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1. 发明申请

WO2015063006A1 FREE FORM FRACTURING METHOD FOR ELECTRONIC OR OPTICAL LITHOGRAPHY USING RESIST THRESHOLD CONTROL 审中-公开
标题翻译：使用电阻阈值控制的电子或光学光刻的免费形式破碎方法
公开(公告)号：WO2015063006A1
公开(公告)日：2015-05-07
申请号：PCT/EP2014/072948
申请日：2014-10-27
申请人： ASELTA NANOGRAPHICS
发明人： MANAKLI, Serdar , MARTIN, Luc
IPC分类号： G03F1/78 , G03F7/20 , H01J37/317 , H01J37/302 , G03F1/00
CPC分类号： G03F1/70 , G03F1/68 , G03F7/70433 , G03F7/70558 , G06F17/5068 , H01J37/3026 , H01J37/3174 , H01J2237/31776
摘要： The invention discloses a computer implemented method of fracturing a free form target design into elementary shots to get a minimum number of shots for a defined roughness of the contour. The method includes determining a first set of shots which pave the target design, except for gaps, and then determining a second set of shots to fill or cover the gaps. The dose levels of the overlapping shots in the first or second sets of shots are determined so that the compounded dose is adequate in view of the resist threshold, taking into account the proximity effect which affects the actual imprint of the shots on the insulated target. Advantageously, a dose geometry modulation is applied. Advantageously, rounded shot prints are produced by shots which are not circular. Shots and rounded shot prints may or may not overlap. The degree of overlap may be determined as a function of a desired optimization of a fit criteria between a printed contour and the contour of the desired pattern. Placements and dimensions of the shots may be determined by a plurality of fit criteria between said printed contour and said contour of the desired pattern.
摘要翻译：本发明公开了一种计算机实现的方法，将自由形式目标设计分解为基本射击，以获得轮廓的规定粗糙度的最小射击次数。该方法包括确定除了间隙之外铺平目标设计的第一组拍摄，然后确定第二组拍摄以填充或覆盖间隙。确定第一组或第二组拍摄中的重叠拍摄的剂量水平，以便鉴于影响绝缘目标上的拍摄实际印记的邻近效应，鉴于抗蚀剂阈值，配合剂量是足够的。有利地，施加剂量几何调制。有利地，通过不是圆形的镜头产生圆形镜头照片。拍摄和圆角拍摄的照片可能重叠也可能不重叠。可以根据期望的图案的打印轮廓和轮廓之间的拟合标准的优化来确定重叠程度。拍摄的放置和尺寸可以由所述打印轮廓和所需图案的所述轮廓之间的多个拟合标准确定。

2. 发明申请

WO2014127850A1 FREE FORM FRACTURING METHOD FOR ELECTRONIC OR OPTICAL LITHOGRAPHY 审中-公开
标题翻译：电子或光学光刻的免费形式破碎方法
公开(公告)号：WO2014127850A1
公开(公告)日：2014-08-28
申请号：PCT/EP2013/053883
申请日：2013-02-27
申请人： ASELTA NANOGRAPHICS
发明人： TIPHINE, Charles , QUAGLIO, Thomas , MARTIN, Luc
IPC分类号： H01J37/302 , H01J37/317
CPC分类号： G06F17/5081 , B82Y10/00 , B82Y40/00 , G06F17/50 , H01J37/3026 , H01J37/3174 , H01J2237/31764 , H01J2237/31776
摘要： The invention discloses a computer implemented method of fracturing a surface into elementary features (720a) wherein the desired pattern has a rectilinear or curvilinear form. Depending upon the desired pattern, a first fracturing will be performed of a non-overlapping or an overlapping type. If the desired pattern is resolution critical, it will be advantageous to perform a second fracturing step using eRIFs (730a). These eRIFs will be positioned either on the edges or on the medial axis (710a) or skeleton of the desired pattern. The invention further discloses method steps to define the position and shape of the elementary features used for the first and second fracturing steps.
摘要翻译：本发明公开了一种将表面压裂成基本特征（720a）的计算机实现方法，其中期望的图案具有直线或曲线形式。根据期望的图案，将执行非重叠或重叠类型的第一压裂。如果期望的模式是分辨率关键的，则使用eRIF（730a）执行第二压裂步骤将是有利的。这些eRIF将被定位在所需图案的边缘或中间轴（710a）或骨架上。本发明还公开了用于限定用于第一和第二压裂步骤的基本特征的位置和形状的方法步骤。

