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1. 发明专利

CA2078732A1 DISPLACEMENT MEASURING DEVICE AND DISPLACEMENT MEASURING METHOD 未知
公开(公告)号：CA2078732A1
公开(公告)日：1993-03-28
申请号：CA2078732
申请日：1992-09-21
申请人： CANON KK
发明人： SENTOKU KOICHI , MATSUMOTO TAKAHIRO , NOSE NORIYUKI , YOSHII MINORU , SAITOH KENJI
IPC分类号： G03F7/20 , G03F9/00 , G01B9/02
摘要： A method and device for measuring the relative displacement between first and second diffraction gratings includes an interference optical system forming first and second interference rays of light from light diffracted from the first and second diffraction gratings and separating the first and second interference rays of light on the basis of the difference in their direction of polarization, a first detector for detecting the first interference ray of light to generate a first detection signal, a second detector for detecting the second interference ray of light to generate a second detection signal, and signal processing section for detecting the phase difference between the first and second detection signals and for determining the relative displacement between the first and second diffraction gratings on the basis of the phase difference.

2. 发明专利

DE69524298T2 未知
公开(公告)号：DE69524298T2
公开(公告)日：2002-06-13
申请号：DE69524298
申请日：1995-06-19
申请人： CANON KK
发明人： MATSUMOTO TAKAHIRO , SENTOKU KOICHI
IPC分类号： G01B9/02 , G01D5/26 , G01J9/04
摘要： A displacement measuring method for measuring displacement of an object to be examined is disclosed, wherein light which contains two components having a small difference in frequency is separated into a first light of a firs wavelength and a second light of a second wavelength, having different frequencies. First light beam of the first light and a second light beam of the second light interfere with each other, wherein at least one of the first and second light beams is directed via the object, whereby a first light beat signal is produced. Third light beam of the first light and a fourth light beam of the second light interfere with each other, wherein at least one of the third and fourth light beams is directed via the object, whereby a second light beat signal having a predetermined phase difference as compared with the first light beat signal is produced. Then, displacement of the object is measured on the basis of a phase resulting from comparison of the phases of the first and second light beat signals.

3. 发明专利

DE69225858T2 未知
公开(公告)号：DE69225858T2
公开(公告)日：1998-11-12
申请号：DE69225858
申请日：1992-09-24
申请人： CANON KK
发明人： NOSE NORIYUKI , YOSHII MINORU , SAITOH KENJI , OSAWA HIROSHI , SENTOKU KOICHI , TSUJI TOSHIHIKO , MATSUMOTO TAKAHIRO
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00
摘要： A device and method for measuring the positional deviation between a plurality of diffraction gratings (2a,2b) formed on the same object (1) include an illumination optical system (3,6,20,21) for illuminating the plurality of diffraction gratings with a light beam, the illumination by the optical system generating a plurality of diffracted light beams from the plurality of diffraction gratings, an interference optical system (22,23,10) for forming at least one interference light beam from the plurality of diffracted light beams, a detector (12,14) for detecting the at least one interference light beam, the result of the detection serving as the basis for measuring the positional deviation between the plurality of diffraction gratings, and a measuring portion (31-33,41-44) for measuring the relative positional relation between the illumination optical system and the plurality of diffraction gratings.

4. 发明专利

DE69207657T2 未知
公开(公告)号：DE69207657T2
公开(公告)日：1996-10-17
申请号：DE69207657
申请日：1992-07-09
申请人： CANON KK
发明人： MATSUMOTO TAKAHIRO , YOSHII MINORU , SAITO KENJI , NOSE HIROYASU , SENTOKU KOICHI , TAKEUCHI SEIJI
IPC分类号： G01B9/02 , G03F9/00

5. 发明专利

CA2078731A1 POSITIONAL DEVIATION MEASURING DEVICE AND METHOD THEREOF 未知
公开(公告)号：CA2078731A1
公开(公告)日：1993-03-28
申请号：CA2078731
申请日：1992-09-21
申请人： CANON KK
发明人： NOSE NORIYUKI , YOSHII MINORU , SAITOH KENJI , OSAWA HIROSHI , SENTOKU KOICHI , TSUJI TOSHIHIKO , MATSUMOTO TAKAHIRO
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00 , G01B9/02
摘要： A device and method for measuring the positional deviation between a plurality of diffraction gratings (2a,2b) formed on the same object (1) include an illumination optical system (3,6,20,21) for illuminating the plurality of diffraction gratings with a light beam, the illumination by the optical system generating a plurality of diffracted light beams from the plurality of diffraction gratings, an interference optical system (22,23,10) for forming at least one interference light beam from the plurality of diffracted light beams, a detector (12,14) for detecting the at least one interference light beam, the result of the detection serving as the basis for measuring the positional deviation between the plurality of diffraction gratings, and a measuring portion (31-33,41-44) for measuring the relative positional relation between the illumination optical system and the plurality of diffraction gratings.

