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1. 发明授权

US4922267B1 Recorder having a recording device and a relatively movable stacker for stacking recorded paper. 失效
标题翻译：记录器具有用于堆放记录纸的记录装置和相对可移动的堆叠器。
公开(公告)号：US4922267B1
公开(公告)日：1995-04-11
申请号：US27313988
申请日：1988-11-14
申请人： CANON KK
发明人： OZAWA MASAKAZU , OZAWA KUNITAKA , HATANAKA KATSUNORI , SUZUKI TETSUO , MORI TETSUZO , SHIINA TADASHI , EBINUMA RYUICHI
IPC分类号： B41J29/02 , G01D15/30 , B41J3/04
CPC分类号： B41J29/026 , B41J29/02

2. 发明专利

DE69130434D1 未知
公开(公告)号：DE69130434D1
公开(公告)日：1998-12-10
申请号：DE69130434
申请日：1991-06-25
申请人： CANON KK
发明人： MORI TETSUZO , MARUMO MITSUJI , IWAMOTO KAZUNORI , CHIBA YUJI , KASUMI KAZUYUKI
IPC分类号： G03F7/20 , H01L21/683 , H01L21/00
摘要： A vacuum-attraction holding device incudes a holding base having an attracting surface, for holding a substrate thereon; a suction passageway formed in the base, for supplying a vacuum to the holding base to attract the substrate to the attracting surface; and a pressure sensor provided in the base and being communicated with the suction passageway.

3. 发明专利

DE68925323T2 未知
公开(公告)号：DE68925323T2
公开(公告)日：1996-05-30
申请号：DE68925323
申请日：1989-07-17
申请人： CANON KK
发明人： EBINUMA RYUICHI , MIZUSAWA NOBUTOSHI , SUZUKI MASAYUKI , UNO SHINICHIRO , MORI TETSUZO , KUROSAWA HIROSHI
IPC分类号： G03F7/20 , G21K1/04 , G03B42/02 , G03B9/00 , H05G1/36

4. 发明专利

DE68925604D1 未知
公开(公告)号：DE68925604D1
公开(公告)日：1996-03-21
申请号：DE68925604
申请日：1989-09-04
申请人： CANON KK
发明人： UDA KOJI , TANAKA YUTAKA , MORI TETSUZO , SHIMODA ISAMU , UZAWA SCHUNICHI
IPC分类号： H05H13/04 , G03F7/20 , H01L21/027 , H01L21/30
摘要： Synchrotron orbital radiation (SOR) exposure system includes a SOR ring (8) and a plurality (15a-15c) of exposure apparatus each being coupled to the SOR ring and being arranged to expose a wafer to a mask pattern with X-rays contained in synchrotron radiation from the SOR ring (8) to thereby print the mask pattern on the wafer. Specific arrangement is provided to allow communication of a control of the SOR ring and respective controls of the exposure apparatuses. If any abnormality such as vacuum leakage occurs in one exposure apparatus, the information is transmitted to all the controls to start, in all the exposure apparatuses, appropriate operations to protect the exposure apparatuses against the abnormality. This makes it possible to prevent stoppage of the SOR exposure system as a whole even when any abnormality occurs in one exposure apparatus.

5. 发明专利

DE68921687T2 未知
公开(公告)号：DE68921687T2
公开(公告)日：1995-08-03
申请号：DE68921687
申请日：1989-08-31
申请人： CANON KK
发明人： MORI TETSUZO , SAKAMOTO EIJI , HARA SHINICHI , UDA KOJI , SHIMODA ISAMU , UZAWA SHINICHI
IPC分类号： G03F7/20
摘要： The mask(3) and the wafer (4) are closely disposed, and predetermined exposure energy is applied to the respective shot areas of the wafer(4) through the mask (3). The exposure energy is soft-X-ray source, for example. The pattern of the mask (3) is transferred onto the respective shot areas in a step-and-repeat manner. In the apparatus (fig 1), a temperature control medium liquid is supplied into the wafer chuck (5) for supporting the wafer (4) at the exposure position. The flow rate is different during the exposure operation than during the non-exposure-operation. The flow control (10) is determined in consideration of the wafer chuck vibration attributable to the supply of the liquid medium and also to the heat generation in the wafer(4) by the exposure energy, so that the vibration of the wafer chuck (5) during the exposure operation is suppressed, and simultaneously, the temperature rise of the wafer (4) can be also suppressed. The pattern transfer from the mask (3) to the wafer (4) can be precisely performed.

