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    • 1. 发明授权
    • Process for plasma sterilizing with pulsed antimicrobial agent treatment
    • 用脉冲抗菌剂处理等离子体灭菌的方法
    • US5645796A
    • 1997-07-08
    • US461412
    • 1995-06-05
    • Ross A. CaputoThomas J. AmslerKangyan DuJeffery JonesKern A. MoultonBryant A. Campbell, deceased
    • Ross A. CaputoThomas J. AmslerKangyan DuJeffery JonesKern A. MoultonBryant A. Campbell, deceased
    • A61L2/14A61L2/20A61L2/00
    • A61L2/208A61L2/14A61L2/20A61L2202/23A61L2202/24Y10S422/906Y10S422/907
    • A process for plasma sterilization in which articles in a sterilizing chamber are taken through at least one combination sterilizing cycle. The articles to be sterilized may include the interior of a vessel or chamber. In that case, the vessel or chamber itself may serve as a sterilizing chamber and connects to the plasma generating chamber. Each combination sterilizing cycle includes a pulsed treatment with gaseous antimicrobial agent, removal of the gaseous antimicrobial agent, and a plasma treatment. The pulsed treatment includes one or more pulse-vacuum cycles, each pulse-vacuum cycle includes the steps of evacuating the sterilizing chamber and exposing the article to the gaseous antimicrobial agent with a predetermined pressure profile during a predetermined time. The gaseous antimicrobial agent is preferably carried in a gas mixture with a nonreactive carrier gas. In one embodiment, the predetermined pressure is pulsed. In another embodiment, it is ramped. After the pulsed treatment, the antimicrobial agent is removed by evacuating the sterilizing chamber. The plasma treatment includes exposure of the article to a plasma having essentially uncharged, highly reactive free radicals, molecules and atoms.
    • 一种用于血浆灭菌的方法,其中灭菌室中的物品通过至少一个组合灭菌循环。 待消毒的物品可以包括容器或室的内部。 在这种情况下,容器或室本身可以用作灭菌室并连接到等离子体产生室。 每个组合灭菌循环包括用气体抗微生物剂进行脉冲处理,去除气态抗微生物剂和等离子体处理。 脉冲处理包括一个或多个脉冲真空循环,每个脉冲真空循环包括在预定时间内以预定的压力分布排空灭菌室并将制品暴露于气态抗微生物剂的步骤。 气态抗微生物剂优选在与非反应性载气的气体混合物中携带。 在一个实施例中,预定压力是脉冲的。 在另一个实施例中,它是斜坡的。 脉冲处理后,通过抽空灭菌室除去抗菌剂。 等离子体处理包括将物品暴露于具有基本上不带电的,高反应性的自由基,分子和原子的等离子体。
    • 3. 发明授权
    • Flash sterilization with plasma
    • 用等离子体灭菌
    • US5178829A
    • 1993-01-12
    • US576325
    • 1990-08-31
    • Kern A. MoultonBryant A. CampbellRoss A. Caputo
    • Kern A. MoultonBryant A. CampbellRoss A. Caputo
    • A61L2/14H05H1/46
    • H05H1/46A61L2/14Y10S422/906
    • A method for flash sterilization with a plasma gas includes exposing an unpackaged article in a sterilizing chamber to a gas plasma flowing from a plasma generating chamber until the temperature in the sterilizing chamber rises to a preselected maximum temperature of at least 100.degree. C. The flow of the plasma gas to the sterilizing chamber is terminated until the temperature in the sterilizing chamber falls to a temperature below the preselected maximum temperature. These steps are repeated until sterilization of the article is effected. The temperature below the preselected maximum temperature when gas plasma flow is again initiated is preferably not more than 3.degree. C. below the preselected maximum temperature. The gas plasma can be generated from a mixture of gases consisting essentially of argon, helium, nitrogen or mixtures thereof; from 1 to 21 (v/v) % oxygen; and from 1 to 20 (v/v) % hydrogen; or a mixture containing from 1 to 10 (v/v) % oxygen and from 3 to 7 (v/v) % hydrogen; or a mixture containing 1 to 10 (v/v) % hydrogen and from 90 to 99 (v/v) % of argon, helium, nitrogen or mixtures thereof. Preferably the pressure in the sterilizing chamber rises to from 0.1 to 10 torr when the gas plasma is flowing into the chamber, and the pressure in the sterilizing chamber falls to a lower pressure when the gas plasma flow into the sterilizing chamber is terminated.
