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1. 发明申请

WO2020064223A1 METHOD AND APPARATUS FOR DETERMINING THE HEATING STATE OF AN OPTICAL ELEMENT IN A MICROLITHOGRAPHIC OPTICAL SYSTEM 审中-公开
公开(公告)号：WO2020064223A1
公开(公告)日：2020-04-02
申请号：PCT/EP2019/072210
申请日：2019-08-20
申请人： CARL ZEISS SMT GMBH , WOLF, Alexander , GRUNER, Toralf , HARTJES, Joachim , ZOTT, Andy
发明人： WOLF, Alexander , GRUNER, Toralf , HARTJES, Joachim , ZOTT, Andy
IPC分类号： G03F7/20 , G01K11/00 , G02B7/18
摘要： The invention relates to a method and an apparatus for determining the heating state of an optical element in a microlithographic optical system, wherein the method includes the following steps: producing, using a light source (303), a first partial beam (310) that is transmitted through the optical element (200, 300) and a second partial beam (320) that is not transmitted through the optical element, and determining the heating state of the optical element on the basis of a measurement of the time-of-flight difference between the first partial beam and the second partial beam, wherein the first partial beam (310) and the second partial beam (320) are reflected at different faces of the optical element (200, 300).

2. 发明申请

WO2019233685A1 COMPUTER-GENERIERTES HOLOGRAMM (CGH), SOWIE VERFAHREN ZUR CHARAKTERISIERUNG DER OBERFLÄCHENFORM EINES OPTISCHEN ELEMENTS 审中-公开
公开(公告)号：WO2019233685A1
公开(公告)日：2019-12-12
申请号：PCT/EP2019/061533
申请日：2019-05-06
申请人： CARL ZEISS SMT GMBH , HETZLER, Jochen , WOLF, Alexander
发明人： HETZLER, Jochen , WOLF, Alexander
IPC分类号： G03F7/20 , G01B9/02 , G01M11/00 , G01M11/02 , G01B11/24 , G03H1/22
摘要： Die Erfindung betrifft ein Computer-generiertes Hologramm (CGH) sowie ein Verfahren zur Charakterisierung der Oberflächenform eines optischen Elements. Gemäß einem Aspekt weist ein CGH einen wenigstens eine Nutzstruktur (A) aufweisenden ersten Bereich (121, 321, 421) und einen von diesem ersten Bereich (121, 321, 421) räumlich separierten zweiten Bereich (122, 322, 422) auf, wobei dieser zweite Bereich einen Kontrollbereich zur Detektion einer sich auf dem CGH (120, 320, 420, 520) ausbildenden Kontamination bildet.

3. 发明申请

WO2019057803A1 IMAGING OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE FIELD 审中-公开
公开(公告)号：WO2019057803A1
公开(公告)日：2019-03-28
申请号：PCT/EP2018/075420
申请日：2018-09-20
申请人： CARL ZEISS SMT GMBH
发明人： RUOFF, Johannes , BEDER, Susanne , ROSTALSKI, Hans-Jürgen , WOLF, Alexander
IPC分类号： G02B17/06 , G03F7/20
摘要： An imaging optical unit (7) serves for imaging an object field (4) into an image field (8). Here, a plurality of mirrors (M1 to M10) serve to guide imaging light (3) along an imaging beam path. The plurality of mirrors (M1 to M10) comprise a number of mirrors (M2 to M8) for grazing incidence (GI mirrors), which deflect a chief ray (16) of a central object field point with an angle of incidence of more than 45°. At least two of the GI mirrors (M2 to M8) are arranged in the imaging beam path as basic GI mirrors (M2 to M7) in such a way that the deflection effect thereof adds up for the chief ray. At least one further GI mirror (M2 to M8) is arranged in the imaging beam path as a counter GI mirror (M8) in such a way that the deflection effect thereof acts in subtractive fashion for the chief ray (16) in relation to the deflection effect of the basic GI mirrors (M2 to M7). This results in an imaging optical unit, the arrangement flexibility of which in relation to an installation space claimed by mirror bodies of the mirrors of the imaging optical unit is increased.

