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1. 发明授权

US07581305B2 Method of manufacturing an optical component 有权
标题翻译：制造光学部件的方法
公开(公告)号：US07581305B2
公开(公告)日：2009-09-01
申请号：US10821959
申请日：2004-04-12
申请人： Bernhard Geuppert , Jens Kugler , Thomas Ittner , Bernd Geh , Rolf Freimann , Guenther Seitz , Bernhard Fellner , Bernd Doerband , Stefan Schulte
发明人： Bernhard Geuppert , Jens Kugler , Thomas Ittner , Bernd Geh , Rolf Freimann , Guenther Seitz , Bernhard Fellner , Bernd Doerband , Stefan Schulte
IPC分类号： G01R31/28
CPC分类号： G03F7/706 , B24B13/0055 , G03F7/70825 , Y10T29/49002 , Y10T29/49004 , Y10T29/4902 , Y10T29/49131 , Y10T29/49171
摘要： A method of manufacturing an optical component comprising a substrate and a mounting frame with plural contact portions disposed at predetermined distances from each other is provided. The method comprises providing a measuring frame separate from the mounting frame for mounting the substrate, which measuring frame comprises a number of contact portions equal to a number of the contact portions of the mounting frame, wherein respective distances between the contact portions of the measuring frame are substantially equal to the corresponding distances between those of the mounting frame, measuring a shape of the optical surface of the substrate, while the substrate is mounted on the measuring frame, and mounting the substrate on the mounting frame such that the contact portions of the mounting frame are attached to the substrate at regions which are substantially the same as contact regions at which the substrate was attached to the measuring frame.
摘要翻译：提供了一种制造光学部件的方法，该光学部件包括基板和安装框架，所述安装框架具有彼此以预定距离设置的多个接触部分。该方法包括提供与用于安装基板的安装框架分离的测量框架，该测量框架包括等于安装框架的多个接触部分的多个接触部分，其中测量框架的接触部分之间的相应距离基本上等于安装框架的相应距离，测量基板的光学表面的形状，同时将基板安装在测量框架上，以及将基板安装在安装框架上，使得接触部分安装框架在与基板附接到测量框架的接触区域基本相同的区域处附接到基板。

2. 发明申请

US20050223539A1 Method of manufacturing an optical component and optical system using the same 有权
标题翻译：制造使用其的光学部件和光学系统的方法
公开(公告)号：US20050223539A1
公开(公告)日：2005-10-13
申请号：US10821959
申请日：2004-04-12
申请人： Bernhard Geuppert , Jens Kugler , Thomas Ittner , Bernd Geh , Rolf Freimann , Guenther Seitz , Bernhard Fellner , Bernd Doerband , Stefan Schulte
发明人： Bernhard Geuppert , Jens Kugler , Thomas Ittner , Bernd Geh , Rolf Freimann , Guenther Seitz , Bernhard Fellner , Bernd Doerband , Stefan Schulte
IPC分类号： B24B13/005 , G02B7/00 , G03F7/20 , G11B7/24
CPC分类号： G03F7/706 , B24B13/0055 , G03F7/70825 , Y10T29/49002 , Y10T29/49004 , Y10T29/4902 , Y10T29/49131 , Y10T29/49171
摘要： A method of manufacturing an optical component comprising a substrate and a mounting frame with plural contact portions disposed at predetermined distances from each other is provided. The method comprises providing a measuring frame separate from the mounting frame for mounting the substrate, which measuring frame comprises a number of contact portions equal to a number of the contact portions of the mounting frame, wherein respective distances between the contact portions of the measuring frame are substantially equal to the corresponding distances between those of the mounting frame, measuring a shape of the optical surface of the substrate, while the substrate is mounted on the measuring frame, and mounting the substrate on the mounting frame such that the contact portions of the mounting frame are attached to the substrate at regions which are substantially the same as contact regions at which the substrate was attached to the measuring frame.
摘要翻译：提供了一种制造光学部件的方法，该光学部件包括基板和安装框架，所述安装框架具有彼此以预定距离设置的多个接触部分。该方法包括提供与用于安装基板的安装框架分离的测量框架，该测量框架包括等于安装框架的多个接触部分的多个接触部分，其中测量框架的接触部分之间的相应距离基本上等于安装框架的相应距离，测量基板的光学表面的形状，同时将基板安装在测量框架上，以及将基板安装在安装框架上，使得接触部分安装框架在与基板附接到测量框架的接触区域基本相同的区域处附接到基板。

