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    • 7. 发明申请
    • Method for inhibiting oxygen and moisture degradation of a device and the resulting device
    • 用于抑制装置和所得装置的氧气和水分降解的方法
    • US20070040501A1
    • 2007-02-22
    • US11207691
    • 2005-08-18
    • Bruce AitkenMark LewisMark Quesada
    • Bruce AitkenMark LewisMark Quesada
    • H05B33/04
    • B05D5/00C03C3/122C03C3/14C03C3/247H01L51/5253
    • A method for inhibiting oxygen and moisture degradation of a device and the resulting device are described herein. To inhibit the oxygen and moisture degradation of the device, a low liquidus temperature (LLT) material which typically has a low liquidus temperature (or in specific embodiments a low glass transition temperature) is used to form a barrier layer on the device. The LLT material can be, for example, tin fluorophosphate glass, chalcogenide glass, tellurite glass and borate glass. The LLT material can be deposited onto the device by, for example, sputtering, evaporation, laser-ablation, spraying, pouring, frit-deposition, vapor-deposition, dip-coating, painting or rolling, spin-coating or any combination thereof. Defects in the LLT material from the deposition step can be removed by a consolidation step (heat treatment), to produce a pore-free, gas and moisture impenetrable protective coating on the device. Although many of the deposition methods are possible with common glasses (i.e. high melting temperature glasses like borate silicate, silica, etc.), the consolidation step is only practical with the LLT material where the consolidation temperature is sufficiently low so as to not damage the inner layers in the device.
    • 本文描述了一种用于抑制装置和所得装置的氧气和水分降解的方法。 为了抑制器件的氧气和水分降解,使用通常具有低液相线温度(或在特定实施方案中为低玻璃化转变温度)的低液相线温度(LLT)材料在器件上形成阻挡层。 LLT材料可以是例如氟磷酸铁玻璃,硫族化物玻璃,碲化物玻璃和硼酸盐玻璃。 通过例如溅射,蒸发,激光烧蚀,喷涂,浇注,玻璃料沉积,气相沉积,浸涂,喷涂或轧制,旋涂或其任何组合,可将LLT材料沉积到器件上。 来自沉积步骤的LLT材料的缺陷可以通过固结步骤(热处理)去除,以在器件上产生无孔隙的气体和湿气不透明的保护涂层。 虽然许多沉积方法可以用普通玻璃(即,高熔点玻璃像硼酸硅酸盐,二氧化硅等)进行,但是固结步骤仅适用于LLT材料,其中固结温度足够低以免损坏 设备内层。