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1. 发明申请

US20050286050A1 Real-time through lens image measurement system and method 审中-公开
标题翻译：实时透镜图像测量系统及方法
公开(公告)号：US20050286050A1
公开(公告)日：2005-12-29
申请号：US10882131
申请日：2004-06-29
申请人： Bausan Yuan , Martin Lee , Nobutaka Magome , Hidemi Kawai
发明人： Bausan Yuan , Martin Lee , Nobutaka Magome , Hidemi Kawai
IPC分类号： G01B11/00 , G03F7/20
CPC分类号： G03F7/70591
摘要： Embodiments of the present invention are directed to an apparatus and a method for through lens measurement for a projection system. In one embodiment, an apparatus for through lens image measurement comprises a projection lens housing containing lens elements therein, and a reflective member having a center of curvature on a first plane. The reflective member is attached to the lens housing. An optical system includes a light source, a position detector, and one or more optical elements. The optical system is attached to the lens housing and configured to direct a light from the light source through the lens elements to the reflective member which reflects the light back through the lens elements and toward the position detector. The position detector is configured to detect any image shift at the first plane due to misalignment of the lens elements with respect to the lens housing.
摘要翻译：本发明的实施例涉及一种用于投影系统的透镜测量的装置和方法。在一个实施例中，用于透镜图像测量的装置包括在其中容纳透镜元件的投影透镜壳体和在第一平面上具有曲率中心的反射构件。反射构件附接到透镜壳体。光学系统包括光源，位置检测器和一个或多个光学元件。光学系统附接到透镜壳体并且被配置为将来自光源的光通过透镜元件引导到反射构件，反射构件将光反射回透镜元件并朝向位置检测器。位置检测器被配置为由于透镜元件相对于透镜壳体的未对准而检测在第一平面处的任何图像偏移。

2. 发明申请

US20070030462A1 Low spring constant, pneumatic suspension with vacuum chamber, air bearing, active force compensation, and sectioned vacuum chambers 审中-公开
标题翻译：低弹簧常数，带真空室的气动悬架，空气轴承，主动力补偿和分段真空室
公开(公告)号：US20070030462A1
公开(公告)日：2007-02-08
申请号：US11197576
申请日：2005-08-03
申请人： Bausan Yuan , Martin Lee , Alton Phillips , Ping-Wei Chang , Akimitsu Ebihara
发明人： Bausan Yuan , Martin Lee , Alton Phillips , Ping-Wei Chang , Akimitsu Ebihara
IPC分类号： F16M1/00 , G03B27/00
CPC分类号： G02B7/005
摘要： Embodiments of the present invention are directed to an apparatus for providing a low spring constant, pneumatic suspension using vacuum for the lens in a projection system. In one embodiment, a pneumatic suspension system for a load comprises a frame; and a body movably disposed in the frame and spaced from a side wall of the frame by a gap to define a chamber in the frame above the body, the body being configured to be connected to the load. The frame includes an outlet to draw a gas from the chamber to lower the pressure in the chamber with respect to an ambient pressure outside the frame. An air bearing is formed in the gap between the body and the side wall of the frame to provide non-contact between the body and the frame. The pressure in the chamber is sufficiently lower than the ambient pressure to produce a lift force to lift the body and the load connected thereto with respect to the frame.
摘要翻译：本发明的实施例涉及一种用于在投影系统中为透镜提供使用真空的低弹簧常数气动悬架的装置。在一个实施例中，用于负载的气动悬挂系统包括框架; 以及主体，其可移动地设置在所述框架中并且通过间隙与所述框架的侧壁间隔开以在所述主体中的所述框架中限定室，所述主体被配置为连接到所述负载。该框架包括从腔室抽出气体的出口，以相对于框架外部的环境压力降低腔室中的压力。空气轴承形成在主体和框架的侧壁之间的间隙中，以在主体和框架之间提供非接触。室内的压力足够低于环境压力，以产生升高力以提升主体和相对于框架连接到其上的负载。

