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1. 发明授权

US08546249B2 Selective growth of polycrystalline silicon-containing semiconductor material on a silicon-containing semiconductor surface 有权
标题翻译：在含硅半导体表面上选择性地生长多晶含硅半导体材料
公开(公告)号：US08546249B2
公开(公告)日：2013-10-01
申请号：US12449335
申请日：2008-02-15
申请人： Bernd Tillack , Bernd Heinemann , Yuji Yamamoto
发明人： Bernd Tillack , Bernd Heinemann , Yuji Yamamoto
IPC分类号： H01L29/04 , C23C16/24 , H01L33/16
CPC分类号： C23C16/24 , C23C16/0272 , C23C16/04 , C23C16/28 , H01L21/02381 , H01L21/0245 , H01L21/02532 , H01L21/02595 , H01L21/0262 , H01L21/02639
摘要： A method of depositing polycrystalline silicon exclusively on monocrystalline first silicon surface portions of a substrate surface which besides the first surface portions additionally has insulator surface portions, comprising the steps of depositing boron on the first silicon surface portions in an amount which in relation to the first silicon surface portions respectively corresponds to more than a monolayer of boron, and depositing silicon on the first silicon surface portions treated in that way.
摘要翻译：一种仅在基板表面的单晶第一硅表面部分上沉积多晶硅的方法，除了第一表面部分之外，还具有绝缘体表面部分，该方法包括以下步骤：在第一硅表面部分上沉积硼，其量相对于第一硅表面部分分别对应于多于单层的硼，并且在以这种方式处理的第一硅表面部分上沉积硅。

2. 发明申请

US20100055880A1 SELECTIVE GROWTH OF POLYCRYSTALLINE SILICON-CONTAINING SEMICONDUCTOR MATERIAL ON A SILICON-CONTAINING SEMICONDUCTOR SURFACE 有权
标题翻译：含硅半导体表面上的多晶硅含硅半导体材料的选择性生长
公开(公告)号：US20100055880A1
公开(公告)日：2010-03-04
申请号：US12449335
申请日：2008-02-15
申请人： Bernd L. Tillack , Bernd Heinemann , Yuji Yamamoto
发明人： Bernd L. Tillack , Bernd Heinemann , Yuji Yamamoto
IPC分类号： H01L21/20
CPC分类号： C23C16/24 , C23C16/0272 , C23C16/04 , C23C16/28 , H01L21/02381 , H01L21/0245 , H01L21/02532 , H01L21/02595 , H01L21/0262 , H01L21/02639
摘要： A method of depositing polycrystalline silicon exclusively on monocrystalline first silicon surface portions of a substrate surface which besides the first surface portions additionally has insulator surface portions, comprising the steps of depositing boron on the first silicon surface portions in an amount which in relation to the first silicon surface portions respectively corresponds to more than a monolayer of boron, and depositing silicon on the first silicon surface portions treated in that way.
摘要翻译：一种仅在基板表面的单晶第一硅表面部分上沉积多晶硅的方法，除了第一表面部分之外，还具有绝缘体表面部分，该方法包括以下步骤：在第一硅表面部分上沉积硼，其量相对于第一硅表面部分分别对应于多于单层的硼，并且在以这种方式处理的第一硅表面部分上沉积硅。

3. 发明授权

US10040761B2 Branched hetero polyethylene glycol and intermediate 有权
公开(公告)号：US10040761B2
公开(公告)日：2018-08-07
申请号：US13167777
申请日：2011-06-24
申请人： Yuji Yamamoto , Hiroki Yoshioka , Fumiaki Manabe
发明人： Yuji Yamamoto , Hiroki Yoshioka , Fumiaki Manabe
IPC分类号： C07D207/452 , C07D209/48 , C08G65/26 , C08G65/331 , C08G65/333 , C08G65/334 , G01N33/543
摘要： A branched hetero polyethylene glycol according to the present invention is represented by the formula [1]: wherein X and Y represent each an atomic group containing at least a functional group which reacts with a functional group present in a bio-functional molecule to form a covalent bond and the functional group contained in the atomic group X and the functional group contained in the atomic group Y are different from each other; s is an integer of 2 to 8, which represents the number of polyethylene glycol chains; n is the number of average added moles for the polyethylene glycol chain and 20≤n≤2000; and E is a branching linker moiety having s-valent bonding valency for the polyethylene glycol chains and having monovalent bonding valency for the functional group Y.