3. 发明申请

US20100177321A1 OPTICAL ELEMENT AND METHOD OF CALIBRATING A MEASURING APPARATUS COMPRISING A WAVE SHAPING STRUCTURE 有权
标题翻译：光学元件和校准包含波形结构的测量装置的方法
公开(公告)号：US20100177321A1
公开(公告)日：2010-07-15
申请号：US12684632
申请日：2010-01-08
申请人： Jochen HETZLER , Frank Schillke , Stefan Schulte , Rolf Freimann , Bernd Doerband
发明人： Jochen HETZLER , Frank Schillke , Stefan Schulte , Rolf Freimann , Bernd Doerband
IPC分类号： G01B11/02
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441 , G01M11/025 , G01M11/0271 , Y10T29/49771
摘要： Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.
摘要翻译：具有光学表面的光学元件，该光学表面适于非球形目标形状，使得光学表面的实际形状相对于目标形状的长波变化被限制为最大值为0.2nm，其中所述长波变化仅包括具有等于或大于10mm的最小空间波长的空间波长的振荡。

4. 发明申请

US20050275849A1 Method of calibrating an interferometer and method of manufacturing an optical element 审中-公开
标题翻译：校准干涉仪的方法和制造光学元件的方法
公开(公告)号：US20050275849A1
公开(公告)日：2005-12-15
申请号：US11133329
申请日：2005-05-20
申请人： Rolf Freimann , Bernd Doerband , Frank Schillke , Susanne Beder , Stefan Schulte
发明人： Rolf Freimann , Bernd Doerband , Frank Schillke , Susanne Beder , Stefan Schulte
IPC分类号： G01B9/02 , G01M11/00
CPC分类号： G01B9/02072 , G01B9/02039 , G01M11/005
摘要： A method of calibrating an interferometer for determining an optical property of the interferometer uses a calibrating optical arrangement. The calibrating optical arrangement comprises at least one diffractive pattern and a mirror having a reflecting surface. The diffractive pattern and the reflecting surface are disposed at a distance from each other in a beam path of measuring light emitted from an interferometer optics of the interferometer system to be calibrated.
摘要翻译：校准用于确定干涉仪的光学特性的干涉仪的方法使用校准光学装置。校准光学装置包括至少一个衍射图案和具有反射表面的反射镜。衍射图案和反射表面设置在从待校准的干涉仪系统的干涉仪光学器件发射的测量光束的光束路径中彼此间隔一定距离处。

5. 发明授权

US08593642B2 Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device 有权
标题翻译：基于计算组合的表面区域测量和干涉测量装置测量光学表面的形状的方法
公开(公告)号：US08593642B2
公开(公告)日：2013-11-26
申请号：US13417487
申请日：2012-03-12
申请人： Rolf Freimann , Bernd Doerband , Stefan Schulte , Albrecht Hof , Frank Riepenhausen , Matthias Manger , Dietmar Neugebauer , Helmut Issler , Armin Bich
发明人： Rolf Freimann , Bernd Doerband , Stefan Schulte , Albrecht Hof , Frank Riepenhausen , Matthias Manger , Dietmar Neugebauer , Helmut Issler , Armin Bich
IPC分类号： G01B11/02
CPC分类号： G01B11/2441 , G01B9/02027 , G01B9/02039 , G01B9/02057 , G01B9/02072 , G01B2290/15 , G01M11/005 , G01M11/025 , G01M11/0271 , G02B3/02 , G02B5/10
摘要： Measuring a shape of an optical surface (14) of a test object (12) includes: providing an interferometric measuring device (16) generating a measurement wave (18); arranging the measuring device (16) and the test object (12) consecutively at different measurement positions relative to each other, such that different regions (20) of the optical surface (14) are illuminated by the measurement wave (18); measuring positional coordinates of the measuring device (16) at the different measurement positions in relation to the test object (12); obtaining surface region measurements by interferometrically measuring the wavefront of the measurement wave (18) after interaction with the respective region (20) of the optical surface (14) using the measuring device (16) in each of the measurement positions; and determining the actual shape of the optical surface (14) by computationally combining the surface region measurements based on the measured positional coordinates of the measuring device (16) at each of the measurement positions.
摘要翻译：测量被测物体（12）的光学表面（14）的形状包括：提供产生测量波（18）的干涉测量装置（16）; 使测量装置（16）和测试对象（12）相对于彼此的不同测量位置连续布置，使得光学表面（14）的不同区域（20）被测量波（18）照亮; 测量所述测量装置（16）在与所述测试对象（12）相关的不同测量位置处的位置坐标; 通过在每个测量位置中使用测量装置（16）在与光学表面（14）的相应区域（20）相互作用之后干涉测量测量波（18）的波前来获得表面区域测量; 以及通过基于在每个测量位置处测量装置（16）的测量位置坐标计算地组合表面区域测量来确定光学表面（14）的实际形状。

6. 发明授权

US08089634B2 Optical element and method of calibrating a measuring apparatus comprising a wave shaping structure 有权
标题翻译：光学元件和校准包括波形整形结构的测量装置的方法
公开(公告)号：US08089634B2
公开(公告)日：2012-01-03
申请号：US12684632
申请日：2010-01-08
申请人： Jochen Hetzler , Frank Schillke , Stefan Schulte , Rolf Freimann , Bernd Doerband
发明人： Jochen Hetzler , Frank Schillke , Stefan Schulte , Rolf Freimann , Bernd Doerband
IPC分类号： G01B9/02 , G01B11/02
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441 , G01M11/025 , G01M11/0271 , Y10T29/49771
摘要： Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.
摘要翻译：具有光学表面的光学元件，该光学表面适于非球形目标形状，使得光学表面的实际形状相对于目标形状的长波变化被限制为最大值为0.2nm，其中所述长波变化仅包括具有等于或大于10mm的最小空间波长的空间波长的振荡。