4. 发明申请

WO2013075923A1 CORRECTING AN INTENSITY OF AN ILLUMINATION BEAM 审中-公开
标题翻译：校正照明光束的强度
公开(公告)号：WO2013075923A1
公开(公告)日：2013-05-30
申请号：PCT/EP2012/071675
申请日：2012-11-02
申请人： CARL ZEISS SMT GMBH
发明人： WOLF, Alexander , BITTNER, Boris , GÖHNERMEIER, Aksel , SCHNEIDER, Sonja
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70091 , G03F7/70191
摘要： A correction device (23) serves for influencing an intensity of a beam (3) of illumination light of an illumination system of a projection exposure apparatus. The correction device (23) comprises an ejection device (26) comprising at least one ejection channel (27) for attenuating bodies (28) which are attenuating for the illumination light. A collecting device (32) serves for collecting the ejected attenuating bodies (28). The ejection device (26) and the collecting device (32) are designed and arranged for the passage of the illumination light beam (3) through a trajectory (38) of the attenuating bodies (28) between the ejection device (26) and the collecting device (32). A control device (30), which is signal-connected (31) to the ejection device (26), serves for predefining ejection instants for ejecting in each case at least one attenuating body (28) from the at least one ejection channel (27). The result is a correction device for influencing the intensity of an illumination light beam which makes possible better spatial influencing in comparison with the known correction devices.
摘要翻译：校正装置（23）用于影响投影曝光装置的照明系统的照明光束（3）的强度。校正装置（23）包括喷射装置（26），该喷射装置（26）包括至少一个用于对照明光衰减的衰减体（28）的喷射通道（27）。收集装置（32）用于收集所弹出的衰减体（28）。喷射装置（26）和收集装置（32）被设计和布置成使得照明光束（3）经过喷射装置（26）和喷射装置（26）之间的衰减体（28）的轨迹（38）收集装置（32）。向喷射装置（26）信号连接（31）的控制装置（30）用于预先限定用于在每种情况下从至少一个排出通道（27）至少一个衰减体（28）喷射的喷射时刻）。结果是用于影响照明光束的强度的校正装置，其与已知的校正装置相比可以更好地进行空间影响。

5. 发明申请

WO2021069140A1 DEVICE AND METHOD FOR SHIELDING COMPONENTS TO BE THERMALLY INSULATED IN MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUSES 审中-公开
公开(公告)号：WO2021069140A1
公开(公告)日：2021-04-15
申请号：PCT/EP2020/073741
申请日：2020-08-25
申请人： CARL ZEISS SMT GMBH
发明人： GRUNER, Toralf , HARTJES, Joachim , WOLF, Alexander
IPC分类号： G03F7/20
摘要： The invention relates to a microlithographic projection exposure apparatus, in particular for the DUV range (400) or for the EUV range (300), comprising a movable shield (100) and at least one component (110, 210) to be thermally insulated. The movable shield (100) is configured, in an operating pause of the microlithographic projection exposure apparatus (300, 400), for example in the case of maintenance, to lengthen the time duration in which the temperature of the component (110, 210) to be thermally insulated approaches the ambient temperature. The invention additionally relates to a method for thermally insulating at least one component (110, 210) of a microlithographic projection exposure apparatus (300, 400). Firstly, the light source (301, 406) is switched off or shaded in an operating pause of the microlithographic projection exposure apparatus (300, 400). Afterward, the movable shield (100) is moved from a rest position into a functional position in such a way that in the functional position the component (110, 210) to be thermally insulated is enclosed at least regionally by the movable shield (100).

6. 发明申请

WO2016102671A1 OPTICAL COMPONENT 审中-公开
标题翻译：光学元件
公开(公告)号：WO2016102671A1
公开(公告)日：2016-06-30
申请号：PCT/EP2015/081166
申请日：2015-12-23
申请人： CARL ZEISS SMT GMBH
发明人： PATRA, Michael , WOLF, Alexander , SCHWAB, Markus , GRUNER, Toralf , HARTJES, Joachim
IPC分类号： G03F7/20
CPC分类号： G02B27/283 , B29C55/023 , G02F1/1333 , G02F1/29 , G02F1/315 , G03F7/70033 , G03F7/702 , G03F7/70208 , G03F7/70558 , G03F7/70991
摘要： An optical component (42) for coupling out an individual output beam (10 i ) from a collective output beam (8) comprises a plurality of radiation-reflecting regions (43 i ) which are grouped in such a way that regions (43 i ) of the same group (i) serve for guiding different partial beams (12 i ) of the individual output beam (10 i ) to the same scanner (3 i ).
摘要翻译：用于从集体输出光束（8）耦合出独立输出光束（10i）的光学部件（42）包括多个辐射反射区域（43i），这些辐射反射区域以相同方式组合的区域（43i）组（i）用于将各个输出光束（10i）的不同部分光束（12i）引导到同一扫描器（3i）。

7. 发明申请

WO2016062499A1 BELEUCHTUNGSOPTIK FÜR DIE EUV-PROJEKTIONSLITHOGRAFIE 审中-公开
标题翻译：照明光学系统的EUV投影光刻
公开(公告)号：WO2016062499A1
公开(公告)日：2016-04-28
申请号：PCT/EP2015/072334
申请日：2015-09-29
申请人： CARL ZEISS SMT GMBH
发明人： WOLF, Alexander , GRUNER, Toralf
IPC分类号： G03F7/20 , G02B27/42
CPC分类号： G03F7/70916 , G02B27/42 , G03F7/70108 , G03F7/702 , G03F7/70308 , G03F7/70316
摘要： Eine Beleuchtungsoptik für die EUV-Projektionslithografie zur Beleuchtung eines Beleuchtungsfeldes mit EUV-Nutzlicht (12) einer EUV-Licht- quelle (2) hat eine optische Baugruppe (13) zur Überführung emittierter EUV-Strahlung der Lichtquelle (2) in einen Zwischenfokus (Z). Die optische Baugruppe (13) hat ein im Strahlengang der EUV-Strahlung (12) angeordnetes Photonensieb (16). Es resultiert eine hinsichtlich ihrer Standfestigkeit bei der Nutzung mit EUV-Lichtquellen verbesserte Beleuchtungsoptik.
摘要翻译：具有用于EUV投射光刻的照明光学部件，用于与EUV光源（2）的光学组件（13）的EUV-有用的光（12），用于在中间焦点转换所述光源（2）发射的EUV辐射照明的照明场（Z ）。所述光学组件（13）具有一个在EUV辐射（12）的光束路径中布置光子筛（16）。其结果是相对于它们的稳定性，在使用EUV光源的照明光学部件的改进。

