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    • 1. 发明授权
    • Circuit component placement
    • 电路元件放置
    • US06768142B2
    • 2004-07-27
    • US10140965
    • 2002-05-08
    • Anwar AliTauman T. LauMax M. YeungKen NguyenWei Huang
    • Anwar AliTauman T. LauMax M. YeungKen NguyenWei Huang
    • H01L2710
    • H01L24/06H01L23/50H01L24/02H01L27/118H01L2224/05554H01L2224/05599H01L2224/85399H01L2924/00014H01L2924/01033H01L2924/14H01L2924/1433H01L2224/45099
    • A method for designing an input output cell of an integrated circuit. The input output cell has a required area, a width, and a height. The bonding pad pitch length between adjacent bonding pads of the integrated circuit is measured. The width of the input output cell is specified to be substantially equal to the bonding pad pitch length. The required area is divided by the width to determine a first value, and the height of the input output cell is specified to be substantially equal to the first value. In this manner, the width of the input output cells is no greater than the distance between two adjacent bonding pads, and thus the input output cells can be placed very close together, facilitating their use in input output limited integrated circuit designs. However, the height of the input output cells is no greater than is necessary to enclose the required area of the input output cell, thus facilitating their use in core limited integrated circuit designs. In various preferred embodiments, the bonding pads for the input output cells are disposed within their surface areas, thereby further reducing the surface area of the integrated circuit that is required for the input output functions of the integrated circuit.
    • 一种用于设计集成电路的输入输出单元的方法。 输入输出单元格具有所需的区域,宽度和高度。 测量集成电路的相邻焊盘之间的焊盘间距长度。 输入输出单元的宽度被规定为基本上等于接合垫间距长度。 将所需区域除以宽度以确定第一值,并且将输入输出单元的高度指定为基本上等于第一值。 以这种方式,输入输出单元的宽度不大于两个相邻键合焊盘之间的距离,因此输入输出单元可以非常靠近地放置在一起,便于它们在输入输出有限的集成电路设计中使用。 然而,输入输出单元的高度不大于包围输入输出单元的所需面积所需的高度,因此有助于它们在核心有限集成电路设计中的使用。 在各种优选实施例中,用于输入输出单元的接合焊盘设置在它们的表面区域内,从而进一步减小集成电路的输入输出功能所需的集成电路的表面积。
    • 2. 发明授权
    • Contact ring architecture
    • 联系环架构
    • US06683476B2
    • 2004-01-27
    • US10140967
    • 2002-05-08
    • Anwar AliTauman T. LauMax M. Yeung
    • Anwar AliTauman T. LauMax M. Yeung
    • H01L2500
    • H01L23/5286H01L2924/0002H01L2924/00
    • An integrated circuit with a VDDio bus line disposed on a first layer of the integrated circuit. The VDDio bus line is disposed along a length, and has a first width transverse to the length. A VSSio bus line is dispose on a second layer of the integrated circuit. The VSSio bus line is disposed along the length and has a second width transverse to the length. The second width of the VSSio bus line substantially overlaps the first width of the VDDio bus line. An input output cell is disposed on a third layer of the integrated circuit. The first layer, the second layer, and the third layer are all different layers of the integrated circuit. The input output cell has a first transistor electrically connected to the VDDio bus line, and a second transistor electrically connected to the VSSio bus line. The first transistor and the second transistor are disposed along the length within the input output cell.
