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    • 1. 发明授权
    • Method for prioritizing production lots based on grade estimates and output requirements
    • 根据年龄估计和产出要求确定生产批次的方法
    • US06699727B1
    • 2004-03-02
    • US09821675
    • 2001-03-29
    • Anthony J. TopracJoyce S. Oey HewettChristopher A. BodeAlexander J. PasadynAnastasia Oshelski PetersonThomas J. SondermanMichael L. Miller
    • Anthony J. TopracJoyce S. Oey HewettChristopher A. BodeAlexander J. PasadynAnastasia Oshelski PetersonThomas J. SondermanMichael L. Miller
    • G01R3126
    • H01L22/20G05B19/418G05B2219/32194G05B2219/32263Y02P90/02Y02P90/18Y02P90/20Y02P90/22
    • A method for prioritizing production flow includes processing a plurality of manufactured items in a process flow; measuring characteristics of a plurality of manufactured items in the process flow; estimating performance grades for the plurality of manufactured items based on the measured characteristics; grouping the manufactured items with like estimated performance grades; assigning priorities to groups of manufactured items with like estimated performance grades; and directing the plurality of manufactured items through the process flow based on the assigned priorities. A manufacturing system includes a plurality of processing tools adapted to process a plurality of manufactured items in a process flow, a metrology tool, and a process control server. The metrology tool is adapted to measure characteristics of a plurality of manufactured items in the process flow. The process control server is adapted to estimate performance grades for the plurality of manufactured items based on the measured characteristics, group the manufactured items with like estimated performance grades, assign priorities to groups of manufactured items with like estimated performance grades, and direct the plurality of manufactured items through the process flow based on the assigned priorities.
    • 一种用于确定生产流程优先级的方法包括在处理流程中处理多个制造的物品; 测量处理流程中的多个制成品的特性; 基于所测量的特性来估计所述多个制造物品的性能等级; 对具有相似估计性能等级的制成品进行分组; 将优先事项分配给具有类似估计绩效等级的制成品组; 以及基于所分配的优先级,通过所述处理流程来引导所述多个制造的物品。 制造系统包括多个处理工具,其适用于处理流程中的多个制造物品,计量工具和过程控制服务器。 计量工具适于测量处理流程中的多个制造物品的特性。 过程控制服务器适于基于测量的特性来估计多个制造物品的性能等级,将具有相似估计性能等级的制造物品分组,将具有相似估计性能等级的制造商品组的优先级分配给多个 基于分配的优先级,通过流程流程制造出的物品。
    • 4. 发明授权
    • Method and apparatus for integrating multiple process controllers
    • 用于集成多个过程控制器的方法和设备
    • US06801817B1
    • 2004-10-05
    • US09789140
    • 2001-02-20
    • Christopher A. BodeAlexander J. PasadynAnthony J. TopracJoyce S. Oey HewettAnastasia Oshelski PetersonThomas J. SondermanMichael L. Miller
    • Christopher A. BodeAlexander J. PasadynAnthony J. TopracJoyce S. Oey HewettAnastasia Oshelski PetersonThomas J. SondermanMichael L. Miller
    • G06F1900
    • G05B19/41865G05B19/40937Y02P90/16Y02P90/20Y02P90/265
    • A method for controlling a manufacturing system includes processing workpieces in a plurality of tools; initiating a baseline control script for a selected tool of the plurality of tools; providing context information for the baseline control script; determining a tool type based on the context information; selecting a group of control routines for the selected tool based on the tool type; determining required control routines from the group of control routines based on the context information; and executing the required control routines to generate control actions for the selected tool. A manufacturing system includes a plurality of tools adapted to process workpieces, a control execution manager, and a control executor. The control execution manager is adapted to initiate a baseline control script for a selected tool of the plurality of tools and provide context information for the baseline control script. The control executor is adapted to execute the baseline control script, determine a tool type based on the context information, select a group of control routines for the selected tool based on the tool type, determine required control routines from the group of control routines based on the context information, and execute the required control routines to generate control actions for the selected tool.
    • 一种用于控制制造系统的方法包括:处理多个工具中的工件; 为所述多个工具的所选择的工具启动基线控制脚本; 提供基线控制脚本的上下文信息; 基于上下文信息确定工具类型; 基于所述工具类型为所选择的工具选择一组控制例程; 基于所述上下文信息来确定来自所述一组控制例程的所需控制例程; 并执行所需的控制例程以产生所选择的工具的控制动作。 制造系统包括适于处理工件的多个工具,控制执行管理器和控制执行器。 所述控制执行管理器适于启动用于所述多个工具的所选工具的基线控制脚本并提供所述基线控制脚本的上下文信息。 控制执行器适于执行基线控制脚本,基于上下文信息确定工具类型,基于工具类型为所选择的工具选择一组控制例程,从基于控制例程的组中确定所需的控制例程 上下文信息,并执行所需的控制例程以生成所选择的工具的控制动作。
    • 8. 发明授权
    • Method and apparatus for controlling wafer uniformity using spatially resolved sensors
    • 使用空间分辨的传感器控制晶片均匀性的方法和装置
    • US06706541B1
    • 2004-03-16
    • US09421803
    • 1999-10-20
    • Anthony J. TopracMichael L. Miller
    • Anthony J. TopracMichael L. Miller
    • H01L2100
    • H01J37/32935H01J37/3299
    • A processing system includes a sensor, a processing tool, and an automatic process controller. The sensor has a plurality of sensing regions. The processing tool is adapted to process at least one process layer on a wafer. The process tool includes a process control device controllable by a process control variable. The sensor is adapted to measure a process layer characteristic of the process layer in a selected one of the sensing regions. The automatic process controller is adapted to receive the process layer characteristics measured by the sensor and adjust the process control variable in response to the process layer characteristic measured in one sensing region differing from the process layer characteristic measured in another sensing region. A method for controlling wafer uniformity includes processing a process layer on a wafer; measuring a characteristic of the layer in a plurality of sensing locations; and changing a process control variable of a process control device in response to the process layer characteristic measured in one sensing location differing from the process layer characteristic measured in another sensing location to affect the rate of processing the process layer in at least one of the sensing locations.
    • 处理系统包括传感器,处理工具和自动过程控制器。 传感器具有多个感测区域。 处理工具适于处理晶片上的至少一个处理层。 处理工具包括可由过程控制变量控制的过程控制装置。 传感器适于测量所选感测区域中的处理层的处理层特性。 自动过程控制器适于接收由传感器测量的过程层特性,并且响应于在与另一感测区域中测量的处理层特性不同的一个感测区域中测量的过程层特性来调整过程控制变量。 一种用于控制晶片均匀性的方法包括处理晶片上的处理层; 测量多个感测位置中的层的特性; 以及响应于在一个感测位置中测量的处理层特性改变过程控制设备的过程控制变量,所述过程控制变量与在另一感测位置中测量的过程层特性不同,以影响在至少一个感测中处理过程层的速率 位置。