    • 用等离子体气体进行闪光灭菌的方法包括将消毒室中的未包装的物品暴露于从等离子体发生室流出的气体等离子体直到灭菌室内的温度上升到预选的最高温度至少为100℃。流量 直到灭菌室内的温度降至低于预选的最高温度的温度。 重复这些步骤直到制品的灭菌。 当再次启动气体等离子体流时,低于预选最高温度的温度优选不超过预选最高温度3℃。 气体等离子体可以由基本上由氩,氦,氮或其混合物组成的气体的混合物产生; 1至21(v / v)%氧气; 和1至20(v / v)%氢; 或含有1至10(v / v)%氧和3至7(v / v)%氢的混合物; 或含有1至10(v / v)%氢和90至99(v / v)%氩,氦,氮或其混合物的混合物。 当气体等离子体流入室时,灭菌室中的压力优选上升至0.1〜10乇,当终止气体等离子体流入灭菌室时,灭菌室内的压力下降到较低的压力。
    • 4. 发明授权
    • Process and apparatus for plasma sterilizing with pulsed antimicrobial agent treatment
    • 用脉冲抗菌剂处理等离子体灭菌的方法和装置
    • US06261518B1
    • 2001-07-17
    • US09183775
    • 1998-10-30
    • Ross A. CaputoThomas J. AmslerKangyan DuJeffery JonesKern A. MoultonBryant A. Campbell
    • Ross A. CaputoThomas J. AmslerKangyan DuJeffery JonesKern A. MoultonBryant A. Campbell
    • A61L214
    • A61L2/208A61L2/14A61L2/20A61L2202/23A61L2202/24Y10S422/906Y10S422/907
    • A process and equipment for plasma sterilization in which articles in a sterilizing chamber are taken through at least one combination sterilizing cycle. The articles to be sterilized may include the interior of a vessel or chamber. In that case, the vessel or chamber itself may serve as a sterilizing chamber and connects to the plasma generating chamber. Each combination sterilizing cycle includes a pulsed treatment with gaseous antimicrobial agent, removal of the gaseous antimicrobial agent, and a plasma treatment. The pulsed treatment includes one or more pulse-vacuum cycles, each pulse-vacuum cycle includes the steps of evacuating the sterilizing chamber and exposing the article to the gaseous antimicrobial agent with a predetermined pressure profile during a predetermined time. The gaseous antimicrobial agent is preferably carried in a gas mixture with a nonreactive carrier gas. In one embodiment, the predetermined pressure is pulsed. In another embodiment, it is ramped. After the pulsed treatment, the antimicrobial agent is removed by evacuating the sterilizing chamber. The plasma treatment includes exposure of the article to a plasma having essentially uncharged, highly reactive free radicals, molecules and atoms.
    • 用于等离子体灭菌的方法和设备,其中消毒室中的物品通过至少一个组合灭菌循环。 待消毒的物品可以包括容器或室的内部。 在这种情况下,容器或室本身可以用作灭菌室并连接到等离子体产生室。 每个组合灭菌循环包括用气体抗微生物剂进行脉冲处理,去除气态抗微生物剂和等离子体处理。 脉冲处理包括一个或多个脉冲真空循环,每个脉冲真空循环包括在预定时间内以预定的压力分布排空灭菌室并将制品暴露于气态抗微生物剂的步骤。 气态抗微生物剂优选在与非反应性载气的气体混合物中携带。 在一个实施例中,预定压力是脉冲的。 在另一个实施例中,它是斜坡的。 脉冲处理后,通过抽空灭菌室除去抗菌剂。 等离子体处理包括将物品暴露于具有基本上不带电的,高反应性的自由基,分子和原子的等离子体。
    • 5. 发明授权
    • Plasma cycling sterilizing process
    • 血浆循环灭菌过程
    • US5186893A
    • 1993-02-16
    • US576294
    • 1990-08-31
    • Kern A. MoultonBryant A. CampbellRoss A. Caputo
    • Kern A. MoultonBryant A. CampbellRoss A. Caputo
    • A61L2/14H05H1/46
    • H05H1/46A61L2/14Y10S422/906
    • A method for plasma sterilization within a controlled temperature range includes exposing an article in a sterilizing chamber to a gas plasma flowing from a plasma generating chamber until the temperature in the sterilizing chamber rises to a preselected maximum temperature. The flow of the plasma gas to the sterilizing chamber is terminated until the temperature in the sterilizing chamber falls to a temperature below the preselected maximum temperature. These steps are repeated until sterilization of the article is effected. The temperature below the preselected maximum temperature when gas plasma flow is again initiated is preferably not more than 3.degree. C. below the preselected maximum temperature. The gas plasma can be generated from a mixture of gases consisting essentially of argon, helium, nitrogen or mixtures thereof; from 1 to 21 (v/v) % oxygen; and from 1 to 20 (v/v) % hydrogen; or a mixture containing from 1 to 10 (v/v) % oxygen and from 3 to 7 (v/v) % hydrogen; or a mixture containing 1 to 10 (v/v) % hydrogen and from 90 to 99 (v/v) % of argon, helium, nitrogen or mixtures thereof. Preferably the pressure in the sterilizing chamber rises to from 0.1 to 10 torr when the gas plasma is flowing into the chamber, and the pressure in the sterilizing chamber falls to a lower pressure when the gas plasma flow into the sterilizing chamber is terminated.
