector is arranged such that it transfers the illumination light (14) from the light source into an intermediate focus (16). The illumination optical unit (32) furthermore has a field facet mirror (20) and a pupil facet mirror (21), each having a plurality of facets (22, 23). The field facets (22) are imaged into the object field (5) by a transfer optical unit (21). The illumination optical unit (32) additionally has an individual-mirror array (17) having individual mirrors tiltable in a manner driven individually, said array being arranged upstream of the field facet mirror (20) and downstream of the intermediate focus (16) in an illumination beam path (26). The intermediate focus (16) is imaged via illumination channels (24), which are each formed by at least one of the individual mirrors and at least one of the field facets (22) and which guide a partial beam of the illumination light (14), into a spatial region (25) in which the pupil facet mirror (21) is situated. This results in illumination of the object to be imaged which can be designed in a flexible fashion and is readily adaptable to predetermined values.
摘要翻译：用于投影光刻的照明光学单元（32）用于照射具有照明光（14）的可成像对象的物场（5）。照明光学单元具有用于收集用于照明光（14）的光源的发射的集电体。收集器被布置成使得其将照明光（14）从光源传送到中间焦点（16）。照明光学单元（32）还具有场分面反射镜（20）和瞳孔面反射镜（21），每个具有多个小平面（22,23）。场面（22）通过传送光学单元（21）成像到物场（5）中。照明光学单元（32）另外具有单独反射镜阵列（17），其具有以单独驱动的方式可倾斜的各个反射镜，所述阵列布置在场面反射镜（20）的上游，并且在中间焦点（16）的下游位于照明光束路径（26）。中间聚焦（16）通过照明通道（24）成像，每个通道由各个反射镜和至少一个场面（22）中的至少一个形成，并且引导照明光（14）的部分光束）进入瞳孔面反射镜（21）所在的空间区域（25）。这导致待成像对象的照明，其可以灵活地设计并且易于适应于预定值。

6. 发明申请

WO2014139814A1 ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY 审中-公开
标题翻译：投影光刻照明光学单元
公开(公告)号：WO2014139814A1
公开(公告)日：2014-09-18
申请号：PCT/EP2014/054042
申请日：2014-03-03
申请人： CARL ZEISS SMT GMBH
发明人： MAUL, Manfred
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/702 , G02B19/0095 , G02B26/0833 , G03F7/70075 , G03F7/70116 , G03F7/70566
摘要： An illumination optical unit (4) for projection lithography serves for illuminating an object field (5), in which an object (7) to be imaged can be arranged, with illumination light (16). The illumination optical unit (4) has a field facet mirror (19) having a plurality of field facets (20). Furthermore, the illumination optical unit (4) has a pupil facet mirror (25) having a plurality of pupil facets. The field facets (20) are imaged into the object field (5) by a transfer optical unit (21, 25, 29a). The illumination optical unit (4) additionally has a deflection facet mirror (21 ) having a plurality of deflection facets, which is arranged in the illumination beam path between the field facet mirror (19) and the pupil facet mirror (25). This results in an illumination optical unit in which the illumination of the object to be imaged can be configured flexibly and can be adapted well to predefined values.
摘要翻译：用于投影光刻的照明光学单元（4）用于照亮其中可以用照明光（16）布置要成像的物体（7）的物场（5）。照明光学单元（4）具有具有多个场面（20）的场面反射镜（19）。此外，照明光学单元（4）具有瞳孔面反射镜（25），具有多个瞳孔面。场面（20）通过转移光学单元（21,25,29a）成像到物场（5）中。照明光学单元（4）还具有偏转面反射镜（21），该偏转小面镜具有多个偏转面，它们设置在场面反射镜（19）和瞳孔面反射镜（25）之间的照明光束路径中。这导致照明光学单元，其中可以灵活地配置要成像的对象的照明，并且可以很好地适应于预定义的值。

7. 发明申请

WO2014067812A1 EUV LIGHT SOURCE FOR GENERATING A USABLE OUTPUT BEAM FOR A PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：用于生成投影曝光装置的可用输出光束的EUV光源
公开(公告)号：WO2014067812A1
公开(公告)日：2014-05-08
申请号：PCT/EP2013/072043
申请日：2013-10-22
申请人： CARL ZEISS SMT GMBH
发明人： SÄNGER, Ingo , MAUL, Manfred , HENNERKES, Christoph , RUOFF, Johannes , KRÄHMER, Daniel
IPC分类号： G03F7/20 , G02B27/28 , G21K1/06 , H05H7/04
CPC分类号： H05G2/001 , G02B27/286 , G03F7/70033 , G03F7/70075 , G03F7/70116 , G03F7/70308 , G03F7/70566 , G21K1/06 , G21K1/062 , G21K1/16 , H01J35/00 , H05H7/04
摘要： An EUV light source (2) serves for generating a usable output beam (3) of EUV illumination light for a projection exposure apparatus (1) for projection lithography. The light source (2) has an EUV generation device (2c) which generates an EUV raw output beam. The latter is circularly polarized. For the purposes of setting the polarization of the usable output beam (3) and in respect of the polarization direction, a polarization setting device (32; 39) has a linearly polarizing effect on the raw output beam. This results in an EUV light source, which provides an improved output beam for a resolution-optimized illumination.
摘要翻译： EUV光源（2）用于产生用于投影光刻的投影曝光装置（1）的EUV照明光的可用输出光束（3）。光源（2）具有产生EUV原始输出光束的EUV生成装置（2c）。后者是圆极化的。为了设定可使用的输出光束（3）的极化和偏振方向的偏振，偏光设定装置（32; 39）对原始输出光束具有线性偏振效果。这导致EUV光源，其提供用于分辨率优化照明的改进的输出光束。