4. 发明授权

US09400427B2 Method of manufacturing fine structure body and fine structure mold 有权
标题翻译：精细结构体精细结构模具的制造方法
公开(公告)号：US09400427B2
公开(公告)日：2016-07-26
申请号：US13821379
申请日：2012-04-26
申请人： Yuji Yamamoto , Toshihiko Wada , Yoshifumi Takasu , Akihisa Yamada
发明人： Yuji Yamamoto , Toshihiko Wada , Yoshifumi Takasu , Akihisa Yamada
IPC分类号： B29C59/02 , G03F7/00 , B82Y10/00 , B82Y40/00 , B29C33/42
CPC分类号： G03F7/0002 , B29C33/42 , B29C59/02 , B82Y10/00 , B82Y40/00
摘要： The present invention is a method of manufacturing a fine structure body which manufactures the fine structure body by repeating a basic fine structure body forming step that forms a basic fine structure body by pressing a fine structure mold against a curable resin (photocurable resin film) on a surface of a base material and a release and moving step that releases the fine structure mold from the base material and moves the fine structure mold, wherein the fine structure mold includes at least a first mold depression pattern which is disposed at center area of it, and a second mold depression pattern which is disposed in at least one side part in circumference area of it, and a size of the second mold depression pattern is smaller than a size of the first mold depression pattern.
摘要翻译：本发明是一种制造精细结构体的方法，该精细结构体通过重复通过将精细结构模具压在固化树脂（光固化树脂膜）上而形成基本精细结构体的基本细微结构体形成步骤基材的表面和释放和移动步骤，从基材释放精细结构模具并移动精细结构模具，其中精细结构模具至少包括设置在其中心区域的第一凹陷图案以及设置在其圆周区域中的至少一个侧部中的第二凹陷图案，并且第二凹陷图案的尺寸小于第一凹陷图案的尺寸。

5. 发明授权

US08815241B2 Use of combination of anti-angiogenic substance and c-kit kinase inhibitor 有权
标题翻译：使用抗血管生成物质和c-kit激酶抑制剂的组合
公开(公告)号：US08815241B2
公开(公告)日：2014-08-26
申请号：US13205328
申请日：2011-08-08
申请人： Yuji Yamamoto
发明人： Yuji Yamamoto
IPC分类号： A61K39/395 , A61K31/506 , A61K31/47 , A61P35/00 , A61K31/4709 , A61K31/404 , A61K31/517 , A61K45/06 , A61K31/519 , A61K31/502 , A61K31/5377 , A61K31/4439 , A61K31/4409 , C07D215/48
CPC分类号： C07D215/48 , A61K31/404 , A61K31/4409 , A61K31/4439 , A61K31/47 , A61K31/4709 , A61K31/502 , A61K31/506 , A61K31/517 , A61K31/519 , A61K31/5377 , A61K45/06
摘要： The object of the present invention is to find a pharmaceutical composition and a method for treating cancer that show an excellent antitumor effect. Combinational use of 4-(3-chloro-4-(cyclopropylaminocarbonyl)aminophenoxy)-7-methoxy-6-quinolinecarboxamide and analogues thereof can result in an excellent antitumor effect when combined with a substance having a c-kit kinase-inhibiting activity.
摘要翻译：本发明的目的是找到显示出优异的抗肿瘤效果的药物组合物和治疗癌症的方法。当与具有c-kit激酶抑制活性的物质组合时，组合使用4-（3-氯-4-（环丙基氨基羰基）氨基苯氧基）-7-甲氧基-6-喹啉甲酰胺及其类似物可以产生优异的抗肿瘤效果。

6. 发明申请

US20130139950A1 ROTATIONAL MISALIGNMENT MEASURING DEVICE OF BONDED SUBSTRATE, ROTATIONAL MISALIGNMENT MEASURING METHOD OF BONDED SUBSTRATE, AND METHOD OF MANUFACTURING BONDED SUBSTRATE 有权
标题翻译：粘结基板的旋转误差测量装置，结合基板的旋转缺陷测量方法和制造粘结基板的方法
公开(公告)号：US20130139950A1
公开(公告)日：2013-06-06
申请号：US13691491
申请日：2012-11-30
申请人： Masato KANNAKA , Masakazu Kajita , Eiji Takahashi , Yuji Yamamoto , Masaru Akamatsu , Kunio Iba , Kenji Imanishi
发明人： Masato KANNAKA , Masakazu Kajita , Eiji Takahashi , Yuji Yamamoto , Masaru Akamatsu , Kunio Iba , Kenji Imanishi
IPC分类号： G01B11/27
CPC分类号： G01B11/272
摘要： A rotational misalignment between semiconductor wafers constituting a bonded wafer is calculated. A light source is arranged at a position which is on a front side of an opening of a notch and which is separated from an outer edge portion of a bonded wafer by a predetermined interval, and outputs light to irradiate the outer edge portion of the bonded wafer including the notch. A camera receives and photoelectrically converts reflected light that is specularly-reflected by the outer edge portion of the bonded wafer including the notch among the light outputted by the light source in order to output a brightness distribution of the reflected light as an image. A computer analyzes positions of notches from the image outputted by the camera to obtain a notch position misalignment, and further calculates a rotational misalignment between semiconductor wafers using a center position misalignment between the semiconductor wafers.
摘要翻译：计算构成接合晶片的半导体晶片之间的旋转未对准。光源布置在位于凹口的开口的前侧上并且与键合晶片的外边缘部分隔开预定间隔的位置处，并输出光以照射粘合的晶片的外边缘部分晶圆包括凹口。照相机接收并光电转换由光源输出的光中包括凹口的键合晶片的外边缘部分被镜面反射的反射光，以输出作为图像的反射光的亮度分布。计算机分析由相机输出的图像的凹口的位置以获得切口位置未对准，并且还使用半导体晶片之间的中心位置未对准来计算半导体晶片之间的旋转未对准。