    • 一种在受控温度范围内进行等离子体灭菌的方法,包括将灭菌室内的物品暴露于从等离子体发生室流出的气体等离子体直到灭菌室内的温度上升到预选的最高温度。 终止等离子体气体到灭菌室的流动,直到灭菌室内的温度降到低于预选的最高温度的温度。 重复这些步骤直到制品的灭菌。 当再次启动气体等离子体流时,低于预选最高温度的温度优选不超过预选最高温度3℃。 气体等离子体可以由基本上由氩,氦,氮或其混合物组成的气体的混合物产生; 1至21(v / v)%氧气; 和1至20(v / v)%氢; 或含有1至10(v / v)%氧和3至7(v / v)%氢的混合物; 或含有1至10(v / v)%氢和90至99(v / v)%氩,氦,氮或其混合物的混合物。 当气体等离子体流入室时,灭菌室中的压力优选上升至0.1〜10乇,当终止气体等离子体流入灭菌室时,灭菌室内的压力下降到较低的压力。
    • 6. 发明授权
    • Apparatus for plasma sterilizing with pulsed antimicrobial agent
treatment
    • 用脉冲抗菌剂处理等离子体灭菌的装置
    • US5413758A
    • 1995-05-09
    • US65859
    • 1993-05-21
    • Ross A. CaputoJeffrey JonesKern A. MoultonBryant A. Campbell, deceased
    • Ross A. CaputoJeffrey JonesKern A. MoultonBryant A. Campbell, deceased
    • A61L2/14A61L2/20
    • A61L2/20A61L2/14Y10S422/906Y10S422/907
    • A process and equipment for plasma sterilization in which articles in a sterilizing chamber are taken through at least one combination sterilizing cycle. The articles to be sterilized may include the interior of a vessel or chamber. In that case, the vessel or chamber itself may serve as a sterilizing chamber and connects to the plasma generating chamber. Each combination sterilizing cycle includes a pulsed treatment with gaseous antimicrobial agent, removal of the gaseous antimicrobial agent, and a plasma treatment. The pulsed treatment includes one or more pulse-vacuum cycles, each pulse-vacuum cycle includes the steps of evacuating the sterilizing chamber and exposing the article to the gaseous antimicrobial agent with a predetermined pressure profile during a predetermined time. The gaseous antimicrobial agent is preferably carried in a gas mixture with a nonreactive carrier gas. In one embodiment, the predetermined pressure is pulsed. In another embodiment, it is ramped. After the pulsed treatment, the antimicrobial agent is removed by evacuating the sterilizing chamber. The plasma treatment includes exposure of the article to a plasma having essentially uncharged, highly reactive free radicals, molecules and atoms.
