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    • 1. 发明申请
    • ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER AND ELECTROPHOTOGRAPHIC APPARATUS
    • 电子照相感光元件和电子照相设备
    • WO2011081079A1
    • 2011-07-07
    • PCT/JP2010/073259
    • 2010-12-16
    • CANON KABUSHIKI KAISHAUEDA, ShigenoriKOJIMA, Satoshi
    • UEDA, ShigenoriKOJIMA, Satoshi
    • G03G5/08
    • G03G5/08235G03G5/08214
    • The present invention provides an electrophotographic photosensitive member having an a-SiC upper charge injection inhibition layer and an a-SiC surface layer, which is superior in adhesiveness, suppresses the surface deterioration, is superior in sensitivity characteristics and charging characteristics, and can keep an adequate image-forming capability for a long period of time. The upper charge injection inhibition layer contains 10 atom ppm or more and 30,000 atom ppm or less of the Group 13 atoms or the Group 15 atoms of the Periodic Table with respect to silicon atoms in the upper charge injection inhibition layer, and the ratio (C/(Si+C)) of the number of carbon atoms in the upper charge injection inhibition layer with respect to the sum of the number of silicon atoms and the number of the carbon atoms in the upper charge injection inhibition layer is 0.10 or more and 0.60 or less; and the sum of the atom density of the silicon atoms and the atom density of the carbon atoms in the surface layer is 6.60 1022 atoms/cm3 or more, and the ratio (C/(Si+C)) of the number of carbon atoms with respect to the sum of the number of silicon atoms and the number of the carbon atoms in the surface layer is 0.61 or more and 0.75 or less.
    • 本发明提供一种电子照相感光构件,其具有优异的粘合性,抑制表面变质的a-SiC上电荷注入抑制层和a-SiC表面层,具有优异的灵敏度特性和充电特性,并且可以保持 足够的成像能力长时间。 上电荷注入抑制层含有上电荷注入抑制层中相对于硅原子的10原子ppm以上且30,000原子ppm以下的元素周期表中的第13族原子或15族原子, 上电荷注入抑制层中的碳原子数相对于上电荷注入抑制层中的硅原子数与碳原子数之和的/(Si + C))为0.10以上, 0.60以下; 并且表面层中的硅原子的原子密度和碳原子的原子密度之和为6.60×10 22原子/ cm 3以上,碳原子数的比例(C /(Si + C)) 相对于硅原子数和表面层中的碳原子数之和为0.61以上且0.75以下。
    • 6. 发明公开
    • ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER AND ELECTROPHOTOGRAPHIC APPARATUS
    • 电子照相感光元件和电子照相设备
    • EP2519860A1
    • 2012-11-07
    • EP10840935.0
    • 2010-12-16
    • Canon Kabushiki Kaisha
    • UEDA, ShigenoriKOJIMA, Satoshi
    • G03G5/08
    • G03G5/08235G03G5/08214
    • The present invention provides an electrophotographic photosensitive member having an a-SiC upper charge injection inhibition layer and an a-SiC surface layer, which is superior in adhesiveness, suppresses the surface deterioration, is superior in sensitivity characteristics and charging characteristics, and can keep an adequate image-forming capability for a long period of time. The upper charge injection inhibition layer contains 10 atom ppm or more and 30,000 atom ppm or less of the Group 13 atoms or the Group 15 atoms of the Periodic Table with respect to silicon atoms in the upper charge injection inhibition layer, and the ratio (C/(Si+C)) of the number of carbon atoms in the upper charge injection inhibition layer with respect to the sum of the number of silicon atoms and the number of the carbon atoms in the upper charge injection inhibition layer is 0.10 or more and 0.60 or less; and the sum of the atom density of the silicon atoms and the atom density of the carbon atoms in the surface layer is 6.60 1022 atoms/cm3 or more, and the ratio (C/(Si+C)) of the number of carbon atoms with respect to the sum of the number of silicon atoms and the number of the carbon atoms in the surface layer is 0.61 or more and 0.75 or less.
    • 本发明提供具有a-SiC上电荷注入阻挡层和a-SiC表面层的电子照相感光构件,其具有优异的粘附性,抑制表面劣化,灵敏度特性和充电特性优异,并且可以保持 足够长时间的图像形成能力。 相对于上部电荷注入阻挡层中的硅原子,上部电荷注入阻挡层包含10原子ppm或更多且30,000原子ppm或更少的13族原子或元素周期表15族原子,并且比例(C 相对于上部电荷注入阻挡层中的硅原子数和碳原子数的总和,上部电荷注入阻挡层中的碳原子数量/((Si + C))为0.10以上且 0.60以下; 并且表面层中的硅原子的原子密度和碳原子的原子密度之和为6.60×1022原子/ cm3以上,碳原子数的比例(C /(Si + C))为 相对于表面层中的硅原子数和碳原子数的总和为0.61以上且0.75以下。