专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2005184000A Lithography apparatus and method for manufacturing device 有权
标题翻译： LITHOGRAPHY设备和制造设备的方法
公开(公告)号：JP2005184000A
公开(公告)日：2005-07-07
申请号：JP2004369270
申请日：2004-12-21
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： BOX WILHELMUS J , EGGINK HENDRIK J
IPC分类号： G03F7/20 , H01L21/027 , H01L21/683 , H01L21/68
CPC分类号： G03F7/707 , G03F7/70783 , G03F7/70875 , G03F7/709
摘要： PROBLEM TO BE SOLVED: To provide lithography apparatus in which vibration of a region of a chuck assembly and other distortion are reduced, and a thermal condition of the assembly is controlled. SOLUTION: The lithography apparatus includes an illumination device for projecting a radiation beam on a substrate, and further includes a chuck assembly for supporting at least one of the substrate or a pattern formation device. The pattern formation device works to give a profile pattern of a beam to the beam. A heat transfer device is operational between first and second surfaces. The first surface is formed at least partially from at least part of the chuck assembly. The second surface is formed at least partially from at least part of a component isolated from the chuck. The second surface is separated mechanically from the first surface, but coupled thermally to the first surface. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种光刻设备，其中卡盘组件的区域的振动和其他变形减小，并且控制组件的热状态。解决方案：光刻设备包括用于将辐射束投射在基板上的照明装置，并且还包括用于支撑基板或图案形成装置中的至少一个的卡盘组件。图案形成装置用于向束提供光束的轮廓图案。传热装置在第一和第二表面之间是可操作的。第一表面至少部分地由卡盘组件的至少一部分形成。第二表面至少部分地由与卡盘隔离的部件的至少一部分形成。第二表面与第一表面机械地分离，但是热耦合到第一表面。版权所有（C）2005，JPO＆NCIPI