8. 发明公开

EP2382510A1 BELEUCHTUNGSSYSTEM FÜR DIE MIKRO-LITHOGRAPHIE 有权
标题翻译： BELEUCHTUNGSSYSTEMFÜRDIE MIKRO-LITHOGRAPHIE
公开(公告)号：EP2382510A1
公开(公告)日：2011-11-02
申请号：EP10701208.0
申请日：2010-01-25
申请人： Carl Zeiss SMT GmbH
发明人： SCHOLZ, Axel , SCHLESENER, Frank , HAVERKAMP, Nils , DAVYDENKO, Vladimir , GERHARD, Michael , ZIEGLER, Gerhard-Wilhelm , KERN, Mirco , BISCHOFF, Thomas , STAMMLER, Thomas , KELLNER, Stephan , MAUL, Manfred , WALLDORF, Daniel , HUREVICH, Igor , DEGÜNTHER, Markus
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02B3/0043 , G03F7/70058 , G03F7/70075 , G03F7/70083
摘要： An illumination system for microlithography is used to illuminate an illumination field by the illumination light of a primary light source. A first grid assembly (12) has bundle-shaped first grid elements (24) that are arranged in a first plane of the illumination system or neighboring the same. The first grid assembly (12) is used to create a grid assembly of secondary light sources. A transmission lens is used for the superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission lens has a second grid assembly (15) having bundle-shaped second grid elements (26). Each of the grid elements (24) of the first grid assembly (12) is associated with one of the grid elements (26) of the second grid assembly (15) for guiding a partial bundle (25) of an entire bundle of the illumination light. For example, the first grid assembly (12) has at least two types (I, II, III) of the first grid elements (24), which differ in their bundle-influencing effect. The grid elements (24, 26) of the two grid assemblies (12, 15) are arranged in relation to one another such that every grid element type (I through III) is associated with at least one individual distance (Δ
I , Δ
II , Δ
III ) between the first grid element (24) of said type (I through III) and the associated second grid element (26) of the second grid assembly (15). The result is an illumination system by means of which an influence of specific illumination parameters is possible, if possible without the undesirable influence of other illumination parameters.
摘要翻译：用于微光刻的照明系统用于利用初级光源的照明光照射照明场。第一光栅装置具有布置在照明系统的第一平面中或与平面相邻的束形成第一光栅元件。第一光栅布置用于产生二次光源的光栅布置。传输光学器件用于将二次光源的照明光的叠加传输到照明场。透射光学器件具有第二光栅装置，其具有束形成第二光栅元件。在每种情况下，第一光栅装置的光栅元件之一被分配给第二光栅装置的光栅元件之一，用于引导整束照明光的部分光束。例如，第一光栅布置具有至少两种具有不同束影响效果的第一光栅元件（I，II，III）。两个光栅布置的光栅元件相对于彼此布置，使得每个光栅元素类型（I至III）被分配至少一个单独的距离（＆Dgr; I，＆Dgr; II，＆Dgr; III）这种类型的第一光栅元素（I至III）和第二光栅排列的分配的第二光栅元素。结果，获得允许特定照明参数受到影响的照明系统，使得最大限度地避免对其他照明参数的不期望的影响。

9. 发明授权

EP1716458B1 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 失效转让
标题翻译：灯光系统的微光刻投射曝光装置
公开(公告)号：EP1716458B1
公开(公告)日：2011-06-01
申请号：EP05707395.9
申请日：2005-02-15
申请人： Carl Zeiss SMT GmbH
发明人： FIOLKA, Damian , MAUL, Manfred , SCHOLZ, Axel , DEGÜNTHER, Markus , WANGLER, Johannes
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G03B27/54 , G03F7/70075 , G03F7/70108
摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source (14), a first optical raster element (62; 62'; 62''; 62''') and a second optical raster element (64; 90; 90''; 100). The first optical raster element extends in a first pupil plane (28) of the illumination system (10) and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane (28) of the illumination system, which is not necessarily different from the first pupil plane (28), and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This allows to improve the irradiance uniformity in a reticle plane (46).

10. 发明授权

EP2915007B1 EUV LIGHT SOURCE FOR GENERATING A USABLE OUTPUT BEAM FOR A PROJECTION EXPOSURE APPARATUS 有权
公开(公告)号：EP2915007B1
公开(公告)日：2019-05-08
申请号：EP13779605.8
申请日：2013-10-22
申请人： Carl Zeiss SMT GmbH
发明人： SÄNGER, Ingo , MAUL, Manfred , HENNERKES, Christoph , RUOFF, Johannes , KRÄHMER, Daniel
IPC分类号： G03F7/20 , G02B27/28 , G21K1/06 , H05H7/04 , G21K1/16 , H01J35/00 , H05G2/00

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