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1. 发明授权

US08687203B2 Method and apparatus for determining a shape of an optical test surface 有权
标题翻译：用于确定光学测试表面的形状的方法和装置
公开(公告)号：US08687203B2
公开(公告)日：2014-04-01
申请号：US13399716
申请日：2012-02-17
申请人： Bernd Doerband
发明人： Bernd Doerband
IPC分类号： G01B11/02
CPC分类号： G01B11/2441 , G01B9/02039 , G01B9/02085 , G01B2210/52 , G01M11/005
摘要： A method of determining a shape of an optical test surface (14) includes: with adaptation optics (20), adapting a wavefront of a measuring beam (30) to a desired shape of the optical test surface (14), interferometrically measuring the shape of the optical test surface (14) with the adapted measuring beam, irradiating the adapted measuring beam at different angles of incidence onto the optical test surface and respectively measuring the wavefront of the measuring beam after the interaction of the measuring beam with the optical test surface (14), establishing the effect of the adaptation optics (20) upon the interferometric measurement result from the wavefronts measured for the individual angles of incidence, and determining the shape of the optical test surface (14) by removing the established effect of the adaptation optics (20) from the interferometric measurement result.
摘要翻译：确定光学测试表面（14）的形状的方法包括：具有自适应光学器件（20），使测量光束（30）的波前适应于光学测试表面（14）的期望形状，干涉测量形状的光学测试表面（14）与适配的测量光束照射，将适应的测量光束以不同的入射角照射到光学测试表面上，并且在测量光束与光学测试表面相互作用之后分别测量测量光束的波前（14），确定适应光学器件（20）对由各个入射角测量的波前的干涉测量结果的影响，以及通过消除适应性的确定的影响来确定光学测试表面（14）的形状光学（20）从干涉测量结果。

2. 发明申请

US20100177321A1 OPTICAL ELEMENT AND METHOD OF CALIBRATING A MEASURING APPARATUS COMPRISING A WAVE SHAPING STRUCTURE 有权
标题翻译：光学元件和校准包含波形结构的测量装置的方法
公开(公告)号：US20100177321A1
公开(公告)日：2010-07-15
申请号：US12684632
申请日：2010-01-08
申请人： Jochen HETZLER , Frank Schillke , Stefan Schulte , Rolf Freimann , Bernd Doerband
发明人： Jochen HETZLER , Frank Schillke , Stefan Schulte , Rolf Freimann , Bernd Doerband
IPC分类号： G01B11/02
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441 , G01M11/025 , G01M11/0271 , Y10T29/49771
摘要： Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.
摘要翻译：具有光学表面的光学元件，该光学表面适于非球形目标形状，使得光学表面的实际形状相对于目标形状的长波变化被限制为最大值为0.2nm，其中所述长波变化仅包括具有等于或大于10mm的最小空间波长的空间波长的振荡。

3. 发明申请

US20080117436A1 Method of manufacturing an optical element 有权
标题翻译：制造光学元件的方法
公开(公告)号：US20080117436A1
公开(公告)日：2008-05-22
申请号：US11905235
申请日：2007-09-28
申请人： Michael Altenberger , Bernd Doerband , Thomas Willkens
发明人： Michael Altenberger , Bernd Doerband , Thomas Willkens
IPC分类号： G01B9/02
CPC分类号： G01B9/02065 , G01B9/02057 , G01B9/0209 , G01B2290/15
摘要： A method of manufacturing an optical element involves an interferometric test of the optical element using an interferometer system of a Fizeau type combined with principles of white-light interferometry. The optical element is disposed in a cavity between a Fizeau surface and a mirror, and an optical path difference between a back surface of the optical element and the mirror is determined for determining parameters of the optical element, such as a thickness thereof. Measuring light from an optical delay apparatus can be supplied to the Fizeau interferometer through an optical fiber.
摘要翻译：制造光学元件的方法涉及使用与白光干涉测量原理结合的Fizeau型干涉仪系统进行光学元件的干涉测试。光学元件设置在Fizeau表面和反射镜之间的空腔中，并且确定光学元件的后表面与反射镜之间的光程差，以确定诸如其厚度的光学元件的参数。可以通过光纤将来自光学延迟装置的测量光提供给Fizeau干涉仪。

4. 发明授权

US08159678B2 Method of measuring a deviation of an optical surface from a target shape 有权
公开(公告)号：US08159678B2
公开(公告)日：2012-04-17
申请号：US13030748
申请日：2011-02-18
申请人： Ralf Arnold , Stefan Schulte , Bernd Doerband
发明人： Ralf Arnold , Stefan Schulte , Bernd Doerband
IPC分类号： G01B11/02
摘要： A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.