6. 发明专利

CA2078726A1 POSITION DETECTOR 未知
公开(公告)号：CA2078726A1
公开(公告)日：1993-03-28
申请号：CA2078726
申请日：1992-09-21
申请人： CANON KK
发明人： MATSUMOTO TAKAHIRO , NOSE NORIYUKI , YOSHII MINORU , SAITOH KENJI , HASEGAWA MASANOBU , SENTOKU KOICHI
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , G01B9/00
摘要： A position detector includes a diffraction grating provided on the surface of an object, an illumination system for illuminating the diffraction grating, a detection system for detecting diffracted light diffracted from the diffraction grating, and a processing system for detecting positional information relating to the object, The illumination system emits a first pair of beams which are diffracted by the diffraction grating and interfere with each other, and emits a second pair of beams which are diffracted by the diffraction grating and also interfere with each other. The first pair of beams are incident upon the diffraction grating along a plane extending in a first direction in which the diffraction grating extends. The second pair of beams are incident upon the diffraction grating along a plane extending in a second direction in which the diffraction grating extends. The first and second directions are different from a grating line direction. The detection system detects the interfering light and generates first and second beat signals therefrom. The processing system detects positional information with respect to the first direction from the phase state of the first beat signal and with respect to the second direction from the phase state of the second beat signal.

7. 发明专利

SG11201605280UA IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE 未知
公开(公告)号：SG11201605280UA
公开(公告)日：2016-08-30
申请号：SG11201605280U
申请日：2015-01-20
申请人： CANON KK
发明人： SATO KAZUHIRO , HASEGAWA NORIYASU , MATSUMOTO TAKAHIRO
IPC分类号： H01L21/027 , B29C59/02 , G03F7/20
摘要： The present invention provides an imprint apparatus that molds an imprint material on a shot region of a substrate by using a mold, comprising a detection unit configured to detect first light with which a first mark of the mold and a second mark of the substrate are irradiated and measure a position deviation between the first mark and the second mark, a heating unit configured to irradiate the substrate with second light for heating the substrate and deforming the shot region, and a control unit configured to control alignment between the mold and the substrate based on the position deviation, wherein a parameter of the detection unit or the heating unit is set not to detect the second light by the detection unit while the first light is detected and the substrate is irradiated with the second light.

8. 发明专利

DE69225858D1 未知
公开(公告)号：DE69225858D1
公开(公告)日：1998-07-16
申请号：DE69225858
申请日：1992-09-24
申请人： CANON KK
发明人： NOSE NORIYUKI , YOSHII MINORU , SAITOH KENJI , OSAWA HIROSHI , SENTOKU KOICHI , TSUJI TOSHIHIKO , MATSUMOTO TAKAHIRO
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00
摘要： A device and method for measuring the positional deviation between a plurality of diffraction gratings (2a,2b) formed on the same object (1) include an illumination optical system (3,6,20,21) for illuminating the plurality of diffraction gratings with a light beam, the illumination by the optical system generating a plurality of diffracted light beams from the plurality of diffraction gratings, an interference optical system (22,23,10) for forming at least one interference light beam from the plurality of diffracted light beams, a detector (12,14) for detecting the at least one interference light beam, the result of the detection serving as the basis for measuring the positional deviation between the plurality of diffraction gratings, and a measuring portion (31-33,41-44) for measuring the relative positional relation between the illumination optical system and the plurality of diffraction gratings.

9. 发明专利

DE69223207D1 未知
公开(公告)号：DE69223207D1
公开(公告)日：1998-01-02
申请号：DE69223207
申请日：1992-09-24
申请人： CANON KK
发明人： SENTOKU KOICHI , MATSUMOTO TAKAHIRO , NOSE NORIYUKI , YOSHII MINORU , SAITOH KENJI
IPC分类号： G03F7/20 , G03F9/00
摘要： A method and device for measuring the relative displacement between first and second diffraction gratings (7,8) includes an interference optical system (2,4a,4b,10) forming first and second interference rays of light from light diffracted from the first and second diffraction gratings and separating the first and second interference rays of light on the basis of the difference in their direction of polarization, a first Detector (11a) for detecting the first interference ray of light to generate a first detection signal, a second detector (11b) for detecting the second interference ray of light to generate a second detection signal, and signal processing section (12,13) for detecting the phase difference between the first and second detection signals and for determining the relative displacement between the first and second diffraction gratings on the basis of the phase difference.

10. 发明专利

DE69223207T2 未知
公开(公告)号：DE69223207T2
公开(公告)日：1998-04-16
申请号：DE69223207
申请日：1992-09-24
申请人： CANON KK
发明人： SENTOKU KOICHI , MATSUMOTO TAKAHIRO , NOSE NORIYUKI , YOSHII MINORU , SAITOH KENJI
IPC分类号： G03F7/20 , G03F9/00
摘要： A method and device for measuring the relative displacement between first and second diffraction gratings (7,8) includes an interference optical system (2,4a,4b,10) forming first and second interference rays of light from light diffracted from the first and second diffraction gratings and separating the first and second interference rays of light on the basis of the difference in their direction of polarization, a first Detector (11a) for detecting the first interference ray of light to generate a first detection signal, a second detector (11b) for detecting the second interference ray of light to generate a second detection signal, and signal processing section (12,13) for detecting the phase difference between the first and second detection signals and for determining the relative displacement between the first and second diffraction gratings on the basis of the phase difference.

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