2. 发明专利

JP2006165565A Lithography device and device manufacturing method 有权
标题翻译： LITHOGRAPHY DEVICE AND DEVICE MANUFACTURING METHOD
公开(公告)号：JP2006165565A
公开(公告)日：2006-06-22
申请号：JP2005352089
申请日：2005-12-06
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： FRANKEN DOMINICUS JACOBUS PETR , BLEEKER ARNO JAN , BOX WILHELMUS J , HOEKS MARTINUS HENDRICUS HENDR , TEGENBOSCH HENRICUS G , TROOST KARS ZEGER , KESSELS LAMBERTUS G M , WILLEM DIETER WEENINK
IPC分类号： H01L21/027 , G02B27/18 , G03F7/20
CPC分类号： G03F7/70875 , G03F7/70291
摘要： PROBLEM TO BE SOLVED: To suppress to minimum an influence on an image forming performance due to heat generation by controlling the heat generation of array of an individually controllable component. SOLUTION: According to the present invention, in order to maintain the temperature of array, a control signal is inputted in an array when the array is not used for pattern-forming a projection beam. Also, in order to maintain the temperature of the array, a heat element is provided, a heat reservoir is provided, or a cooling element is provided for lowering the temperature of the array during its use. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：通过控制独立可控部件的阵列的发热来抑制由于发热而对成像性能的影响的最小化。解决方案：根据本发明，为了保持阵列的温度，当阵列不用于图案形成投影光束时，控制信号被输入阵列。此外，为了保持阵列的温度，设置有热元件，设置有储热器，或者设置冷却元件以降低其使用期间的阵列的温度。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2005150732A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2005150732A
公开(公告)日：2005-06-09
申请号：JP2004328305
申请日：2004-11-12
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： BARTRAY PERTRUS R , BOX WILHELMUS J , KUIT JAN JAAP , LUIJTEN CARLO CORNELIS MARIA , LUTTIKHUIS BERNARDUS ANTONIUS , TEN BHOMER MICHAEL , MIGCHELBRINK FERDY
IPC分类号： H01L21/027 , G02B7/02 , G03B27/42 , G03F7/20
CPC分类号： G03F7/7095 , G02B7/028 , G03F7/70833 , G03F7/70858 , G03F7/709
摘要： PROBLEM TO BE SOLVED: To provide reference frame materials which reduce production costs without encountering performance problems.
SOLUTION: A lithographic apparatus comprises a substrate table WT for holding a substrate W, a projection system PL for projecting a patterned beam onto a target portion of the substrate W, and an isolated reference frame MF for providing a reference surface with respect to which the substrate W is measured. The reference frame MF comprises a material having a high coefficient of thermal expansion, and has a sandwich structure or a laminated structure when made of specified materials.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供降低生产成本而不遇到性能问题的参考框架材料。解决方案：光刻设备包括用于保持基板W的基板台WT，用于将图案化光束投影到基板W的目标部分上的投影系统PL和用于提供参考表面的隔离参考框架MF 测量衬底W。参考框架MF包括具有高热膨胀系数的材料，并且当由特定材料制成时具有夹层结构或层压结构。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2005101593A Lithographic apparatus and method of compensating for thermal deformation in lithographic apparatus 有权
标题翻译：光刻装置的热像仪的补偿方法
公开(公告)号：JP2005101593A
公开(公告)日：2005-04-14
申请号：JP2004256431
申请日：2004-09-03
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： FRANKEN DOMINICUS JACOBUS PETR , BOX WILHELMUS J
IPC分类号： G02B7/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70258 , G02B7/008 , G03F7/70825 , G03F7/70891
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a method of compensating for the thermal deformation of the lithographic apparatus. SOLUTION: A lithographic apparatus is provided with an element subject to a thermal load and a thermal compensation deformation unit for compensating for the deformation of the element due to the thermal load in the lithographic apparatus. The thermal compensation deformation unit is provided with at least one temperature sensor for detecting a temperature at least at one location on the element and a processing unit for calculating the deformation of the element due to the thermal load as a function of the temperature that is detected at the location. Since the deformation of the element is calculated by using the data from the model of the element generated by a computer, the deformation of the lithographic apparatus can be appropriately corrected or taken into account for. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供光刻设备和补偿光刻设备的热变形的方法。光刻设备设置有受热负载的元件和热补偿变形单元，用于补偿由于光刻设备中的热负荷引起的元件的变形。热补偿变形单元设置有至少一个温度传感器，用于至少在元件上的一个位置处检测温度;以及处理单元，用于根据检测到的温度计算由于热负荷而导致的元件的变形在位置。由于通过使用来自计算机产生的元件的模型的数据来计算元件的变形，因此可以适当地校正或考虑光刻设备的变形。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2006173618A Lithography equipment 有权
标题翻译： LITHOGRAPHY设备
公开(公告)号：JP2006173618A
公开(公告)日：2006-06-29
申请号：JP2005359970
申请日：2005-12-14
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN DIJSSELDONK ANTONIUS JOHAN , AMHAOUCH MUSTAFA , BOX WILHELMUS J , JACOBS JOHANNES HENRICUS WILHE , JACOBS HERNES , RAVENSBERGEN MARIUS , TERKEN MARTINUS ARNOLDUS HENRI , LIVESEY ROBERT GORDON , VAN VROONHOVEN FRANCISCUS CATH
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70841 , G03F7/70991
摘要： PROBLEM TO BE SOLVED: To provide lithography equipment which has a short quiescent time and a small area of a portion exposed to vacuum.
SOLUTION: Lithography equipment which operates in a vacuum is disclosed. The lithography equipment comprises a vacuum housing for providing a vacuum environment for a supporting portion or a substrate table structured such that a patterning apparatus is supported, a projection system, or its arbitrary combination. In the vacuum housing, a plurality of transporting circuits for transporting fluids and/or electrical signals for use in the first process mode of a lithography process are housed. At least one of the plurality of transporting circuits is for transporting energy toward the interior of the vacuum housing in order to guide the gas evolution of the vacuum housing for use in the lithography equipment in the second process mode for allowing the lithography equipment to be in a vacuum operation state.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供具有短静态时间和暴露于真空的部分的小面积的光刻设备。
解决方案：公开了在真空中操作的平版印刷设备。光刻设备包括用于为支撑部分提供真空环境的真空外壳或者构造成使得图案形成装置被支撑，投影系统或其任意组合构成的基板台。在真空壳体中，容纳用于输送流体的多个输送电路和/或用于光刻工艺的第一工艺模式的电信号。多个传送电路中的至少一个用于将能量传送到真空壳体的内部，以引导在第二工艺模式中用于光刻设备的真空壳体的气体放出，以允许光刻设备处于真空运行状态。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2009016868A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2009016868A
公开(公告)日：2009-01-22
申请号：JP2008251029
申请日：2008-09-29
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BARTRAY PERTRUS R , BOX WILHELMUS J , KUIT JAN JAAP , LUIJTEN CARLO CORNELIS MARIA , LUTTIKHUIS BERNARDUS ANTONIUS , TEN BHOMER MICHAEL , MIGCHELBRINK FERDY
IPC分类号： H01L21/027 , G02B7/02 , G03B27/42 , G03F7/20 , H01L21/68
CPC分类号： G03F7/7095 , G02B7/028 , G03F7/70833 , G03F7/70858 , G03F7/709
摘要： PROBLEM TO BE SOLVED: To overcome the problems associated with the supply of conventional reference frame materials, without encountering performance problems in return. SOLUTION: The lithographic apparatus includes: a substrate table WT for holding a substrate W; a projection system PL for projecting a patterned beam onto a target portion of the substrate W; and an isolated reference frame MF for providing a reference surface with respect to which the substrate W is measured, wherein the reference frame MF comprises a material having a high coefficient of thermal expansion. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了克服与传统参考框架材料的供应相关的问题，而不会遇到性能问题。光刻设备包括：用于保持衬底W的衬底台WT; 用于将图案化的光束投影到基板W的目标部分上的投影系统PL; 以及用于提供测量衬底W的参考表面的隔离参考框架MF，其中参考框架MF包括具有高热膨胀系数的材料。版权所有（C）2009，JPO＆INPIT