7. 外观设计

USD678737S1 Hedge trimmer 有权
公开(公告)号：USD678737S1
公开(公告)日：2013-03-26
申请号：US29386196
申请日：2011-02-25
申请人： Yuji Yamamoto , Tomoaki Sato
设计人： Yuji Yamamoto , Tomoaki Sato

8. 发明申请

US20130037535A1 INDUCTION COOKER 有权
标题翻译：感应烹饪师
公开(公告)号：US20130037535A1
公开(公告)日：2013-02-14
申请号：US13642450
申请日：2011-06-10
申请人： Fumitaka Ogasawara , Takashi Takehira , Masashi Kinoshita , Yuji Yamamoto
发明人： Fumitaka Ogasawara , Takashi Takehira , Masashi Kinoshita , Yuji Yamamoto
IPC分类号： H05B6/06 , H05B6/12
CPC分类号： H05B6/062
摘要： It is an object of the present invention to provide a highly-reliable induction heating cooker capable of considerably reducing erroneous detection of boiling over of a cooking container generated at the time of cooking. The induction heating cooker includes a boiling over detecting portion to reduce a heating output of an inverter to a predetermined value when a change amount of electrostatic capacitance detected by an electrostatic capacitance detecting portion with respect to a reference value reaches an output reducing threshold value or more, and the boiling over detecting portion stops a heating action or reduces the heating output to a third set value lower than a second set value when a change rate of the detected electrostatic capacitance reaches a predetermined change rate or more, and maintains the heating output at the second set value when the change rate of the detected electrostatic capacitance is less than the predetermined change rate, during a boiling over determining period started from the time when the change amount of the detected electrostatic capacitance with respect to the reference value reaches the output reducing threshold value or more.
摘要翻译：本发明的目的是提供一种高度可靠的感应加热烹调器，其能够显着地减少在烹饪时产生的烹饪容器的沸腾的错误检测。感应加热烹调器包括沸腾检测部分，当由静电电容检测部分检测到的相对于参考值检测的静电电容的变化量达到输出降低阈值或更大时，将逆变器的加热输出减小到预定值并且当检测到的静电电容的变化率达到预定变化率或更大时，沸腾检测部分停止加热动作或将加热输出减小到低于第二设定值的第三设定值，并将加热输出保持在在从检测到的静电电容相对于基准值的变化量达到输出降低的时间开始的沸腾判定期间，当检测到的静电电容的变化率小于预定变化率时的第二设定值阈值以上。

9. 发明申请

US20120269501A1 IMAGE CAPTURING APPARATUS AND CONTROL METHOD 有权
标题翻译：图像捕获设备和控制方法
公开(公告)号：US20120269501A1
公开(公告)日：2012-10-25
申请号：US13445721
申请日：2012-04-12
申请人： Yuji Yamamoto , Kazunori Gouji
发明人： Yuji Yamamoto , Kazunori Gouji
IPC分类号： G03B7/28
CPC分类号： H04N5/2353
摘要： If an exposure control value set according to a user's instruction is out of an exposure control value control range set according to a user's instruction, the exposure control value control range is changed to a range including the exposure control value set according to the user's instruction.
摘要翻译：如果根据用户的指示设定的曝光控制值不在根据用户指令设定的曝光控制值控制范围内，则将曝光控制值控制范围改变为包括根据用户指令设定的曝光控制值的范围。

10. 外观设计

USD663594S1 Electric trimmer 有权
标题翻译：电动修剪机
公开(公告)号：USD663594S1
公开(公告)日：2012-07-17
申请号：US29400635
申请日：2011-08-31
申请人： Yuji Yamamoto , Takahiro Kamiya , Shoko Ohno , Fuzhi Zhang
设计人： Yuji Yamamoto , Takahiro Kamiya , Shoko Ohno , Fuzhi Zhang

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