6. 发明专利

DE69331515D1 未知
公开(公告)号：DE69331515D1
公开(公告)日：2002-03-14
申请号：DE69331515
申请日：1993-11-15
申请人： CANON KK
发明人： YOSHII MINORU , NOSE NORIYUKI , MORI TETSUZO , MIYAZAKI KYOICHI , TSUJI TOSHIHIKO , TAKEUCHI SEIJI
IPC分类号： G01N21/94 , G03F7/20 , G01N21/88

7. 发明专利

DE69130434T2 未知
公开(公告)号：DE69130434T2
公开(公告)日：1999-04-29
申请号：DE69130434
申请日：1991-06-25
申请人： CANON KK
发明人： MORI TETSUZO , MARUMO MITSUJI , IWAMOTO KAZUNORI , CHIBA YUJI , KASUMI KAZUYUKI
IPC分类号： G03F7/20 , H01L21/683 , H01L21/00
摘要： A vacuum-attraction holding device incudes a holding base having an attracting surface, for holding a substrate thereon; a suction passageway formed in the base, for supplying a vacuum to the holding base to attract the substrate to the attracting surface; and a pressure sensor provided in the base and being communicated with the suction passageway.

8. 发明专利

DE68925604T2 未知
公开(公告)号：DE68925604T2
公开(公告)日：1996-07-11
申请号：DE68925604
申请日：1989-09-04
申请人： CANON KK
发明人： UDA KOJI , TANAKA YUTAKA , MORI TETSUZO , SHIMODA ISAMU , UZAWA SCHUNICHI
IPC分类号： H05H13/04 , G03F7/20 , H01L21/027 , H01L21/30
摘要： Synchrotron orbital radiation (SOR) exposure system includes a SOR ring (8) and a plurality (15a-15c) of exposure apparatus each being coupled to the SOR ring and being arranged to expose a wafer to a mask pattern with X-rays contained in synchrotron radiation from the SOR ring (8) to thereby print the mask pattern on the wafer. Specific arrangement is provided to allow communication of a control of the SOR ring and respective controls of the exposure apparatuses. If any abnormality such as vacuum leakage occurs in one exposure apparatus, the information is transmitted to all the controls to start, in all the exposure apparatuses, appropriate operations to protect the exposure apparatuses against the abnormality. This makes it possible to prevent stoppage of the SOR exposure system as a whole even when any abnormality occurs in one exposure apparatus.

9. 发明专利

AT212717T 未知
公开(公告)号：AT212717T
公开(公告)日：2002-02-15
申请号：AT93309113
申请日：1993-11-15
申请人： CANON KK
发明人： YOSHII MINORU , NOSE NORIYUKI , MORI TETSUZO , MIYAZAKI KYOICHI , TSUJI TOSHIHIKO , TAKEUCHI SEIJI
IPC分类号： G01N21/94 , G03F7/20 , G01N21/88

10. 发明专利

DE3517898C2 未知
公开(公告)号：DE3517898C2
公开(公告)日：1999-05-20
申请号：DE3517898
申请日：1985-05-17
申请人： CANON KK
发明人： OZAWA MASAKAZU , OZAWA KUNITAKA , HATANAKA KATSUNORI , SUZUKI TETSUO , MORI TETSUZO , SHIINA TADASHI , EBINUMA RYUICHI
IPC分类号： B41J29/02

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