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1. 发明申请

US20060138349A1 Lithographic apparatus and device manufacturing method 审中-公开
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060138349A1
公开(公告)日：2006-06-29
申请号：US11020567
申请日：2004-12-27
申请人： Arno Bleeker , Johannes Jacobus Baselmans , Marce Mathijs Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Troost
发明人： Arno Bleeker , Johannes Jacobus Baselmans , Marce Mathijs Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Troost
IPC分类号： G03F7/20
CPC分类号： G03F7/702 , G03F7/70291
摘要： A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.
摘要翻译：系统和方法用于引导辐射束非垂直地照射用于图案化辐射束的单独可控元件的构图阵列。可单独控制的元件可以改变辐射束的远心性。将辐射束投射到可独立控制的元件上可以通过凹面镜或使用放置在单独可控元件的物场中的折叠镜。或者，独立可控元件可以改变辐射束的光轴。

2. 发明申请

US20060040187A1 Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same 有权
标题翻译：用于产生掩模图案的平版印刷设备，方法和计算机程序产品以及使用其的设备制造方法
公开(公告)号：US20060040187A1
公开(公告)日：2006-02-23
申请号：US10919532
申请日：2004-08-17
申请人： Kars Troost , Johannes Jacobus Baselmans , Karel Van Der Mast
发明人： Kars Troost , Johannes Jacobus Baselmans , Karel Van Der Mast
IPC分类号： G03C5/00 , G06F17/50 , G03F1/00
CPC分类号： G03F7/70283 , G03F1/36 , G03F7/70291 , G03F7/70441
摘要： Grayscale Optical Proximity Correction device features are added to a mask pattern by convoluting the device features with a two-dimensional correction kernel or two one-dimensional correction kernels to generate grayscale OPC features. The resulting pattern may be used in a projection lithography apparatus having a programmable patterning means that is adapted to generate three or more intensity levels. An iterative process of simulating an aerial image that would be produced by the pattern, comparing the simulation to the desired pattern, and adjusting the OPC features may be used to generate an optimum pattern for projection
摘要翻译：灰度光学接近校正设备特征通过使用二维校正内核或两个一维校正内核卷积设备特征来添加到掩模图案中，以生成灰度OPC功能。所得到的图案可以用在具有适于产生三个或更多个强度水平的可编程图案形成装置的投影光刻设备中。可以使用模拟由图案产生的空间图像，将模拟与期望图案进行比较并调整OPC特征的迭代过程来产生用于投影的最佳图案

3. 发明申请

US20050243292A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050243292A1
公开(公告)日：2005-11-03
申请号：US10835856
申请日：2004-05-03
申请人： Johannes Jacobus Baselmans , Sjoerd Nicolaas Donders , Christiaan Hoogendam , Hans Jansen , Jeroen Johannes Sophia Mertens , Johannes Catharinus Mulkens , Bob Streefkerk
发明人： Johannes Jacobus Baselmans , Sjoerd Nicolaas Donders , Christiaan Hoogendam , Hans Jansen , Jeroen Johannes Sophia Mertens , Johannes Catharinus Mulkens , Bob Streefkerk
IPC分类号： H01L21/027 , G03B27/42 , G03F7/20 , G03F9/00
CPC分类号： G03F9/7034 , G03F7/70341
摘要： A lithographic apparatus and method, in an embodiment for immersion lithography, are disclosed with a single stage in which levelling and exposure are performed simultaneously.
摘要翻译：在用于浸没式光刻的实施例中的光刻设备和方法被公开在其中同时执行调平和曝光的单个阶段。

4. 发明申请

US20070153250A1 Interferometric lithography system and method used to generate equal path lengths of interfering beams 有权
标题翻译：用于产生相等路径长度的干涉光束的干涉光刻系统和方法
公开(公告)号：US20070153250A1
公开(公告)日：2007-07-05
申请号：US11320473
申请日：2005-12-29
申请人： Harry Sewell , Johannes Jacobus Baselmans
发明人： Harry Sewell , Johannes Jacobus Baselmans
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03F7/70408
摘要： A system and method are provided for writing patterns onto substrates. First and second beams are directed to converge and substantially overlap in a common region on a substrate. This can be done so that the first and second beams are mutually temporally coherent and spatially coherent in the region of overlap to form interference fringes to define a writing image. A beam width of the first and second beams is adjusted. This can be done so that respective path lengths of the beams are matched when they reach the common region to ensure the first and second beams are mutually spatially coherent and temporally coherent across an entire width of the common region. In one example, the substrate is moved with respect to the writing image, while writing patterns onto the substrate. In another example, the substrate remains stationary.
摘要翻译：提供了将图案写入基板的系统和方法。引导第一和第二光束在基板上的公共区域中会聚并基本重叠。这可以进行，使得第一和第二波束在重叠区域中相互时空相干和空间相干以形成干涉条纹以限定写入图像。调整第一和第二光束的光束宽度。这可以进行，使得当它们到达公共区域时，波束的相应路径长度匹配，以确保第一和第二波束在公共区域的整个宽度上相互空间相干和时间相干。在一个示例中，当将图案写入基板时，基板相对于写入图像移动。在另一个实例中，衬底保持静止。