7. 发明授权

US08159678B2 Method of measuring a deviation of an optical surface from a target shape 有权
公开(公告)号：US08159678B2
公开(公告)日：2012-04-17
申请号：US13030748
申请日：2011-02-18
申请人： Ralf Arnold , Stefan Schulte , Bernd Doerband
发明人： Ralf Arnold , Stefan Schulte , Bernd Doerband
IPC分类号： G01B11/02
摘要： A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.

8. 发明申请

US20110141484A1 METHOD OF MEASURING A DEVIATION OF AN OPTICAL SURFACE FROM A TARGET SHAPE 有权
标题翻译：测量目标形状的光学表面偏差的方法
公开(公告)号：US20110141484A1
公开(公告)日：2011-06-16
申请号：US13030748
申请日：2011-02-18
申请人： Ralf ARNOLD , Stefan Schulte , Bernd Doerband
发明人： Ralf ARNOLD , Stefan Schulte , Bernd Doerband
IPC分类号： G01B11/02
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441 , G01M11/025 , G01M11/0271 , Y10T29/49771
摘要： A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.
摘要翻译：对准至少两个波形整形元件的方法，测量光学表面与目标形状的偏差的方法和用于干涉测量光学表面与目标形状的偏差的测量装置。对准至少两个波形整形元件的方法，其中每个波形整形元件具有衍射测量结构，用于将入射光的一部分波前适应到目标形状的相应部分，包括：提供第一波具有衍射对准结构的成形元件，将波形整形元件相对于彼此布置，使得每个衍射测量结构在测量设备的操作期间被入射光的单独的子集子穿过，并且对准第一波形整形元件和第二波形成形元件相对于彼此，通过评估与衍射对准结构和第二波形整形元件连续相互作用的对准光。

9. 发明授权

US08508749B2 Method of measuring a deviation of an optical surface from a target shape using interferometric measurement results 有权
标题翻译：使用干涉测量结果测量光学表面与目标形状的偏差的方法
公开(公告)号：US08508749B2
公开(公告)日：2013-08-13
申请号：US13609084
申请日：2012-09-10
申请人： Ralf Arnold , Stefan Schulte , Bernd Doerband
发明人： Ralf Arnold , Stefan Schulte , Bernd Doerband
IPC分类号： G01B11/02
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441 , G01M11/025 , G01M11/0271 , Y10T29/49771
摘要： A method of measuring a deviation of an optical surface from a target shape and a method of manufacturing an optical element. This method of measuring the deviation includes: performing a first interferometric measurement using a first diffractive measurement structure, which is arranged to cover a first area of the optical surface, to provide a first interferometric measurement result, performing a second interferometric measurement using a second diffractive measurement structure, which is arranged to cover a second area of the optical surface different from the first area, to provide a second interferometric measurement result, and determining a deviation of the optical surface from the target shape.
摘要翻译：测量光学表面与目标形状的偏差的方法和制造光学元件的方法。这种测量偏差的方法包括：使用被布置成覆盖光学表面的第一区域的第一衍射测量结构来执行第一干涉测量，以提供第一干涉测量结果，使用第二衍射进行第二干涉测量测量结构被布置成覆盖与第一区域不同的光学表面的第二区域，以提供第二干涉测量结果，以及确定光学表面与目标形状的偏差。

10. 发明申请

US20100177320A1 METHOD OF MEASURING A DEVIATION OF AN OPTICAL SURFACE FROM A TARGET SHAPE 有权
标题翻译：测量目标形状的光学表面偏差的方法
公开(公告)号：US20100177320A1
公开(公告)日：2010-07-15
申请号：US12684600
申请日：2010-01-08
申请人： Ralf Arnold , Stefan Schulte , Bernd Doerband
发明人： Ralf Arnold , Stefan Schulte , Bernd Doerband
IPC分类号： G01B11/02 , G02B13/18
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441 , G01M11/025 , G01M11/0271 , Y10T29/49771
摘要： A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.
摘要翻译：对准至少两个波形整形元件的方法，测量光学表面与目标形状的偏差的方法和用于干涉测量光学表面与目标形状的偏差的测量装置。对准至少两个波形整形元件的方法，其中每个波形整形元件具有衍射测量结构，用于将入射光的一部分波前适应到目标形状的相应部分，包括：提供第一波具有衍射对准结构的成形元件，将波形整形元件相对于彼此布置，使得每个衍射测量结构在测量设备的操作期间被入射光的单独的子集子穿过，并且对准第一波形整形元件和第二波形成形元件相对于彼此，通过评估与衍射对准结构和第二波形整形元件连续相互作用的对准光。

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