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1. 发明申请

WO2008099795A3 IMPRINT METHOD AND IMPRINT APPARATUS 审中-公开
标题翻译： IMPRINT方法和印刷装置
公开(公告)号：WO2008099795A3
公开(公告)日：2009-02-12
申请号：PCT/JP2008052219
申请日：2008-02-05
申请人： CANON KK , OKUSHIMA SHINGO , SUEHIRA NOBUHITO , SEKI JUNICHI , KASUMI KAZUYUKI
发明人： OKUSHIMA SHINGO , SUEHIRA NOBUHITO , SEKI JUNICHI , KASUMI KAZUYUKI
IPC分类号： G03F7/00 , G03F9/00
CPC分类号： G03F7/0002 , B05C11/00 , B29C59/002 , B82Y10/00 , B82Y40/00 , G03F9/7023 , G03F9/703 , G03F9/7042
摘要： An imprint method for imprinting an imprint pattern provided to a mold onto a pattern forming layer formed on a substrate is constituted by a first step of effecting alignment between the substrate and the mold with feedback control; a second step of bringing the mold and the pattern forming layer into contact with each other; a third step of curing the pattern forming layer; and a fourth step of increasing a gap between the substrate and the mold. The imprint method further includes a step of stopping the feedback control between the first step and the second step and/or between the second step and the third step.
摘要翻译：用于将提供给模具的印模图案压印到形成在基板上的图案形成层上的印记方法由通过反馈控制来实现基板和模具之间的对准的第一步骤构成; 使模具和图案形成层彼此接触的第二步骤; 固化图案形成层的第三步骤; 以及增加基板和模具之间的间隙的第四步骤。压印方法还包括停止第一步骤和第二步骤之间和/或在第二步骤和第三步骤之间的反馈控制的步骤。

2. 发明公开

KR20180072550A 광학 장치, 노광 장치 및 물품의 제조 방법 审中-公开
公开(公告)号：KR20180072550A
公开(公告)日：2018-06-29
申请号：KR20170169969
申请日：2017-12-12
申请人： CANON KK
发明人： KASUMI KAZUYUKI
IPC分类号： G03F7/20
摘要： 액추에이터의코일의열에기인하는미러의변형을저감하기에유리한광학장치를제공한다. 미러를변형시키는광학장치는, 상기미러에힘을가하는복수의액추에이터를포함하고, 상기복수의액추에이터각각은서로대향하여배치된자석과코일을갖고, 상기자석은부재를통해상기미러에의해지지되고, 상기부재는상기미러와의접촉면에평행인단면의면적이상기접촉면에평행인상기자석의단면의면적보다작은부분을포함한다.

3. 发明专利

DE69130434D1 未知
公开(公告)号：DE69130434D1
公开(公告)日：1998-12-10
申请号：DE69130434
申请日：1991-06-25
申请人： CANON KK
发明人： MORI TETSUZO , MARUMO MITSUJI , IWAMOTO KAZUNORI , CHIBA YUJI , KASUMI KAZUYUKI
IPC分类号： G03F7/20 , H01L21/683 , H01L21/00
摘要： A vacuum-attraction holding device incudes a holding base having an attracting surface, for holding a substrate thereon; a suction passageway formed in the base, for supplying a vacuum to the holding base to attract the substrate to the attracting surface; and a pressure sensor provided in the base and being communicated with the suction passageway.

4. 发明专利

DE602005024340D1 Vorrichtung und Verfahren zur Übertragung eines Musters 未知
公开(公告)号：DE602005024340D1
公开(公告)日：2010-12-09
申请号：DE602005024340
申请日：2005-06-07
申请人： CANON KK
发明人： KAWAKAMI EIGO , OTA HIROHISA , NAKAMURA TAKASHI , KASUMI KAZUYUKI , TOKITA TOSHINOBU
IPC分类号： G03F7/00 , G03F7/20 , H01L21/027

5. 发明专利

DE69225378D1 未知
公开(公告)号：DE69225378D1
公开(公告)日：1998-06-10
申请号：DE69225378
申请日：1992-09-30
申请人： CANON KK
发明人： KASUMI KAZUYUKI , ABE NAOTO , EBINUMA RYUICHI , HASEGAWA TAKAYUKI
IPC分类号： G03F7/20
摘要： An X-ray apparatus is disclosed which includes a mirror (2) having a reflection surface, for expanding an X-ray beam (1) in a predetermined direction, a detecting device (8a, 8b) for detecting a relative positional relationship between the X-ray beam and the reflection surface with respect to a direction perpendicular to the reflection surface, and an adjusting device (6) for adjusting the relative position of the X-ray beam and the reflection surface on the basis of the detection. Also disclosed is an exposure apparatus and a semiconductor device manufacturing method using the X-ray apparatus.