5. 发明申请

US20110141484A1 METHOD OF MEASURING A DEVIATION OF AN OPTICAL SURFACE FROM A TARGET SHAPE 有权
标题翻译：测量目标形状的光学表面偏差的方法
公开(公告)号：US20110141484A1
公开(公告)日：2011-06-16
申请号：US13030748
申请日：2011-02-18
申请人： Ralf ARNOLD , Stefan Schulte , Bernd Doerband
发明人： Ralf ARNOLD , Stefan Schulte , Bernd Doerband
IPC分类号： G01B11/02
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441 , G01M11/025 , G01M11/0271 , Y10T29/49771
摘要： A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.
摘要翻译：对准至少两个波形整形元件的方法，测量光学表面与目标形状的偏差的方法和用于干涉测量光学表面与目标形状的偏差的测量装置。对准至少两个波形整形元件的方法，其中每个波形整形元件具有衍射测量结构，用于将入射光的一部分波前适应到目标形状的相应部分，包括：提供第一波具有衍射对准结构的成形元件，将波形整形元件相对于彼此布置，使得每个衍射测量结构在测量设备的操作期间被入射光的单独的子集子穿过，并且对准第一波形整形元件和第二波形成形元件相对于彼此，通过评估与衍射对准结构和第二波形整形元件连续相互作用的对准光。

6. 发明授权

US07738117B2 Method of manufacturing an optical element 有权
标题翻译：制造光学元件的方法
公开(公告)号：US07738117B2
公开(公告)日：2010-06-15
申请号：US11905235
申请日：2007-09-28
申请人： Michael Altenberger , Bernd Doerband , Thomas Willkens
发明人： Michael Altenberger , Bernd Doerband , Thomas Willkens
IPC分类号： G01B11/02
CPC分类号： G01B9/02065 , G01B9/02057 , G01B9/0209 , G01B2290/15
摘要： A method of manufacturing an optical element involves an interferometric test of the optical element using an interferometer system of a Fizeau type combined with principles of white-light interferometry. The optical element is disposed in a cavity between a Fizeau surface and a mirror, and an optical path difference between a back surface of the optical element and the mirror is determined for determining parameters of the optical element, such as a thickness thereof. Measuring light from an optical delay apparatus can be supplied to the Fizeau interferometer through an optical fiber.
摘要翻译：制造光学元件的方法涉及使用与白光干涉测量原理结合的Fizeau型干涉仪系统进行光学元件的干涉测试。光学元件设置在Fizeau表面和反射镜之间的空腔中，并且确定光学元件的后表面与反射镜之间的光程差，以确定诸如其厚度的光学元件的参数。可以通过光纤将来自光学延迟装置的测量光提供给Fizeau干涉仪。

7. 发明授权

US07436520B1 Method of calibrating an interferometer optics and of processing an optical element having an optical surface 有权
标题翻译：校准干涉仪光学元件和处理具有光学表面的光学元件的方法
公开(公告)号：US07436520B1
公开(公告)日：2008-10-14
申请号：US11035723
申请日：2005-01-18
申请人： Bernd Doerband
发明人： Bernd Doerband
IPC分类号： G01B11/02
CPC分类号： G01B11/2441 , G01B9/02039 , G01B9/02057 , G01B9/02072 , G01M11/025 , G01M11/0271
摘要： A method of calibrating an interferometer apparatus uses a calibrating element having a plurality of structures comprising at least one of projections and indentations formed on a surface of the calibrating element at predetermined positions to generate interference fringes in the interferometer apparatus to be calibrated.
摘要翻译：校准干涉仪装置的方法使用具有多个结构的校准元件，该多个结构包括在预定位置上形成在校准元件的表面上的突起和凹陷中的至少一个，以在待校准的干涉仪装置中产生干涉条纹。