8. 发明申请

WO2014154229A1 MICROLITHOGRAPHIC APPARATUS AND METHOD OF VARYING A LIGHT IRRADIANCE DISTRIBUTION 审中-公开
标题翻译：微光学设备和改变光线辐射分布的方法
公开(公告)号：WO2014154229A1
公开(公告)日：2014-10-02
申请号：PCT/EP2013/000952
申请日：2013-03-28
申请人： CARL ZEISS SMT GMBH
发明人： WALTER, Holger , WOLF, Alexander
IPC分类号： G03F7/20 , G02B27/58
CPC分类号： G03F7/70883 , G02B27/58 , G03F7/70091 , G03F7/70266 , G03F7/70308
摘要： A microlithographic apparatus (10) comprises an objective (20) that comprises a transmission filter (42) that is configured to variably modify a light irradiance distribution in a projection light path. The transmission filter (42) comprises a plurality of gas outlet apertures (44, 144) that are configured to emit gas flows (72, 172) that pass through a space (55) through which projection light (PL) propagates during operation of the microlithographic apparatus (10). The transmission filter (42) further comprises a control unit (48) which is configured to vary a number density of ozone molecules in the gas flows (72, 172) individually for each gas flow. In this manner it is possible to finally adjust the transmittance distribution (TD42) of the transmission filter (42).
摘要翻译：微光刻设备（10）包括物镜（20），其包括被配置为可变地修改投影光路中的光照度分布的透射滤光器（42）。传输过滤器（42）包括多个气体出口孔（44,144），其被配置成发射通过空间（55）的气流（72,172），在空间（55）中，投影光（PL）在操作期间传播通过该空间微光刻设备（10）。透射过滤器（42）还包括控制单元（48），其被配置为针对每个气体流量分别改变气体流（72,172）中的臭氧分子的数量密度。以这种方式，可以最终调整透射过滤器（42）的透射率分布（TD42）。

9. 发明申请

WO2014139990A1 PROJECTION EXPOSURE APPARATUS WITH A HIGHLY FLEXIBLE MANIPULATOR 审中-公开
标题翻译：投影曝光装置与高灵活的操纵器
公开(公告)号：WO2014139990A1
公开(公告)日：2014-09-18
申请号：PCT/EP2014/054662
申请日：2014-03-11
申请人： CARL ZEISS SMT GMBH
发明人： WOLF, Alexander , GRUNER, Toralf , BITTNER, Boris , WABRA, Norbert
IPC分类号： G03F7/20
CPC分类号： G03F7/706 , G03F7/70266 , G03F7/70308 , G03F7/70891
摘要： The invention relates to a projection exposure apparatus (1) for semiconductor lithography, comprising at least one manipulator (10) for reducing image aberrations, wherein the manipulator (10) has at least two optical elements (101, 102) that can be positioned relative to one. another, wherein at least one of the optical elements (101, 102) is spatially dependent in terms of its effect on an optical wavefront. passing therethrough such that a local phase change of a wavefront propagating in the optical system is produced in the case of a relative movement of the optical elements (101, 102) against one another. Here, the spatially dependent effect of the at least one optical element (101, 102) can be set in a reversible dynamic manner.
摘要翻译：本发明涉及一种用于半导体光刻的投影曝光装置（1），包括至少一个用于减小图像像差的操纵器（10），其中所述操纵器（10）具有至少两个可相对定位的光学元件（101,102）到一个另一个，其中至少一个光学元件（101,102）在其对光学波前的影响方面是空间上依赖的。在光学元件（101,102）彼此相对运动的情况下产生在光学系统中传播的波阵面的局部相位变化。这里，可以以可逆的动态方式设置至少一个光学元件（101,102）的空间依赖的影响。

10. 发明申请

WO2021115789A1 PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY 审中-公开
公开(公告)号：WO2021115789A1
公开(公告)日：2021-06-17
申请号：PCT/EP2020/083370
申请日：2020-11-25
申请人： CARL ZEISS SMT GMBH
发明人： HARTJES, Joachim , WOLF, Alexander , GRUNER, Toralf
IPC分类号： G03F7/20 , G02B7/18
摘要： The invention relates to a projection exposure apparatus (1) for semiconductor lithography, comprising a mirror (50), wherein the mirror (50) comprises at least one cutout (53), a temperature-regulating device (30,40) for regulating temperature on the basis of radiation comprising a temperature-regulating body (31,41), which is arranged without contact in the cutout (53) of the mirror (50) and which has a cavity (33,43). According to the invention, a fluid (39) for temperature regulation of the temperature- regulating body (31) is present in the cavity (33,43).

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