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1. 发明专利

JP2005203754A Lithography apparatus and device manufacturing method 审中-公开
标题翻译： LITHOGRAPHY设备和设备制造方法
公开(公告)号：JP2005203754A
公开(公告)日：2005-07-28
申请号：JP2004353616
申请日：2004-12-07
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： LUTTIKHUIS BERNARDUS ANTONIUS , BARTRAY PERTRUS R , BOX WILHELMUS JOSEPHUS , LEENDERS MARTINUS HENDRIKUS AN , MARIA VAN DER WIJST MARC W
IPC分类号： G21K5/02 , F16F15/04 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70858
摘要： PROBLEM TO BE SOLVED: To provide a lithography apparatus and a device manufacturing method that improves thermal loading.
SOLUTION: The lithography apparatus, which has an illumination system IL, a support structure MT supporting a patterning means M, a substrate table WT holding a substrate W, a projecting system PL that projects a patterned beam onto a target part of the substrate W, and a reference frame MF wherein at least one of position sensors IF at least for either one of the patterning means M and the substrate W, and the projection system PL are located, has a heat transport system HT-PL/HT-MF that thermally interacts with at least either one of the projection system PL and the reference frame MF, and transports heat at least to or from either one of the projection system PL and the reference frame MF. The heat transport system HT-PL/HT-MF is joined to another frame mechanically separated from the reference frame.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种提高热负荷的光刻设备和设备制造方法。解决方案：具有照明系统IL的光刻设备，支持图案形成装置M的支撑结构MT，保持衬底W的衬底台WT，将图案化的光束投射到目标部分上的投影系统PL 基板W和参考框架MF，其中位于图案形成装置M和基板W中的任一个的位置传感器IF和投影系统PL中的至少一个具有热传输系统HT-PL / HT- MF与投影系统PL和参考框架MF中的至少一个热相互作用，并且至少传送至投影系统PL和参考框架MF中的任一个。热传输系统HT-PL / HT-MF连接到与参考框架机械分离的另一个框架。版权所有（C）2005，JPO＆NCIPI

