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1. 发明授权

US4524719A Substrate loading means for a chemical vapor deposition apparatus 失效
标题翻译：用于化学气相沉积装置的基板装载装置
公开(公告)号：US4524719A
公开(公告)日：1985-06-25
申请号：US529415
申请日：1983-09-06
申请人： Bryant A. Campbell , Dale R. DuBois , Ralph F. Manriquez , Nicholas E. Miller
发明人： Bryant A. Campbell , Dale R. DuBois , Ralph F. Manriquez , Nicholas E. Miller
IPC分类号： C23C16/48 , C23C16/54 , C23C13/08
CPC分类号： C23C16/54 , C23C16/481 , Y10S414/141
摘要： A controlled temperature deposition device comprising an inner reaction chamber having gas distribution means for introducing gas into inner chamber and removing gas therefrom and a vacuum chamber means surrounding the inner deposition chamber and spaced from the walls thereof for maintaining a medium vacuum therein. Associated with the deposition device is a substrate loading and unloading fork which transfers substrates such as wafer boats from outside the device to a position in the inner deposition chamber and removes them from the inner deposition chamber following deposition.
摘要翻译：一种控制温度沉积装置，包括具有气体分配装置的内部反应室，该气体分配装置用于将气体引入内部并从其中除去气体;以及真空室装置，围绕内部沉积室并与其间隔开并保持其中的真空。与沉积装置相关联的是基板装载和卸载叉，其将诸如晶片舟皿的基板从装置的外部传送到内部沉积室中的位置，并且在沉积之后将其从内部沉积室中移出。

2. 发明授权

US4539933A Chemical vapor deposition apparatus 失效
标题翻译：化学气相沉积装置
公开(公告)号：US4539933A
公开(公告)日：1985-09-10
申请号：US528193
申请日：1983-08-31
申请人： Bryant A. Campbell , Dale R. DuBois , Ralph F. Manriquez , Nicholas E. Miller
发明人： Bryant A. Campbell , Dale R. DuBois , Ralph F. Manriquez , Nicholas E. Miller
IPC分类号： C23C16/44 , C23C16/455 , C23C16/48 , H01L21/205 , H01L21/285 , C23C13/08
CPC分类号： C23C16/481 , Y10S505/819 , Y10S505/826
摘要： An improved chemical vapor deposition device having heating means substantially surrounding an inner deposition chamber for providing isothermal or precisely controlled gradient temperature conditions therein. The internal components of the chamber are quartz or similar radiant energy transparent material. Also included are special cooling means to protect thermally sensitive seals, structural configurations strengthening areas of glass components subjected to severe stress during operation, and specific designs permitting easy removal and replacement of all glass components exposed to deposition gas.
摘要翻译：一种改进的化学气相沉积装置，其具有基本上围绕内部沉积室的加热装置，用于在其中提供等温或精确控制的梯度温度条件。室的内部部件是石英或类似的辐射能透明材料。还包括用于保护热敏密封件的特殊冷却装置，在操作期间受到严重应力的玻璃部件的结构构造加强，以及允许容易地移除和更换暴露于沉积气体的所有玻璃部件的特定设计。

3. 发明授权

US4545327A Chemical vapor deposition apparatus 失效
标题翻译：化学气相沉积装置
公开(公告)号：US4545327A
公开(公告)日：1985-10-08
申请号：US412237
申请日：1982-08-27
申请人： Bryant A. Campbell , Nicholas E. Miller
发明人： Bryant A. Campbell , Nicholas E. Miller
IPC分类号： C23C16/44 , C23C14/24 , C23C16/46 , C23C16/48 , C23C13/02
CPC分类号： C23C16/481 , Y10S505/819 , Y10S505/826
摘要： A chemical vapor deposition device having uniformly distributed heating means substantially surrounding an inner deposition reaction chamber for providing isothermal or precisely controlled gradient temperature conditions therein, the reaction chamber being surrounded by the walls of an outer vacuum chamber spaced therefrom.
摘要翻译：一种具有均匀分布的加热装置的化学气相沉积装置，其基本上围绕内部沉积反应室，用于在其中提供等温或精确控制的梯度温度条件，所述反应室由与其间隔开的外部真空室的壁包围。

