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1. 发明授权

US06721047B2 Method and apparatus for inspecting defects of a specimen 失效
标题翻译：用于检查样本缺陷的方法和装置
公开(公告)号：US06721047B2
公开(公告)日：2004-04-13
申请号：US09944858
申请日：2001-08-31
申请人： Atsushi Shimoda , Sachio Uto , Minoru Yoshida , Shunji Maeda , Toshihiko Nakata
发明人： Atsushi Shimoda , Sachio Uto , Minoru Yoshida , Shunji Maeda , Toshihiko Nakata
IPC分类号： G01N2100
CPC分类号： G01N21/95684
摘要： The object of the invention is to provide high-sensitivity detection of fine patterns on a transparent inter-layer insulative film and defects on the same layer. Detection is performed with lower-layer patterns and defects on the same layer defocused, thus allowing detection of just the defects from the process that is intended for inspection. An inspection apparatus for a specimen on which a plurality of patterns intended to have identical shapes are arranged in a uniform manner includes: an imaging optical system with a relationship between illumination wavelength and objective lens numerical aperture that provides a resolution of no more than 0.18 microns, or preferably no more than 0.13 microns; an opto-electric converter disposed at an imaging position of the imaging optical system; an auto-focus optical system formed with an optical path disposed separate from the imaging optical system, with illumination applied at an incident angle of at least 85 degrees, preferably at least 88 degrees; means for adjusting a focal position of the imaging optical system based on a detection signal from the auto-focus optical system; and means for processing electronic signals from the opto-electrical converter.
摘要翻译：本发明的目的是提供在透明层间绝缘膜上的精细图案的高灵敏度检测和同一层上的缺陷。以相同层上的较低层图案和缺陷进行检测，散焦，从而允许仅检测来自用于检查的过程的缺陷。用于其上具有相同形状的多个图案的样本的检查装置以均匀的方式布置包括：具有提供不超过0.18微米的分辨率的照明波长和物镜数值孔径之间的关系的成像光学系统，或优选不超过0.13微米; 设置在成像光学系统的成像位置处的光电转换器; 形成有与成像光学系统分开设置的光路的自动聚焦光学系统，其入射角至少为85度，优选为至少88度; 用于基于来自所述自动聚焦光学系统的检测信号调整所述成像光学系统的焦点位置的装置; 以及用于处理来自光电转换器的电子信号的装置。

2. 发明授权

US06943876B2 Method and apparatus for detecting pattern defects 失效
标题翻译：检测图案缺陷的方法和装置
公开(公告)号：US06943876B2
公开(公告)日：2005-09-13
申请号：US10223423
申请日：2002-08-20
申请人： Minoru Yoshida , Sachio Uto , Shunji Maeda , Toshihiko Nakata
发明人： Minoru Yoshida , Sachio Uto , Shunji Maeda , Toshihiko Nakata
IPC分类号： G01B11/30 , G01N21/956 , H01L21/66 , G02N21/88
CPC分类号： G01N21/95684
摘要： A method and apparatus for detecting pattern defects which includes annularly scanning of a laser beam emitted from a laser light source on a pupil of an objective lens, illuminating the scanned laser beam, through the objective lens, onto a sample on which there is formed a pattern coated with an optically transparent thin film, acquiring an optical image of the illuminated sample, and processing the acquired image to find defects in the pattern. The annular scan diameter of the laser beam is determined based on the thickness of the optically transparent thin film.
摘要翻译：一种用于检测图案缺陷的方法和装置，其包括从物镜的瞳孔上的激光光源发射的激光束的环状扫描，将扫描的激光束通过物镜照射到其上形成有涂覆有光学透明薄膜的图案，获取照射样品的光学图像，以及处理所获取的图像以发现图案中的缺陷。基于光学透明薄膜的厚度确定激光束的环形扫描直径。