2. 发明专利

JP2005191573A Lithography apparatus and method for manufacturing device 有权
标题翻译： LITHOGRAPHY设备和制造设备的方法
公开(公告)号：JP2005191573A
公开(公告)日：2005-07-14
申请号：JP2004371556
申请日：2004-12-22
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： BARTRAY PERTRUS R , AMHAOUCH MUSTAFA , VAN ENGELEN ANGELO A M , LIEBREGTS PAULUS MARTINUS MARI , MEESTERS TIM ANTON JOHAN
IPC分类号： H01L21/027 , H01J37/18 , H01J37/30
CPC分类号： H01J37/18 , B82Y10/00 , B82Y40/00 , G03F7/70841 , G03F7/70916 , H01J37/3174
摘要： PROBLEM TO BE SOLVED: To provide a lithography apparatus having an illumination system for supplying projection beams of radiation.
SOLUTION: The apparatus has a support structure MT for supporting patterning means, a substrate table WT for supporting a substrate, and a projection system PL for projecting a patterned beam onto a target area of the substrate. Moreover, the apparatus has at least an illumination system IL and a vacuum system 100 in which the substrate table is located, and the vacuum system 100 has vacuum modules 101 to 107. A first vacuum modules 102, 107 have at least the projection system and/or illumination system IL, and a second vacuum module 1021 has the vacuum table WT. At least two of the vacuum modules 101 to 107 are connected to each other through closable connection parts 120 to 128 and 130.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种具有用于提供投射射束的照明系统的光刻设备。解决方案：该装置具有用于支撑图案形成装置的支撑结构MT，用于支撑衬底的衬底台WT，以及用于将图案化的束投影到衬底的目标区域上的投影系统PL。此外，该设备至少具有照明系统IL和真空系统100，其中衬底台位于其中，并且真空系统100具有真空模块101至107.第一真空模块102,107至少具有投影系统和 /或照明系统IL，第二真空模块1021具有真空台WT。至少两个真空模块101至107通过可关闭的连接部分120至128和130彼此连接。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2005150732A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2005150732A
公开(公告)日：2005-06-09
申请号：JP2004328305
申请日：2004-11-12
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： BARTRAY PERTRUS R , BOX WILHELMUS J , KUIT JAN JAAP , LUIJTEN CARLO CORNELIS MARIA , LUTTIKHUIS BERNARDUS ANTONIUS , TEN BHOMER MICHAEL , MIGCHELBRINK FERDY
IPC分类号： H01L21/027 , G02B7/02 , G03B27/42 , G03F7/20
CPC分类号： G03F7/7095 , G02B7/028 , G03F7/70833 , G03F7/70858 , G03F7/709
摘要： PROBLEM TO BE SOLVED: To provide reference frame materials which reduce production costs without encountering performance problems.
SOLUTION: A lithographic apparatus comprises a substrate table WT for holding a substrate W, a projection system PL for projecting a patterned beam onto a target portion of the substrate W, and an isolated reference frame MF for providing a reference surface with respect to which the substrate W is measured. The reference frame MF comprises a material having a high coefficient of thermal expansion, and has a sandwich structure or a laminated structure when made of specified materials.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供降低生产成本而不遇到性能问题的参考框架材料。解决方案：光刻设备包括用于保持基板W的基板台WT，用于将图案化光束投影到基板W的目标部分上的投影系统PL和用于提供参考表面的隔离参考框架MF 测量衬底W。参考框架MF包括具有高热膨胀系数的材料，并且当由特定材料制成时具有夹层结构或层压结构。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2006032953A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2006032953A
公开(公告)日：2006-02-02
申请号：JP2005201993
申请日：2005-07-11
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： LUTTIKHUIS BERNARDUS ANTONIUS , BARTRAY PERTRUS R , JACOBS JOHANNES HENRICUS W , HARINK THIJS , LIEBREGTS PAULUS MARTINUS MARI
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70841
摘要： PROBLEM TO BE SOLVED: To provide a lithographic system and a manufacturing method of the lithographic system capable of preventing the contamination of a projection optical system.
SOLUTION: The lithographic apparatus has a support configured so as to support a patterning device capable of forming a patternized radiation beam by giving a pattern to the section of the radiation beam. A projection system is configured so as to project the patternized radiation beam to the target portion of a substrate. The projection system is included in a first vacuum environment and a patterning device support is included in a second vacuum environment, the separator divides the first vacuum environment from the second vacuum environment. The separator has an opening from the first vacuum environment to the patterning device and/or reversely, an opening through which the projected beam is allowed to pass. The patterning device forms at least a part of seal that almost seals the opening of the separator.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供能够防止投影光学系统污染的光刻系统的光刻系统和制造方法。解决方案：光刻设备具有支撑结构，以支持能够通过向辐射束的部分提供图案来形成图案化的辐射束的图案形成装置。投影系统被配置为将图案化的辐射束投影到基板的目标部分。投影系统包括在第一真空环境中，并且图案形成装置支撑件包括在第二真空环境中，分离器将第一真空环境与第二真空环境分开。分离器具有从第一真空环境到图案形成装置的开口和/或反向，允许投射的光束通过的开口。图案形成装置形成密封件的至少一部分，其几乎密封隔板的开口。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2012028797A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2012028797A
公开(公告)日：2012-02-09
申请号：JP2011199359
申请日：2011-09-13
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BARTRAY PERTRUS R , WILHELMUS JOSEPHUS BOX , KUIT JAN JAAP , LUIJTEN CARLO CORNELIS MARIA , LUTTIKHUIS BERNARDUS ANTONIUS JOHANNES , TEN BHOMER MICHAEL , FERDI MICHELBRINK
IPC分类号： H01L21/027 , G02B7/02 , G03B27/42 , G03F7/20
CPC分类号： G03F7/7095 , G02B7/028 , G03F7/70833 , G03F7/70858 , G03F7/709
摘要： PROBLEM TO BE SOLVED: To provide a material for a reference frame that can solve the problems associated with conventional technique while avoiding performance problems.SOLUTION: A lithographic apparatus includes a substrate table WT for holding a substrate W, a projection system PL for projecting a patterned beam onto a target portion of the substrate W, and an independent reference frame MF for providing a reference surface with which the position of the substrate W is measured. The reference frame MF is made of a material having a high coefficient of thermal expansion.
摘要翻译：要解决的问题：提供可以解决与常规技术相关的问题的参考框架的材料，同时避免性能问题。解决方案：光刻设备包括用于保持基板W的基板台WT，用于将图案化光束投影到基板W的目标部分的投影系统PL以及用于提供基准面的参考表面的独立参考框架MF 测量基板W的位置。参考框架MF由具有高热膨胀系数的材料制成。版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2009016868A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2009016868A
公开(公告)日：2009-01-22
申请号：JP2008251029
申请日：2008-09-29
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BARTRAY PERTRUS R , BOX WILHELMUS J , KUIT JAN JAAP , LUIJTEN CARLO CORNELIS MARIA , LUTTIKHUIS BERNARDUS ANTONIUS , TEN BHOMER MICHAEL , MIGCHELBRINK FERDY
IPC分类号： H01L21/027 , G02B7/02 , G03B27/42 , G03F7/20 , H01L21/68
CPC分类号： G03F7/7095 , G02B7/028 , G03F7/70833 , G03F7/70858 , G03F7/709
摘要： PROBLEM TO BE SOLVED: To overcome the problems associated with the supply of conventional reference frame materials, without encountering performance problems in return. SOLUTION: The lithographic apparatus includes: a substrate table WT for holding a substrate W; a projection system PL for projecting a patterned beam onto a target portion of the substrate W; and an isolated reference frame MF for providing a reference surface with respect to which the substrate W is measured, wherein the reference frame MF comprises a material having a high coefficient of thermal expansion. COPYRIGHT: (C)2009,JPO&INPIT

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