    • 用于等离子体灭菌的方法和设备,其中消毒室中的物品通过至少一个组合灭菌循环。 待消毒的物品可以包括容器或室的内部。 在这种情况下,容器或室本身可以用作灭菌室并连接到等离子体产生室。 每个组合灭菌循环包括用气体抗微生物剂进行脉冲处理,去除气态抗微生物剂和等离子体处理。 脉冲处理包括一个或多个脉冲真空循环,每个脉冲真空循环包括在预定时间内以预定的压力分布排空灭菌室并将制品暴露于气态抗微生物剂的步骤。 气态抗微生物剂优选在与非反应性载气的气体混合物中携带。 在一个实施例中,预定压力是脉冲的。 在另一个实施例中,它是斜坡的。 脉冲处理后,通过抽空灭菌室除去抗菌剂。 等离子体处理包括将物品暴露于具有基本上不带电的,高反应性的自由基,分子和原子的等离子体。
    • 7. 发明授权
    • Plasma cycling sterilizing process
    • 血浆循环灭菌过程
    • US5288460A
    • 1994-02-22
    • US962895
    • 1992-10-19
    • Ross A. CaputoJeffrey JonesKern A. MoultonBryant A. Campbell, deceased
    • Ross A. CaputoJeffrey JonesKern A. MoultonBryant A. Campbell, deceased
    • A61L2/14H05H1/46A61L2/00
    • H05H1/46A61L2/14
    • A method for plasma sterilization within a controlled temperature range includes exposing the interior of a chamber and any articles therein to a gas plasma flowing from a plasma generating chamber until the temperature in the chamber rises to a preselected maximum temperature. The flow of the plasma gas to the chamber is terminated when the temperature in the chamber falls to a temperature below the preselected maximum temperature. These steps are repeated until sterilization of the interior of the chamber or any articles therein is effected. The temperature below the preselected maximum temperature when gas plasma flow is again initiated is preferably not more than 3.degree. C. below the preselected maximum temperature. The gas plasma can be generated from a gas mixture that includes oxidizing and/or reducing agents. Preferably the pressure in the sterilizing chamber rises to from 0.1 to 10 torr when the gas plasma is flowing into the chamber, and the pressure in the sterilizing chamber falls to a lower pressure when the gas plasma flow into the sterilizing chamber is terminated. The articles to be sterilized include the interior of a vessel or chamber. The vessel or chamber itself serves as a sterilizing chamber and connects to the plasma generating chamber.
    • 在受控温度范围内的等离子体灭菌的方法包括将室内和其中的任何物品暴露于从等离子体发生室流出的气体等离子体,直到室内的温度上升到预选的最高温度。 当室内的温度下降到低于预选的最高温度的温度时,等离子体气体流到室的流动被终止。 重复这些步骤,直到对室内或其中的任何物品进行杀菌。 当再次启动气体等离子体流时,低于预选最大温度的温度优选不低于预选最高温度3摄氏度。 气体等离子体可以由包括氧化和/或还原剂的气体混合物产生。 当气体等离子体流入室时,灭菌室中的压力优选上升至0.1〜10乇,当终止气体等离子体流入灭菌室时,灭菌室内的压力下降到较低的压力。 待灭菌的物品包括容器或室的内部。 容器或室本身用作灭菌室并连接到等离子体产生室。
    • 8. 发明授权
    • Plasma sterilizing process with pulsed antimicrobial agent treatment
    • 脉冲灭菌方法采用脉冲抗菌剂处理
    • US5084239A
    • 1992-01-28
    • US576235
    • 1990-08-31
    • Kern A. MoultonBryant A. CampbellRoss A. Caputo
    • Kern A. MoultonBryant A. CampbellRoss A. Caputo
    • A61L2/14A61L2/20
    • A61L2/14A61L2/20
    • A process for plasma sterilization comprising exposing an article in a sterilizing chamber to at least one cycle comprising a pulsed treatment with gaseous antimicrobial agent and a plasma treatment. The pulsed treatment comprises at least two pulse-vacuum cycles, each pulse-vacuum cycle comprising the steps of exposing the article to the gaseous antimicrobial agent at a pressure of from 4 to 18 torr and reducing the pressure in the sterilizing chamber to from 0.1 to 4 torr. The plasma treatment comprising exposing the article to a plasma generated from gases selected from the group consisting essentially of argon, helium, nitrogen, oxygen, hydrogen and mixtures thereof, the exposure to the plasma being carried out at a pressure of from 0.1 to 10 torr and a temperature of less than 80.degree. C. The antimicrobial agent is selected from the group consisting of hydrogen peroxide, a peracid antimicrobial agent, and mixtures thereof, the peracid antimicrobial agent being selected from the group consisting of saturated and unsaturated peralkanoic acids having from 1 to 8 carbon atoms and halogenated derivatives thereof.
    • 一种用于等离子体灭菌的方法,包括将消毒室中的物品暴露于至少一个循环,包括用气态抗微生物剂进行脉冲处理和等离子体处理。 脉冲处理包括至少两个脉冲真空循环,每个脉冲真空循环包括以4至18托的压力将制品暴露于气态抗微生物剂的步骤,并将灭菌室中的压力降至0.1至 4托 等离子体处理包括将制品暴露于从基本上由氩,氦,氮,氧,氢及其混合物组成的组中选出的气体产生的等离子体中,暴露于等离子体的压力为0.1至10托 并且温度低于80℃。抗微生物剂选自过氧化氢,过酸性抗微生物剂及其混合物,所述过酸抗微生物剂选自饱和和不饱和的过氧烷酸,其具有 1至8个碳原子及其卤化衍生物。