5. 发明申请

US20050231694A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050231694A1
公开(公告)日：2005-10-20
申请号：US10823777
申请日：2004-04-14
申请人： Aleksey Kolesnychenko , Johannes Jacobus Baselmans , Sjoerd Donders , Christiaan Hoogendam , Hans Jansen , Jeroen Johannes Mertens , Johannes Mulkens , Felix Peeters , Bob Streefkerk , Franciscus Johannes Teunissen , Helmar Santen
发明人： Aleksey Kolesnychenko , Johannes Jacobus Baselmans , Sjoerd Donders , Christiaan Hoogendam , Hans Jansen , Jeroen Johannes Mertens , Johannes Mulkens , Felix Peeters , Bob Streefkerk , Franciscus Johannes Teunissen , Helmar Santen
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
摘要翻译：公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。屏障围绕基板并与衬底间隔开。以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。

6. 发明申请

US20060119816A1 Sensor shield 有权
标题翻译：传感器屏蔽
公开(公告)号：US20060119816A1
公开(公告)日：2006-06-08
申请号：US11005500
申请日：2004-12-07
申请人： Johannes Jacobus Baselmans , Sjoerd Nicolaas Donders , Christiaan Hoogendam , Hans Jansen , Jeroen Johannes Mertens , Johannes Catharinus Mulkens , Bob Streefkerk
发明人： Johannes Jacobus Baselmans , Sjoerd Nicolaas Donders , Christiaan Hoogendam , Hans Jansen , Jeroen Johannes Mertens , Johannes Catharinus Mulkens , Bob Streefkerk
IPC分类号： G03B27/42 , G03C5/00
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70808
摘要： The lithographic apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, a measurement system configured to measure a parameter of (a) the substrate table, or (b) the substrate, or (c) an image projected by the projection system, or (d) any combination of (a)-(c), and a liquid supply system configured to supply a liquid to a space between the substrate and the projection system. The lithographic apparatus also includes a shield disposed in a vicinity of a portion of the measurement system and configured to shield the portion of the measurement system from the liquid.
摘要翻译：光刻设备包括构造成保持图案形成装置的支撑结构。图案形成装置被配置成根据期望的图案对辐射束进行图案化。所述光刻设备还包括被配置为保持基板的基板台，配置成将所述图案化的光束投影到所述基板的目标部分上的投影系统;被配置为测量（a）所述基板台的参数的测量系统，或（b ）基板，或（c）由投影系统投影的图像，或（d）（a） - （c）的任何组合，以及被配置为将液体供应到基板和投影件之间的空间的液体供应系统系统。光刻设备还包括设置在测量系统的一部分附近并被配置为将测量系统的部分与液体隔离的屏蔽件。

7. 发明申请

US20050219482A1 Lithographic apparatus, device manufacturing method and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20050219482A1
公开(公告)日：2005-10-06
申请号：US10814822
申请日：2004-04-01
申请人： Johannes Jacobus Baselmans , Jeroen Johannes Mertens , Sjoerd Nicolaas Donders , Christiaan Hoogendam , Hans Jansen , Johannes Catharinus Mulkens , Bob Streefkerk
发明人： Johannes Jacobus Baselmans , Jeroen Johannes Mertens , Sjoerd Nicolaas Donders , Christiaan Hoogendam , Hans Jansen , Johannes Catharinus Mulkens , Bob Streefkerk
IPC分类号： H01L21/027 , G03B27/52 , G03F7/20 , G03F9/00
CPC分类号： G03F9/7096 , G03F7/70341
摘要： A substrate is exposed through immersion liquid supplied by a liquid supply system. Prior to being exposed, a map of the surface of the substrate is generated at a measurement station. A liquid supply system fills the space between a measurement system and the substrate so the measurement takes place through liquid.
摘要翻译：通过由液体供应系统供应的浸没液体暴露基板。在曝光之前，在测量台产生基板表面的图。液体供应系统填充测量系统和基板之间的空间，以便通过液体进行测量。

8. 发明申请

US20050174550A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050174550A1
公开(公告)日：2005-08-11
申请号：US10964816
申请日：2004-10-15
申请人： Bob Streefkerk , Johannes Jacobus Baselmans , Adrianus Engelen , Jozef Finders , Paul Graeupner , Johannes Catharinus Mulkens , Jan Bernard Van Schoot
发明人： Bob Streefkerk , Johannes Jacobus Baselmans , Adrianus Engelen , Jozef Finders , Paul Graeupner , Johannes Catharinus Mulkens , Jan Bernard Van Schoot
IPC分类号： G03F7/20 , G03F7/207 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70333
摘要： In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
摘要翻译：在浸没光刻设备或设备制造方法中，在成像期间投影图像的焦点位置改变以增加焦点宽度。在一个实施例中，焦点可以使用浸没式光刻设备的液体供应系统来改变。

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