3. 发明授权

US06765201B2 Ultraviolet laser-generating device and defect inspection apparatus and method therefor 有权
标题翻译：紫外线激光发生装置及缺陷检查装置及其方法
公开(公告)号：US06765201B2
公开(公告)日：2004-07-20
申请号：US09764457
申请日：2001-01-19
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunji Maeda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunji Maeda
IPC分类号： G21K700
CPC分类号： G01N21/956 , G01N21/33 , G02F2001/3505 , G02F2001/3542 , H01S3/0092
摘要： An ultraviolet laser-generating device, for use in a defect inspection apparatus and a method thereof, etc., comprising: a laser ray source for irradiating and emitting a basic wave of laser ray therefrom; a wavelength converter device for receiving the basic wave of laser ray emitted from the laser ray source and for converting it into an ultraviolet laser ray composed of a multiplied high harmonic light of the basic wave of laser ray; and a container having an inlet window, upon which the basic wave of laser ray emitted from the laser ray source is incident upon, and an outlet window for emitting the ultraviolet laser ray composed of the multiplied high harmonic light of the basic wave of laser ray, and installing the wavelength converter device therein, wherein the container is hermetically sealed and is filled up with an inert gas, such as nitrogen or argon gas, therein.
摘要翻译：一种用于缺陷检查装置及其方法的紫外线激光发生装置，包括：用于从其照射和发射激光光线的基本波的激光束源; 波长转换器装置，用于接收从激光射线源发射的激光的基波，并将其转换为由激光的基波的相乘的高次谐波构成的紫外激光; 以及具有入射窗的容器，从激光射线源发射的激光的基波入射到该入口窗口，以及用于发射由激光的基波的倍增的高次谐波构成的紫外线激光的出射窗并且在其中安装波长转换器装置，其中容器被气密密封，并在其中填充有惰性气体，例如氮气或氩气。

4. 发明授权

US07791725B2 Method and equipment for detecting pattern defect 有权
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US07791725B2
公开(公告)日：2010-09-07
申请号：US12271348
申请日：2008-11-14
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An inspection apparatus and method includes a light source which emits an ultraviolet laser beam, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.
摘要翻译：一种检查装置和方法，包括发射紫外线激光的光源，具有偏振光控制器和物镜的照明单元，用于利用从光源发出并通过偏振光控制器和物镜的光照射样本，检测单元，具有用于检测由照明单元照射的样本的光的传感器;处理器，处理从传感器输出的信号以检测样本上的缺陷;以及显示器，显示从处理器输出的信息。处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

5. 发明授权

US07456963B2 Method and equipment for detecting pattern defect 失效
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US07456963B2
公开(公告)日：2008-11-25
申请号：US11593091
申请日：2006-11-06
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An Inspection apparatus and method includes utilizing an emitter which emits a light beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer, and an objective lens, for illuminating a specimen with a polarization condition controlled and coherency reduced light beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the light beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
摘要翻译：检查装置和方法包括利用发射光束的发射器，照明光学系统，检测光学系统和处理器。照明光学系统包括偏振控制器，相干减少器和物镜，用于照射具有偏振状态的样本并通过物镜降低光束的相干性。检测光学系统包括成像透镜和用于检测由通过照明光学系统的光束照射的样本的图像的传感器。处理器处理从传感器输出的信号并检测样本上的缺陷。

6. 发明授权

US07305015B2 Ultraviolet laser-generating device and defect inspection apparatus and method therefor 有权
标题翻译：紫外线激光发生装置及缺陷检查装置及其方法
公开(公告)号：US07305015B2
公开(公告)日：2007-12-04
申请号：US10888980
申请日：2004-07-13
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunji Maeda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunji Maeda
IPC分类号： H01S3/10
CPC分类号： G01N21/956 , G01N21/33 , G02F2001/3505 , G02F2001/3542 , H01S3/0092
摘要： An ultraviolet laser-generating device, for use in a defect inspection apparatus and a method thereof, etc., comprising: a laser ray source for irradiating and emitting a basic wave of laser ray therefrom; a wavelength converter device for receiving the basic wave of laser ray emitted from the laser ray source and for converting it into an ultraviolet laser ray composed of a multiplied high harmonic light of the basic wave of laser ray; and a container having an inlet window, upon which the basic wave of laser ray emitted from the laser ray source is incident upon, and an outlet window for emitting the ultraviolet laser ray composed of the multiplied high harmonic light of the basic wave of laser ray, and installing the wavelength converter device therein, wherein the container is hermetically sealed and is filled up with an inert gas, such as nitrogen or argon gas, therein.
摘要翻译：一种用于缺陷检查装置及其方法的紫外线激光发生装置，包括：用于从其照射和发射激光光线的基本波的激光束源; 波长转换器装置，用于接收从激光射线源发射的激光的基波，并将其转换为由激光的基波的相乘的高次谐波构成的紫外激光; 以及具有入射窗的容器，从激光射线源发射的激光的基波入射到该入口窗口，以及用于发射由激光的基波的倍增的高次谐波构成的紫外线激光的出射窗并且在其中安装波长转换器装置，其中容器被气密密封，并在其中填充有惰性气体，例如氮气或氩气。

7. 发明申请

US20110001972A1 Method And Equipment For Detecting Pattern Defect 有权
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US20110001972A1
公开(公告)日：2011-01-06
申请号：US12876709
申请日：2010-09-07
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An inspection apparatus and method includes a light source, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.
摘要翻译：一种检查装置和方法，包括光源，具有偏振控制器和物镜的照明单元，用于利用从光源发射并通过偏振控制器和物镜的光照射样本;检测单元，具有用于检测由所述照明单元照射的样本的光;处理器，其处理从所述传感器输出的信号以检测所述样本上的缺陷;以及显示器，其显示从所述处理器输出的信息。处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