    • 具有布置在集成电路的第一层上的VDDio总线的集成电路。 VDDio总线沿着长度设置,并且具有横向于该长度的第一宽度。 VSSio总线布置在集成电路的第二层上。 VSSio总线沿着该长度设置并且具有横向于该长度的第二宽度。 VSSio总线的第二宽度基本上与VDDio总线的第一宽度重叠。 输入输出单元设置在集成电路的第三层上。 第一层,第二层和第三层都是集成电路的不同层。 输入输出单元具有电连接到VDDio总线的第一晶体管和与VSSio总线电连接的第二晶体管。 第一晶体管和第二晶体管沿着输入输出单元内的长度设置。
    • 4. 发明授权
    • Test structure for detecting bonding-induced cracks
    • 用于检测接合引起的裂纹的测试结构
    • US06998638B2
    • 2006-02-14
    • US10856213
    • 2004-05-28
    • Qwai H. LowRamaswamy RanganathanAnwar AliTauman T. Lau
    • Qwai H. LowRamaswamy RanganathanAnwar AliTauman T. Lau
    • H01L23/58
    • H01L24/05H01L22/34H01L24/48H01L2224/04042H01L2224/05001H01L2224/05073H01L2224/05093H01L2224/05095H01L2224/05624H01L2224/48463H01L2224/85399H01L2924/00014H01L2924/01013H01L2924/01019H01L2924/01029H01L2924/14H01L2224/45099H01L2924/00
    • An integrated circuit having a crack detection structure. A control structure is formed having interleaved electrically conductive layers and non electrically conductive layers in a vertical orientation. Electrically conductive vias are disposed vertically through all of the non electrically conductive layers, which vias electrically connect all of the electrically conductive layers one to another. A test structure is formed having a bonding pad for probing and bonding, with underlying interleaved electrically conductive layers and non electrically conductive layers disposed in a vertical orientation. At least one of the non electrically conductive layers has no vias formed therein, simulating active circuitry under other bonding pads of the integrated circuit. At least one of the interleaved electrically conductive layers of the control structure extends from within the control structure to within the test structure as a sensing layer. The sensing layer immediately underlies the at least one of the non electrically conductive layers in the test structure that has no vias formed therein. Thus, a crack in the at least one of the non electrically conductive layers in the test structure that has no vias formed therein is detectable as a leakage current between the bonding pad of the test structure and a top most electrically conductive layer of the control structure.
    • 具有裂纹检测结构的集成电路。 形成具有垂直取向的交错导电层和非导电层的控制结构。 导电通孔垂直地设置在所有非导电层上,通孔将所有的导电层彼此电连接。 形成具有用于探测和结合的接合焊盘的测试结构,其中底层交错的导电层和以垂直取向设置的非导电层。 非导电层中的至少一个在其中没有形成通孔,模拟集成电路的其它接合焊盘下的有源电路。 控制结构的交错导电层中的至少一个从控制结构内延伸到作为感测层的测试结构内。 感测层紧邻在其中形成有通孔的测试结构中的非导电层中的至少一个之上。 因此,测试结构中没有形成通孔的非导电层中的至少一个的裂纹可以被检测为在测试结构的焊盘与控制结构的最高导电层之间的漏电流 。
    • 10. 发明授权
    • Test structure for detecting bonding-induced cracks
    • 用于检测接合引起的裂纹的测试结构
    • US06781150B2
    • 2004-08-24
    • US10229601
    • 2002-08-28
    • Qwai H. LowRamaswamy RanganathanAnwar AliTauman T. Lau
    • Qwai H. LowRamaswamy RanganathanAnwar AliTauman T. Lau
    • H01L2358
    • H01L24/05H01L22/34H01L24/48H01L2224/04042H01L2224/05001H01L2224/05073H01L2224/05093H01L2224/05095H01L2224/05624H01L2224/48463H01L2224/85399H01L2924/00014H01L2924/01013H01L2924/01019H01L2924/01029H01L2924/14H01L2224/45099H01L2924/00
    • An integrated circuit having a crack detection structure. A control structure is formed having interleaved electrically conductive layers and non electrically conductive layers in a vertical orientation. Electrically conductive vias are disposed vertically through all of the non electrically conductive layers, which vias electrically connect all of the electrically conductive layers one to another. A test structure is formed having a bonding pad for probing and bonding, with underlying interleaved electrically conductive layers and non electrically conductive layers disposed in a vertical orientation. At least one of the non electrically conductive layers has no vias formed therein, simulating active circuitry under other bonding pads of the integrated circuit. At least one of the interleaved electrically conductive layers of the control structure extends from within the control structure to within the test structure as a sensing layer. The sensing layer immediately underlies the at least one of the non electrically conductive layers in the test structure that has no vias formed therein. Thus, a crack in the at least one of the non electrically conductive layers in the test structure that has no vias formed therein is detectable as a leakage current between the bonding pad of the test structure and a top most electrically conductive layer of the control structure.
    • 具有裂纹检测结构的集成电路。 形成具有垂直取向的交错导电层和非导电层的控制结构。 导电通孔垂直地设置在所有非导电层上,通孔将所有的导电层彼此电连接。 形成具有用于探测和结合的接合焊盘的测试结构,其中底层交错的导电层和以垂直取向设置的非导电层。 非导电层中的至少一个在其中没有形成通孔,模拟集成电路的其它接合焊盘下的有源电路。 控制结构的交错导电层中的至少一个从控制结构内延伸到作为感测层的测试结构内。 感测层紧邻在其中形成有通孔的测试结构中的非导电层中的至少一个之上。 因此,测试结构中没有形成通孔的非导电层中的至少一个的裂纹可以被检测为在测试结构的焊盘与控制结构的最高导电层之间的漏电流 。