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1. 发明专利

JP2556559B2 失效
公开(公告)号：JP2556559B2
公开(公告)日：1996-11-20
申请号：JP22600488
申请日：1988-09-09
申请人： CANON KK
发明人： NOSE TETSUSHI , ABE NAOTO
IPC分类号： G01B11/14 , G03F9/00 , H01L21/027 , H01L21/30

2. 发明专利

JP2556126B2 失效
公开(公告)号：JP2556126B2
公开(公告)日：1996-11-20
申请号：JP3674089
申请日：1989-02-16
申请人： CANON KK
发明人： OOWADA MITSUTOSHI , MATSUGI MASAKAZU , SUDA SHIGEYUKI , YOSHII MINORU , NIWA JUKICHI , NOSE TETSUSHI , SAITO KENJI
IPC分类号： G01B11/14 , G03F9/00 , H01L21/027 , H01L21/30

3. 发明专利

JPH07209200A INSPECTION DEVICE AND PRODUCTION OF SEMICONDUCTOR DEVICE USING THE SAME 失效
公开(公告)号：JPH07209200A
公开(公告)日：1995-08-11
申请号：JP1489794
申请日：1994-01-13
申请人： CANON KK
发明人： SUZUKI MASAYUKI , TSUJI TOSHIHIKO , MIYAZAKI KYOICHI , TAKEUCHI SEIJI , NOSE TETSUSHI , YOSHII MINORU
IPC分类号： G01N21/88 , G01B11/30 , G01N21/94 , G01N21/956 , G03F1/84 , H01L21/66
摘要： PURPOSE:To detect the presence or position of the foreign matter on an inspection surface by providing a scanning system having a refractive power forming spots at distances different with respect to a main scanning direction. CONSTITUTION:A beam expander 2 enlarges the diameter of the laser beam from a light source 1 to emit the laser beam as parallel beam and a scanning lens system 4 condenses the beam flux from a polygon mirror 3 to form spots SP on an inspection surface 6. When foreign matter is present on the inspection surface 6, reflected scattered beam is generated and condensed to a photodetector 8 to be photoelectrically converted. A signal processing means MP uses the output signal of the photodetector 8 to judge the presence of the foreign matter on the inspection surface 6. A lens system 4 has rotary asymmetric refractive power forming respective spots SP at distance different from the lens system 4 in the main scanning direction 5 on the inspection surface 6 and performs beam scanning in the main scanning direction 5 and, by moving the inspection surface 6 in a sub-scanning direction 5a, the presence of foreign matter is inspected on the entire surface of the inspection surface 6.

4. 发明专利

JPH07130645A MASK FOR X-RAY EXPOSURE AND X-RAY ALIGNER USING SAME 失效
公开(公告)号：JPH07130645A
公开(公告)日：1995-05-19
申请号：JP29895493
申请日：1993-11-04
申请人： CANON KK
发明人： NOSE TETSUSHI , MAEHARA HIROSHI
IPC分类号： G03F1/22 , G03F7/20 , H01L21/027 , G03F1/16
摘要： PURPOSE:To enable alignment of a mask and a wafer with high precision, by forming a circuit pattern and an alignment pattern on an X-ray transmission mask, for an X-ray exposure mask, and forming a metal layer for shielding an alignment beam with which the alignment pattern is irradiated, in the area where the circuit pattern is formed. CONSTITUTION:As to a mask XM for X-ray exposure, a circuit pattern and an alignment pattern are formed on an X-ray transmission film 32, and a metal film 21 for shielding an alignment beam is formed in an circuit pattern area 27. When the alignment beam is made to enter an alignment pattern area 28 from above the mask XM for X-ray exposure, the alignment beam does not enter a circuit pattern composed of X-ray absorber 25 in the circuit pattern area 27, because the beam is shielded by the metal film 21. Hence it can be prevented that scattering light is generated from the circuit pattern and enters an alignment detection system, so that the highly precise alignment with the wafer is enabled. Thereby a mask for X-ray exposure capable of highly precise alignment can be realized.

5. 发明专利

JPH06317534A INSPECTION DEVICE AND METHOD, AND SYSTEM THEREWITH 失效
公开(公告)号：JPH06317534A
公开(公告)日：1994-11-15
申请号：JP9954193
申请日：1993-04-26
申请人： CANON KK
发明人： TSUJI TOSHIHIKO , TAKEUCHI SEIJI , MIYAZAKI KYOICHI , YOSHII MINORU , NOSE TETSUSHI , MORI TETSUZO
IPC分类号： G01B11/24 , G01B11/30 , G01N21/88 , G01N21/94 , G01N21/956
摘要： PURPOSE:To detect micro foreign mater or defects at a high S/N ratio by radiating two light fluxes, which are different from each other in polarization status and wavelength, on the inspection position and generating a heterodyne interference between one light flux in which the polarization status of scattered light changed and the other light flux. CONSTITUTION:A laser beam 12a is led through an optical scanning system consisting of a scanning mirror 13 and an ftheta lens system 14 and then it is divided into a P polarization laser beam 15a and an S polarization laser beam 15b through a polarization beam splitter 15. The beam 15a is set by a filter system 16 in a manner to have an intensity most suitable to the foreign matter inspection and it is converged on an inspection surface 21 by a mirror 18 to form a spot 20. On the other hand, the beam 15b is also converged on the spot 20 on the surface of a face to be inspected 21 by a mirror 19 after passing through a filter system 17. Then, a P-polarized zero-th order diffracted light 23 out of the scattered light, which are directed in a photoelectric detector 29 direction from the spot 20, and a P-polarized element of backscattered light 24 caused by foreign matter or defects generate heterodyne interference because of the alignment of polarization plane, so that only the scattered light caused by the foreign matters or defects can be detected as a beat signal.

