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    • 1. 发明申请
    • Reference current generator
    • 参考电流发生器
    • US20060125460A1
    • 2006-06-15
    • US11299188
    • 2005-12-09
    • Bong MheenMin ChoChong KwonJin Kang
    • Bong MheenMin ChoChong KwonJin Kang
    • G05F3/16G05F3/20
    • G05F3/30G05F3/262
    • Provided is a low-reference-current generator that includes a circuit employing two feedback loops enabling it to operate even at a low voltage, has a high power supply rejection ratio (PSRR) to control power supply noise, and simply forms a voltage without a voltage-to-current converter used in a conventional general reference current generator. The reference current generator includes: a first voltage generator receiving a predetermined current and generating a first voltage that decreases as temperature increases; a second voltage generator generating a second voltage that increases as temperature increases; a first current generator generating a first current corresponding to the first voltage; a second current generator generating a second current corresponding to the second voltage; and a reference current generator receiving the first current and the second current and generating a reference current that is the sum of the first current and the second current.
    • 提供了一种低参考电流发生器,其包括使用两个反馈回路的电路,使得其能够在低电压下操作,具有高电源抑制比(PSRR)以控制电源噪声,并且简单地形成电压,而不需要 用于常规通用参考电流发生器的电压 - 电流转换器。 参考电流发生器包括:接收预定电流并产生随温度升高而降低的第一电压的第一电压发生器; 产生随着温度升高而增加的第二电压的第二电压发生器; 产生对应于第一电压的第一电流的第一电流发生器; 产生对应于第二电压的第二电流的第二电流发生器; 以及参考电流发生器,接收第一电流和第二电流,并产生作为第一电流和第二电流之和的参考电流。
    • 2. 发明申请
    • CMOS image sensor
    • CMOS图像传感器
    • US20060108613A1
    • 2006-05-25
    • US11166639
    • 2005-06-24
    • Young Joo SongBong MheenJin Kang
    • Young Joo SongBong MheenJin Kang
    • H01L27/148
    • H01L27/14603H01L27/14601
    • Provided is a CMOS image sensor including a pinned photodiode and a transfer transistor. The CMOS image sensor includes: a substrate; a gate electrode disposed on the substrate and electrically isolated from the substrate by a gate insulating layer; a first floating region disposed in the substrate of one side of the gate electrode; a first impurity region for a photodiode disposed in the substrate of the other side of the gate electrode; a second floating region disposed in the substrate between the first impurity region for the photodiode and the gate electrode; and a second impurity region for the photodiode disposed in a surface portion of the substrate including the first impurity region for the photodiode and the second floating region.
    • 提供了包括钉扎光电二极管和转移晶体管的CMOS图像传感器。 CMOS图像传感器包括:基板; 栅电极,设置在所述基板上,并通过栅极绝缘层与所述基板电隔离; 设置在所述栅电极的一侧的基板中的第一浮置区域; 用于设置在栅极电极的另一侧的基板中的光电二极管的第一杂质区域; 布置在所述基板中的用于所述光电二极管的所述第一杂质区域和所述栅电极之间的第二浮置区域; 以及用于光电二极管的第二杂质区域,设置在包括用于光电二极管的第一杂质区域和第二浮动区域的基板的表面部分中。
    • 5. 发明申请
    • Pillar anchor and method for manufacturing the same
    • 支柱锚及其制造方法
    • US20050017498A1
    • 2005-01-27
    • US10897259
    • 2004-07-22
    • Jin Kang
    • Jin Kang
    • B60R22/24B60R22/00
    • B21D53/88B21D35/00B60R22/24
    • The present invention relates to an improved pillar anchor and a method for manufacturing the same. According to the pillar anchor of the present invention described as above and the method for manufacturing the same, the rims of the pair of separated base plates abut each other, so that the surface in contact with the belt is formed in a “C”-shape. Thus, it is simple to manufacture the pillar anchor of the present invention, and moreover, the number of processes needed for manufacture is reduced. In addition, since the inner peripheral surfaces of the belt insertion holes around which the belt is wound are generally formed of only a steel plate, the friction coefficient between the belt and the inner peripheral surfaces of the belt insertion holes is reduced. Accordingly, when the belt is subjected to tension, damage caused from wear and tear of the belt due to the friction between the belt and the inner peripheral surfaces of the belt insertion holes is effectively reduced. Moreover, the belt can smoothly moves on the inner peripheral surfaces of the belt insertion holes.
    • 本发明涉及一种改进的支柱锚及其制造方法。 根据如上所述的本发明的支柱锚及其制造方法,一对分离的基板的边缘彼此邻接,使得与带接触的表面形成为“C”形, 形状。 因此,制造本发明的支柱锚固件变得简单,此外,减少制造所需的工序数量。 此外,由于带卷绕的带插入孔的内周面通常仅由钢板形成,所以带与带插入孔的内周面之间的摩擦系数降低。 因此,当带受到张力时,由于带与带插入孔的内周面之间的摩擦而导致的带的磨损造成的损伤被有效地减少。 此外,带可以在带插入孔的内周面上平滑地移动。
    • 6. 发明授权
    • Method of preparing a composite of organic and inorganic compounds
    • 制备有机和无机化合物复合物的方法
    • US6107396A
    • 2000-08-22
    • US192864
    • 1998-11-16
    • Ho-jin KweonSung-soo KimDong-gon ParkJin KangHye-young Kwon
    • Ho-jin KweonSung-soo KimDong-gon ParkJin KangHye-young Kwon
    • C08K3/22C07C29/70C08F2/00C08L83/02C08J5/05
    • C07C29/70
    • A method of preparing a composite of organic and inorganic compounds includes the steps of reacting a mixed solution of a metal alkoxide and a silicon-containing compound with a catalyst to produce an alcogel of a metal oxide or a complex metal oxide. The metal alkoxide is prepared by reacting at least one metal with an alcohol and the mixed solution is prepared by mixing the metal alkoxide with the silicon-containing compound. An alcogel is produced from the reacting step and alcohol is impregnated within the inorganic oxide lattice structure of the alcogel. Furthermore, the method of preparing a composite of an organic and an inorganic compound includes the steps of centrifuging the alcogel to separate any alcohol from the alcogel to form a gel, adding an organic monomer the gel and polymerizing the organic monomer in-situ to form an organic polymer. The resulting composite has characteristics of both the parent organic and inorganic compounds.
