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    • 4. 发明申请
    • ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER AND ELECTROPHOTOGRAPHIC APPARATUS
    • 电子照相感光元件和电子照相设备
    • WO2011081079A1
    • 2011-07-07
    • PCT/JP2010/073259
    • 2010-12-16
    • CANON KABUSHIKI KAISHAUEDA, ShigenoriKOJIMA, Satoshi
    • UEDA, ShigenoriKOJIMA, Satoshi
    • G03G5/08
    • G03G5/08235G03G5/08214
    • The present invention provides an electrophotographic photosensitive member having an a-SiC upper charge injection inhibition layer and an a-SiC surface layer, which is superior in adhesiveness, suppresses the surface deterioration, is superior in sensitivity characteristics and charging characteristics, and can keep an adequate image-forming capability for a long period of time. The upper charge injection inhibition layer contains 10 atom ppm or more and 30,000 atom ppm or less of the Group 13 atoms or the Group 15 atoms of the Periodic Table with respect to silicon atoms in the upper charge injection inhibition layer, and the ratio (C/(Si+C)) of the number of carbon atoms in the upper charge injection inhibition layer with respect to the sum of the number of silicon atoms and the number of the carbon atoms in the upper charge injection inhibition layer is 0.10 or more and 0.60 or less; and the sum of the atom density of the silicon atoms and the atom density of the carbon atoms in the surface layer is 6.60 1022 atoms/cm3 or more, and the ratio (C/(Si+C)) of the number of carbon atoms with respect to the sum of the number of silicon atoms and the number of the carbon atoms in the surface layer is 0.61 or more and 0.75 or less.
    • 本发明提供一种电子照相感光构件,其具有优异的粘合性,抑制表面变质的a-SiC上电荷注入抑制层和a-SiC表面层,具有优异的灵敏度特性和充电特性,并且可以保持 足够的成像能力长时间。 上电荷注入抑制层含有上电荷注入抑制层中相对于硅原子的10原子ppm以上且30,000原子ppm以下的元素周期表中的第13族原子或15族原子, 上电荷注入抑制层中的碳原子数相对于上电荷注入抑制层中的硅原子数与碳原子数之和的/(Si + C))为0.10以上, 0.60以下; 并且表面层中的硅原子的原子密度和碳原子的原子密度之和为6.60×10 22原子/ cm 3以上,碳原子数的比例(C /(Si + C)) 相对于硅原子数和表面层中的碳原子数之和为0.61以上且0.75以下。
    • 7. 发明专利
    • TOOTHBRUSH
    • JP2000050958A
    • 2000-02-22
    • JP25448998
    • 1998-08-05
    • KOJIMA SATOSHI
    • KOJIMA SATOSHI
    • A46B9/04
    • PROBLEM TO BE SOLVED: To extremely easily remove plaque at the side surface of a tooth in contact with an adjacent tooth and in the recessed part of a molar without regard to selecting a normal tooth brushing method or a special tooth brushing method by implanting the bunches of bristles consisting of long bristles and short bristles to a brush table. SOLUTION: In these bunches 3 of about thirty bristles of 11 mm length implanted by two lines of ten places in a center and respectively one line of nine places on both sides of it (at 4 lines made of 38 places in total) in the shape of the grids of the toothbrush on the market, about 15 bristles at the outer periphery of each bunch 3 are cut into 7 mm length to manufacture the toothbrush. Otherwise, among the bunches 3 of about thirty bristles of 11 mm in length implanted by three lines of eleven places in a center and respectively one line of nine places on an outermost part (five lines made of 51 places in total) in the shape of the grids of the toothbrush on the market, odd-numbered bunches 3 of outermost line are cut to be 7 mm in length and concerning inner lines, the bunches 3 of the bristles at a position forming a zigzag with the outermost line are cut to be 7 mm to manufacture the toothbrush. Thus, this tooth brush can contribute to maintaining the teeth of the nation and can contribute to the health of the nation.