6. 发明专利

JPH06207808A OPTICAL HETERODYNE INTERFERENCE MEASURING APPARATUS 失效
公开(公告)号：JPH06207808A
公开(公告)日：1994-07-26
申请号：JP28019293
申请日：1993-10-12
申请人： CANON KK
发明人： CHITOKU KOICHI , MATSUMOTO TAKAHIRO , SAITO KENJI , NOSE TETSUSHI , TSUJI TOSHIHIKO , YOSHII MINORU
IPC分类号： G01B9/02 , G01B11/00 , G01J9/04 , G03F9/00
摘要： PURPOSE:To enable highly accurate measurement by reducing leak-in light contained in a luminous flux. CONSTITUTION:An optical element 44 composed of a plurality of polarization beam splitters is provided on an optical path of a 2-frequency linearly polarized laser light source 41 and a luminous flux from the 2-frequency linearly polarized laser light source 41 is divided in two with the optical element 44 and then, enters diffraction gratings 46 and 48 provided respectively on a 2-luminous flux mask 45 and a wafer 47. Mirrors 49 and 50 paired are provided above vertical to the mask 45 and lenses 51 and 54 paired polarizing plates 52 and 55 paired and photoelectric detectors 53 and 56 paired are arranged sequentially in directions of reflection thereof. Outputs of the two photoelectric detectors 53 and 56 turn to beat signals and a phase difference between the beat signals is measured to position the mask 45 with the wafer 47. Here, the optical element 44 is made up of the plurality polarization beam splitters thereby reducing leak-in light contained in the respective luminous fluxes.

7. 发明专利

JPH06201601A INSPECTING DEVICE AND SYSTEM USING THE SAME 失效
公开(公告)号：JPH06201601A
公开(公告)日：1994-07-22
申请号：JP1884993
申请日：1993-02-05
申请人： CANON KK
发明人： TSUJI TOSHIHIKO , MIYAZAKI KYOICHI , TAKEUCHI SEIJI , YOSHII MINORU , NOSE TETSUSHI
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , H01L21/027 , H01L21/30 , H01L21/66
摘要： PURPOSE:To provide an inspecting device which can detect a very small foreign matter, a defect which has been heretofore difficult to be detected at a high S/N ratio. CONSTITUTION:A laser beam 34 which includes two light components in which frequencies are different by DELTAomega and polarizing directions are coincide is generated. It is branched by a half mirror 13, and one is detected by a photoelectric detector 24, and input as a reference light to a sync detector 25. The other is scanned as a laser beam 35 on an inspecting surface 18 by a scanning optical system having a polygonal mirror 15 and an ftheta lens 16. The beam 35 is intensity- modulated by a beat frequency DELTAomega at a scanning spot position on the surface 18 by a light heterodyne interference. Scattered lights 35 scattered by the matter, a defect existing on the surface 18 are detected by a photoelectric detector 22, and input to the detector 25. The detector 25 detects a scattered light signal in synchronization with the frequency DELTAomega of the previous reference light.

8. 发明专利

JPH0629714B2 失效
公开(公告)号：JPH0629714B2
公开(公告)日：1994-04-20
申请号：JP29784185
申请日：1985-12-28
申请人： CANON KK
发明人： WATANABE KEIJI , NARUMI KOJI , NOSE TETSUSHI , NIWA JUKICHI , FUKUDA HITOSHI
IPC分类号： G01B11/24 , G01B11/255 , G01M11/00

9. 发明专利

JPH068726B2 失效
公开(公告)号：JPH068726B2
公开(公告)日：1994-02-02
申请号：JP11226687
申请日：1987-05-11
申请人： CANON KK
发明人： YOSHII MINORU , KURODA AKIRA , NOSE TETSUSHI , NIWA JUKICHI
IPC分类号： G01B11/00 , G01D5/38 , H01L21/027 , H01L21/30 , H01L21/68

10. 发明专利

JPH05217849A POSITION DETECTOR AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING THE SAME 失效
公开(公告)号：JPH05217849A
公开(公告)日：1993-08-27
申请号：JP4797592
申请日：1992-02-04
申请人： CANON KK
发明人： NOSE TETSUSHI , HASEGAWA MASANORI , OZAWA KUNITAKA
IPC分类号： G03F9/00 , G01B11/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To detect a relative positional deviation between a mask and a wafer with high accuracy by locating signals obtained from sensors of a detector corresponding to alignment systems of each pair so that they may be symmetric when locating two pairs of the alignment systems on a first substance surface and on a second substance surface. CONSTITUTION:A sensor 12 receives a first signal light flux 7a and a second signal light flux 7b. Here, a projected light flux L1 is first cast at the specified angle on alignment marks 71a and 71b on the surface of a mask 1 and then is transmitted and diffracted and after that, is reflected and diffracted on alignment patterns 72a and 72b on the surface of a wafer 2 and finally is cast on a light receiving surface of the sensor 12. In a signal processor 23 which receives a signal from the sensor 12, the location of the center of gravity of the alignment light flux cast on the surface of the sensor 12 in the surface of the sensor 12 is detected. Using the output signal from the sensor 12, the positional deviation of the mask 1 and of the wafer 2 is also detected by the signal processor 23. By this method, a very accurate alignment can be done.

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