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    • 1. 发明授权
    • Thin film transistor
    • 薄膜晶体管
    • US08344373B2
    • 2013-01-01
    • US12891704
    • 2010-09-27
    • Ayumu SatoHideya KumomiRyo HayashiTomohiro Watanabe
    • Ayumu SatoHideya KumomiRyo HayashiTomohiro Watanabe
    • H01L29/786H01L21/84
    • H01L29/7869
    • To achieve, in an oxide semiconductor thin layer transistor, both the stability of threshold voltage against electric stress and suppression of variation in the threshold voltage in a transfer characteristic. A thin film transistor includes an oxide semiconductor layer and a gate insulating layer disposed so as to be in contact with the oxide semiconductor layer, wherein the oxide semiconductor layer contains hydrogen atoms and includes at least two regions that function as active layers of the oxide semiconductor and have different average hydrogen concentrations in the layer thickness direction; and when the regions functioning as the active layers of the oxide semiconductor are sequentially defined as, from the side of the gate insulating layer, a first region and a second region, the average hydrogen concentration of the first region is lower than the average hydrogen concentration of the second region.
    • 为了在氧化物半导体薄层晶体管中实现阈值电压对电应力的稳定性和抑制传输特性中阈值电压变化的两者。 薄膜晶体管包括氧化物半导体层和设置成与氧化物半导体层接触的栅极绝缘层,其中氧化物半导体层包含氢原子,并且包括至少两个用作氧化物半导体的有源层的区域 并且在层厚度方向上具有不同的平均氢浓度; 并且当用作氧化物半导体的有源层的区域依次定义为从栅极绝缘层的侧面开始第一区域和第二区域时,第一区域的平均氢浓度低于平均氢浓度 的第二个地区。
    • 2. 发明申请
    • THIN FILM TRANSISTOR
    • 薄膜晶体管
    • US20110073856A1
    • 2011-03-31
    • US12891704
    • 2010-09-27
    • Ayumu SatoHideya KumomiRyo HayashiTomohiro Watanabe
    • Ayumu SatoHideya KumomiRyo HayashiTomohiro Watanabe
    • H01L29/786H01L29/04H01L21/84
    • H01L29/7869
    • To achieve, in an oxide semiconductor thin layer transistor, both the stability of threshold voltage against electric stress and suppression of variation in the threshold voltage in a transfer characteristic. A thin film transistor includes an oxide semiconductor layer and a gate insulating layer disposed so as to be in contact with the oxide semiconductor layer, wherein the oxide semiconductor layer contains hydrogen atoms and includes at least two regions that function as active layers of the oxide semiconductor and have different average hydrogen concentrations in the layer thickness direction; and when the regions functioning as the active layers of the oxide semiconductor are sequentially defined as, from the side of the gate insulating layer, a first region and a second region, the average hydrogen concentration of the first region is lower than the average hydrogen concentration of the second region.
    • 为了在氧化物半导体薄层晶体管中实现阈值电压对电应力的稳定性和抑制传输特性中阈值电压变化的两者。 薄膜晶体管包括氧化物半导体层和设置成与氧化物半导体层接触的栅极绝缘层,其中氧化物半导体层包含氢原子,并且包括至少两个用作氧化物半导体的有源层的区域 并且在层厚度方向上具有不同的平均氢浓度; 并且当用作氧化物半导体的有源层的区域依次定义为从栅极绝缘层的侧面开始第一区域和第二区域时,第一区域的平均氢浓度低于平均氢浓度 的第二个地区。
    • 5. 发明申请
    • METHOD OF EJECTING FAULTY ABSORBENT ARTICLE
    • 喷射非吸收性物品的方法
    • US20140197079A1
    • 2014-07-17
    • US14130155
    • 2012-06-29
    • Kazuhiko TakahashiTomohiro WatanabeMasanobu Miyaki
    • Kazuhiko TakahashiTomohiro WatanabeMasanobu Miyaki
    • A61F13/15
    • A61F13/15764A61F13/15772B07C5/342
    • A method of ejecting a faulty absorbent article which includes a step of detecting a failure region of an absorbent article in which a failure location of the absorbent article exists, and a type of a failure in the failure region, by identifying a shape of the absorbent article in the course of the manufacturing line, a step of deciding the absorbent article to be ejected based on the detection result of the failure region and the type of failure in the step of detecting, and a step of disengaging, from the manufacturing line, the absorbent article decided in the step of deciding, and then ejecting the absorbent article in the course of the manufacturing line. In the step of deciding, the number of absorbent articles to be ejected in the step of ejecting is decided according to the failure region and the type of the failure.
    • 一种排出有缺陷的吸收性物品的方法,其包括检测存在吸收性物品的故障位置的吸收性物品的失效区域的步骤,以及破坏区域的失效类型,通过识别吸收性物品的形状 在制造过程中的制品,基于故障区域的检测结果和检测步骤中的故障类型来决定要排出的吸收性物品的步骤,以及从生产线脱离的步骤, 所述吸收性物品在制造过程中决定,然后喷射吸收性物品的步骤中决定。 在决定步骤中,根据故障区域和故障类型来决定喷射步骤中要喷射的吸收性物品的数量。
    • 8. 发明申请
    • LIGHT-EMITTING APPARATUS AND PRODUCTION METHOD THEREOF
    • 发光装置及其生产方法
    • US20100084648A1
    • 2010-04-08
    • US12530638
    • 2008-04-03
    • Tomohiro Watanabe
    • Tomohiro Watanabe
    • H01L29/786H01L21/30H01L33/00
    • H01L27/1225H01L27/1214H01L27/127H01L27/3262H01L29/66742H01L29/66969H01L29/78606H01L29/7869H01L51/0026H01L51/0037H01L51/5237
    • Provided is a method of producing a light-emitting apparatus having a field effect transistor for driving an organic EL device, the field effect transistor including an oxide semiconductor containing at least one element selected from In and Zn, the method including the steps of: forming a field effect transistor on a substrate; forming an insulating layer; forming a lower electrode on the insulating layer; forming an organic layer for constituting an organic EL device on the lower electrode; forming an upper electrode on the organic layer; and after the step of forming the semiconductor layer of the field effect transistor and before the step of forming the organic layer, performing heat treatment such that an amount of a component that is desorbable as H2O from the field effect transistor during the step of forming the organic layer is less than 10−5 g/m2.
    • 提供一种制造具有驱动有机EL器件的场效应晶体管的发光装置的方法,所述场效应晶体管包括含有选自In和Zn中的至少一种元素的氧化物半导体,所述方法包括以下步骤:形成 在衬底上的场效应晶体管; 形成绝缘层; 在绝缘层上形成下电极; 在下电极上形成用于构成有机EL器件的有机层; 在有机层上形成上电极; 并且在形成场效应晶体管的半导体层的步骤之后,并且在形成有机层的步骤之前,进行热处理,使得在形成所述有机层的步骤期间,来自场效应晶体管的作为H 2 O可解吸的成分的量 有机层小于10-5g / m2。