3. 发明申请

US20060033903A1 Moving mechanism with high bandwidth response and low force transmissibility 有权
标题翻译：具有高带宽响应和低力传递性的移动机构
公开(公告)号：US20060033903A1
公开(公告)日：2006-02-16
申请号：US10918182
申请日：2004-08-13
申请人： Bausan Yuan , Martin Lee , W. Novak
发明人： Bausan Yuan , Martin Lee , W. Novak
IPC分类号： G03B27/62
CPC分类号： G03F7/70775 , G03F7/70725 , G03F7/70758 , G03F7/70766
摘要： Methods and apparatus for providing a stage with a relatively high positioning bandwidth and low transmissibility are disclosed. According to one aspect of the present invention, a method for positioning a stage including providing a first force of a first magnitude to the stage using a primary actuator and providing a second force of a second magnitude to the stage using a secondary actuator. The first force is arranged to cause the stage to translate along a first axis. The secondary actuator is also arranged to cause the stage to translate along the first axis, and has a relatively high positioning bandwidth. The first force is arranged to enable the stage to be relatively coarsely positioned and the second force is arranged to enable the stage to be relatively finely positioned. In one embodiment, the secondary actuator is one of a voice coil motor and a piezoelectric motor.
摘要翻译：公开了提供具有相对高的定位带宽和低传输性的平台的方法和装置。根据本发明的一个方面，一种用于定位平台的方法，包括使用主致动器向舞台提供第一幅度的第一力，并使用辅助致动器向舞台提供第二大小的第二力。第一力布置成使得台架沿着第一轴线平移。次级致动器还被布置成使得平台沿着第一轴线平移，并且具有相对较高的定位带宽。第一力被布置成使得台架能够相对粗略地定位，并且第二力被布置成使得台架能够相对精细地定位。在一个实施例中，次级致动器是音圈电动机和压电电动机之一。

4. 发明申请

US20080068568A1 Projection Optical Device And Exposure Apparatus 审中-公开
标题翻译：投影光学装置和曝光装置
公开(公告)号：US20080068568A1
公开(公告)日：2008-03-20
申请号：US11662330
申请日：2005-07-18
申请人： Akimitsu Ebihara , Martin Lee , Bausan Yuan
发明人： Akimitsu Ebihara , Martin Lee , Bausan Yuan
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/709 , G03F7/70808 , G03F7/70833 , G03F7/70891
摘要： A projection optical device includes a projection optical system which projects an image of a pattern, a support device having a flexible structure to support the projection optical system, and a positioning device having an actuator to position the projection optical system. The projection optical device can include a frame to which one end of the flexible structure is attached. The projection optical system may hang from the frame via the support device, or it may be supported from below by the support device. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.
摘要翻译：投影光学装置包括投影图案的投影光学系统，具有柔性结构的支撑装置以支撑投影光学系统，以及具有用于定位投影光学系统的致动器的定位装置。投影光学装置可以包括附接有柔性结构的一端的框架。投影光学系统可以经由支撑装置从框架悬挂，或者可以由支撑装置从下方支撑投影光学系统。投影光学装置还可以包括液体供应源，其利用重力将温度控制的液体供应到投影光学系统的侧表面，以使温度控制的液体沿着投影光学系统的侧表面流动。

5. 发明申请

US20070236854A1 Anti-Gravity Device for Supporting Weight and Reducing Transmissibility 审中-公开
标题翻译：用于支撑重量和降低传播率的重力装置
公开(公告)号：US20070236854A1
公开(公告)日：2007-10-11
申请号：US11279296
申请日：2006-04-11
申请人： Martin Lee , Bausan Yuan , Susumu Makinouchi
发明人： Martin Lee , Bausan Yuan , Susumu Makinouchi
IPC分类号： H01H47/00
CPC分类号： G03F7/709 , G03F7/70716
摘要： Methods and apparatus for supporting the weight of a first stage of a stage apparatus using magnets are disclosed. According to one aspect of the present invention, and apparatus includes a first structure, a second structure, and an anti-gravity device. The anti-gravity device has a first magnet and a piston arrangement that includes a second magnet. The first magnet is coupled to the first structure, and the piston arrangement is movably interfaced with the second structure through an air bearing. The first magnet and the piston arrangement cooperate to support the first structure over the second structure relative to a vertical axis.
摘要翻译：公开了一种用于支撑使用磁体的平台装置的第一级的重量的方法和装置。根据本发明的一个方面，并且装置包括第一结构，第二结构和反重力装置。反重力装置具有包括第二磁体的第一磁体和活塞装置。第一磁体联接到第一结构，并且活塞装置通过空气轴承与第二结构可移动地接合。第一磁体和活塞装置配合以相对于垂直轴线支撑第二结构的第一结构。