7. 发明专利

DE602004009256T2 未知
公开(公告)号：DE602004009256T2
公开(公告)日：2008-07-10
申请号：DE602004009256
申请日：2004-08-26
申请人： ASML NETHERLANDS BV
发明人： FRANKEN DOMINICUS J P A , BOX WILHELMUS J
IPC分类号： G03F7/20 , G02B7/00 , H01L21/027
摘要： A lithographic apparatus comprising a projection system PL for projecting a patterned beam onto a target portion of a substrate, the projection system comprising a support frame 4 for supporting a plurality of optical elements including at least one moveable optical element M1-M4, M6, the plurality of optical elements being disposed in the frame in a spaced relationship; and wherein the apparatus further comprises a thermal deformation compensation unit 10, 12, 14, 15, 16, 18 comprising at least one sensor 10 for sensing the temperature at a location on said support frame 4 and an adjustment unit 15 arranged to adjust the position of said at least one moveable mirror M1-M4, M6 so as to compensate for a deformation of the frame 4, in response to the at least one temperature sensed by the at least one sensor 10.

8. 发明专利

DE602004009256D1 未知
公开(公告)号：DE602004009256D1
公开(公告)日：2007-11-15
申请号：DE602004009256
申请日：2004-08-26
申请人： ASML NETHERLANDS BV
发明人： FRANKEN DOMINICUS J P A , BOX WILHELMUS J
IPC分类号： G03F7/20 , G02B7/00 , H01L21/027
摘要： A lithographic apparatus comprising a projection system PL for projecting a patterned beam onto a target portion of a substrate, the projection system comprising a support frame 4 for supporting a plurality of optical elements including at least one moveable optical element M1-M4, M6, the plurality of optical elements being disposed in the frame in a spaced relationship; and wherein the apparatus further comprises a thermal deformation compensation unit 10, 12, 14, 15, 16, 18 comprising at least one sensor 10 for sensing the temperature at a location on said support frame 4 and an adjustment unit 15 arranged to adjust the position of said at least one moveable mirror M1-M4, M6 so as to compensate for a deformation of the frame 4, in response to the at least one temperature sensed by the at least one sensor 10.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式