3. 发明公开

EP2959496A1 FREE FORM FRACTURING METHOD FOR ELECTRONIC OR OPTICAL LITHOGRAPHY 有权转让
标题翻译： VERFAHREN ZUR FRAKTURIERUNG FREIER FORMENFÜRELEKTRONISCHE ODER OPTISCHE LITHOGRAFIE
公开(公告)号：EP2959496A1
公开(公告)日：2015-12-30
申请号：EP13706532.2
申请日：2013-02-27
申请人： Aselta Nanographics
发明人： TIPHINE, Charles , QUAGLIO, Thomas , MARTIN, Luc
IPC分类号： H01J37/302 , H01J37/317
CPC分类号： G06F17/5081 , B82Y10/00 , B82Y40/00 , G06F17/50 , H01J37/3026 , H01J37/3174 , H01J2237/31764 , H01J2237/31776
摘要： The invention discloses a computer implemented method of fracturing a surface into elementary features wherein the desired pattern has a rectilinear or curvilinear form. Depending upon the desired pattern, a first fracturing will be performed of a non-overlapping or an overlapping type. If the desired pattern is resolution critical, it will be advantageous to perform a second fracturing step using eRIFs. These eRIFs will be positioned either on the edges or on the medial axis or skeleton of the desired pattern. The invention further discloses method steps to define the position and shape of the elementary features used for the first and second fracturing steps.
摘要翻译：本发明公开了一种将表面压裂成基本特征的计算机实现方法，其中期望的图案具有直线或曲线形式。根据期望的图案，将执行不重叠或重叠类型的第一压裂。如果期望的模式是分辨率关键的，则使用eRIF执行第二压裂步骤将是有利的。这些eRIF将位于所需图案的边缘或中轴或骨架上。本发明还公开了用于限定用于第一和第二压裂步骤的基本特征的位置和形状的方法步骤。

4. 发明授权

EP3153926B1 A METHOD OF REDUCING SHOT COUNT IN DIRECT WRITING BY A PARTICLE OR PHOTON BEAM 有权转让
公开(公告)号：EP3153926B1
公开(公告)日：2020-04-22
申请号：EP16192398.2
申请日：2016-10-05
申请人： Aselta Nanographics
发明人： MARTIN, Luc , QUAGLIO, Thomas , MILLEQUANT, Matthieu , BROWNING, Clyde , MANAKLI, Serdar
IPC分类号： G03F7/20 , G03F1/00 , G03F1/78 , H01J37/302 , H01J37/317

5. 发明公开

EP3153926A1 A METHOD OF REDUCING SHOT COUNT IN DIRECT WRITING BY A PARTICLE OR PHOTON BEAM 有权转让
标题翻译：一种用于减少火灾数量直接描绘用粒子束或光子
公开(公告)号：EP3153926A1
公开(公告)日：2017-04-12
申请号：EP16192398.2
申请日：2016-10-05
申请人： Aselta Nanographics
发明人： MARTIN, Luc , QUAGLIO, Thomas , MILLEQUANT, Matthieu , BROWNING, Clyde , MANAKLI, Serdar
IPC分类号： G03F7/20 , G03F1/00 , G03F1/78 , H01J37/302 , H01J37/317
摘要： A method for transferring a fractured pattern (210, 310), decomposed into elementary shapes, onto a substrate by direct writing by means of a particle or photon beam, comprising
a step of identifying at least one elementary shape (2000) of the fractured pattern, called removable elementary shape, whose removal induces modifications of the transferred pattern within a preset tolerance envelope;
- a step of removing said removable shape or shapes from the fractured pattern, to obtain a modified fractured pattern (220, 230) ; and
- an exposure step, comprising exposing the substrate to a plurality of shots of a shaped particle or photon beam, each shot corresponding to an elementary shape of said modified fractured pattern.
A computer program product for carrying out such a method.
摘要翻译：一种用于传递环方法的断裂模式（210，310），分解成基本形状，到基板通过直接写入由粒子或光子束的手段，包括识别所述裂缝图案的至少一个基本形状（2000）的步骤被称为可移动基本形状，其脱除诱导预设公差包络内的转印图案的变型; - 从压裂图案移除所述可移除的形状或形状的步骤，以获得经修改裂缝图案（220，230）; 和 - 在暴露步骤中，包括在基板暴露于成型颗粒或光子束的射击的复数，每个镜头在所述的基本形状对应于改性裂缝图案。实施寻求一个方法的计算机程序产品。

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