6. 发明授权

US07061577B2 Image adjustor including damping assembly 失效
标题翻译：图像调节器包括阻尼组件
公开(公告)号：US07061577B2
公开(公告)日：2006-06-13
申请号：US10107269
申请日：2002-03-26
申请人： Bausan Yuan , Martin Lee , Takeshi Asami
发明人： Bausan Yuan , Martin Lee , Takeshi Asami
IPC分类号： G03B27/42 , G03B27/58 , G03B27/32
CPC分类号： G03F7/70716 , G03B27/42 , G03F7/709
摘要： An adjuster assembly (12) that adjusts the location where an image (18) from an object (20) is transferred onto a device (16) includes an adjuster (54) and a stage mover assembly (244). The stage mover assembly (244) adjusts the position of the adjuster (54). This moves the position where the image (18) is transferred onto the device (16). The adjuster assembly (12) can include a damper assembly (250) that is coupled to the stage mover assembly (244) and reduces the effect of vibration from the stage mover assembly (244) causing vibration on the rest of the apparatus.
摘要翻译：调节器（12），其调节来自物体（20）的图像（18）被转移到装置（16）上的位置包括调节器（54）和载物台移动器组件（244）。平台移动器组件（244）调节调节器（54）的位置。这将图像（18）传送到设备（16）上的位置移动。调节器组件（12）可以包括阻尼器组件（250），该阻尼器组件（250）联接到载物台移动器组件（244）并且减小来自载物台组件（244）的振动对设备的其余部分产生振动的影响。

7. 发明授权

US06590639B1 Active vibration isolation system having pressure control 失效
标题翻译：主动隔振系统具有压力控制
公开(公告)号：US06590639B1
公开(公告)日：2003-07-08
申请号：US09663184
申请日：2000-09-15
申请人： Bausan Yuan , Michael Binnard , Martin Lee
发明人： Bausan Yuan , Michael Binnard , Martin Lee
IPC分类号： G03B2762
CPC分类号： G03F7/70825 , G03F7/709
摘要： An active vibration isolation system includes a pneumatic control system and an electronic control system. The pneumatic control system supports a mass sensitive to vibration and isolates the mass from high frequency external disturbances. The electronic control system isolates the mass from low frequency external disturbances. The pneumatic control system includes a compliance chamber filled with a fluid to pneumatically support the mass, apparatus for directly measuring a pressure level in the compliance chamber, and apparatus for controlling the pressure level to minimize the effects of pressure variation in the compliance chamber. The measuring apparatus includes an instrument to measure an absolute pressure level of the compliance chamber or an instrument to measure a differential pressure level between the compliance chamber and a reference chamber having a predetermined pressure level.
摘要翻译：主动隔振系统包括气动控制系统和电子控制系统。气动控制系统支持对振动的质量敏感，并将质量与高频外部干扰隔离。电子控制系统将质量与低频外部干扰隔离开来。气动控制系统包括填充有流体的顺应室，用于气动地支撑质量，用于直接测量顺应室中的压力水平的装置，以及用于控制压力水平的装置，以使顺应室中的压力变化的影响最小化。测量装置包括用于测量柔性室的绝对压力水平的仪器或用于测量柔性室与具有预定压力水平的参考室之间的压差水平的仪器。

8. 发明申请

US20080275661A1 On-machine methods for identifying and compensating force-ripple and side-forces produced by actuators on a multiple-axis stage 有权
标题翻译：用于识别和补偿由多个执行器在多轴平台上产生的力 - 波动和侧力的机上方法
公开(公告)号：US20080275661A1
公开(公告)日：2008-11-06
申请号：US11986314
申请日：2007-11-19
申请人： Pai-Hsueh Yang , Bausan Yuan , Kazuo Masaki , Kazuhiro Hirano , Xiao-Feng Yang , Scott Coakley , Michael B. Binnard
发明人： Pai-Hsueh Yang , Bausan Yuan , Kazuo Masaki , Kazuhiro Hirano , Xiao-Feng Yang , Scott Coakley , Michael B. Binnard
IPC分类号： G01L25/00
CPC分类号： G03F7/70758 , G03F7/70725
摘要： Methods, apparatus, and systems are disclosed for identifying force-ripple and/or side-forces in actuators used for moving a multiple-axis stage. The identified force-ripple and/or side-forces can be mapped, and maps of corresponding position-dependent compensation ratios useful for correcting same are obtained. The methods are especially useful for stages providing motion in at least one degree of freedom using multiple (redundant) actuators. In an exemplary method a stage member is displaced, using at least one selected actuator, multiple times over a set distance in the range of motion of the subject actuator(s). Each displacement has a predetermined trajectory and respective starting point in the range. For each displacement, respective section force-command(s) are extracted and normalized to a reference section force-command to define a section compensation-ratio. Multiple section compensation-ratios are assembled, as functions of displacement in the range, to provide a map of compensation ratios for the actuator(s) throughout the range.
摘要翻译：公开了用于识别用于移动多轴平台的致动器中的力波动和/或侧向力的方法，装置和系统。可以对所识别的力 - 纹波和/或侧向力进行映射，并且获得用于校正相应的位置相关的补偿比的映射。这些方法对于使用多个（冗余）致动器在至少一个自由度中提供运动的阶段特别有用。在示例性方法中，使用至少一个所选择的致动器，在主体致动器的运动范围内的设定距离上移动台架构件多次。每个位移具有预定的轨迹和该范围内的相应起始点。对于每个位移，提取相应的截面力命令并将其归一化为参考部分力命令以定义截面补偿比。组合多段补偿比作为该范围内的位移的函数，以提供在整个范围内的致动器的补偿比的图。