4. 发明授权

US4547404A Chemical vapor deposition process 失效
标题翻译：化学气相沉积工艺
公开(公告)号：US4547404A
公开(公告)日：1985-10-15
申请号：US657313
申请日：1984-10-02
申请人： Bryant A. Campbell , Nicholas E. Miller
发明人： Bryant A. Campbell , Nicholas E. Miller
IPC分类号： C23C16/48 , C23C13/02
CPC分类号： C23C16/481
摘要： A chemical vapor deposition device having uniformly distributed heating means substantially surrounding an inner deposition reaction chamber for providing isothermal or precisely controlled gradient temperature conditions therein, the reaction chamber being surrounded by the walls of an outer vacuum chamber spaced therefrom.
摘要翻译：一种具有均匀分布的加热装置的化学气相沉积装置，其基本上围绕内部沉积反应室，用于在其中提供等温或精确控制的梯度温度条件，所述反应室由与其间隔开的外部真空室的壁包围。

5. 发明授权

US5413759A Plasma sterilizer and method 失效
标题翻译：等离子灭菌器及方法
公开(公告)号：US5413759A
公开(公告)日：1995-05-09
申请号：US73653
申请日：1993-06-07
申请人： Bryant A. Campbell , Kern A. Moulton
发明人： Bryant A. Campbell , Kern A. Moulton
IPC分类号： A61L2/14 , H05H1/46 , A61L2/00
CPC分类号： A61L2/14 , H05H1/46 , Y10S422/906
摘要： A method for plasma sterilization includes exposing an article to be sterilized to a plasma generated from a gas mixture. The gas mixture being either (a) argon, helium, nitrogen, or mixtures thereof, and oxygen and hydrogen; (b) argon, helium, nitrogen or mixtures thereof, and hydrogen; or (c) argon, helium, nitrogen or mixtures thereof, and oxygen. The exposure of the article to the plasma is carried out at a pressure of from 0.1 to 10 torr and a chamber temperature of less than 63.degree. C. for a time period sufficient to effect sterilization. Contaminated articles can be pretreated in a plasma generated from oxygen and optionally argon, helium and/or nitrogen at the same conditions for up to 5 minutes to remove protein. The apparatus for plasma sterilization of articles includes a plasma generator and a sterilizing chamber. The plasma generator includes a plurality of generator tubes positioned in one or more electromagnetic field zones defined by one or more waveguides. The outlet of the generator tube preferably has a restriction for maintaining the gas pressure in the plasma generating chamber at from 0.3 to 10 torr.
摘要翻译：用于等离子体灭菌的方法包括将待灭菌的物品暴露于由气体混合物产生的等离子体。气体混合物是（a）氩，氦，氮或其混合物，以及氧和氢; （b）氩，氦，氮或其混合物和氢; 或（c）氩，氦，氮或其混合物和氧气。制品对等离子体的暴露在0.1至10托的压力和小于63℃的室温下进行足够时间以进行灭菌。受污染的制品可以在氧气和任选的氩，氦和/或氮气中在相同条件下等离子体中预处理多达5分钟以除去蛋白质。用于制品等离子体灭菌的装置包括等离子体发生器和灭菌室。等离子体发生器包括位于由一个或多个波导限定的一个或多个电磁场区域中的多个发生器管。发电机管的出口优选具有将等离子体发生室中的气体压力维持在0.3至10乇的限制。

6. 发明授权

US5084239A Plasma sterilizing process with pulsed antimicrobial agent treatment 失效
标题翻译：脉冲灭菌方法采用脉冲抗菌剂处理
公开(公告)号：US5084239A
公开(公告)日：1992-01-28
申请号：US576235
申请日：1990-08-31
申请人： Kern A. Moulton , Bryant A. Campbell , Ross A. Caputo
发明人： Kern A. Moulton , Bryant A. Campbell , Ross A. Caputo
IPC分类号： A61L2/14 , A61L2/20
CPC分类号： A61L2/14 , A61L2/20
摘要： A process for plasma sterilization comprising exposing an article in a sterilizing chamber to at least one cycle comprising a pulsed treatment with gaseous antimicrobial agent and a plasma treatment. The pulsed treatment comprises at least two pulse-vacuum cycles, each pulse-vacuum cycle comprising the steps of exposing the article to the gaseous antimicrobial agent at a pressure of from 4 to 18 torr and reducing the pressure in the sterilizing chamber to from 0.1 to 4 torr. The plasma treatment comprising exposing the article to a plasma generated from gases selected from the group consisting essentially of argon, helium, nitrogen, oxygen, hydrogen and mixtures thereof, the exposure to the plasma being carried out at a pressure of from 0.1 to 10 torr and a temperature of less than 80.degree. C. The antimicrobial agent is selected from the group consisting of hydrogen peroxide, a peracid antimicrobial agent, and mixtures thereof, the peracid antimicrobial agent being selected from the group consisting of saturated and unsaturated peralkanoic acids having from 1 to 8 carbon atoms and halogenated derivatives thereof.
摘要翻译：一种用于等离子体灭菌的方法，包括将消毒室中的物品暴露于至少一个循环，包括用气态抗微生物剂进行脉冲处理和等离子体处理。脉冲处理包括至少两个脉冲真空循环，每个脉冲真空循环包括以4至18托的压力将制品暴露于气态抗微生物剂的步骤，并将灭菌室中的压力降至0.1至 4托等离子体处理包括将制品暴露于从基本上由氩，氦，氮，氧，氢及其混合物组成的组中选出的气体产生的等离子体中，暴露于等离子体的压力为0.1至10托并且温度低于80℃。抗微生物剂选自过氧化氢，过酸性抗微生物剂及其混合物，所述过酸抗微生物剂选自饱和和不饱和的过氧烷酸，其具有 1至8个碳原子及其卤化衍生物。