    • 制备有机和无机化合物复合物的方法包括使金属醇盐和含硅化合物的混合溶液与催化剂反应以产生金属氧化物或复合金属氧化物的醇酸盐的步骤。 金属醇盐通过使至少一种金属与醇反应制备,并且通过将金属醇盐与含硅化合物混合来制备混合溶液。 由反应步骤产生酸酐,并将醇浸渍在铝酸盐的无机氧化物晶格结构内。 此外,制备有机和无机化合物的复合物的方法包括以下步骤:离心凝胶以从凝胶中分离任何醇以形成凝胶,加入有机单体凝胶并原位聚合有机单体以形成 有机聚合物。 所得复合材料具有母体有机和无机化合物的特征。
    • 9. 发明申请
    • Voltage-controlled oscillator using current feedback network
    • 使用电流反馈网络的压控振荡器
    • US20050156682A1
    • 2005-07-21
    • US10957749
    • 2004-10-05
    • Ja LeeSang LeeJin KangSeung Oh
    • Ja LeeSang LeeJin KangSeung Oh
    • H03B5/08H03B1/00H03B5/12
    • H03B5/1231H03B5/1215H03B5/1221H03B5/1243
    • Provided is a voltage-controlled oscillator (VCO) using a current feedback network for use in a wireless communication terminal. The voltage-controlled oscillator has high input impedance and low output impedance, so that a degree of isolation from the external load is excellent, thereby preventing degradation of the Q-factor by the load in overall oscillation circuit. In the voltage-controlled oscillator of the present invention, an LC resonator is provided to generate positive feedback, and negative resistance may be obtained at a wider frequency range by tuning a varactor of the LC resonator. And a boosting inductor is inserted into the positive feedback loop to have a greater negative resistance, therefore it is possible to prevent a problem in which the oscillation does not occur due to the parasitic resistance components generated during circuit fabrication.
    • 提供了一种使用电流反馈网络在无线通信终端中使用的压控振荡器(VCO)。 压控振荡器具有高输入阻抗和低输出阻抗,使得与外部负载的隔离度优异,从而防止整个振荡电路中的负载对Q因子的劣化。 在本发明的压控振荡器中,设置LC谐振器以产生正反馈,并且通过调谐LC谐振器的变容二极管可以在更宽的频率范围内获得负电阻。 并且将增压电感器插入到正反馈回路中以具有更大的负电阻,因此可以防止由于在电路制造期间产生的寄生电阻分量而不发生振荡的问题。
    • 10. 发明申请
    • METHOD FOR FORMING SELF ALIGNED CONTACTS FOR INTEGRATED CIRCUIT DEVICES
    • 用于形成用于集成电路设备的自对准接触的方法
    • US20080153294A1
    • 2008-06-26
    • US11697287
    • 2007-04-05
    • Jin KangMingching Wang
    • Jin KangMingching Wang
    • H01L21/3065
    • H01L21/02063H01L21/76831H01L21/76897
    • A method for processing integrated circuit devices including forming self aligned contact regions. The method includes providing a partially completed semiconductor wafer, the wafer including one or more semiconductor chips, where each of the chips including a plurality of MOS gate structures. Each of the gate structures is formed on a substrate and having a first layer of silicon nitride formed overlying portions including a contact region between the gate structures. Each of the chips has conformal layer of doped silicon glass of a predetermined thickness overlying the silicon nitride layer and the gate structures. The method then applies a plasma etching process to the doped silicon glass to expose a portion of the first silicon nitride layer using an anisotropic etching component to vertically remove portions of the doped silicon glass. A step of cleaning the exposed portion of silicon nitride using an isotropic component is also included. The method forms a second silicon nitride layer on the exposed portion of the second silicon nitride layer and removes the second silicon nitride layer and exposed portion of the first silicon nitride layer to expose the contract region on the substrate. The method processes the exposed contact region using a soft etching technique.
    • 一种用于处理集成电路器件的方法,包括形成自对准接触区域。 该方法包括提供部分完成的半导体晶片,晶片包括一个或多个半导体芯片,其中每个芯片包括多个MOS栅极结构。 栅极结构中的每一个形成在衬底上,并且具有形成在栅极结构之间的接触区域的覆盖部分的第一氮化硅层。 每个芯片具有覆盖氮化硅层和栅极结构的预定厚度的掺杂硅玻璃的保形层。 然后,该方法对掺杂的硅玻璃施加等离子体蚀刻工艺,以使用各向异性蚀刻部件暴露第一氮化硅层的一部分,以垂直去除掺杂的硅玻璃的部分。 还包括使用各向同性组分清洁氮化硅的暴露部分的步骤。 该方法在第二氮化硅层的暴露部分上形成第二氮化硅层,并且去除第二氮化硅层和第一氮化硅层的暴露部分以暴露衬底上的合约区域。 该方法使用软蚀刻技术处理曝光的接触区域。