6. 发明公开

EP1286220A2 Exposure apparatus and exposing method 审中-公开
标题翻译： Belichtungsapparat和Belichtungsmethode
公开(公告)号：EP1286220A2
公开(公告)日：2003-02-26
申请号：EP02255625
申请日：2002-08-13
申请人： CANON KK
发明人： KASUMI KAZUYUKI
IPC分类号： G03F1/22 , G03F1/24 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70141
摘要： The relationship between the intensity distribution within the exposure field and the attitude and position of a collimator (21) is stored in a collimator position controller (24). The collimator position controller (24) outputs commands to actuators (22) in order to perform position control such that the collimator (21) is positioned with such position and attitude that the intensity within the exposure field becomes uniform. While an apparatus operates and exposure takes place, a light source position sensor (23) constantly measures the position of a light source (12), and the collimator position controller (24) controls the position and attitude of the collimator (21) on the basis of the data of the intensity distribution measured in advance described above, so that the intensity distribution of the exposure light within the exposure field becomes uniform.
摘要翻译：曝光区域内的强度分布与准直仪（21）的姿态和位置之间的关系被存储在准直仪位置控制器（24）中。准直器位置控制器（24）向致动器（22）输出命令，以执行位置控制，使得准直仪（21）以曝光区域内的强度变得均匀的位置和姿态定位。当设备操作和曝光发生时，光源位置传感器（23）不断测量光源（12）的位置，并且准直仪位置控制器（24）控制准直仪（21）的位置和姿态基于上述测量的强度分布的数据，使得曝光区域内的曝光光的强度分布变得均匀。

7. 发明专利

SG50723A1 X-ray exposure apparatus 未知
公开(公告)号：SG50723A1
公开(公告)日：1998-07-20
申请号：SG1996009700
申请日：1992-09-30
申请人： CANON KK
发明人： ABE NAOTA , EBINUMA RYUICHI , TAKAYUKI HASEGAWA , KASUMI KAZUYUKI
IPC分类号： G03F7/20 , H01J35/14

8. 发明专利

CA2079562C X-RAY EXPOSURE APPARATUS X-RAY EXPOSURE APPARATUS 未知
公开(公告)号：CA2079562C
公开(公告)日：1997-01-07
申请号：CA2079562
申请日：1992-09-30
申请人： CANON KK
发明人： KASUMI KAZUYUKI , ABE NAOTO , EBINUMA RYUICHI , HASEGAWA TAKAYUKI
IPC分类号： G03F7/20 , H05G1/00 , H01L21/027
摘要： An X-ray apparatus is disclosed which includes a mirror having a reflection surface, for expanding an X-ray beam in a predetermined direction, a detecting device for detecting a relative positional relationship between the X-ray beam and the reflection surface with respect to a direction perpendicular to the reflection surface, and an adjusting device for adjusting the relative position of the X-ray beam and the reflection surface on the basis of the detection. Also disclosed is an exposure apparatus and a semiconductor device manufacturing method using the Xray apparatus.

9. 发明专利

DE602005026767D1 Prägemaschine und Verfahren zur Herstellung eines Artikels unter deren Verwendung 未知
公开(公告)号：DE602005026767D1
公开(公告)日：2011-04-21
申请号：DE602005026767
申请日：2005-12-08
申请人： CANON KK
发明人： NAKAMURA TAKASHI , OTA HIROHISA , KAWAKAMI EIGO , KASUMI KAZUYUKI , TOKITA TOSHINOBU
IPC分类号： G03F7/00 , G03F9/00

10. 发明专利

DE69130434T2 未知
公开(公告)号：DE69130434T2
公开(公告)日：1999-04-29
申请号：DE69130434
申请日：1991-06-25
申请人： CANON KK
发明人： MORI TETSUZO , MARUMO MITSUJI , IWAMOTO KAZUNORI , CHIBA YUJI , KASUMI KAZUYUKI
IPC分类号： G03F7/20 , H01L21/683 , H01L21/00
摘要： A vacuum-attraction holding device incudes a holding base having an attracting surface, for holding a substrate thereon; a suction passageway formed in the base, for supplying a vacuum to the holding base to attract the substrate to the attracting surface; and a pressure sensor provided in the base and being communicated with the suction passageway.

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