7. 发明授权

US06261518B1 Process and apparatus for plasma sterilizing with pulsed antimicrobial agent treatment 失效
标题翻译：用脉冲抗菌剂处理等离子体灭菌的方法和装置
公开(公告)号：US06261518B1
公开(公告)日：2001-07-17
申请号：US09183775
申请日：1998-10-30
申请人： Ross A. Caputo , Thomas J. Amsler , Kangyan Du , Jeffery Jones , Kern A. Moulton , Bryant A. Campbell
发明人： Ross A. Caputo , Thomas J. Amsler , Kangyan Du , Jeffery Jones , Kern A. Moulton , Bryant A. Campbell
IPC分类号： A61L214
CPC分类号： A61L2/208 , A61L2/14 , A61L2/20 , A61L2202/23 , A61L2202/24 , Y10S422/906 , Y10S422/907
摘要： A process and equipment for plasma sterilization in which articles in a sterilizing chamber are taken through at least one combination sterilizing cycle. The articles to be sterilized may include the interior of a vessel or chamber. In that case, the vessel or chamber itself may serve as a sterilizing chamber and connects to the plasma generating chamber. Each combination sterilizing cycle includes a pulsed treatment with gaseous antimicrobial agent, removal of the gaseous antimicrobial agent, and a plasma treatment. The pulsed treatment includes one or more pulse-vacuum cycles, each pulse-vacuum cycle includes the steps of evacuating the sterilizing chamber and exposing the article to the gaseous antimicrobial agent with a predetermined pressure profile during a predetermined time. The gaseous antimicrobial agent is preferably carried in a gas mixture with a nonreactive carrier gas. In one embodiment, the predetermined pressure is pulsed. In another embodiment, it is ramped. After the pulsed treatment, the antimicrobial agent is removed by evacuating the sterilizing chamber. The plasma treatment includes exposure of the article to a plasma having essentially uncharged, highly reactive free radicals, molecules and atoms.
摘要翻译：用于等离子体灭菌的方法和设备，其中消毒室中的物品通过至少一个组合灭菌循环。待消毒的物品可以包括容器或室的内部。在这种情况下，容器或室本身可以用作灭菌室并连接到等离子体产生室。每个组合灭菌循环包括用气体抗微生物剂进行脉冲处理，去除气态抗微生物剂和等离子体处理。脉冲处理包括一个或多个脉冲真空循环，每个脉冲真空循环包括在预定时间内以预定的压力分布排空灭菌室并将制品暴露于气态抗微生物剂的步骤。气态抗微生物剂优选在与非反应性载气的气体混合物中携带。在一个实施例中，预定压力是脉冲的。在另一个实施例中，它是斜坡的。脉冲处理后，通过抽空灭菌室除去抗菌剂。等离子体处理包括将物品暴露于具有基本上不带电的，高反应性的自由基，分子和原子的等离子体。

8. 发明授权

US5376332A Plasma sterilizing with downstream oxygen addition 失效
标题翻译：等离子体灭菌与下游氧加成
公开(公告)号：US5376332A
公开(公告)日：1994-12-27
申请号：US020904
申请日：1993-02-22
申请人： Phillip A. Martens , Bryant A. Campbell
发明人： Phillip A. Martens , Bryant A. Campbell
IPC分类号： A61L2/14 , A61L2/00
CPC分类号： A61L2/14
摘要： A method for plasma sterilization includes forming a gas plasma from a substantially oxygen-free mixture containing argon or helium and from 1% to 5% (v/v) hydrogen in a plasma generating chamber, and exposing an article to be sterilized in a sterilizing chamber to a non-explosive mixture of the plasma gas and from 1% up to 20% (v/v) oxygen gas. Preferably, the pressure in the sterilizing chamber is from 0.1 to 10 torr and the chamber temperature is less than 6.degree. C., the mixture from which the plasma is generated contains from 4% to 5% (v/v) hydrogen, and the article in the sterilizing chamber is exposed to a mixture of plasma gas and from 1% to 10% (v/v) oxygen.
摘要翻译：等离子体灭菌的方法包括在等离子体发生室中从含有氩或氦和1％至5％（v / v）氢的基本上不含氧的混合物形成气体等离子体，并将待灭菌的制品暴露于灭菌室到等离子体气体和1％至20％（v / v）氧气的非爆炸性混合物。优选地，灭菌室中的压力为0.1至10托，并且室温度低于6℃，产生等离子体的混合物含有4％至5％（v / v）氢气，并且灭菌室中的物品暴露于等离子气体和1％至10％（v / v）氧气的混合物中。