8. 发明授权

US07167251B1 Method of processing an optical substrate 有权
标题翻译：光学基板的处理方法
公开(公告)号：US07167251B1
公开(公告)日：2007-01-23
申请号：US11230455
申请日：2005-09-21
申请人： Wilhelm Ulrich , Bernd Doerband , Rudolf Tannert
发明人： Wilhelm Ulrich , Bernd Doerband , Rudolf Tannert
IPC分类号： G01B11/02
CPC分类号： G01B9/02024 , G01B9/02018 , G01B9/02039 , G01M11/0214 , G01M11/025 , G01M11/0271 , G01N21/93 , G01N2021/8416 , G01N2021/9511
摘要： A method of processing an optical substrate having a convex surface comprises an interferometric measurement using a beam of diverging measuring light traversing the substrate and reflected from a concave mirror.
摘要翻译：一种处理具有凸面的光学基片的方法包括使用穿过基底并从凹面镜反射的发散测量光束的干涉测量。

9. 发明申请

US20050225774A1 Method for measuring and manufacturing an optical element and optical apparatus 审中-公开
标题翻译：光学元件和光学装置的测量和制造方法
公开(公告)号：US20050225774A1
公开(公告)日：2005-10-13
申请号：US11098546
申请日：2005-04-05
申请人： Rolf Freimann , Susanne Beder , Guenther Seitz , Frank Schillke , Bernd Doerband , Heinz Martin , Franz Krug
发明人： Rolf Freimann , Susanne Beder , Guenther Seitz , Frank Schillke , Bernd Doerband , Heinz Martin , Franz Krug
IPC分类号： G01B9/02 , G01M11/02 , G02B13/18 , G02B27/62
CPC分类号： G01M11/0214 , G01M11/025 , G01M11/0271 , G02B13/18 , G02B27/62
摘要： A method of processing an optical element comprises testing the optical surface of the optical element using an interferometer optics for generating a beam of measuring light; wherein the interferometer optics has a plurality of optical elements which are configured and arranged such that the measuring light is substantially orthogonally incident on a reflecting surface, at each location thereof; and wherein the method further comprises: measuring at least one property of the interferometer optics, disposing the optical surface of the optical element at a measuring position relative to the interferometer optics within the beam of measuring light, and performing at least one interferometric measurement; determining deviations of the optical surface of the first optical element from a target shape thereof, based on the interferometric measurement and the at least one measured property of the interferometer optics.
摘要翻译：一种处理光学元件的方法包括使用用于产生测量光束的干涉仪光学器件来测试光学元件的光学表面; 其中所述干涉仪光学元件具有多个光学元件，所述多个光学元件被配置和布置成使得所述测量光在其每个位置处基本正交入射在反射表面上; 并且其中所述方法还包括：测量所述干涉仪光学器件的至少一个属性，将所述光学元件的光学表面相对于所述测量光束内的所述干涉仪光学器件设置在测量位置处，并且执行至少一个干涉测量; 基于干涉测量和干涉仪光学器件的至少一个测量特性，确定第一光学元件的光学表面与其目标形状的偏差。

10. 发明授权

US08508749B2 Method of measuring a deviation of an optical surface from a target shape using interferometric measurement results 有权
标题翻译：使用干涉测量结果测量光学表面与目标形状的偏差的方法
公开(公告)号：US08508749B2
公开(公告)日：2013-08-13
申请号：US13609084
申请日：2012-09-10
申请人： Ralf Arnold , Stefan Schulte , Bernd Doerband
发明人： Ralf Arnold , Stefan Schulte , Bernd Doerband
IPC分类号： G01B11/02
CPC分类号： G01B9/021 , G01B9/02039 , G01B11/2441 , G01M11/025 , G01M11/0271 , Y10T29/49771
摘要： A method of measuring a deviation of an optical surface from a target shape and a method of manufacturing an optical element. This method of measuring the deviation includes: performing a first interferometric measurement using a first diffractive measurement structure, which is arranged to cover a first area of the optical surface, to provide a first interferometric measurement result, performing a second interferometric measurement using a second diffractive measurement structure, which is arranged to cover a second area of the optical surface different from the first area, to provide a second interferometric measurement result, and determining a deviation of the optical surface from the target shape.
摘要翻译：测量光学表面与目标形状的偏差的方法和制造光学元件的方法。这种测量偏差的方法包括：使用被布置成覆盖光学表面的第一区域的第一衍射测量结构来执行第一干涉测量，以提供第一干涉测量结果，使用第二衍射进行第二干涉测量测量结构被布置成覆盖与第一区域不同的光学表面的第二区域，以提供第二干涉测量结果，以及确定光学表面与目标形状的偏差。

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