8. 发明授权

US07218389B2 Method and apparatus for inspecting pattern defects 有权
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US07218389B2
公开(公告)日：2007-05-15
申请号：US10223422
申请日：2002-08-20
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunji Maeda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunji Maeda
IPC分类号： G02N21/88
CPC分类号： G01N21/956 , G01N21/94 , G01N2021/9513 , G01N2201/10 , G01N2201/1045
摘要： A pattern defect inspection apparatus is capable of detecting defects, without being affected by non-uniform thickness of a thin film formed on a sample, even when using monochromatic light, such as a laser. The apparatus comprises a laser to illuminate a sample, coherence suppression optics to reduce laser beam coherence, a condenser to condense the laser beam onto a pupil plane of an objective lens, and a detector to detect the light reflected from a circuit pattern formed on a sample. The condenser is designed so that the intensity of light illuminating the sample under test can be partially adjusted according to the type of laser beam illumination condensed on the pupil of the objective lens. Variations in reflected light intensity caused by non-uniform film thickness on the surface of the sample are therefore reduced, and shading is minimized in the detected image to allow detecting of fine defects.
摘要翻译：即使使用激光等单色光，图案缺陷检查装置也能够不受样品上形成的薄膜的不均匀的厚度的影响而检测缺陷。该装置包括用于照亮样品的激光器，减少激光束相干性的相干抑制光学器件，将激光束冷凝到物镜的光瞳平面上的冷凝器，以及用于检测从形成在物镜上的电路图案反射的光的检测器样品。冷凝器被设计成使得照射待测试样品的光的强度可以根据在物镜的瞳孔上聚集的激光束照明的类型来部分地调节。因此，在样品表面上由不均匀膜厚引起的反射光强度的变化因此减少，并且在检测图像中使阴影最小化以允许检测细小缺陷。

9. 发明申请

US20050253081A1 Method and equipment for detecting pattern defect 有权
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US20050253081A1
公开(公告)日：2005-11-17
申请号：US11184981
申请日：2005-07-20
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21/00 , G01N21/88 , G01N21/95 , G01N21/956 , G02B5/09 , G02B26/12
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An Inspection apparatus and method includes utilizing a laser source which emits an ultraviolet laser beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer and an objective lens for illuminating a specimen with a polarization condition controlled and coherency reduced ultraviolet laser beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the ultraviolet laser beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
摘要翻译：一种检查装置和方法，包括利用发射紫外激光束的激光源，照明光学系统，检测光学系统和处理器。照明光学系统包括偏振控制器，相干减少器和用于照射具有偏振状态的样本的物镜，并且通过物镜减少紫外激光束的相干性。检测光学系统包括成像透镜和用于检测通过照明光学系统由紫外线激光束照射的样本的图像的传感器。处理器处理从传感器输出的信号并检测样本上的缺陷。

10. 发明授权

US06800859B1 Method and equipment for detecting pattern defect 失效
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US06800859B1
公开(公告)日：2004-10-05
申请号：US09473296
申请日：1999-12-28
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21956
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： With a view to provide a method and equipment for detecting a minute circuit pattern with a high resolution, pattern defect detecting equipment is provided, comprising: an ultraviolet laser source; coherence reducing means for reducing the coherence of the ultraviolet laser beam emitted from this ultraviolet laser source; projecting means for projecting the ultraviolet laser beam passing through this coherence reducing means on a pupil of an objecting lens; illuminating means for illuminating a detection field of view in the object uniformly by the ultraviolet laser beam projected on the pupil of the objective lens by this projecting means through the objective lens; image detecting means for detecting an image of the object illuminated almost uniformly by the illuminating means; and detecting means for detecting a defect on the object by comparing image data obtained from the image of the object detected by this image detecting means to image data stored beforehand.
摘要翻译：为了提供用于检测具有高分辨率的微小电路图案的方法和设备，提供了图案缺陷检测设备，包括：紫外激光源; 相干减少装置，用于减少从该紫外激光源发出的紫外激光束的相干性; 投影装置，用于将穿过该相干减少装置的紫外激光束投射在物镜的瞳孔上; 照射装置，用于通过该投影装置通过物镜通过投射在物镜的光瞳上的紫外激光束均匀地照射物体中的检测视场; 图像检测装置，用于检测照明装置几乎均匀地照亮的物体的图像; 以及检测装置，用于通过将从该图像检测装置检测的对象的图像获得的图像数据与预先存储的图像数据进行比较来检测对象上的缺陷。

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