9. 发明授权

US5186893A Plasma cycling sterilizing process 失效
标题翻译：血浆循环灭菌过程
公开(公告)号：US5186893A
公开(公告)日：1993-02-16
申请号：US576294
申请日：1990-08-31
申请人： Kern A. Moulton , Bryant A. Campbell , Ross A. Caputo
发明人： Kern A. Moulton , Bryant A. Campbell , Ross A. Caputo
IPC分类号： A61L2/14 , H05H1/46
CPC分类号： H05H1/46 , A61L2/14 , Y10S422/906
摘要： A method for plasma sterilization within a controlled temperature range includes exposing an article in a sterilizing chamber to a gas plasma flowing from a plasma generating chamber until the temperature in the sterilizing chamber rises to a preselected maximum temperature. The flow of the plasma gas to the sterilizing chamber is terminated until the temperature in the sterilizing chamber falls to a temperature below the preselected maximum temperature. These steps are repeated until sterilization of the article is effected. The temperature below the preselected maximum temperature when gas plasma flow is again initiated is preferably not more than 3.degree. C. below the preselected maximum temperature. The gas plasma can be generated from a mixture of gases consisting essentially of argon, helium, nitrogen or mixtures thereof; from 1 to 21 (v/v) % oxygen; and from 1 to 20 (v/v) % hydrogen; or a mixture containing from 1 to 10 (v/v) % oxygen and from 3 to 7 (v/v) % hydrogen; or a mixture containing 1 to 10 (v/v) % hydrogen and from 90 to 99 (v/v) % of argon, helium, nitrogen or mixtures thereof. Preferably the pressure in the sterilizing chamber rises to from 0.1 to 10 torr when the gas plasma is flowing into the chamber, and the pressure in the sterilizing chamber falls to a lower pressure when the gas plasma flow into the sterilizing chamber is terminated.
摘要翻译：一种在受控温度范围内进行等离子体灭菌的方法，包括将灭菌室内的物品暴露于从等离子体发生室流出的气体等离子体直到灭菌室内的温度上升到预选的最高温度。终止等离子体气体到灭菌室的流动，直到灭菌室内的温度降到低于预选的最高温度的温度。重复这些步骤直到制品的灭菌。当再次启动气体等离子体流时，低于预选最高温度的温度优选不超过预选最高温度3℃。气体等离子体可以由基本上由氩，氦，氮或其混合物组成的气体的混合物产生; 1至21（v / v）％氧气; 和1至20（v / v）％氢; 或含有1至10（v / v）％氧和3至7（v / v）％氢的混合物; 或含有1至10（v / v）％氢和90至99（v / v）％氩，氦，氮或其混合物的混合物。当气体等离子体流入室时，灭菌室中的压力优选上升至0.1〜10乇，当终止气体等离子体流入灭菌室时，灭菌室内的压力下降到较低的压力。

10. 发明授权

US5184046A Circular waveguide plasma microwave sterilizer apparatus 失效
标题翻译：圆波导等离子体微波消毒器
公开(公告)号：US5184046A
公开(公告)日：1993-02-02
申请号：US589511
申请日：1990-09-28
申请人： Bryant A. Campbell
发明人： Bryant A. Campbell
IPC分类号： A61L2/14 , H01J37/32 , H05H1/46
CPC分类号： H01J37/32211 , A61L2/14 , H01J37/32192 , H05H1/46
摘要： An apparatus for plasma sterilization including a sterilization chamber and at least one microwave plasma generator for producing gas plasma products communicating therewith. The mircowave plasma generator includes a cylindrical metal waveguide and an axially concentric magnetron antenna extending into the waveguide. The plasma generator includes an inner plasma container made of a electromagnetic transparent material.
摘要翻译：一种用于等离子体灭菌的装置，包括消毒室和用于产生与其连通的气体等离子体产品的至少一个微波等离子体发微波等离子体发生器包括圆柱形金属波导和延伸到波导中的轴向同心磁控管天线。等离子体发生器包括由电磁透明材料制成的内部等离子体容器。

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