9. 发明申请

US20060061751A1 Stage assembly including a stage having increased vertical stroke 审中-公开
标题翻译：舞台组合包括具有增加的垂直行程的舞台
公开(公告)号：US20060061751A1
公开(公告)日：2006-03-23
申请号：US10945638
申请日：2004-09-21
申请人： Ting-Chien Teng , Bausan Yuan
发明人： Ting-Chien Teng , Bausan Yuan
IPC分类号： G03B27/58
CPC分类号： G03F7/70716
摘要： A stage assembly (220) includes a stage base (202) having a guide surface (203), a first stage (206), a second stage (208), and a first mover subassembly (216) including a first mover (231) and a second mover (232) that are arranged in series. The stage base (202) supports the first stage (206), which moves relative to the stage base (202). The movers (231, 232) cooperate to move the second stage (208) relative to the first stage (206). The movers (231, 232) can include one or more attraction-only type actuators. The movers (231, 232) cooperate to move the second stage (208) along an axis that is substantially perpendicular to the guide surface (203). The stage assembly (220) can also include a second mover subassembly (216) that cooperates with the first mover subassembly (216) to move the second stage (208) with two or more degrees of freedom relative to the first stage (206). Further, the first mover (231) can directly move a portion of the second mover (232).
摘要翻译：舞台组件（220）包括具有引导表面（203），第一舞台（206），第二舞台（208）和包括第一移动器（231）的第一移动器子组件（216）的舞台基座（202）和串联布置的第二移动器（232）。舞台基座（202）支撑相对于舞台基座（202）移动的第一舞台（206）。移动器（231,232）协作以相对于第一级（206）移动第二级（208）。移动器（231,232）可以包括一个或多个仅吸引型的致动器。移动器（231,232）协作以沿着基本上垂直于引导表面（203）的轴线移动第二阶段（208）。舞台组件（220）还可以包括与第一移动器子组件（216）协作以相对于第一舞台（206）以两个或更多个自由度移动第二舞台（208）的第二动子子组件（216）。此外，第一移动器（231）可以直接移动第二移动器（232）的一部分。

10. 发明授权

US06987558B2 Reaction mass for a stage device 有权
公开(公告)号：US06987558B2
公开(公告)日：2006-01-17
申请号：US09759524
申请日：2001-01-16
申请人： Bausan Yuan , Michael Binnard
发明人： Bausan Yuan , Michael Binnard
IPC分类号： G03B27/58 , G02B27/42
CPC分类号： F16F7/1005 , G03F7/70716 , G03F7/70766
摘要： A stage assembly and support system are provided to stabilize a stage base, such as a wafer stage base or a reticle stage base, minimizing forces transmitted from the stage assembly to a stationary surface, such as the ground, and thereby preventing vibration of other parts or systems in a wafer manufacturing process. Depending of the applicable photolithography system, a reticle stage and/or a wafer stage are accelerated in response to a wafer manufacturing control system to position the semiconductor substrates. The jerking motions of the reticle stage and/or wafer stage cause reaction forces acting on the reticle stage base and/or wafer stage base. The reaction forces induce vibration to the stationary surface and surrounding parts of the photolithography system. The wafer stage assembly and support system according to this invention allow the reticle stage base and/or wafer stage base to move relative the stationary surface. The base, acting as a massive reaction mass, stores a kinetic energy from the reaction force and gradually dissipates such energy by applying small forces to the reaction mass. The stage assembly and support system according to this invention are also capable of canceling any disturbance forces acting on the base.

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